SemiStar Corp. has been professionally providing equipment, parts

Company-SemiStar

Welcome to SemiStar Corp
Your Trusted Partner in High-Tech Manufacturing Solutions.

SemiStar Corp is a privately owned company specializing in comprehensive technical and business development solutions for high-tech manufacturing and research. Our expertise spans multiple industries, including semiconductors, MEMs, biomedical, nanotechnology, solar, and LEDs.

Our Specialties
We provide high-quality reconditioned semiconductor equipment and worldwide express delivery of spare parts for leading brands such as AG Associates, AMAT, Brooks Equipe PRI, Gasonics, Lam, Matrix, Mattson, Novellus, Nordson March, Tegal, and Tel.

Why SemiStar Corp?
Located in the heart of Silicon Valley, our experienced management team and engineers are committed to delivering top-tier quality and customer satisfaction with a responsive support system. We aim to be your long-term business partner, helping you achieve your operational and technological goals.

Manufacturer Representation & Distribution
As a manufacturer’s representative organization, we offer cutting-edge products and solutions for industries such as Semiconductor, Optoelectronics, Wireless, Defense/Aerospace, and Life Sciences. Our distribution portfolio includes:

Nano-Master: ALD, PECVD, MOCVD, PAALE, PEALD, RIE, ICP, DRIE, Evaporator, Sputter, Cleaning, Dual Chamber, Optical Coating, Space Simulation, and Plasma Source Systems.
Tystar Corporation: Furnace, Atmosphere CVD, and PLCVD Instruments.
Premtek International Inc: Vacuum RTPs and TC wafers.
Glow Research: Desktop low-cost plasma ashers, etchers, and cleaners.
Ekrubnano: Micro IION Plasma RIE and NANOTHERM FABLINE Furnace/LPCVD.
USIC: 200mm, 300mm wafers, and 350mm Si ingots.
Customized Quartz, Ceramic, and Silicon Parts for AG Associates, AMAT, Brasnon, Gasonics, Lam, Matrix, Mattson, Novellus, Tegal, and Tel.

At SemiStar Corp, we are dedicated to innovation, quality, and customer success. Contact us today to learn how we can support your business with industry-leading solutions and technology.

hermal annealer, Lindberg furnaces,Plasma therm ICP (deep RIE), Plasma therm PECVD, Plasma term RIE, STS PECVD, PlasMos ellipsometer, Ozone stripper, Alpha step profilometer, Veeco Dektak profilometer, Filmetrics Profilm3D Profilometer Tencor Alpha-Step 200 Profilometer AST VCA Optima XE Zeiss Axiotech Microscope Cascade Probe Station PDMS Alignment Tool 3D Systems Figure 4 3D Printer Motic BA310MET-T Microscope CorSolutions PDMS Port Creator Disco DAD 2H/6T Wafer Dicer Fisher Muffle Furnace Lindberg/Blue M Tube Furnace Blue M Oven Lindberg/Blue M Oven Unitron Z10 Stereo Zoom Microscope Leica Stereo Zoom Microscope Electro-Technic Products BD-20 Corona Treater Harrick PDC-32G Plasma Cleaner PDMS Station Brewer Science Cee 100 PVD Chamber Stratasys Mojo 3D Printer Universal M-25 CO2 LASER Engraver SUSS MicroTec PMC-150 Cryoprober Keysight PNA Network Analyzer N5127B DC-67 GHz Lakeshore CPX Cryogenic Probe Station Zurich Instruments HF2LI Lock-in Amplifier Cascade Microtech Model 9000 Manual RF Probe Station QuikLaze-50 Multi-Wavelength Laser Trimming Station JFP Microtechnic Flip Chip Bonder WestBond 747677E Three-Way Convertible Manual Bonder Cincinnati Sub-Zero MicroClimate Temperature Chamber Zyvex tDriver 1600 Micro-Electro-Mechanical (MEMS) Control Station Lithography Equipment DUV Exposure Station and Aligner MicroWriter ML3 Pro Metrology Equipment Ellipsometer Reflectometer Atomic Force Microscope (AFM) Scanning Electron Microscope (SEM) NIR-UV-VIS Spectrophotometer Measuroscope Optical Microscope Plasma etching (Deep Reactive Ion Etching) Analytic Probe Contact Profilometer Optical Profilometer Processing Equipment Plasma Asher Hot Plate Station Non-vacuum Oven Denton Plasma Coating Xanthos Hood Probestation (Zeus) PE50 O2 Plasma Asher Oxidation Furnace-Wet Teaching Bay Diffusion Furnace (MRL P-Type) Teaching Bay Diffusion Furnace (MRL N-Type) Hydra Wet Hood Chimera Wet Hood Wafer Bonder 3-Zone Tube Furnace Ebeam Evaporator RTP Oxford ICP/RIE Back-End Processing Critial Point Dryer Lapping and Polishing Tool LatticeGear Scribing Tools MA 1006 Dicing Saw Chemical Vapor Deposition EasyTube Diffusion Furnace Fiji Plasma ALD GSI 2000 PECVD SSI Solaris RTA Etching AutoGlow 200 Plasma Cleaner Oxford 100 ICP RIE Oxford 80+ ICP RIE Oxford Cryo Bosch DRIE XeF2 Silicon Etcher Lithography EVG 620 Mask Aligner Heidelberg DWL-66 Laser Mask Writer Laurell Spinners YES HDMS Prime Ovens Metrology Filmetrics F54-UV Reflectometer Four Point Probe Station KLA P-7 Stylus Profiler Olympus BH-2 Optical Microscope Woollam Ellipsometer Zeta-20 Optical Profiler Sputtering and Evaporation Denton E-Beam Evaporator KJL Sputterer Nano38 Thermal Evaporator PETE E-Beam Evaporator PECVD PEALD AJA Magnetron Sputter SuSS MJB4 Contact Aligner Vacuum Oven Chemical Hoods Deposition Equipment E-Beam Evaporator Lithographic Tools LaserWriter.jpg UV Mask Aligner (front side and front to back) Laser Writer MLA Interferometric Lithography System 100KV Electron Beam Lithography System (JEOL 9100 FS) Raith 30KV Electron Beam Lithography System Focused Ion Beam System Plasma and Reactive Ion Etching Oxford ICP etching system (2 chambers – 1 loadlock) Oxford 6 Inch ICP March RIE etchers Wet Processing WAFER PRIMING OVEN LAMINAR FLOW PROCESS STATIONS Deposition Small Coater AJA Oxide Sputter System AJA Sputter System (metals) FC2000 Ferrotec Ebeam Evaporator(metals) ICP – CVD Deposition System Nanocarbon Synthesis Facilities Lamda Microwave Plasma CVD system (nanocrystalline diamond deposition) Thermal/PECVD System for Synthesis of CNT and Graphene Seeding Station for UNCD Deposition Metrology SPECTROSCOPIC ELLIPSOMETER SCANNING PROBE MICROSCOPE SURFACE PROFILOMETERS Filmetrics F40-UV OPTICAL MICROSCOPE RESISTIVITY MEASUREMENT SYSTEM SCANNING VIBRATING ELECTRODE SYSTEM VOLTAMMETRY SYSTEM Misc Tools ADT 7200 Dicing Saw Critical Point Dryer Jeol JBX-5500FS Electron Beam Writer Nanonex NX-2004 ABM Mask Aligner Thermionics eBeam Evaporator AJA ATC-2200 Denton Desk II Brewer Cee 200X KRI KDC75 Oxford Instrument Plasmalab System 100 ICP Oxford Instrument Plasmalab System 80 Fume Hoods Allwin AW 410 Ultraviolet Ozone Cleaning System Characterization X-ray Photoelectron Spectroscopy Electron Microprobe Scanning Electron Microscope ICP-MS ICP-OES RAMAN Combustion Elemental Analyzer (CHN) Leica GZ Stereo Microscope Spectroscopic Ellipsometer WYKO NT1100 3-D Profiling System Lithography and NanoImprint Electron Beam Nanolithography System Nanonex NX1000 NanoImprint OAI Mask Aligner Model 800 Thin-film deposition Angstrom Engineering 6-pocket E-Beam Evaporator IntlVac – Nanochrom I Sputterer Oxford Instruments – Atomic Layer Deposition (ALD) System – OpAL Nanonex_Ultra Plasma etching Oxford Instruments – RIE-ICP PlasmaPro 100 Cobra Oxford Instruments RIE NGP80 Sample Preparation VWR Vacuum Oven – AFM – Asylum MFP3D – Confocal Laser Scanning Microscope – Zeiss LSM 700 – Contact angle – Dataphysics OCA15plus – Dynamic Light Scattering (DLS) – AvidNano W130i – Optical Microscope – Olympus BX51 – Optical Stereo Microscope – Leica M80 – Scanning Electron Microscopy Focused Ion Beam (SEM-FIB) workstation – Tabletop microscope TM3030 Plus Hitachi – Drying oven – Electro-optical bench – Glove Box – Heated vacuum desiccator – Langmuir–Blodgett – NMR Spectrometer – Precision Balance – Rotovapor – UV/Vis Spectrophotometer – Agilent 4155C semiconductor parameter analyzer + Cascade Microtech M150 manual probe station – Agilent 4155C semiconductor parameter analyzer + Everbeing C-2 Mini manual probe station – Biorad/Nanometrics HL5500 Hall effect systems – Jandel Four point prober – Keithley 4200 SCS semiconductor parameter analyzer + Janis ST-500 cryogenic probe station – Keysight B1500A semiconductor parameter analyzer + Cascade Microtech EPS 150 manual probe station – Potentiostat Gamry Reference 600 – Heidelberg µPG 101 Tabletop Micro Pattern Generator – Hot plates – Spinners for resist coating and development – Suss MA6 UV mask aligner – Suss substrate conformable nanoimprint lithography (SCIL) – Trion Phantom 3 reactive ion etcher (RIE-ICP) – Zeiss Axioscope 5 optical microscope – AJA ATC-1300 F Sputtering – AJA ATC-1800 F Sputtering – AJA Orion-8 Sputtering – AnnealSys As-One 100 Rapid thermal processing – ELETTRORAVA PECVD – HOSITRAD PECVD – Resistive and e-beam evaporators – Speciality Coating PDS-2010 Parylene coater – “3 chamber” PECVD – “3 target” home-made sputtering – “Home-made” e-beam evaporator – “Pfeiffer” sputtering – FTIR – Thermo Nicolet 6700 – Luminescence Spectrometer – Perkin Elmer LS55 – Micro Plate Reader – Raman Microscope – Reninshaw Qontor – Spectrometer UV-Vis_NIR – Perkin Elmer Lambda 950 – Spectroscopic Ellipsometer – Horiba-Jobin Yvon – Sun Simulator – SPI 240A – TGA-DSC – STA 449 F3 Jupiter – X-ray diffraction – PANalytical Xpert PRO CHARACTERIZATION 3D Optical Profiler – Zygo Atomic Force Microscope – Bruker Edge Contact Angle Measurement – VCA Optima XE Electrical Test Station Microscope – Nikon LV150 Reflectometer – Filmetrics F20 Spectroscopic Ellipsometer – J.A. Woollam alpha-SE Stylus Profilometer – Veeco Dektak-8 DEPOSITION Atomic Layer Deposition – Arradiance GEMStar XT-P E-beam Evaporator – AJA Parylene Coater – SCS Labcoter2 Parylene Deposition System Plasma Enhanced Chemical Vapor Deposition (PECVD) – STS LpX CVD Sputter I – AJA Orion Sputter II – AJA Orion Thermal Evaporator – Denton Vacuum Explorer 14 ETCHING – ASHING Deep Reactive Ion Etcher (DRIE) – STS LpX Pegasus Plasma Cleaner – Samco PC-300 Reactive Ion Etcher (RIE) – Samco RIE-10NR Xenon Difluoride Etcher – Xactix FURNACES Furnace – Tystar Rapid Thermal Processor – AW-610 PACKAGING Laser Cutter – LPKF ProtoLaser R Wire Bonder -Ball- iBond5000 Wire Bonder – Wedge – West Bond 747677E PHOTOLITHOGRAPHY Convection Ovens – Blue M DCC-146-C-ST350 Develop Hood Mask Aligner – Suss MABA6 Mask Aligner – Suss MJB4 Maskless Aligner – Heidelberg MLA150 Maskless Aligner – Heidelberg uPG501 Microscope – Nikon LV150 Polyimide/SU8 Hood Spinner Hood Ultraviolet Flood Exposure System – Inpro Technologies F300S Vacuum Oven – YES WET PROCESSING Acid Hoods Critical Point Dryer – Tousimis Automegasamdri – 915B, Series C Ultrasonic and Megasonic Cleaners Characterization 1540XB FIB/SEM Stacks Image 173 Tencor P7 Profilometer Stacks Image 177 1530 SEM Stacks Image 175 Woollam Ellipsometer Stacks Image 179 Leica Stereozoom Stacks Image 183 Zeiss Axioskop Stacks Image 181 Mitutoyo Finescope Stacks Image 197 Lithography Neutronix-Quintel NXQ4006 Mask Aligner Stacks Image 107 Solitec 5110 coater/developer Stacks Image 111 Karl Suss MA6 Mask Aligner Stacks Image 109 CEE 200 spinner Stacks Image 113 Zeiss 1530 e-beam Lithography Stacks Image 117 Yield Engineering YES-3TA HMDS oven Stacks Image 115 Zeiss 1540XB FIB lithography Stacks Image 119 Innopsys Innostamp Stacks Image 121 Deposition Angstrom e-beam Deposition Stacks Image 91 IKO Electroplating Bench Stacks Image 95 Custom e-beam Deposition Stacks Image 93 Filgen Osmium Plasma Coater Stacks Image 97 STS PECVD Stacks Image 101 Edwards Auto500 Sputtering Stacks Image 99 Etching Trion Orion RIE Stacks Image 235 Miscellaneous Grey Lab Spinner Stacks Image 223 Ozone Cleaner Stacks Image 221 Spin Rinse Dryer Stacks Image 219 Dicing Saw Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean,Gasonics AE 2001, Gasonics AE 2000LL Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Tegal 915, Tegal 965, Tegal 405, Tegal 401 Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch Rapid Thermal Process, Modular Process Technology, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, 4100 , 4100S 4108, 8108 ,Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing,JIPELEC, ag2146,JetClip,JetStar, AST SHS2000, AST STEAG 2800, ssintegration, Rapid Thermal Oxide,JetFirst ,Mattson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG-MATTSON 2800, STEAG-MATTSON 2900, STEAG-MATTSON 3000, heat pulse, Solaris, Eclipse ,modularpro, RLA-1000, AG Heatpulse, rapid thermal processor, Steag AST SHS2000, Solaris 75, Solaris75,STEAG Electronic Systems ,eng-sol, Annealsys, RLA-3000, Engineering Solutions ，Solaris 150, Rapid Thermal Annealer , AS-Master ,modularpro,RTO ,Modular Process Technology, Solaris150,AS-One,AS-Micro, ADDAX, JetFirst, JetLight, JetStar, MPT-600S,MPT-800S, MPT-600XP, MPT-800XP, MPT-3000, Jipelec Jetfirst 150,Jipelec Jetfirst 200, JETFIRST 100,AnnealSys AS-One, RTP-3000, ULVAC, Ulvac Technology MILA 3000 ,Rapid Thermal Annealing, ULVAC RTA-2000,ULVAC RTA-4000,ULVAC RTA-6000,ULVAC RTA-8000,ULVAC RTA-12000, EasyTube® 3000EXT, CVD Equipment Corporation, Dr. Eberl MBE-Komponenten GmbH, AO 600,Rapid Thermal Annealing System,MBE Components,MBE Systems,OCTOPLUS 300,OCTOPLUS 400,OCTOPLUS 500,OCTOPLUS 500 EBV,OCTOPLUS 600,OCTOPLUS 600 EBV,OCTOPLUS-O 400,Thin Film Systems,Organic Deposition System,Rapid Thermal Annealing,MBE Components,Thin Film / CIGS / CZTS / CdTe,ECM, Annealsys AS-Premium, Annealsys Zenith-100, Annealsys AS-One, Annealsys AS-Master, Jipelec JetStar, Annealsys AS-Micro, Jipelec JetLight, Jipelec JetFirst 100, Jipelec JetFirst 200, Jipelec JetFirst 300, CreaTec Fischer & Co. GmbH, Rapid Thermal Anneling System, Mini MBE System,Growth System, Research Linear Transfer System,RTA System,UHV Shuttle System, SemiTEq JSC, Molecular-Beam Epitaxy Systems (MBE),PVD Systems,RTP & RTA Systems,ICP/RIE/PECVD Systems,Components and accessories, STE RTP150, STE RTA100, STE ICP200 , ADVANCE RIKO, Inc., RTP-mini, Atmospheric Thermoelectric Module Evaluation System F-PEM,Mini Lamp Annealer MILA-5050,infrared lamp heating system, ULTECH CO.LTD,Real RTP-100,Real RTP-100,Real RTP-150,Real RTP-Mini,SPUTTER,DRY ETCHER,PECVD,ALD,E beam evaporator,Thermal Evaporator, SJ High Technology ,Tube RTA,R-8160,drawer type RTA, R-401, Dai-ichi Kiden Co.,Ltd., Combustion furnace,High vacuum heating system,Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system, Koyo Thermo Systems Co.,Ltd., Premtek Technology Co，技鼎股份有限公司，技鼎股份有限公司，VF-5900 300mm Large Batch,VF-5700 300mm Mini Batch,VF-5300,8 inch,Large Batch,VF-5100,8 inch,Wide-Range Batch,VF-3000,8 inch,Low-Cost Mini Batch,VF-1000,Small Production and R&D,VFS-4000,Large Bore Vertical Furnace,Koyo Thermo Systems Co.,Ltd.,Model 200 Series Horizontal Furnaces for Mass Production and Experiments,Model 206A Horizontal Furnace for PV Production ,Model 206A Horizontal Furnace for PV ,Production,RLA-3100 Lamp Annealing System for Rapid Thermal Processing,RLA-1200 Lamp Annealing System for Rapid Thermal Processing,RLA-1200 Lamp Annealing System for Rapid Thermal Processing,SO2-12-F Heated-air Circulating Type Clean Oven for 300-mm Wafers,CLH Series High-Temperature Clean Ovens,CLH Series High-Temperature Clean Ovens,VFS-4000 Large Bore Vertical Furnace,VF-5300HLP Activation Annealing Furnace,VF-5300H Vertical Furnace for Gate Insulating Film Formation,VF-5300H Vertical Furnace for Gate Insulating Film Formation,RLA-4106-V Lamp Annealing System for Contact Annealing,RLA-4106-V Lamp Annealing System for Contact Annealing,VF-3000HLP Activation Annealing Furnace, VF-3000HLP Activation Annealing Furnace,VF-3000H Vertical Furnace for Gate Insulating Film Formation,VF-3000H Vertical Furnace for Gate Insulating Film Formation,RLA-3100-V Lamp Annealing System for Contact Annealing,RLA-3100-V Lamp Annealing System for Contact Annealing,Rapid temperature rise annealing furnace RTP_Table ，RTP_Table type rapid temperature rise annealing furnace，Rapid temperature rise annealing furnace RTP_SA ，RTP ，semi-automatic rapid temperature rise annealing furnace，Rapid temperature rise annealing furnace ，RTP_Auto ，automatic rapid temperature rise annealing furnace，RTP600V，RTP600Z，RTP500Z，RTP500V，RTP500SV，快速退火炉，北京东之星应用物理研究所，快速升溫退火爐，estarlabs，Glovebox+PVD,2D material CVD,LPCVD & furnace,Vacuum Sintering Furnace,RTP,Plasma Doping (PDS),ASHER,Wet bench,Crystal Si solarcell Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor, Sonog-age 200, Sono-gage 300, Sonogage200, Sonogage 300, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition Singulus,singular, pecvd,Plasma Enhanced Chemical Vapor Deposition, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment Furnace, MRL, MRL 4 Stack,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment ,快速退火炉，速升溫退火爐，保护气氛快速退火炉，保護氣氛快速退火爐，快速退火爐，红外灯加热，红外灯快速退火，卤素灯加热，高温计，红外高温计，等离子去胶机，等离子刻蚀，深刻蚀，各向同性，各向异性，等离子清洗，溅射台，蒸发台，磁控溅射台，直流电源溅射，高频溅射，自动刻蚀机，自动去胶机，手动去胶机，手动刻蚀机，干法去胶机，湿法去胶机，干法刻蚀机，湿法刻蚀机，半导体设备，半导体旧设备，半导体中古设备，半导体前道工艺设备，半导体后道工艺设备，半导体前道设备，半导体后道设备，半导体量测仪器，半导体量测设备，美国制造，紅外線燈加熱，紅外線燈快速退火，鹵素燈加熱，高溫計，紅外線高溫計，等離子去膠機，等離子蝕刻，深刻蝕，各向同性，各向異性，等離子清洗，濺射台，蒸發台，磁控濺射台，直流電源濺射，高頻濺射，自動蝕刻機，自動去膠機，手動去膠機，手動蝕刻機，乾式去膠機，濕式去膠機，乾法蝕刻機，濕蝕刻機，半導體設備，半導體舊設備，半導體中古設備，半導體前道製程設備，半導體後道製程設備，半導體前道設備，半導體後道設備，半導體量測儀器，半導體量測設備，美國製造 Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean,Gasonics AE 2001, Gasonics AE 2000LL Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Tegal 915, Tegal 965, Tegal 405, Tegal 401 Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch Enviro,ENVIRO-1XaENVIRO-1Xa ,2CENVIRO-Optima,Luminous NA,NA-8000NA-1300NA-1500 ,Multifilm,NE-550EXaNE-950EX, APIOSNE-5700Deep, Oxide Etching ,NLD-570EXaRISE System,RISE Series,Cluster Systems,SME SeriesuGmni Series,SRH SeriesULDiS Series,SMV-500FRoll-coater,SPW SeriesIn-line Systems,SIV SeriesSDH-4550LR&D,CS-200, 300mm,ENTRON-EXENTRON-EX2,Evaporation Roll Coater,EW SeriesR&D/Pilot Production,Ei-5In-line Systems, Ei-H series,Si Processing,IMX-3500SOPHI-200/260 ,SiC,IH-860,Brazing Furnace,FB SeriesFHHn series ,Vacuum Sintering,FSC SeriesVacuum,Induction Melting,FMI Series,Vacuum Heat Treatment,FHB-60CFHV Series,Single-Substrate,CC Series,CME Series,In-line Systems, ULGLAZE Series,Lyophilizer,DFB Series,Micropowder Dry, UPD-400D,FM Series,DFR Series,Centrifugal Type,CEH-400B,ULVAC Rapid Thermal Process, Modular Process Technology, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, 4100 , 4100S 4108, 8108 ,Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing,JIPELEC, ag2146,JetClip,JetStar, AST SHS2000, AST STEAG 2800, ssintegration, Rapid Thermal Oxide,JetFirst ,Mattson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG-MATTSON 2800, STEAG-MATTSON 2900, STEAG-MATTSON 3000, heat pulse, Solaris, Eclipse ,modularpro, RLA-1000, AG Heatpulse, rapid thermal processor, Steag AST SHS2000, Solaris 75, Solaris75,STEAG Electronic Systems ,eng-sol, Annealsys, RLA-3000, Engineering Solutions ，Solaris 150, Rapid Thermal Annealer , AS-Master ,modularpro,RTO ,Modular Process Technology, Solaris150,AS-One,AS-Micro, ADDAX, JetFirst, JetLight, JetStar, MPT-600S,MPT-800S, MPT-600XP, MPT-800XP, MPT-3000, Jipelec Jetfirst 150,Jipelec Jetfirst 200, JETFIRST 100,AnnealSys AS-One, RTP-3000, ULVAC, Ulvac Technology MILA 3000 ,Rapid Thermal Annealing, ULVAC RTA-2000,ULVAC RTA-4000,ULVAC RTA-6000,ULVAC RTA-8000,ULVAC RTA-12000, EasyTube® 3000EXT, CVD Equipment Corporation, Dr. Eberl MBE-Komponenten GmbH, AO 600,Rapid Thermal Annealing System,MBE Components,MBE Systems,OCTOPLUS 300,OCTOPLUS 400,OCTOPLUS 500,OCTOPLUS 500 EBV,OCTOPLUS 600,OCTOPLUS 600 EBV,OCTOPLUS-O 400,Thin Film Systems,Organic Deposition System,Rapid Thermal Annealing,MBE Components,Thin Film / CIGS / CZTS / CdTe,ECM, Annealsys AS-Premium, Annealsys Zenith-100, Annealsys AS-One, Annealsys AS-Master, Jipelec JetStar, Annealsys AS-Micro, Jipelec JetLight, Jipelec JetFirst 100, Jipelec JetFirst 200, Jipelec JetFirst 300, CreaTec Fischer & Co. GmbH, Rapid Thermal Anneling System, Mini MBE System,Growth System, Research Linear Transfer System,RTA System,UHV Shuttle System, SemiTEq JSC, Molecular-Beam Epitaxy Systems (MBE),PVD Systems,RTP & RTA Systems,ICP/RIE/PECVD Systems,Components and accessories, STE RTP150, STE RTA100, STE ICP200 , ADVANCE RIKO, Inc., RTP-mini, Atmospheric Thermoelectric Module Evaluation System F-PEM,Mini Lamp Annealer MILA-5050,infrared lamp heating system, ULTECH CO.LTD,Real RTP-100,Real RTP-100,Real RTP-150,Real RTP-Mini,SPUTTER,DRY ETCHER,PECVD,ALD,E beam evaporator,Thermal Evaporator, SJ High Technology ,Tube RTA,R-8160,drawer type RTA, R-401, Dai-ichi Kiden Co.,Ltd., Combustion furnace,High vacuum heating system,Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system, Koyo Thermo Systems Co.,Ltd., Premtek Technology Co，技鼎股份有限公司，技鼎股份有限公司，VF-5900 300mm Large Batch,VF-5700 300mm Mini Batch,VF-5300,8 inch,Large Batch,VF-5100,8 inch,Wide-Range 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Activation Annealing Furnace,VF-3000H Vertical Furnace for Gate Insulating Film Formation,VF-3000H Vertical Furnace for Gate Insulating Film Formation,RLA-3100-V Lamp Annealing System for Contact Annealing,RLA-3100-V Lamp Annealing System for Contact Annealing,Rapid temperature rise annealing furnace RTP_Table ，RTP_Table type rapid temperature rise annealing furnace，Rapid temperature rise annealing furnace RTP_SA ，RTP ，semi-automatic rapid temperature rise annealing furnace，Rapid temperature rise annealing furnace ，RTP_Auto ，automatic rapid temperature rise annealing furnace，RTP600V，RTP600Z，RTP500Z，RTP500V，RTP500SV，快速退火炉，北京东之星应用物理研究所，快速升溫退火爐，estarlabs，Glovebox+PVD,2D material CVD,LPCVD & Furnace,Vacuum Sintering Furnace,RTP,Plasma Doping (PDS),ASHER,Wet bench,Crystal Si solarcell Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor, Sonog-age 200, Sono-gage 300, Sonogage200, Sonogage 300, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition Singulus,singular, pecvd,Plasma Enhanced Chemical Vapor Deposition, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment Furnace, MRL, MRL 4 Stack,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment ，Eaton Reliance 850 ，SOLARIS 100,SOLARIS 200,SOLARIS 150,SOLARIS 150UV,surface science integration, ssi-rtp,ecm-usa,Jipelec JetLight,Jipelec JetFirst 100,Jipelec JetFirst 200,Jipelec JetFirst 300,Jipelec JetStar,Annealsys AS-Micro,Annealsys AS-150,Annealsys AS-100,Annealsys AS-One,Annealsys AS-Master,Annealsys AS-Premium,Annealsys Zenith-100, unitemp, Vacuum Solder System , VSS-450-300 ,RTP-100,RTP-100-EP,RTP-100-HV,RTP-100-HV-EP,RTP-150,RTP-150-EP,RTP-150-HV,RTP-200,VPO-300,VPO-300-HV, hot plate HP-220,hot plate , VSS-450-300, RSO-200, RSO-300, RSS-210-S, RSS-160-S, RSS-110-S , ULVAC, Real RTP-100,Real RTP-150,Real RTP-Mini, SJ High Technology Company, ULTECH, Mattson,Helios XP, Helios C200,Millios,Aspen III,Aspen II,Alpine, Plasma Asher, Descum, Clean, Novyka, Selective Etch Systems, Surface Treatment Systems, Interface Treatment Systems, paradigmE, inductively coupled plasma, ICP, SUPREMA, plasma dry strip , Dry Strip, Plasma ETCH,Plasma ETCH,Surface Treatment ,Ultra-Selective 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Thermal Processor,JTEKT Thermo Systems,Crystec Technology,RTP/RTA system RLA 1200, RTP/RTA system RLA 3100, RTP/RTA system RLA 3300, Unity 2900, 0.18-micron thermal processing system, Zhengzhou KJ Technology,High Vacuum RTP-Rapid Annealing Furnace,RTP infrared tube heating tube furnace,RTP rapid annealing furnace,Custom RTP tube furnace,1200℃ RTP Annealing Tube Furnace with Slide-able Quartz Tube,Touch screen RTP rapid annealing furnace,900℃ Two Zone IR-Heating RTP Tube Furnace,900℃ RTP tube furnace with multi-channel proton flowmeter control system,1200℃ Crucible Movable Tube Furnace,Compact Atmosphere Controlled RTP Furnace with 4＂ ID Quartz Tube up to 1100ºC,900℃ Max Slideable RTP Tube Furnace,MATTSON AST Steag 2800,MATTSON AST Steag 2900,MATTSON AST Steag 3000,Steag RTP Systems, Steag Heatpulse 610,Applied Materials,Centura DPN HD,Producer Pyra Anneal,Vantage Astra DSA,Vantage RadOx RTP,Vantage Radiance Plus RTP,Steam oxidation,Applied Materials Centura RTP,Producer Pyra Anneal,radical oxidation,millisecond annealing,model-based controller,Vantage Vulcan RTP,SEMATECH Methodologies , 0.25 m Technology Thermal Applications,firstnano,EasyTube 2000,EasyTube 3000,EasyTube 3000EXT,EasyTube 101,EasyTube 6000, EasyTube 6308, Applied Materials Vantage RadiancePlus, AMAT Vantage RadiancePlus,Vantage RadiancePlus, 0.25 pm TECHNOLOGY,Lamp-based,Laser-based,Heater-based,irradiate the surface of the material,Veeco,Mattson Technology,Screen Holdings,AnnealSys,Applied Materials,Kokusai Electric,JTEKT Thermo Systems,Tokyo Electron,Centrotherm,Hitachi Kokusai Electric,Modular Process Technology,Shankar Muthukrishnan,Beyond the 100nm node, single-wafer RTP,single-wafer rapid thermal Processing, sub-100nm device design node,ultra-shallow junction activation and anneal,USJ, silicide contact formation, thermal oxidation STI formation, spike anneal ,spike annealing, within-wafer uniformity, wafer-to-wafer process uniformity, nickel silicide formation,radical-based oxidation process,rapid thermal processing spike anneal,300mm RTP spike anneal process,ramp-up methodologies, rampdown methodologies,Rapid thermal annealing apparatus,RTA furnace,Dai-ichi Kiden,Dai-ichi Kiden RSA, Combustion furnace, High vacuum heating system, Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system,CreaTec Fischer,Growth Systems,Mini MBE System,LT-STM/AFM,Evaporators,Centrotherm,centrotherm c.HORICOO 300 ,horizontal batch-type system,centrotherm c.HORICOO 200 , field-proven , ultra-versatile tube furnace system ,centrotherm c.VERTICOO , batch-type wafer processing , semiconductor device fabrication, atmospheric processes, LPCVD processes,centrotherm c.ACTIVATOR, high-temperature annealing, high-volume SiC device manufacturing, electrical activation , post implantation annealing ,SiC MOSFET , diode manufacturing,Cost-efficient dopant activation,Annealing of AlN seed layers , Annealing of AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，Applied Materials Mattson Technology Kokusai Electric Ultratech（Veeco） Centrotherm AnnealSys JTEKT Thermo System ECM CVD Equipment Corporation SemiTEq 快速退火炉是利用卤素红外灯作为热源，通过极快地升温速率，将晶圆或者材料快速地加热到300℃-1200℃，从而消除晶圆或者材料内部地一些缺陷，改善产品性能。快速退火炉采用先进的微电脑控制系统，采用PID闭环控制温度，可以达到极高的控温精度和温度均匀性，并且可配置真空腔体，也可根据用户工艺需求配置多路气体。 1.快速热处理(RTP)，快速退火(RTA)，快速热氧化(RTO)，快速热氮化(RTN)； 2.离子注入/接触退火； 3.金属合金； 4.热氧化处理； 5.化合物合金（砷化镓、氮化物等）； 6.多晶硅退火； 7.太阳能电池片退火； 8.高温退火； 9.高温扩散。快速退火炉（芯片热处理设备）广泛应用在IC晶圆、LED晶圆、MEMS、化合物半导体和功率器件等多种芯片产品的生产，和欧姆接触快速合金、离子注入退火、氧化物生长、消除应力和致密化等工艺当中，通过快速热处理以改善晶体结构和光电性能，技术指标高、工艺复杂、专用性强. ACE PILLAR CO.,LTD. 羅昇企業股份有限公司 ALLIED SUPREME CORP. 上品綜合工業股份有限公司 Ares Green Techonlogy Corporatiom 榮眾科技股份有限公司 ASCENTEX INDUSTRY CORPORATION 技高工業股份有限公司 ASIA IC MIC- PROCESS,INC. 亞泰半導體設備股份有限公司 Branchy Technology Co.,Ltd” 倍強科技股份有限公司 C SUN MFG.LTD 志聖工業股份有限公司 Calitech co.,LTD 瑞耘科技股份有限公司 CHPOMA ATE TNC. 致茂電子股份有限公司 CHUNGSHANINSTITUTEOSCIENCE& TECHNOLOGY 中山科學研究院第二研究所 E-CON TECHNOLOGY CO.,LTD 易控自動化科技股份有限公司 Epicstream Technology Inc 德碩科技股份有限公司 EROS TECH CO.,LTD. 銥洛斯科技有限公司 EVERPRECISION TECH CO.,LTD. 禾宇精密科技股份有限公司 Executuve Strategy Group Marketech International Corp 帆宣系統科技股份有限公司 GeMeTec Taiwan 德商捷密(股)公司台灣分公司 GRACE DERWEY CO.,LTD 德瑋企業有限公司 Grand Plastic Technology Corporation 弘塑科技股份有限公司 HEATA ENTERPRISECO.LTD 太郁企業有限公司 HIWINTECHNOLOGIESCORP 上銀科技股份有限公司 Indusial Technology Reswreh Institute Energy & ResouresLaboratories 工業技術研究能源與資源研究所 INSTRUMATICCORPORATION(IMC) 儀鍵科技股份有限公司 JAPPERAUTOMATION&VISIONSYSENS.LTD 爵鵬有限公司 JC.s Chunson LIMITED 沖成有限公司 Jumpanny Enterprise CO.Ltd 毅企業有限公司 JUSUN INSTRUMENTS CO.LTD 志尚儀器股份有限公司 Keteca Electronics CO.Ltd 碁達科技股份有限公司 King Mechatronics Co.Ltd 華東半導體工業股份有限公司 LIM CHEMICAL CO.LTD 霖豐股份有限公司 Maludai Technology Corp 丸大科技股份有限公司 Mechanical Industry Research Laboratories Industrial Technology Research Institute 工業技術研究院機械工業研究所 MERIC SEMICONDUCTOR Inc 美瑞特半導體股份有限公司 MITUOYO TAIWAN CO.,LTD 台灣三豐儀器股份有限公司 Nanmat Technology Co.,Ltd 南美特科技股份有限公司 Nano-Architect Research Corporation 晶研科技股份有限公司 NENIN MECHANICAL CO.,LTD 寧英機械自動控制有限公司 NIAN HONG PIPE FITTINGS CO., LTO 年鴻管件股份有限公司 Osin Net Taiwan Corp. 日商台灣應信科技網路股份有限公司 PERFECTDYNASTY TAIWAN LTD. 嘉智實業股份有限公司 Premtek International Inc 技鼎股份有限公司 ProSys Technology integration, Inc. 鐠德科技股份有限公司 SAN CHIH SEMICONDUCTOR CO.,LTD. 尚志半導體股份有限公司 San FuChemical.,Ltd 三福化工股份有限公司 Scientech Corporation Hsin Chu-Office. 辛耕企業股份有限公司 SOLOMON TECHNOLOGY CORP 所羅門股份有限公司 Standard Technology Corporation 資騰科技股份有限公司 Sunway Sicentific Corporation 尚偉股份有限公司 Sysage Technology Co , Ltd 聚碩科技股份有限公司 TACHIA YUNG HO MACHINE INDUSTRY CO , LTD 大甲永和機械工股份有限公司業 TAISIL ELECTRONIC MATERIALS CORP 中德電子材料股份有限公司 Taiwan Valva and Fitting Co.. 台灣管件股份有限公司 TECO Electric & Machinery Co..LCD 東元電機股份有限公司 TEST RESEARCH,INC 德律科技股份有限公司 Uni-Tek System,Ins. 優力特科技股份有限公司 Wafer Works Corp 合晶科技股份有限公司 Yu Chuan Technology Enterprise Co ,,Ltd 友荃科技股份有限公司 ABON-TECH INTERNATIONAL CORP. 亞邦國際科技股份有限公司 ACER TWP CORPORATION 第三波資訊股份有限公司 AIR PRODUCTS ASIA ELECTRONICS 美國氣體化工產品亞洲有限公司 AKT,INC 美商業凱科技股份有限公司台灣分公司 AMPOC FAR EAST CO,.LTD. 揚博科技(股)公司 ARCO INFOCOMM,INC. 亞格數位股份有限公司 ASCENTEX INDUSTRY CORPORATION 技高工業股份有限公司 ATLAS TECHNOLOGY CORP. 聯宙科技股份有限公司 AU OPTRONICS CORP 友達光電股份有限公司 C SUN MFG LTD. 志聖工業股份有限公司 CHAIN-LOGIC INTERNATIONAL 長洛國際股份有限公司 CHENG MEI INSTRUMENT CO.,LTD 政美儀器有限公司 CORNING DISPLAY TECHNOLOGIES TAIWAN 台灣康寧顯示玻璃股份有限公司 DA CEI TRADE CO.,LTD 大熹企業有限公司 TOYO INDUSTRIAL CO.LTD. 臺灣區代理，東祈業股份有限公司有限公司 U.K.TECHNOLOGY CORP 凱科技股份有限公司 UNAXIS BALZERS LTD 百瑟系統股份有限公司 UREXPRECISION.INC 泓進科技股份有限公司 USHINE PHOTONICS CORPORATION 聯享光電股份有限公司 USHIO TAIWAN.INC 優志旺股份有限公司 VARIAN TECHNOLOGIES ASIA.LTD.TAIWAN BRANCH 美商亞洲瓦里科技(股)台灣分公司 VERO VERIA CORPORATION 惠亞工程有線公司 VISIONOPTO TECHNOLOGY CO.LTD 泓岳光電股份有限公司 WU JII INDUSTRY CO LTD 梧濟工業股份有限公司 RISSHI CO， LTD RISSHI CO， LTD SAMURAI SPIRITS INC 邑富有限公司 ENTECH CORPORATION 辛耕企業股份有限公司 SEKISUI（ HONG KONG） LIMITED TAIWAN BRANCH 香港積水有限公司台灣分公司 SEMI TECHNOLOGY CO， LTD 強森股份有限公司 SEMICONDUCTOR EQUIPMENT&MATERIALS INTERATIONAL 美商斯麥公司 SHIBAURA MECHATRONICS TAIWAN CO 台灣芝浦先進科技股份有限公司 SID TAIPEI CHAPTER 國際資訊顯示學會中華明國總會 SOLAR APPLIED MATERIALS TECHNOLOGY CORP 光洋應用材料科技股份有限公司 SUNWAY SCIENTIFIC CORPORATION 尚偉股份有限公司 TAIWAN TFT-LCD ASSOCIATION 中華民國台灣薄膜電晶體液晶顯示產業協會 TECNHOS ASIA INC 太科有限公司 3S SILICON TECH， INC 斯利康科技股份有限公司 TOTAL TECHNOLOGIES， LTD 同皇企業有限公司 DEMPA PUBLICATION 電波新聞社 DOTOP MEDIA CO.,LTD. 龍璟文化事業股份有限公司 DYNACOLOR,ITD. 彩富電子股份有限公司 ELLIPSIZ LTD. 晶儀科學儀器股份有限公司 EVER TECH INSTRUMENTAL CO.,LTD. 俊永科技股份有限公司 FLYING TIGER KJ CO.,LTD 科基企業有限公司 FONG KAI INDUSTRIAL CO.,LTD 泓凱工業股份有限公司 FU WEI OPTOELECTRONICS TECH.CO.,LTD. 富偉光電股份有限公司 GRACE DERWEY CO.,LTD. 德瑋企業有限公司 GROUP UP INDUSTRIAL CO.,LTD. 群翊工業股份有限公司 HEADWAY ADVANCED MATERIALS CO.,LTD. 展宇科技材料股份有限公司 HERMES-EPITEK CORP. 漢民科技股份有限公司 HITACHI ELECTRONICS ENGINEERING CO.,LTD. 勤友企業股份有限公司 HIWIN TECHNOLOGIES CORP. 上銀科技股份有限公司 HOYA CORPORATION MASK DIVISION 台灣豪雅股份有限公司 INFO WORKSTATION CO.,LTD 資訊工房股份有限公司 ITRI MATERIALS RESEARCH LABORIES 工研院工業材料研究所 JIM&STEVE TRADING CO.,LTD 龍誼企業股份有限公司 KETECA ELECTRONICS CO.,LTD. 碁達科技股份有限公司 KING MECHATRONICS CO.,LTD 華東半導體工業股份有限公司 KING SON INSTRUMENT TECH CO.,LTD 慶聲科技股份有限公司 KROMAX INTERNATIONAL CORPORATION 奇裕企業股份有限公司 MERCK DISPLAY TECHNOLOGIES LTD 默克光電科技股份有限公司 MERCK-KANTO ADVANCED CHEMICALS LTD 伊默克化學科技股份有限公司 ABETECH TAIWAN INC. 明技國際股份有限公司 ABON-TECH INTERNATIONAL CORP 亞邦國際科技股份有限公司 ACETEAM CORPORATION 煒群科技股份有限公司 ADTEC PLASMA TECHNOLOGY CORPORATINO LIMITED 純化國際有限公司 ADVANCED ENERGY INDUSTRIES,INC 台灣艾儀有限公司 ADVANTEK TAWIAN INC 怡凡得股份有限公司 A.E.ADVANCED ENGLINEERING LTD. A.E.ADVANCED ENGLINEERING LTD. AIR PRODUCTS ASIA INC. 美國氣體化工產品亞洲有限公司 ALLIED SUPREME CORP. 上品綜合工業股份有限公司 ALLIS ELECTRIC CO.,LTD. 亞力電機股份有限公司 AMPOC FAR- EAST CO.,LTD. 揚博科技股份有限公司 ANELVA CORPORATION 日商安內華股份有限公司 APPLIED MATERIALS TAIWAN 台灣應用材料股份有限公司 ARENA INSTRUMENT CO.,LTD. 鼎嚮科研股份有限公司 ASHLAND UNION ELECTRONIC CHEMICAL CO., 連仕電子化學材料股份有限公司 ASI ADVANCED SEMICONDUCTOR INSTRUMENTS GMBH 純化國際有限公司 ASIA IC MIC- PROCESS,INC 亞泰半導體設備股份有限公司 ASM INTERNATIONAL N.V.TAIWAN BRANCH 英屬開曼群島商先藝半導體科技有限公司台灣公司 ASTEC GMBH ASTEC GMBH ATLAS EQUIP MENT CORP. 聯宙企業有限公司 ATS PRODUCTS INC. ATS PRODUCTS INC. BALAMAN CO.LTD 臂力人有限公司 BOC EDWARDS 愛德華先進科技(股)公司 BRIGHT SHELAND INTERNATIONAL CO.,LTD. 旭然國際股份有公司 BROOKS AUTOMATION INC. 布魯克斯自動化機械股份有限公司 CARL ZEISS JENA GMBH 台灣儀器行股份有限公司 CHENG MEI INSTRUMENT CO.,LTD. 政美儀器有限公司 CHIEFTECH PRECISION CO.,LTD. 直得科技股份有限公司 CHING HSIANG PRECISION CO,LTD. 精鑲精密股份有限公司 CHI YHEI TECH INTERNATIONAL CO.,LTD 七益科技國際股份有限公司 CHUNG LIAN CO.,LTD. 中連股份有限公司 JC`S CHUNSON LIMITED 沖成有限公司 CHROMA ATE INC. 致茂電子股份有限公司 COOKSON SEMICONDUCTOR PACKAGING MATERIALS 確信半導體封裝材料 CST ASIA INC. 展躍科技股份有限公司 DAE-HA INTERNATIONAL TAIWAN CORP. 台灣大河國際有限公司 DAIKIN INDUSTRIES,INC. 日商大金工業株式會社 DAINPPON SCREEN MFG.CO.,LTD. 網屏股份有限公司 DAITO ELECTRON CO.,LTD 日商大都電子股份有限公司 DALUX INTERNATIONL CO.,LTD 宇資企業股份有限公司 DELTA DESIGN SINGAPORE PTE LTD.TAIWAN BRANCH 新加坡商利特股份有限公司台灣分公司 DENKEN ENGINEERING CO.,LTD. 登肯科技股份有限公司 DINSON TECHNOLOGY INC. 鼎森科技股份有限公司 DURATEK INC. 慶康科技股份有限公司 EBERTS ELECTRONICS CO.,LTD. 伊柏洱企業有限公司 E+H EICHIHORN + HAUSMANNGMBH E+H EICHIHORN + HAUSMANNGMBH ELLIPSIZ CO., 奕力公司 ENI TAIWAN LIMITED 台灣億恩埃股份有限公司 ETRNAL CHEMICALCO.,LTD. 長興化學工業股份有限公司 EVER TEAM INTERNATIONAL CORP. 九佳科技股份有限公司 EVER- ISLAND CORPORATION 九介企業有限股份公司 EVERLIGHT CHEMICAL INDUSTRIAL CORP. 台灣永光化學工業股份有限公司 FANSYS CO.,LTD. 恆馳國際股份有限公司 FAR EAST DENKEN TECH CORPORATINO 遠東登肯科技股份有限公司 FEEDBACK TECHNOLOGY CORP. 翔名科技股份有限公司 FORTREND TAIWAN SCINTFIC CORP. 富創得科技股份有限公司 FREUDENBERG 科德寶集團 FULL BRIGHT 福宮通商股份有限公司 G&N GMBH G&N GMBH GOLD STONE DEVELOPMENT CO., 彰京開發有限公司 GOLDEN-TECH TECHNOLOGIES INC. 矽英科技股份有限公司 GRACE DERWEY CO.,LTD. 德瑋企業有限公司 GRAND PLASTIC TECHNOLOGY CORP. 弘塑科技股份有限公司 GRANDWAY TECHNOLOGY INC. 冠緯實業股份有限公司 GREAT DOMAIN ENTERPRISE CO.,LTD 鴻碩企業有限公司 HIGH STORAGE SYSTEM CO.,LTD. 高密集實業股份有限公司 HI-TONE INTERNATAIONAL CO.,LTD. 星揚國際有限公司 HOMWELL CO.,LTD. 宏屹企業股份有限公司 HWA SHU ENTERPISE CO.,LTD. 樺塑企業股份有限公司 ICS TECHNOLOGY CO.,LTD. 愛迪亞科技股份有限公司 IDEALTECH INDUSTRY CO.,LTD 愛迪亞實業有限公司 INABATA & CO.,LTD. 華稻股份有限公司 INFICON 英福康有限公司 INSTURUMATIC CORPORATION 華鑑科技股份有限公司 INTEGRATED PLASMA INC. 臺禹科機股份有限公司 INTEGRATED SERVICE TECHNOLDGY INC 宜特科技股份有限公司 JEM TAIWAN PROBE CORP 台灣傑睦股份有限公司 JERCY-SMART TECH CORP 業實科技有限公司 JET TECHNOLCGY CO.,LTD. 捷智科技股份有限公司建誼企業股份有限公司 JUSUNG ENGINEERING CO.,LTD. 俊尚科技有限公司 KEITHLEY INSTRUMENTS INC. 英屬蓋曼群島商 KETEDA ELECTRONICS CO.,LTD. 美商吉時利儀器股份有限公司台灣分公司 KETECA ELECTRONICS CO.,LTD. 碁達股份有限公司 KEYENCE TAIWAN CO.,LTD. 台灣基恩斯股份有限公司 KIMPSION CORPORATION 訊程實業股份有限公司 KING LAI INTERNATIOMAL CO.,LTD. 新萊實業有限公司 KINGROUP AUTOMATION INDUSTRY CORP. 群錄自動化工業股份有限公司 KINIK PRECISION GRINDING CO., 金敏精研股份有限公司 KORNIC SYSTEMS CORPORATION 韓商科尼克電子股份有限公司 KOYO THERMO SYSTEMS ASIA CO.,LTD 光洋林博股份有限公司 KORMAX INTERNATIONAL CORP. 奇裕企業股份有限公司 KYOCERA ASIA PACIFIC 京瓷亞太有限公司 LEE CHANG YUNG TECHNOLOGY CORP. 李長榮科技股份有限公司 LEE-TECH CO.,LTD. 巨晶科技有限公司 LEYBOLD VACUUM 台灣萊寶真空股份有限公司 LIGHTHOUSE WORLDWIDE SOLUTIONS 新加坡商萊浩斯國際股份有限公司 LINTEC ADVANCED TECHNOLOGIES(TAIWAN),INC. 琳得科先進科技股份有限公司 MACTRONIX INC. 倫昇科技股份有限公司 MARKETECH INTERNATIONAL CORP. 帆宣系統科技股份有限公司 MATTSON TECHNOLOGY,INC. 美商得昇科技股份有限公司台灣分公司 MERCK-KANTO ADVANCED CHEMICALS LTD. 伊默克化學股份有限公司 METRON TECHNOLOGY(TAIWAN)LTD. 美呈科技有限公司 MICRONICS JAPAN CO.,LTD. 旺矽科技有限公司 MITUTOYO TAIWAN CO.,LTD. 台灣三豐儀器股份有限公司 MKS INSTRUMENTS,INC. 美商安愷儀控股份有限公司 MORECO TECHNOLOGY INC. 瑞耘科技股份有限公司 MPP FASTENER CORPORATION 晨鈞股份有限公司 NAPSON CORP 德技股份有限公司 NECMACHINERYCORPORATION 日商日電機械股份有線公司 NISSO ENGINEER CD,LTD 日商日電機械股份有線公司 OMRON TAIWAN ELECTRONIC INC 台灣歐姆龍股份有限公司 OPTICAL GAGING (SINGAPORE)PTE.LTD 台灣歐基玻股份有限公司 ORIENT SERVICE CO,LTD 東服企業有線公司 PARKER HANNIFIN TAIWAN CO.LTD 臺灣派克漢尼分股份有限公司 pinpointek corporatiom 晶友股份有限公司 PREMTEK INTERNATIONAL INC 技鼎股份有限公司 RASCO AGSMOL ENTERPRISE CO LTD 莫斯企業有限公司 RIKEN KEIKI CD LTD 理研實驗股份有限公司 RISSHI CO LTD RISSHI CO LTD ROFIN-SINAR LASER VAIWAN 德商羅光雷射科技有限公司台灣分公司 SAINT-GOBAIN NORTH KK TAIPEI OFFECE 聖戈班集團日商諾頓股份有限公司台北辦事處 SANLIEN TECHNOLOGY CORP. 三聯科技股份有限公司 SCIENTECH CORPORATION 莘耘企業股份有限公司 SCIENTEK CORPORATION 科技股份有限公司 SE TECHNOLOGLES 雙城科技股份有限公司 SEKI TECHNOTRON TAIWAN 協基科技股份有限公司 SEMI PLASTIC CO LTD 水興實業有限公司 SENJU METAL INDUSTRY CO LTD TAIWAN BRANCH 日商千住金屬工業股份有限公司台灣分公司 SEZ AG 瑟思半導體設股份有限公司 SHBASOKU TAIWAN CO LTD 台灣芝測科技股份有限公司 SHIBAURA MECHATRONICS TAIWAN CORPORATIOM 台灣芝浦先進科技股份有限公司 SHINKAWA TAIWAN CO LTD 新川半導體機械股份有限公司 SIERRA INSTRUMENTS INC 湯英科技有限公司 SINGIN MACHINE CORP 新晶科技股份有限公司 SINOM CORPORATION 子子嘉企業有限公司 SONG JAAM TECHOLOGY CO LTD 崇展科技股份有限公司 SPEEDFAM- IPEC TAIWAN LTD 美商艾貝克國際有限公司台灣分公司 SPEEDLINE TECHNOLOGIES ASIA 台灣辦事處 SPIRE TECHNOLOGLES (TAIWAN)LIMITED 魏巖股份有限公司 STAMDARD TECHNOLOGY CORP 資騰科技股份有限公司 SUNWAY SICENTIFIC CORPORATION 尚偉股份有限公司 SUPERB AIR FILTER CORP 順寶企業股份有限公司 TAIWAN PURITIC CORP 台灣儀器行股份有限公司 TAIWAH VALVE AND FITTING CO 和淞科技股份有限公司 VASK TECHOLOGY INC 台灣管件股份有限公司 TERADYNE INC 美商泰瑞達股份有限公司 3S SILICON TECH INC 斯利康科技股份有限公司 TOKYO CATHOODE LABORATORY TAIWAN INC 東京探針股份有限公司 TOSOH GROPG(TOSOH QUAZRTY CO LTD) 台南石英科技股份有限公司 TROY ENTERPRISE CO LTD 洛泰爾企業有限公司 TRUTEK CORPORATOIN 博磊科技股份有限公司 TUSON CORPORAION 杜商股份有限公司 UANGYIH INDUSTRIAL CO LIT 晃誼實業有限公司 UNI-TEK SYSTEM.INC 優力科技股份有限公司 USHIO TAIWAN INC 優志旺股份有限公司 VARITECH INTERMATIONA/ 星楊國際有限公司 VIEETECH TAIWAN CO LTD 微拓科技股份有限公司 WONIK TAIWAN QUARTZ CO LTD 台灣圓益石英股份有限公司 XINTEC INC 精材科技股份有限公司 YU-TECH INSTRUMENIT CO LTD 鈺晟國際有限公司 ZMC TECHNOLOGIES PET LTD 前景企業有限公司 ABETECH TAIWAN INC. 明技國際股份有限公司 ALLIS ELECTRIC CO.,LTD 亞力電機股份有限公司 ASHLAND UNION ELECTRONIC CHEMICAL CO., 連仕電子化學材料股份有限公司 ASIA IC MIC- PROCESS,INC 亞泰半導體設備股份有限公司 ASTEC GMBH ASTEC GMBH ATS PRODUCTS INC. ATS PRODUCTS INC. BALAMAN CO.LTD 臂力人有限公司 BRIGHT SHELAND INTERNATIONAL CO.,LTD. 旭然國際股份有公司 CARL ZEISS JENA GMBH 台灣儀器行股份有限公司 CHING HSIANG PRECISION CO,LTD. 精鑲精密股份有限公司 CHI YHEI TECH INTERNATIONAL CO.,LTD 七益科技國際股份有限公司 CHROMA ATE INC. 致茂電子股份有限公司 COOKSON SEMICONDUCTOR PACKAGING MATERIALS 確信半導體封裝材料 CST ASIA INC. 展躍科技股份有限公司 DAIKIN INDUSTRIES,INC. 日商大金工業株式會社 DAINPPON SCREEN MFG.CO.,LTD. 網屏股份有限公司 DENKEN ENGINEERING CO.,LTD. 登肯科技股份有限公司 DINSON TECHNOLOGY INC. 鼎森科技股份有限公司 DURATEK INC. 慶康科技股份有限公司 E+H EICHIHORN + HAUSMANNGMBH E+H EICHIHORN + HAUSMANNGMBH ELLIPSIZ CO., 奕力公司 ENI TAIWAN LIMITED 台灣億恩埃股份有限公司 FANSYS CO.,LTD. 恆馳國際股份有限公司 FAR EAST DENKEN TECH CORPORATINO 遠東登肯科技股份有限公司 FREUDENBERG 科德寶集團 FULL BRIGHT 福宮通商股份有限公司 G&N GMBH G&N GMBH HIGH STORAGE SYSTEM CO.,LTD. 高密集實業股份有限公司 HI-TONE INTERNATAIONAL CO.,LTD. 星揚國際有限公司 INSTURUMATIC CORPORATION 華鑑科技股份有限公司 INTEGRATED PLASMA INC. 臺禹科機股份有限公司 INTEGRATED SERVICE TECHNOLDGY INC 宜特科技股份有限公司 JET TECHNOLCGY CO.,LTD. 捷智科技股份有限公司建誼企業股份有限公司 JUSUNG ENGINEERING CO.,LTD. 俊尚科技有限公司 KEYENCE TAIWAN CO.,LTD. 台灣基恩斯股份有限公司 KINIK PRECISION GRINDING CO., 金敏精研股份有限公司 LEYBOLD VACUUM 台灣萊寶真空股份有限公司 MACTRONIX INC. 倫昇科技股份有限公司 MATTSON TECHNOLOGY,INC. 美商得昇科技股份有限公司台灣分公司 MKS INSTRUMENTS,INC. 美商安愷儀控股份有限公司 NAPSON CORP 德技股份有限公司 NECMACHINERYCORPORATION 日商日電機械股份有線公司 NISSO ENGINEER CD,LTD 日商日電機械股份有線公司 RISSHI CO LTD RISSHI CO LTD SEMI PLASTIC CO LTD 水興實業有限公司 SINGIN MACHINE CORP 新晶科技股份有限公司 SONG JAAM TECHOLOGY CO LTD 崇展科技股份有限公司 SPEEDLINE TECHNOLOGIES ASIA 台灣辦事處 SPIRE TECHNOLOGLES (TAIWAN)LIMITED 魏巖股份有限公司 SUPERB AIR FILTER CORP 順寶企業股份有限公司 TAIWAN PURITIC CORP 台灣儀器行股份有限公司 3S SILICON TECH INC 斯利康科技股份有限公司 TOSOH GROPG(TOSOH QUAZRTY CO LTD) 台南石英科技股份有限公司 TROY ENTERPRISE CO LTD 洛泰爾企業有限公司 VARITECH INTERMATIONA/ 星楊國際有限公司 WONIK TAIWAN QUARTZ CO LTD 台灣圓益石英股份有限公司 XINTEC INC 精材科技股份有限公司 YU-TECH INSTRUMENIT CO LTD 鈺晟國際有限公司 ZMC TECHNOLOGIES PET LTD 前景企業有限公司 ACE PILLAR CO.,LTD 羅昇企業股份有限公司 ADVANCED THERMAL SCIENSES CORP. 台控科技股份有限公司 ADVANTEC CO.,LTD ADVANTEC CO.,LTD AEHR TEST SYSTEMS TAIWAN 美商艾爾測試系統股份有限公司台灣分公司 AGEJET TECHNOLOGY INC. 亞聚捷科技股份有限公司 ALCATEL VACUUM TECHNOLOGY ERANCE 阿爾卡特真空科技股份有限公司 ALMATEC 建誼企業股份有限公司 APEX DYNAMICS.,INC. 台灣廣用動力股份有限公司 APPLIED CERAMICS TAIWAN 美商應陶股份有限公司台灣分公司 ARCO INFOCOMM,INC 亞格數位股份有限公司 ASCENTEX INDUSTRY CORPORATION 技高工業股份有限公司 ASHLAND TAIWAN CO.,LTD. 台灣亞仕藍股份有限公司 ASM PACIFIC TECHNOLOGY LTD. 香港商先導自動器材有限公司台灣分公司 ASML ASML NORDSON PACIFIC INC.,(ASYMTEK)TAIWAN BRANCH 美商諾森股份有限公司 AUGUST TECHNOLOGY 美商佑福科技有限公司台灣分公司 BEYOND BROADBAND NETWORKS,INS. 凱裕股份有限公司 BIONICS INSTRUMENT CO.,LTD. 百歐尼仕科技股份有限公司 BUSCH SEMICONDUCTOR VACUUM GROUP 台灣普熙股份有限公司 CANON SEMICONDUCTOR EQUIPMENT TAIWAN,INC. 佳能半導體設備股份有限公司 CANTUS TECHNOLOGY CORP. 昕鈦科技股份有限公司 CHALLENTECH INTERNATIONAL CORPORATION 佳霖科技股份有限公司 CHIEF UP INTERNATIONAL CORPORATION 奇灝國際有限公司 CHIKAL TECHNO CO.,LTD. 千加科技股份有限公司 CLARIANT(TAIWAN)CO.,LTD. 台灣科萊恩股份有限公司 CST ASIA INC 英屬維京群島商展耀科技股份有限公司台灣分司 DAINIPPON SCREEN ELSCTRONICS (TAIWAN)CO.,LTD. 迪恩仕科技股份有限公司 DAS DUNNSCHICHT ANLAGEN SYSTEME GMBH 德商薄膜分析系統有限公司 DEMPA PUBLICATIONS INC. 電波新聞社 FAR EAST DENKEN TECH CORPORATION 遠東登肯科技股份有限公司 DH INSTRUMENTS,INC. 榮帥電機有限公司 DIGITIMES PUBLICATION INC. 電子時報(大椽股份有限公司) DOU YEE LIMITED 道益有限公司 DOW CORNING TAIWAN INC. 台灣道康寧股份有限公司 DRESSLER HF-TECHNIK GMBH 晶研科技股份有限公司 DTEK SEMICON TECHNOLOGY CO.,LTD. 昶驎科技股份有限公司 EBARA CORPORATION 台灣荏原精密股份有限公司 ELECTROGLAS,INC. 美商伊智科技股份有限公司台灣分公司 ENTEGRIS,INC. 美商英特格股份有限公司台灣分公司 EO TECHNICS CO.,LTD. 伊歐科技股份有限公司 ESCORT SEAL CO.,LTD. 漢昇油封實業有限公司 EUROX CO.LTD. 台灣友絡股份有限公司 EVG-JOINTECH CORP. EVG-JOINTECH CORP. FEI COMPANY 美商麥克里昂股份有限公司 FINTEX INDUSTRY CORP. 技達工業股份有限公司 FOI CORPORATION 東來科技股份有限公司 GRANDOME TECHAOLOGY INC. 巨唐技股份有限公司 GRANDTREND CORP. 新流有限公司 HAKUTO TAIWAN LTD. 伯東國際通商股份有限公司 HAPPY POLE,LTD. 家榮股份有限公司 HAUMAN TECHNOLOGIES CORP. 豪勉科技股份有限公司 HELIX TECHNOLOGY CORPORATION 宏冷科技股份有限公司 HERMES-EPITEK CORPORATION 漢民科技股份有限公司 HERSMEY VALVE CO.,LTD. 鐶琪塑膠股份有限公司 HIGHLIGHT TECH CORP. 日揚科技股份有限公司 HITACHI HIGH-TECHNOLOGIES CORPORATION 日商日立全球先端科技股份有限公司 HIWIN MIKROSYSTEM 大銀微系統股份有限公司 HONLYCO.,INC. 宏立有限公司 HPL TECHNOLOGIES INC. HPL TECHNOLOGIES INC. HYPERSONIC INC. 瀚軒股份有限公司 HYPERVISION INC. 美商超視界科技股份有限公司 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE(ITRI) 工業技術研究院 INFO WORKSTATION CO.,LTD. 光電科技雜誌 INTRACO TAIWAN CORPORATION 台灣穎傳科技有限公司 ITC TECHNOLOGY TAIWAN CORPORATION 忠創科技股份有限公司 JIPAL CORPORATION 巨沛股份有限公司 JSR CORPORATION TAIWAN BRANCH 日商捷時雅股份有限公司台灣分公司 KANG SHENG CO.,LTD. 港勝企業有限公司 KAO DUEN TECHOLOGY CORPO RATION 高敦科技股份有限公司 KAO FONG MACHANCRY CO.,LTD. 高鋒工業股份有限公司 KINETICS 台灣凱能提克股份有限公司 KING MECHATRONICS CO.,LTD. 華東半導體工業股份有限公司 KISHISANG &CO.,LTD. 台岸股份有限公司 KITZ SCT CORPORATION 日商北澤系統科技股份有限公司 KLA-TENCOR CORPORATION 美商科磊股份有限公司台灣分公司 LESIN ENTERPRISE CORP. 雷欣實業股份有限公司 LEYBOLD VACUUM TAIWAN,LTD. 台灣萊寶真空股份有限公司 LIGHTHOUSE WORLDWIDE SOLUTIONS 新加坡商萊浩斯國際股份有限公司 LIH YUAN ENTERPRISE CO.,LTD. 立源興葉股份有限公司 MIRL/ITRI 工業技術研究機械技術研究所 NAPSON CORPORATION NAPSON CORPORATION OPTIVIZ TECHNOLOGY INC. 詳維科技股份有限公司 PHILIPS TAIWAN LTD. 台灣飛利浦股份有限公司 QUATEK CO.,LTD. 德技股份有限公司 RASCO AG 莫斯企業有限公司 RECIF 台灣瑞斯福股份有限公司 SCS HIGHTECH INC. 矽晶源高科股份有限公司 TACHIA YUNG HO MACHINE INDUSTRY CO.,LTD. 大甲永和機械工業股份有限公司 TAIWAN VALVE&FITTING CO.,LTD. 台灣管件股份有限公司 WINLIGHT ENTERPRISE CO.,LTD. 英永誼實葉有限公司 Applied Materials Mattson Technology Kokusai Electric Ultratech(Veeco） Centrotherm AnnealSys Koyo Thermo Systems ECM CVD Equipment Corporation SemiTEq Applied Materials Optorun Shincron Von Ardenne Buhler ULVAC Canon Anelva Satisloh Evatec. Nanofab equipment list: Our Equipment Alpha-Step IQ Alpha-Step IQ – W1-040 Autosorb iQ Branson 3000 Barrel Etcher Brewer Spinner and Hotplate Bruker XRD D8 Discover Cee 200CB Coat-Bake System #1 Cee 200CB Coat-Bake System #2 Cold plate (Stir-Kool SK-12D) Contact Angle (FTA-200) Critical Point Dryer Denton Gold Sputter Unit (for SEM) Dicing Saw (Disco DAD 321) Disco 3240 Dicing Saw Dymax BlueWave 200 Electron Beam Evaporation System #1 (Gomez) Electron-Beam Evaporation System #2 (PVD-75) Ellipsometer (M-2000V) Filmetrics F50-UV Filmetrics Thickness Monitor (F10-VC) (B) Four-Point Probe Four-Point Probe (Pro4 4000) FTIR-iS50 Fumehood (Aisle 1 – Laurell / Headway Spinner/Hotplate) Fumehood (Aisle 2 – KOH/TMAH)(Station A) Fumehood (Aisle 3 – General Use) GLAD System (Achilles) Glass Bonding Area Heidelberg MLA150 Helium Ion Microscope (Zeiss Orion NanoFAB with Ga FIB) ICPRIE (Alcatel AMS110) ICPRIE (Cobra Metal Etch) ICPRIE (Oxford Estrelas) Keithley 4200-Semiconductor Characterization System (SCS Analyzer) Leica ACE600 Carbon/Metal coater Leica INM-100 Optical Microscope #1 Leica INM-100 Optical Microscope #2 Litho Wet Deck #1 Litho Wet Deck #2 LPCVD Boron Doped PolySi Deposition LPCVD Nitride Deposition LPCVD PolySi Deposition Mask Aligner (Grover – MA#1) Mask Aligner (IR through-wafer) (Bert – MA#1) Mask/Bond Aligner (SUSS MA/BA6) Minibrute Bottom Furnace (Boron Doping) Minibrute Middle Furnace (Thermal Oxide and General Annealing) Minibrute Top Furnace (Thermal oxide only) Muffle Furnace Muffle Furnace (For PZT only!) Nanometrics Hall Measurement (HL5500) Nanoscribe Photonic Professional GT Olympus Laser Confocal Microscope (OLS3000) Parylene Deposition System Pattern Generator (Heidelberg DWL-200) PDMS Process area PECVD (Trion) Probe Station #1 (Wentworth) Probe Station #2 (Wentworth) RAITH150 Two EBL System RIE (Oxford NGP80) RIE (Trion) RIE (uEtch) Rigaku XRD Ultima IV Savant SuperModulyo Freeze Dryer Scanning Electron Microscope (Zeiss EVO MA10) Scanning Electron Microscope (Zeiss Sigma FESEM w/ EDX & EBSD) Scriber Servo Precision Drill Press (7140-M) Sitek SRD (bottom – 100 mm) Sitek SRD (top – 150 mm) Spectrophotometer (Perkin-Elmer NIR-UV) Spectrophotometer UV/VIS (Hitachi U-3900H) Spin Rinse Dryer (Wet aisle #1) Sputtering System #1 (Bob) Sputtering System #2 (Doug) Sputtering System #3 (Floyd) Sputtering System #4 (Moe) SUSS Bonder Thin Film Stress Measurement (FLX 2320) TPT HB16 Wire bonder Tystar Doped Anneal Tystar General Anneal Tystar Oxidation Upright Microscope (LV150) UV / Ozone Bonder UV Flood Exposure System (Sunny) Vacuum Ovens (×3) Vapour HF Etcher (memsstar Orbis Alpha) VASE Ellipsometer Wet Process – General Use – Wet Deck 1A Wet Process – General Use – Wet Deck 1B Wet Process – General Use – Wet Deck 2A Wet Process – HF/BOE – Wet Deck 1A Wet Process – HF/BOE – Wet Deck 1B Wet Process – ISE KOH Bath – Wet Deck 2A Wet Process – Metal Etch – Wet Deck 1A Wet Process – Metal Etch – Wet Deck 1B Wet Process – Piranha – Wet Deck 2B XeF2 Etching System XPS Imaging Spectrometer (Kratos AXIS Ultra) Yamato Oven YES HMDS Oven Zeiss AXIO Lab.A1 (east plasma area) Zeiss AXIO Lab.A1 (W1-040) Zeiss AXIO Lab.A1 (west plasma area) Zeiss Stemi 508 (east plasma area) Zeiss Stemi 508 (W1-040) Zygo Optical Profilometer Hypoxia incubator Microbeam Laser Capture Microdissection System (Zeiss) Seahorse XF96e (Agilent) Seahorse XFp (Agilent) Vevo-2100 (VisualSonics) BIOHOOD1 BIOHOOD2 Biacore T200 SPR Microfuge 18 Micro-centrifuge Q-sense QCM-D Applied Biosystems 7500 Fast PCR System Axopatch 200B Amplifier- Patch Clamp BD Biosciences FACSAria III Flow Cytometer System BioTek MX/Mono-based MultiFunction Microplate Reader BioTek PRC384 Microplate Sample Processor BioTek Quant Spectrophotometer BSL3 Laboratory Covaris Ultrasonicator DNR MF ChemiBIS Image Analysis System DNR MiniLumi Bio Imaging System Gel electrophoresis setup and accessories Horiba SPRi-LAB+ Surface Plasma Resonance System Illumina MiSeq DNA Sequencer Labconco FreeZone 6 Lyophilizer Nexcelom Bioscience Cellometer Vision Trio Cell Profiling System Stratagene Robocycler Gradient 96 Gradient Thermal Cycler Thermo Scientific 325a Rotary Microtome Thermo Scientific Nanodrop 2000c Spectrophotometer Transilluminators – multiple Critical Point Dryer Leica CM1800 BioSoft Indenter Biotage V10 Touch Solvent Evaporation System CEM Liberty Blue Microwave assisted Peptide Synthesizer CEM Liberty Blue Microwave assisted Peptide Synthesizer CEM Liberty Microwave assisted Peptide Synthesizer CEM Liberty Microwave assisted Peptide Synthesizer Centrifuge Chemiluminescent Gel Imager Cytation3 Automated Microscope Plate Reader Freeze Dry Systems Freeze Substitutor High Pressure Freezer High Vacuum Coater IncuCyte Live Cells Analysis System Leica UC7/FC7 Ultramicrotome Microwave Processor Plunge-Freezer (1) Plunge-Freezer (2) Real-Time PCR Detection System Vibrotome LB Trough: Biolin Scientific KSV 5000 QCM: Biolin Q-Sense Quartz Crystal Microbalance SPR: GE Biacore X100 Surface Plasmon Resonance Biosafety Hoods Cell Incubators Centrifuge Biacore SPR DSC EVO 220 UV/vis ITC QCMD Tousimis Critical Point Dryer Wet Chemistry for Wafer Cleaning Anatech Resist Strip Bal-Tec CPD 408 Critical Point Dryer Clean Bench & Tanks-class 3 materials Critical Point Dryer – Leica Critical Point Dryer – Tousismis General Chemistry Hoods Glen 1000 Resist Strip Hamatech Hot Piranha Hamatech Post CMP Brushcleaner Harrick Plasma Generator Harrick Plasma Generator MOS Clean Bench & Tanks-Class 3 Materials Nanostrip Tank Spin Rinse Dryers (SRD) YES Asher YES EcoClean Asher ASH1 CPD1 CPD3 GLOW1 Abrasive Blast Cabinet CMOS Cleaning Station (Marcus) CMOS Cleaning Station (Pettit) CMOS Spin Rinse Dryer (Inorganic) CMOS Spin Rinse Dryer (SRD) – Pettit Fumehood 1 Left Fumehood 1 Right Fumehood 2 Left Fumehood 2 Right Fumehood 3 Left Fumehood 3 Right MEMS Spin Rinse Dryer (SRD) MEMS Wet Bench Plasma-Etcher Plasma Cleaner Samco UV Ozone Dry Stripper Semitool Spin Rinse Dryer — Instructional Center Solvent Fumehood Left Solvent Fumehood Right SWC 3000-C Mask Cleaner Tousimis Super Critical Dryer (Marcus) Tousimis Super Critical Dryer (Pettit) Ultratech Plate Cleaner Critical Point Dryer RCA Clean Wet Process Station Solvent Processing Station Spin Rinse Dryer Air Control Wet Bench Lam OnTrak DSS200 Series II Brush Cleaner Plasma Etch PE-100 Plasma ystem Santa Clara Stainless Steel Wet Bench Tousimis 916B Critical Point Dryer Crest Ultrasonic Cleaner Harrick Plasma Cleaner PVA Tepla Ion 10 Chemical Hoods/Wet Benches Plasma Asher Critical Point Dryer Plasma Cleaner Plasma Cleaner Ultrasonic and Megasonic Cleaners Large Sonicator PE-200 PE-200 PE-50 Clean-1 and 2 Wetbench Critical Point Dryer Decon and Clean-3 Wetbench Fume Hoods 1-4 Germanium wbgen-2 Lithography Solvent Bench Miscellaneous Photoresist Wetbench Plasma Etch IoN Wave 10 Plasma Asher Jelight UVO-Cleaner UV Cleaning Machine ST270 Spin Rinse Dryer WAFAB Bottle Washer Bench WAFAB Cleaning Bench WAFAB Solvent Bench YES CV200 RFS Plasma Strip / Descum System YES-G1000 Plasma Asher PE100 Spin Rinse Dryer Tepla 100 Tousimis AutoSamdri 815A Tousimis Autosamdri 815B Critical Point Dryer Barrel Asher Critical Point Dryer RCA Cleaning Wet Bench Solvents Wet Bench Solvents Wet Bench (Photolithography Bay) Spin Rinse Dryer (Photolithography Bay) Spin Rinse Dryer (Wet Etch Bay) Asher Critical Point Dryer UV Ozone Cleaner Wet Bench – Etching Wet Bench – General Use Wet Bench – General Use Wet Bench – HF Wet Bench – KOH Wet Bench – RCA Wet Bench – Solvents LFE Barrel Etcher-Soft Lithography YES-R1 Plasma Cleaner Automatic Bottle Washer Leica Critical Point Dryer Solvent Process Bench Tousimis Critical Point Dryer Verteq Superclean Spin Rinse Dryer Critical Point Drier Spin Rinser & Drier SAT Spin Rinser & Drier- 8″ SRD SPIN RINSER & DRIER Verteq Spin Rinse Dryer — Instructional Center Verteq Spin Rinse Dryer — Instructional Center WPS- acid C11 C14 C16 G12-14 H14-15 WPS- solvent F06 G8-11 BarrelEtch BATH1 BATH2 Plasma Cleaner SRD 1-4 YES Asher KOH baths for wafer Polishing and Texturing Oxford Plasmalab 80 – Chlorine Oxford Plasmalab 80 – Fluorine Plasmatherm 790 RIE PlasmaTherm Apex ICP STS AGE ICP – Chlorine STS ASE ICP DRIE – Fluorine Tegal 421 Xactix XeF2 Etcher AJA Ion Mill Hamatech Mask Chrome Etch Hamatech Wafer Processor Develop 1 Hamatech Wafer Processor Develop 2 Hot Phosphoric Tank KOH Hood and Bath Oerlikon Versaline Deep Si Etcher Oxford 100 Etcher Oxford 81 Etcher Oxford 82 Etcher Oxford Cobra ICP Etcher Plasma-Therm Takachi ALE Primaxx Vapor HF Etcher PT72 Etcher PT720 Etcher PT740 Etcher PT770 Etcher – Left Side (Metal Etch) PT770 Etcher – Right Side (III-V) SAMCO UV-1 UV/Ozone Trion Etcher Unaxis 770 Deep Si Etcher Xactix Xenon Difluoride Etcher ACIDHOOD1 ACIDHOOD2 ACIDHOOD3 PLAP1 RIE1 RIE2 RIE3 SOLVHOOD1 SOLVHOOD2 SOLVHOOD3 Gasonics Asher Gasonics Asher (Inorganic) Hydrofluoric (HF) Vapor Etcher Oxford Cryogenic ICP Oxford End-point RIE Oxford ICP-PECVD Plasma Therm ICP Plasma Therm RIE Plasma Therm SLR RIE STS AOE ICP STS HRM ICP STS ICP STS Pegasus ICP STS SOE ICP Technics Micro PD – Instructional Center Technics Micro RIE – Organic Cleanroom Unaxis RIE Vision RIE 1 Vision RIE 2 Xactix Xenon Difluoride Etcher Anatech Barrel Plasma System General Wet Process Station Ion Beam Etcher Matrix Plasma Asher Plasma -Therm Diamond RIE Samco UV & Ozone Stripper South Bay RIE SPTS Rapier DRIE STS ICP RIE ULVAC Deep Oxide Etcher Unaxis Shuttleline ICP RIE Air Control Wet Bench Americhem Eng Polypro Wet Bench Lam Rainbow 4400 RIE Plasma Therm SLR RIE Acid Process Wetbench Base Process Wetbench March 1703 Oxford ICP Oxidation Diffusion Wetbench Deep Reactive Ion Etching System – Alcatel AMS 100 Oxford NPG80 Reactive Ion Etcher Oxford Plasmalab 100 ICP Reactive Ion Etcher Acid Bench – multiple wafer processing Acid Benches Deep Reactive Ion Etcher (DRIE) Plasma Cleaner Reactive Ion Etcher (RIE) Samco RIE-10NR Solvent Benches Xenon Difluoride Etcher AMT Oxide Plasma Etcher Applied Materials P5000 Etcher Drytek 100 Plasma Etcher Flexible Corrosive Wetbench and GaAs Gasonics Aura Asher Lam Research TCP 9400 Poly Etcher Laurell Develop-Etch Matrix Plasma Resist Strip milling: Intlvac Ion Mill MRC Reactive Ion Etcher Oxford Dielectric Etcher Oxford III-V etcher Plasma Pen Plasma Therm Versaline LL ICP Deep Silicon Etcher Plasma Therm Versaline LL ICP Dielectric Etcher Plasma Therm Versaline LL ICP Metal Etcher RIE: Oxford PlasmaPro 80 Samco Plasma Etcher Solvent Wetbench SPTS uetch vapor etch STS Deep RIE Etcher Xactix Xenon Difluoride Etcher Memsstar Orbis Alpha Oxide Etch System Plasma-Therm ICP Chlorine Etch Plasma-Therm ICP Fluoride Etch Plasma-Therm Versaline Deep Si RIE PlasmaTherm SLR ICP Etch Solaris 150 RTP Rapid Thermal Annealer WAFAB Acid/Base Bench WAFAB HF/TMAH Bench WAFAB Toxic Corrosives Bench 80+ RIE HF Vapor Etch Tool ICP100 Trion RIE/ICP Xactix XeF2 etcher Microwave induced plasma etcher Acid Wet Bench Base Development Bench Base Wet Bench Chlorine & Flourine Metal Etching System Deep Reactive Ion Etching System – STS MESC Multiplex ICP Developer Wet Bench EDP Wet Bench Fischione Ion Mill Reactive Ion Etcher XeF2 System Deep Trench Etcher Dielectric Etcher Ion Mill Oxford Etcher Plasmatherm AV Etcher-Keller STS Etcher XeF2 Etcher Deep RIE FIB IBM RIE DRIE Acid Process Bench 1 Anatech SCE 106 (DE-07) Base Process Bench Glenn Downstream RIE HF Process Bench Oxford 80+ RIE II Oxford PlasmaLab 80+ (DE-04) Oxford PlasmaLab 80+ (Unit 2) SPTS Deep Silicon Etch (DE-03) SPTS Xactix Xetch (DE-06) Technics RIE Multipurpose I Technics RIE Multipurpose II Trion Phantom 790 Plasmatherm #1 RIE 790 Plasmatherm #2 RIE AJA Ion Mill with End Point Detector Ashers Batchtop RIE ICP 2300 Versys LAM ICP STS Ion miller March Asher Microwave plasma asher Oxford ICP100 Oxford Reactive Ion Etcher RIE Plasma Lab 80+ PECVD and Etching Plasma Therm Versaline DSE RIE etching system TRION BATH3 BATH4 DRIE HOOD1 HOOD2 HOOD3 ICP – Chlorine ICP – Fluorine SPTS uEtch HF Vapor Etcher SPTS-DRIE Vision-RIE 2010F (JEOL) ARM200F (JEOL) Axiophot Photomicroscope Bruker Dimension Bruker Multimode CM200-FEG (Philips) Electroluminescence Focused Ion Beam – Helios G4 UX (FEI) Focused Ion Beam – Nova 200 NanoLab (FEI) HITACHI 4100 Spectrophotometer Hitachi FESEM Imaging Photoluminescence Lock-in Thermography Nion UltraSTEM 100 Tecnai F20 (FEI) Titan 300/80 (FEI) Titan Krios (FEI) XL30 Environmental FEG AFM – Veeco Icon Bruker Skyscan 1276 micro-CT BX-51 Fluorescence Microscope Confocal Microscope (Zeiss LSM710) Confocal Multiphoton Microscope Inverted (Zeiss LSM880 “i880”) Confocal Multiphoton Microscope Upright (Zeiss LSM880 “u880”) Fluorescence Upright Metamorph (Olympus) Hummer Au/Pd Sputtering System IVIS Spectrum (PerkinElmer) Light Sheet Microscope (LaVision BioTec) Nikon L200 Eclipse Microscope Olympus Confocal Microscope Olympus IX-71 Inverted Fluorescence Microscope Olympus MX-50 Optical Microscopes – Other Polaron Gold Sputtering System Schott IR Inspector Spinning Disk Confocal Microscope (Andor) Stereomicroscope (Zeiss) Super Resolution Microscope (Zeiss Elyra PS.1) Tabletop SEM Vevo-2100 (VisualSonics) Zeiss Supra SEM Zeiss Ultra SEM Zeiss Xradia 520 Versa nano-CT AFM1 AFM2 IMILL1 MICROCT1 MTOME1 SCOPE1 SCOPE3 SCOPE4 SCOPE7 SEM1 SEM2 SEM3 SEM4 SPUT6 TEM2 VITRO1 VITRO2 AMSCOPE IN300TB Inverted Microscope Bruker Icon AFM Cressington 108A Carbon Coater FEI Nova Nanolab 200 FIB/SEM FEI Quanta 200 3D FIB/SEM FEI Tecnai F30 TEM Hitachi HD-2700 Hitachi HT7700 TEM Hitachi S-3500H SEM Hitachi S-3700N VP-SEM Hitachi S-4700 FE-SEM Hitachi SU8010 SEM Hitachi SU8230 Hummer 5 Gold/Palladium Sputterer Hummer 6 Gold/Palladium Sputterer Hummer XP Gold Sputterer JEOL 100 CX-II TEM Keyence VHX-600 Digital Microscope LEO 1530 FE-SEM LEO 1530 SEM Microscope 1 – Instructional Center Microscope 2 – Instructional Center Microscope 4 – IR (infrared) Microscope M1 (Olympus MX61) Microscope M2 (Olympus MX61) Microscope M3 – Soft-lithography Microscope M4 Microscope M5 (Nikon L200) Microscope P1 Microscope P2 Microscope P3 Microscope P4 Microscope P5 Nicolet iN10 MX FTIR Microscope Olympus LEXT 3D Material Confocal Microscope Olympus MX50 Microscope Olympus MX61 Microscope – Pettit Quorum Q-150T ES Renishaw inVia Confocal Raman Microscope (UV-IR) Renishaw Qontor Confocal Raman Microscope (Vis/Near IR) Zeiss Ultra60 FE-SEM Baltec Carbon Coater Critical Point Dryer Cryoplunge Cs-TEM Aberration Corrected MC Zeiss 200-80 Cypher AFM Diener/Femto Plasma Cleaner FEI Helios 660 FEI Tecnai Arctica CryoTEM with Autoloader FEI Tecnai Cryo-Bio 200kV FEG TEM FESEM Supra 55VP FESEM Ultra Plus FESEM Ultra55 Hitachi SU8230 Hydrophilic Treatment System JEOL 2010 FED – TEM/STEM JEOL 2100 TEM JEOL ARM 200F STEM JEOL Cross Section Polisher Knife Maker NanoMill 1040 Plasma Cleaner Polisher Sputter Coater Ultramicrotome Veeco NanoMan AFM Zeiss EVO SEM Agilent Cary Eclipse Fluorescence Spectrophotometer Asylum MFP-3D Origin+ AFM Cytoviva Hyperspectral Darkfield Microscope Hitachi S-4800 FESEM Horiba FluoroMax 4 Keysight 5600 LS AFM Leica EM ACE200 Sample Coater Nanoscience TraxSTM Southbay PC2000 Plasma Cleaner Zeiss Auriga Crossbeam FIB-FESEM Zeiss Axio Imager Z2m Zeiss Axio Observer A1 Zeiss Axio Observer Spinning Disc Confocal Microscope Zeiss EVO LS VP-SEM Zeiss Libra 120 PLUS TEM Zeiss Orion Plus Helium Ion Microscope Atomic Force Microscope Confocal Scanning Laser Microscopes, 1 upright, 1 inverted Epifluorescence Optical Microscope Field Emission Scanning Electron Microscope Multi-Modality Multi-Photon Digital Light Sheet Fluorescence Microscope Nikon Eclipse E-800 (2 units) Nikon SMZ-1500 Pella Carbon Coater Raman Microscope Scanning Electron Microscope Talos Arctica Cryo-EM Tecnai Spirit TEM THUNDER Live Cell Epi-Fluorescence Widefield Microscope Transmission Electron Microscope Vitrobot Mk. IV 3D X-ray Tomography System Aberration Corrected STEM Advanced Coater AFM Conventional STEM Cryo SEM Cryo Ultramicrotome Desktop SEM Dimpler Grinder Disc Cutter Field Emission Scanning Electron Microscope Focused Ion Beam & Scanning Electron Microscope Freeze Fracture Grinder/Polisher Low angle Ion Milling and Polishing System Low-speed Diamond Saw Micro-CT Multiprep Polishers Multiprep Polishers Multiprep Polishers Optical Microscope Plasma Etcher Talos TEM TEM Mill Twin-jet Electro-polisher Ultramicrotome Ultrasonic Cutter Variable Pressure Scanning Electron Microscope Vitrobot ARM 200CF ARM 300CF Atomic Force Microscope Bioscope Resolve Bruker Fastscan Bruker ICON PT System Dimpler FEI Helios Nanolab FEI Quanta 650 FEG Glove Box Hitachi H-8100 TEM Hitachi HD-2300 STEM Hitachi HT-7700 S/TEM Hitachi S-3400 Hitachi S-4800 Hitachi SU8030 IBT JEOL 2100F S/TEM JEOL JEM 7900-FLV JEOL JEM1230 TEM Leo 1525 Microscope MultiPrep Polisher Nano Mill Optical Microscope Osmium Coater Oven PIPS Plasma Cleaner Polisher Grinder Sputter Coater Stereo Microscope TEM Mill Twin-jet Electro Polisher AP-XPS/AP-STM Aberration Corrected TEM, Atomic Resolution Microscope with EELS (JEOL ARM) Atom Probe Tomography Biological Atomic Force and Super Resolution Fluorescence Microscope Confocal, FLIM & Multi-Photon Fluorescence Microscope CryoTEM (Tecnai) Dynamic Force AFM (Asylum) Electron Microprobe Environmental FIB/SEM (Quanta) Environmental TEM Geochemistry AFM (Icon) Helios FIB/SEM Helium Ion Microscope Imaging XPS Laser Capture Microdissection (LCM) Liquid He CryoTEM Low Temperature UHV STM/AFM Multimode AFM (Nanoscope) Photoemission Electron Microscope Radiological AFM Radiological FIB/SEM (Quanta) Radiological XPS Scanning Probe AFM Compound Microscope Scanning TEM Scattering IR SNOM SIM – Structured Illumination Super Resolution Fluorescence Microscope Single-Molecule Fluorescence Microscope STORM/PALM – Super Resolution Fluorescence Microscope Variable Temperature UHV STM/AFM Carbon and Metal Sputter Coater e-beam/SEM: FEI Nova FIB/SEM: FEI Helios 600i Keyence Polarized LM: Nikon LV100 SEM: Apreo S LoVac SEM SEM: FEI Magellan Spectroscopy: Horiba XploRA+ Confocal Raman SPM: Bruker Dimension Icon SPM: Horiba Labram Raman SPM: Park NX-10 SPM: Park XE-100 SPM: Park XE-70 SPM: Scanning SQUID Microscope TEM: FEI Tecnai TEM: FEI Titan XCT: Zeiss Xradia 520 Versa X-ray CT Bruker Dimension Icon AFM FEI Quanta 650 FEG SEM with Nabity Pattern Generator Nikon Eclipse L200 Microscope (3) JEOL JSM-7400F Field Emission Scanning Electron Microscope Keyence VHX1000 Thermo Fisher Scientific Apreo SEM Thermo Fisher Scientific Quanta FEG 250 SEM Thermo Fisher Scios DualBeam FIB/SEM Thermo Fisher Scios DualBeam FIB/SEM Veeco Scanning Probe Microscope Zeiss Sigma 500 Cryo-EM Freeze Substitution System Cryo-EM High Pressure Freezer Cryo-EM Trimmer Cryo-EM Ultramicrotome Dimpler/Grinder Ecomet Helios Nanolab 660/G3 Hitachi s4300 Ion Mill Ion Polisher Isomet Minimet Multiprep Plasma Cleaner Quanta 250 Scanning Electron Microscope Talos TEM TenuPol Thermolyne Furnace Ultrasonic Disc Cutter Vibromet Vitrobot Zeiss Optical Microscope AFM Axio Imager Microscope BIO AFM FEI Nova 600 FEI Tecnai Hi-Speed Camera Leitz Ergolux Microscope Microscope Zeiss Axiotron Microtome RMC MR3 Mid-Wave Thermal Imaging System Scanning electron Microscope Scanning electron Microscope SEM Stereoscope Vega 3 SEM Zeiss Zxiolmager M2M microscope 6700 SEM Atomic Force Microscope-Keller Atomic Force Microscope-PAN Bruker Nanoscope V Multimode 8 with or without optional high-speed scanning (SPM 1 and 2) Confocal Microscope Confocal/fluorescence Microscope FEI Tecnai G2 F30 Field Emission Gun Transmission Electron Microscope FEI Titan Aberration-Corrected Scanning Transmission Electron Microscope Inverted Microscope JEOL 6500 Field Emission Gun JEOL Scanning Electron Microscope SEM Keyence microscope Materials Microscope SEM Sputterer SPM Icon SPM IR 3D Bio AFM Atomic Force Microscope Bruker Dimension Icon Atomic Force Microscope Dimension 3100 SPM EnviroScope Atomic Force Microscope (ESCOPE) FEI Nova Nano450 FEI Tecnia Osiris Helios Dual Beam FIB JEOL JEM2010 Laser Scanning Microscope Olympus polarizing Microscope Quanta 200 Environmental SEM AFM Critical Point Drier Cryo Ultramicrotome ESEM FIB SEM Sputter coater TEM TEM 2010F Ultramicrotome Agilent PicoPlus atomic force microscope Asylum MFP-3D atomic force microscope Bruker Dimension Icon AFM Horiba Raman/AFM JEOL 7500F HRSEM JEOL F200 TEM JEOL NeoARM 200CF TEM Lakeshore probe station Microscope 1 Microscope 2 Microscope 3 Microscope 4 Omicron VT-STM/AFM Quanta 600 FEG ESEM Smart Zoom Tescan Focused Ion Beam Microscope Titan Krios (FEI) UHV VT AFM Atomic Force Microscope Axioskope 2 MAT Emitech Au/Pd and Ir sputter coater ESEM Laser Microscope Leitz ergolux Olympus Inspection Microscope Olympus Inspection Microscope Olympus Inspection Microscope Olympus Inspection Microscope Park NX10 Atomic Force Microscope Plasma cleaner SEM SEM/FIB with Zyvex S100 SEM/STEM TECNAI TEM Transmission Electron Microscope (TEM) UT FIB FEI Video Microscope Zeiss FE-SEM Neon40 Confocal Microscope Cypher AFM Dimpling Grinder Disc Cutter Dualbeam FIB/SEM FEI Apreo FEI Sirion FEI Tecnai FEI Tecnai Icon AFM Ion Mill JEOL-SEM Leica Microtome Microscopes PiFM Bruker AFM Multimode FEI Helios 600 NanoLab, Focused Ion Beam (FIB) FEI Quanta 600 FEG Environmental SEM FEI Titan 300 HIROX KH-7700 3D Digital Video Microscope JEOL 2100 LEO (Zeiss) 1550 Field Emission SEM Phillips EM420 Veeco BioScope II Environmental SEM Scanning Electron Microscope with EDS Sonoscan C-Mode Scanning Acoustic Microscope Veeco Mulitmode Atomic Force Microscope (AFM) X-ray Imaging System Zeiss Flourescence Microscope Brewer CEE Spinner and Hotplate EV Group 620 Contact Aligner GCA 8500 Stepper JEOL Electron Beam Lithography OAI 808 Aligner 300mm hotplate 300mm spinner ABM Contact Aligner ASML 300C DUV Stepper Autostep i-line Stepper BLE 150 Hotplate E-Beam Lithography Hot Plates E-beam Lithography Spinners Ebeam Resist Hood – Left Ebeam Resist Hood – Right Edge Bead Removal System Gamma Automatic Coat-Develop Tool GCA 5x Stepper Heidelberg Mask Writer – DWL2000 Heidelberg Mask Writer – DWL66 High-Temperature PDMS Curing Oven Hotplates and Ovens Jelight 144AX UVO-Cleaner JEOL 6300 JEOL 9500 JEOL Alignment Microscope Laurell WS-400A Spin Coater Low-temp PDMS Vacuum Oven 1 (2nd Floor) Low-temp PDMS Vacuum Oven 2 (2nd Floor) Low-temperature Vacuum Oven (Clean Room) Nabity PAMS_JEOL_Pre-Alignment Photolithography Hotplates (Rm 121) Photolithography Spinners (Rm 121) Photolithography Spinners (SU8 etc) Photolithography Wet Benches (Rm 121) Photolithography Wet Benches (Rm 133) Photolithography Wet Benches (SU8 etc) Resist Hot Strip Bath SU-8 Hotplates SUEX / ADEX Laminator Suss MA6-BA6 Contact Aligner Suss MJB4 Contact Aligner YES Image Reversal Oven YES Polyimide Bake Oven YES Vapor Prime Oven ARRAY1 COATHOOD1 COATHOOD2 DEVHOOD1 EBL1 PHOTO1 PHOTO2 BLE Spinner ELS-G100 EBL System EVG 620 Mask Aligner Karl Suss MA-6 Mask Aligner – Pettit Karl Suss MA6 — Instructional Center Karl Suss RC8 Spinner (Marcus) Karl Suss RC8 Spinner (Pettit) Karl Suss TSA MA-6 Mask Aligner Microtech Laserwriter LW405 SCS G3P8 -Soft-lithography Suss Microtec MJB4 AS200 i-line Stepper Electron Beam Resist Developing Station Electron Beam Resist Spin Coating Station Elionix ELS-7000 Elionix ELS-F125 EVG 150 Automated Wafer Coater/Developer EVG 620 Mask Aligner Heidelberg Mask Writer Heidelberg MLA150 Maskless Aligner Heidelberg uPG501 JEOL JSM-7000F Layout BEAMER/LAB software Metal Lift-Off Processing Station Nanoscribe 3D Lithography System Photoresist Developer Station Positive/Negative Photoresist Station Raith-150 E-Beam Solvent Based Photoresist Developer Station SU-8 Spin Coating Station SUSS MA6 Mask Aligner Suss MJB4 Mask Aligner YES Vapor Prime Oven Microfluidics/PDMS processing setup OAI 8808 Mask Aligner w/DUV AB-M Contact Aligner Brewer CEE 100CB EMS Hotplate Laurell Spin Coater Solvent/Headway Spinner Bench YES III Vapor Prime Oven Heidelberg µP-101 Direct Write Lithography I-Line Lithography – GCA 8500DSW Stepper Karl Suss MA 6 Mask Aligner RAITH 150 TWO E-BEAM WRITER YES Oven – HMDS and Image Reversal Convection Ovens Develop Bench Mask Aligner Maskless Aligner MLA150 Spinner Bench Ultraviolet Flood Exposure System CEE-100 Spinner ECE418 Aligner Karl Suss MJB-3 Aligners Tractrix Spinbot Alveole PRIMO ASML PAS 5500/60 i-line Stepper e-beam: JEOL 6300-FS EV Group Contact Aligner Heildelberg MLA 150 – 1 Heildelberg MLA 150 – 2 Karl Suss MA-6 Contact Aligner 1&2 Lasercutter ML3 MicroWriter Nanoscribe Raith Voyager 50kV/10kV 3C Technical GCA AutoStep 200 5x Reduction Stepper Bachur and Associates UV Flood Exposure System Despatch LCC1-16-5 Resist Oven (3) Heidelberg MLA150 Direct Write Lithographer Raith EBPG5000 Plus E-Beam Writer SUSS MJB4 Manual Mask Aligner WAFAB Developer Bench WAFAB Resist Bench (2) YES-58TA Vacuum Bake/HMDS Vapor Prime & Image Reversal System EVG620 Lithography System Heidelberg MLA150 Karl Suss MA6 Mask Aligner Karl Suss MJB3 Mask Aligner PDMS Processing Clean Space Vistec EBPG Mask Aligner Raith E-line CPK Spin Developer/Etch Bench Image Reversal Oven Mask Aligner Mask Aligner Photomask Laser Pattern Generator Canon I-line stepper Contact Aligner System Contact Aligner System Contact Aligner System – Backside Aligning Heidelberg laserwriter Photo Resist Dispensing System Photo Resist Exposing System Spinner Spinner Spray developer Vistec EBPG5000+ Wet Bench – Resist YES Image Reversal Oven DWL66 Laser Wrier EBL MJB4 Mask Aligner Mask Aligner ABM 3000 ABM Aligner II ABM Aligner III Dehydration Oven E-Beam Resist Hot Plate Tower Electron Beam Lithography Spinner Electron Beam Resist Oven Elionix ELS-7500EX Heidelberg Laser Writer Negative Resist Hot Plate Tower Negative Resist Oven Negative Resist Spinner Negative Resist Spinner PDMS Process Bench Positive Resist Hot Plate Tower Positive Resist Oven Positive Resist Spinner Positive Resist Spinner Reynolds Tech E-Beam Resist Spin & Develop Bench Reynolds Tech Negative Photoresist Develop Bench Reynolds Tech Negative Photoresist Spinner Bench Reynolds Tech Positive Photoresist Develop Bench Reynolds Tech Positive Photoresist Spinner Bench Soft Lithography Hot Plate Tower SU-8 and PDMS Baking SU-8/PDMS Resist Spinner SU-8/PDMS Spin Bench Suss MicroTec AltaSpray Automated Spray Coated AS8 SUSS MicroTec MA-6 Vacuum Oven YES Vapor Phase Deposition System Brewer Science Spinner EV Group 620 Contact Aligner Headway Spinner hood J21/J23 HMDS oven JEOL e-beam lithography Laser Writer Mask Aligner OAI Mask Aligner Photomask Aligner Raith Pattern generator Semiautomatic Screen Printer SFIL IMPRIO100 Spincoater Suss Microtec MA6/BA6 Contact Aligner Suss Microtec MJB4 ABM Contact Aligner ABM-SemiAuto Aligner Automated Coater/Developer BATH 5 BATH 6 Canon Stepper E-beam Litho EVG Contact Aligner LabSpin8 Spin Coater Mask Writer 1 Mask Writer 2 PI-Oven SCS Spin Coater Vapor Prime Oven Alessi Probe Station Auger Bruker FTIR/FTRaman D-5000 Dektak Profilometer DSC Ellipsometer (VASE) Flash Solar Cell Tester Four point probe JXA-8530F Electron Probe Microanalyzer (EPMA) Micro-Raman spectrometer Optical Profilometer PANalytical MRD Perkin Elmer Lambda 18 UV vis spectrometer Quantum Efficiency measurement tool Sinton Lifetime Tester Tandem Accelerator Tencor profilometer TGA/DTA UV-Vis Spectrometers (Perkin Lambda 950) Veeco 4-point probe Woollam Spectroscopic Ellipsometer X-ray topography instrument XPS Zygo Zegage Optical profilometer Absorption Spectrometer Cary 300 UV-Vis (Agilent) Accurion EP3 Imaging Ellipsometer Bruker EDS CDE ResMap Resistivity 4-pt Probe CV Testing Station DC Probe Station and Electronics Dektak 6M Profilometer Dektak XT Profilometer Everbeing 4-point Probe Station-Manual Everbeing EB-6 DC Probe Station FilMetrics F40 Filmetrics F40-UV Filmetrics F50 FilMetrics F50-EXR FleXus Film Stress Measurement Leitz MVP-SP Interferometer Metricon Mettler Hand-held Refractometer Microwave Large Signal Test System-Load-pull System Microwave Small Probe Station and Electronics mm-Wave Vector Network Analyzer and Probe Station P-7 Profilometer Panalytical X-ray Diffractometer PTI Fluorometer QuantaMaster 400 (Horiba) Rame-Hart 500 Contact Angle Goniometer Rudolph FTM Sine-wave Vibro Viscometer Soft Materials 4-pt Probe Station Suss Backside Alignment Measurement VCA Optima Contact Angle Woollam RC2 Spectroscopic Ellipsometer Woollam Spectroscopic Ellipsometer Zygo Optical Profilometer Zyvex Nanoprobes for Ultra SEM ELL1 MSA1 NANO1 OPT1 OPT2 OPT3 PROBE2 PROF2 SAXS1 SAXS2 XDIF1 XPS1 ZYGO1 Bond Tester Bowoptic Stress Measurement Contact Angle Measurement System Dage X-Ray XD7600NT Dektak 150 Profilometer Dektak 150 Profilometer — Instructional Center FEI Nova Nanolab 200 FIB/SEM FEI Tecnai F30 TEM FTIR Spectrometer High Speed Optical Signal Testing Hitachi HD-2700 Hitachi SU8230 Hysitron TriboIndenter IONTOF Time-of-Flight SIMS KLA Tencor Surfscan 6100 Kratos XPS LEO 1530 SEM Millimeter-Wave Test-Bed Nanospec Reflectometer – Inorganic Nanospec Reflectometer – Pettit Nicolet 6700 FTIR Nicolet iN10 MX FTIR Microscope Panalytical Empyrean Panalytical X’Pert PRO MRD XRD Panalytical XPert PRO Alpha-1 XRD Peel Tester Plas-Mos Ellipsometer Q600 TGA/DSC Renishaw inVia Confocal Raman Microscope (UV-IR) Renishaw Qontor Confocal Raman Microscope (Vis/Near IR) SemiTest SCA-2500 Surface Charge Analyzer Semprex Spectrometer – Instructional Center Signatone Four-point Probe Signatone Probe Station Tencor P15 Profilometer Tencor P15 Profilometer (left) Tencor P15 Profilometer (right) Thermo K-Alpha XPS Thermo UV-VIS Spectrometer UV-VIS Spectrophotometer Veeco Four-point Probe — Instructional Center Wafer Inspection Camera Woollam Ellipsometer Woollam M2000 Ellipsometer Woollam Vase Ellipsometer Wyko NT2000 Profilometer (VEECO) Wyko Profilometer NT3300 Zeiss Ultra60 FE-SEM 3D Atom Probe 4156c Seminconductor Analyzer No 2 Agilent B1500 Semiconductor Analyzer CCI HD Optical Profiler CDE ResMap-178 Characterization Electronics Contact Angle and Surface Tension Measurement System FLX-2320-S Thin Film Stress Measurement Hall Effect Measurement System Lakeshore 1.5K Probe Station LED Measurement System and Integrating Sphere Multi-wavelength Scanning Ellipsometer Scanning Ellipsometer Signatone Probe Station Veeco Dektak Profilometer Woollam Spectroscopic Ellipsometer Agilent 212-LC/500-MS Agilent 34401A Multimeter Agilent 400 MHz NMR Spectrometer Agilent 4294A Impedance Analyzer Agilent 610 FT-IR Microscope Agilent 700 Mhz NMR Spectrometer Agilent 710-ES ICP-OES Agilent 920-Liquid Chromatograpy Agilent Cary 6000i UV-vis-NIR Spectrophotometer Agilent Cary 670 FT-IR Spectrophotometer Agilent microwave vector network analyzer Agilent Technologies 54624A Oscilloscope Cascade REL-4800 Manual Probe Station Gaertner LSE-WS Ellipsometer Horiba XploRA ONE Raman Confocal Microscope Hysitron TI950 Triboindenter Instron 3384 Materials Test Frame Instron 5900R Material Test Frame Instron 8802 Dynamic Test Frame Instron 9250G Impact Test Frame Jandel 4-point probe RM3000 Keithley 2602A Dual Channel Source Meter KLA-Tencor P-10 Profilometer Kruss Tensiometer Perkin Elmer DMA 8000 Dynamic Mechanical Analyzer Perkin Elmer DSC 6000 Differential Scanning Calorimeter Princeton VeraSTAT4 Potentiostat/Galvanostat Rame Hart 260-F4 Goniometer/Tensiometer Rheosense m-VROC Viscometer Rigaku Gemini A Single Crystal Diffractometer Siemens Magnetom Trio MRI 3T Scanner TA Q200 DSC Differential Scanning Calorimeter TA Q500 TGA Thermogravimetric Analyzer Thermo Scientific Escalab Xi+ Thermtest TPS2500S Thermal Conductivity Instrument Tinius Olsen Model IT 503 Low Energy Pendulum Impact Tester Tinius Olsen Model IT 503 Low Energy Pendulum Impact Tester Agilent 6490 QQQ MS Agilent 6538 Q-TOF with Agilent 1290 UHPLC Agilent 7800 ICP-MS with ESL 193 nm Laser Ablation System Ambios XP2 Angstrom Sun Technologies Spectroscopic Ellipsometer Bruker Autoflex Bruker D8 Advance Powder X-ray Diffractometer Bruker maXis Impact with Dionex 3000 nano-uHPLC Bruker micrOTOF with Agilent 1290 UHPLC Cameca ION TOF IV Filmetrics Filmetrics GC-MS Agilent Jandel 4-point probe Nikon LV150 Scanning Auger Electron Microprobe Waters Synapt G2S-i Q-TOF with ion mobility Waters Synapt-XS Q-IMS-TOF with Ion Mobility Wild X-ray Photoelectron Spectrometer Bruker AXS General Area Detector Diffraction System Confocal Laser Scanning Microscope Confocal Raman Microscope Ellipsometer Four point probe Nanoindenter Nanometrics PANalytical Empyrean Linear Detector and Non-ambient Environment Probe Station I: I-V & C-V Testing Rigaku SmartLab X-Ray Diffractometer Shielded Antenna Chamber TI980 Nanoindenter Time-of-Flight SIMS Veeco Dektak 150 Profilometer Wyko Optical Profilometer XPS/UVS – SPECS System with PHOIBOS 150 Analyzer 3D optical microscope 3D Optical Profiler 400 MHz solid state NMR 500 MHz NMR Spectrometer with Direct Cryoprobe 500 MHz NMR Spectrometer with Triple Resonance Cryoprobe 600 MHz NMR Spectrometer Agilent 6520 QTOF LCMS Agilent 6520 QTOF LCMS AmaZon X Ion Trap BioSoft Indenter Bruker Duo X-Ray Diffractomer Camera Contact Angle Measurement ED-XRF Electrical Test Station Ellipsometer Ellipsometer FT-IR GC-TOF MS Huber 2-circle Cu Huber 2-circle XSW Mo Huber 4-circle Labram HR Evolution Raman Spectrometer LC-TOF MS LEAP 5000 XS MALDI-TOF MS Micro FT-IR Modular Compact Rheometer Nanoindenter Netzsch STA Powder X-Ray Diffractomer Reflectometer Rigaku ATXG Rigaku Smartlab Rigaku Smartlab Step2 3kW Rigaku Smartlab Step2 9kW Rigaku Smartlab XE 9kW Rigaku Smax3000 Rigaku Ultima IV Sciex Qtrap 6500 Scintag XDS2000 Shimadzu Prominence HPLC Shimadzu Prominence HPLC SIMS Stylus Profilometer Stylus Profilometer Triboindenter Waters Prep150 HPLC Waters Prep150 HPLC X-Ray Fluorescence Spectrometer XPS 3D Optical Profiler Alisse REL 4800 Alpha Step 200 AP-XPS/AP-STM Karl Suss probe Tau Science Flash QE XPS 300 MHz NMR Mazama (Solids) 400 MHz NMR Karloff (Solids) 500 MHz NMR Shasta (Solids) 600 MHz NMR Baker (Liquids) 600 MHz NMR Hood (Metabolomics) 600 MHz NMR Nittany (Solids) 750 MHz NMR Bokan (Metabolomics) 750 MHz NMR Rainier (Liquids) 850 MHz NMR Ellis (Solids) CyTOF – Mass Cytometer Electron Spectrometer: XPS with Laser Interface Fluorimeter FTIR Microscope High Resolution Microprobe XPS High Resolution, Ultrafast SFG Vibrational Spectroscopy ICP-MS (Quadrupole) Ion Chromatograph Low Temperature Photoelectron Spectroscopy Mass Spectrometer: 21T FTICR Mass Spectrometer: Aerosol, time-of-flight, high resolution Mass Spectrometer: FT-ICR, 6T (Ion Surface Collisions) Mass Spectrometer: Inductively Coupled Plasma (ICP-MS), High Resolution (Element XR) Mass Spectrometer: Ion Mobility Spectrometry, Time of Flight Mass Spectrometer: Linear Ion Trap Quadrupole (LTQ) Orbitrap MS – for environmental research (nanoDESI) Mass Spectrometer: Proton Transfer Reaction (PTRMS) Mass Spectrometer: Single Particle (SPLAT II) Mass Spectrometer: Time of Flight Secondary Ion (ToF SIMS) – 1997 Microbeam XRD Molecular Beam Kinetics Multipurpose XRD Nano-SIMS Powder XRD Pulsed/CW X-Band (9.5 GHz) EPR Radiological Powder XRD Stopped-Flow Absorbance/Fluorescence Spectrometer Sum Frequency Generation for Surface Vibrational Spectroscopy Time-of-Flight SIMS Agilent 8900 Triple Quadrupole QQQ-ICP-MS Alphastep 500 Profilometer Applied Spectra RESOlution Laser LA-ICPMS Auger: PHI 700 Biologic Potentiostat Contact Angle Goniometer: Rame-Hart 290 Cytoviva Digital Instruments Nanoscope 3000 AFM DMA: TA Instrument Q800 DSC: TA Instrument Q100 DSC: TA Instrument Q2000 Eddy Current Measurement System Ellipsometer: Horiba Smart SE EPMA Filmetrics F-40 Flexus 2320 Gas sorption: Quantachrome Autosorb iQ3 HT-GPC: Tosho High-temperature EcoSEC with MALS: Wyatt Dawn Heleos Imaging Ellipsometer Accurion EP3 J.A. Woollam M2000 Spectroscopic Ellipsometer Jasco UV/Vis/IR Spectrometer Keyence VK-X series 3D Laser Scanning Confocal Microscope Lakeshore Hall Measurement System Malvern Zetasizer Manual Probe Station Mechanical Testing, Instron 5565 Nanospec Film Thickness Measurement System Nu Plasma HR Multicollector HR-ICP-MS PESA: Riken AC-2 Photoelectron Spectrometer Photovoltatic test system Profilometer: Bruker Dektak 150 Prometrix Resistivity Mapping System Rheometer: TA Instrument ARES-G2 Sensofar S-neox, non contact 3D optical profiling SIMS: Cameca NanoSIMS 50l Spectroscopy: Agilent Cary 6000i UV/Vis/NIR Spectroscopy: Horiba FluoroLog Fluorimeter Spectroscopy: Nicolet iS50 FT/IR Spectrometer Tencor P2 Profilometer TGA: TA Instrument Q500 XPS: PHI Versaprobe XPS: PHI Versaprobe XRD: Bruker Single Crystal D8 Venture XRD: Multiwire Laue XRD: PANalytical X’Pert 1 XRD: PANalytical X’Pert 2 DektakXT Filmetrics Film Thickness F3 FMS Thin Film Stress Measurement System Horiba UVISEL 2 Spectroscopic Ellipsometer Keysight B1500A Semiconductor Device Analyzer KLA-Tencor P-7 Surface Profilometer RGA Series 200 AMU Residual Gas Analyzer Signatone Checkmate CM-21X Probe Station 81600B Tunable Laser Source 83453B High Resolution Spectrometer 86142B High Performance Optical Spectrum Analyzer Agilent B1500A Semiconductor Device Analyzer Bruker D2 Phaser Benchtop XRD Continuous Wave Diode Pumped Solid State Laser Dektak 150 DektakXT Stylus Profilometer DSA91304A Infiniium High Performance Oscilloscope: 13 GHz E8361C PNA Microwave Network Analyzer Filmetrics F20 Filmetrics F20 (2) Hitachi UH4150 UV-Visible/NIR Spectrophotometer ID Quantique ID220 Single Photon Detector (one pair) J.A. Woollam M-2000D Spectroscopic Ellipsometer J.A. Woollam M-2000D Spectroscopic Ellipsometer Jandel Four Point Probe with RM3000 Test Unit Kobelco Photocurrent Measurement System Lake Shore 8400 Series Hall Effect Measurement System Microfluidics Workstation – Valves Controller N4373C 67 GHz Lightwave Component Analyzer N4906B Serial BERT N9010A EXA Signal Analyzer, 26 GHz Optical Parametric Amplifier Panalytical XPert XRD (Line Source) Panalytical XPert XRD (Point Source) PHI Quantera Scanning XPS PicoHarp 300 PicoQuant Time-Correlated Single Photon Counting (TCSPC) system Profilm3D Optical Profiler Q-Switched Nd:YLF Laser Renishaw inVia confocal Raman microscope Rigaku Smartlab XRD Rudolph Auto EL Ellipsometer Ti:Sapphire Regenerative Laser Amplifier Toho Technology FLX-2320 Thin Film Stress Measurement System Ultrafast Ti:Sapphire Laser Oscillator Veeco Dimension 3100 AFM Veeco NT1100 Optical Profiling System Analytical Balance attocube MFM Bench-top crystal orientation analyzer Laser Flash Apparatus (LFA) Physical Properties Measurement System (PPMS) Probe station and Electronics Rack Quartz Crystal Microbalance with Dissapation (QCM-D) Small Angle/Wide Angle X-Ray Scattering (SAXS) Spectroscopic Ellipsometer SQUID Magnetometer Thermal Analysis Equipment X-ray Powder Diffractometer XPS 16 core Xeon High Perfomance Computing BRUKER Discovery D8 Calorimeter Differential Scanning Calorimeter Dynisco D4003 Melt Index Tester Ellipsometer Four Point Probe Gas Chromatographer Gas Chromatographer HPLC System Instron 5569 Mechnical Tester Instron E10000 Fatigue Test Equipment Instron Impact Tester 8250 inVia Raman/PL Microscope IPCE Keithley SCS Mass Spectrometer PerkinElmer Spectrum Potentiostat Potentiostat Potentiostat Potentiostat Potentiostat Probe Station Rotating Disc Electrode Simultaneous Thermal Analyzers Solar Simulator Solar Simulator Spectrophotometer SRI Gas Chromatographer Thermogravimetric Analyzer Thin Film Measurement System Thin Film Measurement System Thin Film Stress Measurement System Ti-Sapphire Laser TriStar 3000 UV-Vis Spectrophtometer VG Scientific Multilab 3000 CV-IV D8 Discover Ellipsometer Ellipsometer FilmSense Four Point Probe KLA-Tencor P-16 Stylus Profilometer KLA-Tencor P-7 Stylus Profilometer SPM IR Surface particle Measurement Thin Film Stress Measurement System Thin Film Thickness Measurement System UV-Vis Spectrophotometer VersaProbe XPS Woolam-Ellipsometer ASAP 2460 Surface Area and Porosity Analyzer Bruker D8 Discover Bruker Photon 100 Dektak Differential Scanning Calorimeter Filmetrics MPMS Squid Nikon Microscope PANalytical Empyrean Probe Station R Stand Rigaku D / Max -B Rigaku Multiflex Rigaku SmartLab Thermogravimetry analysis system Triboindenter Vibrating Sample Magnetometer EDS on FIB EDS on SEM EDS on TEM Ellipsometer FTIR Microspectrophotometer Profilometer Reflectance mapping system UPS XPS XRD Agilent E3620 Cascade Micromanipulator 6000 Filmetrics F40 Filmetrics F50 Horiba Raman/AFM J.A. Woollam V VASE Spectroscopic Ellipsometer Keithley 3600 KLA 2D Profilometer (MET-01) KLA 3D Profilometer (MET-02) Kratos Axis Ultra Kratos Axis Ultra Lucas Labs 4PP NEC Mini-Tandem 5.1 MeV Ion Accelerator NewView 7300 3D Optical Surface Profiler Princeton Instruments Tri-Vista spectrometer with SI and InGaAs array detectors Quantum Design PPMS 9 T Quantum Design PPMS 9 Tesla with EverCool-II Quantum Designs MPMS 7 Tesla with EverCool-II Scanning confocal Raman spectrometer with atomic force microscope / near-field scanning optical microscope Total internal reflection fluorescence atomic force microscope AFM Veeco/Bruker NanoMan AFMs Atomic Force Microscope Cary 5000UV-VIS NIR Contact Angle Goniometer Dektak Stylus Profilometer Fluorimeter Hysitron TI 950 TriboIndenter Infrared Spectrometer Infinity Gold FTIR Interferometer Mettler Thermogravimetric Analyzer Micro-Raman Spectrometer Alpha 300 Nanometrics Nanospec Thin Film Thickness System #2 Optical Profilometer Philips Vertical Scanning Diffractometer Philips X’Expert XRD Philips XPERT Theta-Theta Diffractometer probe station Rigaku Laue/Precession Rigaku Ultima IV Rikagu Scanning Tunneling Microscope Scintag X1 Theta-Theta Diffractometer Semiconductor Characterization System Semiconductor Parameter Analyzer #1-#2 Small Angle X-Ray Scattering (SAXS) Solar Cell Testing Glovebox Spectroscopic Ellipsometer Stylus Profilometer Time of Flight Secondary Ion Mass Spectrometer (TOF.SIMS 5) Veeco AP-150 Woollam Spectroscopic Ellipsometer X-ray Photoelectron Spectrometer Axis Ultra DLD 4-point Probe Alphastep Bruker D8 Discover CEI-XANES Cyro Probe Station DektakXT EDS Ellipsometer Filmetrics GDOES ION-TOF Keyence Kinetic Laser Kratos Nanoindenter Nanospec P15 Picosecond SFG Probe Station Profilometer Raman Microscope S-Probe Wollam Ellipsometer Wyko Hysitron TriboIndenter SIMS: Cameca IMS 7f GEO XPS: PHI Quantera SXM BioTek Synergy HTX Microplate Reader Cary 5000, UV-Vis-NIR Spectrophotometer Circuit Tester Free Fall Shock Machine HAST Chamber Linkam THMS600 Thermal Stage Mass Spectrometer: Orbitrap Micro-hardness Tester Optical Measuring System Semi-Automatic Probe Station Temp/Humidity Chamber Thermal Shock Chamber Wire Pull/Ball Shear Tester Witec Raman Confocal Atomic Force Microscope Corsolutions Fluidic Probe Station GLOVE1 THINKY1 Heraeus Vacuum Oven (Pettit) Thermo Scientific Precision Oven VWR Oven VWR Oven COMSOL Multiphysics FlackTek Speedmixer Glovebox Elemental Analysis Computing: Cascade (Atipa 1440 Intel Xeon-Phi Node FDR-Infiniband Linux Cluster) Computing: Data File Storage (Aurora) (GB) Electron and Photon Stimulated Desorption (BES 2) Eukaryotic Cell Culture Ice Nucleation Chamber Influx – Flow Cytometer Cell Sorter Intermediate Flow Cells Laser Desorption Analysis Live Cell Single Molecule Fluorescence Microscope Microfluidics and Microfabrication Pore Scale Micromodels Sequencing, Next Generation, High Throughput – Ion S5 Transient Kinetic Analysis Thinky Mixer Carbolite Cleanroom Oven CNC Micro Milling System Hot Laminator – GBC Catena 35 Nickel Electroforming System QuickLaze Laser Trimmer Thorlabs Nanomax 606/609L 6-axis piezo stages Turbo Pumping System Vac Glove Box Syste Haas ST-10Turning Center HAAS VMC VF-2 Controlled Atmosphere Glovebox Exfoliation Glove Box Backside Wafer Scriber Dicing Saw-DISCO Flip Chip Bonder KS Ball Bonder Logitech CMP Microdrill Suss SB8e Substrate Bonder Tape Frame Applicator Ultrasonic (wedge) Wire Bonder SAW3 SB1 WIBO1 BGA Rework Station Dage Shear Tester Dicing Saw Finetech Sub-micron Flip-chip Bonder K&S 1472 Wire Bonder 1 K&S 1472 Wire Bonder 2 K&S 4522 Ball Bonder K&S 4523 Ball Wire Bonder K&S 4523A Wedge Wire Bonder Karl Suss SB6 Bonder Karl Suss SB8E Bonder Logitech LP50 Lapper Logitech PM5 Polisher 1 Logitech SS Bonder Manual Flip Chip Bonder Quick Circuit 7000 PCB Milling Machine Semi-Automatic Wire Bonder Disco wafer dicing saw EVG 501 Wafer Bonder Finetech Flip Chip Bonder Fusion Splicer LSD-100 Scriber/Cleaver Wire Bonder Flow Mach2-1313b Waterjet Cutting Machine Lam IPEC 472 CMP AWB04 Wafer Bonder DISCO DAD3221 Dicing Saw K&S 4124 Wire Bonder K&S 4523AD Wire Bonder Ball Wire Bonder Wedge Bonder Disco Dicing Saw Dispensing Tool ACF Heat Sealer Disco Backgrind DISCO Wafer Saw EV Group Wafer Bonder Flipchip Bonder GnP Poli-400L Idonus Chip Bonder Westbond Wirebonder Disco DAD3240 Automatic Dicing Saw Questar Q7800 Automatic Wedge Bonder ULTRON UH104 UV Curing System ULTRON UH114 Wafer/Frame Film Applicator Ball Bonder Disco Automatic Dicing Saw 3220 Wedge Bonder Wedge/Ball Bonder Precision CNC Dicing / Cutting Saw Flip Chip Bonder Wafer Level Bonder Wirebonder (Ball) Wirebonder Wedge Disco 552 Saw Wafer Bonder Westbond Wirebonder Wirebonder ADT 7100 Dicing Saw EVG 510 Wafer Bonder EVG 620 Wafer Bond Aligner Kulicke 4523 Wire Bonder ADT 7100 Dicing Saw AML Wafer bonder Au Ball Bonder CMP System Press Wafer Dicing Saw Wire Bonder Wire Bonder Disco-Saw Flip-Chip Bonder Screen Printer Wafer Back Grinder Wafer Cleaner Wafer Polisher WestBond Aqueous Cleaner Autoclave Bump Plating Machine Decapsulation System Dicing Saw Die Bonder Dispenser Laminator Manual Wire Bonder Molding Press Pick & Place Reflow Oven Screen Printer Semi-Automated Die Bonder Stencil Printer Wire Bonder Malvern Nano ZS Zetasizer Malvern NS300 NanoSight Malvern Zetasizer Malvern NanoSight LM10 Malvern Zetasizer ZS Microtrac Zetatrac Zeta Potential Analyzer Nanosight300 Zetasizer Zetasizer Zetasizer C, H, N, S Analyzer DLS: Brookhaven Instrument 90 & ZetaPALS MetOne Laser Particle Counter Microtrac S3000 Particle Size Analyzer Particle Size Analyzer Dynamic Light Scattering Particle Size Analyzer Laser Diffraction Particle Size Analyzer Nanoparticle Tracking Analyzer Optical Particle Size and Shape Analyzer qNano qNano Ultrasonicator System Zeta Potential Analyzer Dynamic Light Scattering Zetasizer Nano ZS Beckman Coulter Ultracentrifuge California Measurements MPS-3 Microanalysis Particle Sampler EcoChem Analytics DC 2000 CE Diffusion Charger EcoChem Analytics PAS 2000 Quantachrome AS-1 BET Sioutas impactors TSI 3321 Aerodynamic Particle Sizer (APS) Spectrometer TSI 3936NL Scanning Mobility Particle Sizer (SMPS) TSI 9306 Aerotrak Optical Particle Counter TSI DustTrak 8520 PM Monitor Dimatix Printer Epilog Legend 36EXT Epilog Mini 24 Formlabs Form 3 Fortus 250mc Hot Press Lulzbot Taz6 Markforged Mark Two Monoprice MakerSelect Nanoimprint NX-2500 NanoScribe GT2 Objet 30 Scholar ObjetPRO 3D Printer Stratasys F370 Ultimaker 2+ Ultimaker 3 uPrint SE VersaLaser Engraver/Cutter Tool PRINT3D Bioforce Nano eNabler Printer/Patterner Heidelberg MLA150 No.1 (375/405) Heidelberg MLA150 No.2 (375) Hermes LS500XL CO2 laser Image Reversal Oven JetLabII Ink-jet Printer MakerBot Replicator 3D Printer Nanoscribe 3D Lithography System Obducat Nano-imprinter (NIL) OPTEC Femtosecond Laser Micro-machining System Resonetics IR laser Fusion 3D printer Horiba XACTII Arrayer System MicroFab Jetlab 4 Ink Printer System Laser Cutter DWL66fs Mask Writer Laser Cutting System Nanoimprinter 3D Wax Printer Dimatix Nano Inkjetter Form2 3D SLA Printer Optomec BJ300 Voltera Carver Hot Embossing System EVG 620 UV-NIL Nanoscribe 3D Lithography System 3D Systems 2500 CI High Temperature Research Platform 3D Systems 2500plus Arcam S400 Autodesk Ember EOS M270 ExOne Digital Part Materialization FormLabs Form2 Open Architecture High Temperature Production Platform Stratasys uPrint Universal Laser Systems PLS4.75 Laser Cutter/Engraver Nanonex NX-B200 Nanoimprinter Femtosecond Laser System Stratysis 3D Printer Laser Ablation Dimatix DMP-2831 IPG Photonics IX-255 IPG Photonics IX200F Nanonex 2600 Nanoimprint Aligner Nanonex 2600 Nanoimprinter Dimatix Materials Printer Applied Mateiral’s P5000 AST 280 RTA Belt Furnace Cambridge NanoTech ALD CHA E-beam evaporator Edwards thermal evaporator Lesker PVD75 #1 Sputter Deposition Lesker PVD75 #2 ZnO Sputter deposition Lesker PVD75 #3 E-beam evaporator Lesker PVD75 #4 E-beam evaporator Lesker PVD75 #5 Sputter Tool Lesker PVD75 #5 Sputter Tool Molecular Beam Epitaxy (MBE) MRC 944 Sputtering Tool MRL 1414 Diffusion Furnace Oxford PECVD Rapid Thermal Annealer RF/DC Sputter deposition Screen Printers SCS Spin Coater Tempress boron diffusion Tempress Metal Anneal Tempress Oxidation Tempress phosphorus diffusion Tystar LPCVD nitride Tystar LPCVD polysilicon Tystar Oxidation Furnace AJA Sputter Deposition #1 AJA Sputter Deposition #2 AJA Sputter Deposition #3 Arradiance ALD Boron Doping – Bank D-1 Carbon Nanotube/Graphene Furnace CHA Evaporator CHA Mark 50 Evaporator CMOS Wet Oxide -Bank E-2 Dry Oxide-CMOS-CVD – Bank E-1 Electroplating Hood – Au Electroplating Hood – Cu Electroplating Hood – Ni General Material Anneal 1 – Bank A-1 LPCVD CMOS N+ Polysilicon – Bank D-3 LPCVD CMOS Nitride – Bank E-4 LPCVD Low Temperature Oxide (LTO) – Bank B-3 LPCVD N+/P+ Polysilicon – Bank C-4 LPCVD Nitride – B4 LPCVD P+polysilicon CVD- Bank D-4 LPCVD TEOS Oxide- Bank C-3 LPCVD Undoped Polysilicon – Bank E-3 Molecular Vapor Deposition MOS Clean Anneal 2 – Bank B-1 MOS Metal Anneal 3 -Bank C-1 MOS Metal Anneal 4 -Bank C-2 OEM Piezoelectric AlN Depostion Oxford ALD FlexAL Oxford PECVD Parylene Deposition Parylene Deposition #2 Phosphorus Doping – Bank D-2 Plasma-Therm Takachi HDP-CVD POCL3 Doping – Furnace A2 PVD 75 Sputter Deposition RTA – AG610a RTA – AG610b SC4500 Even-Hour Evaporator SC4500 Odd-Hour Evaporator TFT LPCVD LT410 (low temp oxide) Bank A-3 TFT Polysilicon – Bank A-4 Wet/Dry Oxide – Bank B-2 ALDE1 EVAP1 EVAP2 EVAP3 FURN2-Tube1 FURN2-Tube2 FURN2-Tube3 OVEN1 OVEN2 OVEN4 OVEN5 OVEN6 PARYL1 PECVD1 RTA1 SPUT2 SPUT3 AET RTP AJA International Sputtering System ALD1 ALD2 Black Magic PECVD Cambridge NanoTech Plasma ALD – Metal (left) Cambridge NanoTech Plasma ALD – Oxide (right) CHA E-beam Evaporator 1 (dielectrics) CHA E-beam Evaporator 2 (metals) CTRLayer Anti-Reflective Coater CtrLayer SDS CVC DC Sputterer CVC E-Beam Evaporator 1 CVC E-Beam Evaporator 2 — Instructional Center CVD FirstNano Graphene Furnace 1 CVD FirstNano Graphene Furnace 2 CVD FirstNano SiGe Nanowire Furnace Denton Discovery – RF/DC Sputterer Denton Discovery 2 Denton Explorer – E-beam Evaporator Denton Infinity EBL CEE Spinner Electroless Plating Line Electrolytic Plating Line EVG 101 Spin Coater JetFirst RTP Laurell Spinner Lesker E-beam Evaporator – Soft-Lithography Lindberg Furnace 1 (CMOS Sintering Tube) Lindberg Furnace 2 (Polymer Curing Tube) Lindberg Furnace 3 (Oxidation Tube) Lindberg Furnace 4 (Polymer Curing Tube) Mini Tystar Tube 1 Mini Tystar Tube 2 Mini Tystar Tube 3 MRL Furnace – Tube 3 MRL Furnace – Tube 4 Plasma Therm PECVD Plating Station 1-4 PVD Filament Evaporator (Instructional Lab) PVD75 Filament Evaporator PVD75 RF Sputterer Schmid APCVD SCS G3P8 Spin Coater — Instructional Center SCS G3P8 Spin Coater 1 (small pieces) SCS G3P8 Spin Coater 2 – Pettit SCS G3P8 Spin Coater 3 – Inorganic SCS Parylene Coater SSI RTP STS PECVD 2 STS PECVD 3 Sulfurization furnace Surrey CNT NanoGrowth Suss AltaSpray Spray Coater Tystar Nitride Furnace 1 Tystar Nitride Furnace 2 Tystar Nitride Furnace 3 Tystar Nitride Furnace 4 Tystar Poly Furnace 1 Tystar Poly Furnace 2 Tystar Poly Furnace 3 Tystar Poly Furnace 4 Unaxis PECVD Unifilm Sputterer Cambridge Nanotech/Ultratech Savannah Denton E-Beam Evaporator GEMStar ALD and Pulsed CVD Key High Thermal Evaporator Lindberg Furnace PdR Atomic Layer Deposition PECVD; Diamond PVD E-Beam Deposition System Rapid Thermal Processor Savannah Atomic Layer Deposition Sharon E-Beam Evaporator Sharon Thermal Evaporator TE-3 Sharon Thermal Evaporator TE-4 Sharon Thermal Evaporator TE-5 Sputtering System – 3 target Sputtering System – 6 target STS PECVD Tystar Bank1 Low Temp Silicon Dioxide Tystar Bank1 Non-Metal Anneal Tystar Bank1 Polysilicon Tystar Bank1 Silicon Nitride Tystar Bank2 Metal Anneal Tystar Bank2 TEOS Silicon Dioxide Tystar Bank2 Wet/Dry Oxidation Brewer CEE 100 Spin Coat System Laurell Spin Processor with Wet Station Lesker PVD 75 Evaporator Lesker PVD 75 Sputterer Novellus Concept II PECVD STF1200 Oxidation and Annealing Furnace TFM2.1200 Vapor Phase Deposition System Ultron UH-102 UV Curing Oven Veeco Savannah S200 Thermal ALD YES-310TA Vapor Prime and Image Reversal Oven Amod Evaporator Angstrom Evovac Angstrom Evovac Angstrom Sputter System ATV PEO 603 KYKY Mini Sputter Modulab Evaporator MRL Boron Diffusion MRL Oxidation Phosphorous Diffusion Amorphous Silicon LPCVD System Annealsys Rapid Thermal Processor Atomic Layer Deposition Boron Disk Doping (Tylan Furnace D2) DC Sputtering System Drive-In Anneal / Re-Oxidation (Tylan Furnace D4) Dry Oxidation (Tylan Furnace D3) Forming Gas Anneal (Tylan Furnace C4) Forming Gas Anneal of High-K Dielectrics (Tylan Furnace C1) Headway Spinner I Heatpulse 610 High Temperature SiC Dry Oxidation Furnace (D1) Kurt Lesker Electron Beam Evaporation System Laurell Spinner Phosphorus Disk Doping (Tylan Furnace C3) Plasma CVD TEOS Oxide Silicon Dioxide LPCVD System Silicon Nitride LPCVD System Spin Track Steam Oxidation (Furnace D1) Thermionics Ebeam Evaporator Atomic Layer Deposition E-beam Evaporator Furnace IBS/e IBS/e Parylene Coater Plasma Enhanced Chemical Vapor Deposition (PECVD) PVD Products PLD/MBE 2300 PVD Products PLD/MBE 2300 Rapid Thermal Processor Spin Coater Sputtering Thermal Evaporator Thermal Evaporator Denton Vacuum Explorer 14 62700 Eurotherm Furnace AJA Orion 8 Sputter System Carbolite Tube Furnace Cooke Thermal Evaporator CPA Sputter System Neytech Furnace Orion V Orion V Orion VIII Polaron Rapid Thermal Annealer Spin Coater Spin Coater 1 Spin Coater 2 TANG Veeco Thermal Evaporator Mass-Selected Ion Deposition System – Electrospray Source Molecular Beam Epitaxy Molecular Beam Epitaxy, Multi-source Pulsed Laser Deposition 110 C Oven 90 C Oven Aixtron Black Magic graphene CVD furnace Aixtron MOCVD – III-N System Aixtron MOCVD – III-V System AJA Evaporator AllWin 610 Rapid Thermal Annealer Applied Materials Centurion Epitaxial System Blue M Programmable Oven Boron Doping Furnace (BBr3) Deposition: KJL Evaporator deposition: Oerlikon Univex Sputter EVG 101 Resist Spray Coater Fiji Atomic Layer Deposition Fiji Atomic Layer Deposition First Nano carbon nanotube CVD furnace Headway Manual Resist Spinner Hummer V Sputter Coater Innotec ES26C E-Gun Evaporator IntlVac Nanochrome I Evaporator System Laurell Manual Resist Spinner Lesker Sputter Lesker2 Sputter Manual Spin Coater Metallica Sputter System Micromist Coater Parylene Coater PlasmaTherm Shuttlecock PECVD System PlasmaTherm Versaline HDP VCD System Savannah Atomic Layer Deposition System Savannah/Plasma Cleaner in Glovebox System SVG Resist Coat Tracks 1&2 SVG Resist Develop tracks 1&2 Thermco LPCVD Low Temperature Oxide Thermco LPCVD Poly 1/2 Thermco Oxidation Furnace Thermo LPCVD Nitride Tylan9 Forming Gas Anneal Furnace TylanFGA Forming Gas Anneal Furnace Tystar TEOS Deposition YES Prime Oven AJA ATC 2200 UHV Sputtering System AJA ATC Orion 8 UHV Sputtering System Angstrom EvoVac Electron Beam Evaporator Angstrom Nexdep Thermal E-Beam Evaporator Angstrom Nexdep Thermal E-Beam Evaporator Plasma-Therm Apex SLR HDPCVD Plasma-Therm Vision 310 PECVD Plassys Electron Beam Evaporator Tystar Mini-Tytan 4600 Furnace System Ultratech/Cambridge Fiji G2 Plasma-Enhanced ALD Ultratech/Cambridge Savannah ALD System 80+ PECVD AJA DC Sputter Deposition Tool AJA RF Sputter Deposition Tool Beneq TFS200 Atomic Layer Deposition Denton 502A Thermal Evaporator Denton Discovery 18 Sputter System Denton Discovery 635 Sputter System Emitech K575X Sputter Coater PDS 2010 Parylene Coater Rapid Thermal Annealer 1 Rapid Thermal Annealer 2 Temescal BJD 1800 Ebeam Evaporator (1) Temescal BJD 1800 Ebeam Evaporator (2) Tempress Furnace Ulvac Mini-Annealer Vapor treatment system AJA Phase II J Sputtering System Ebeam evaporator General Furnace IR Image Furnace Rapid Thermal Processing (RTP) Savanah ALD Thermal Evaporator (Bell Jar) Thin Film Processing Atomic Layer Deposition Atomic Layer Deposition Ball Mixer Battery Tester CVD Reactor E-beam Evaporator Electrode Fabricator Electroplating Bench Furnaces and Controllers Lindberg Glove Box Intermediate Coating Platform Lindburg Blue M Ovens Metalorganic Vapor Deposition System MOCVD Reactor PGSTAT Photoresist Spinner/Thermal Bench Plasma Enhanced Chemical Vapor Deposition Polyimide Curing Oven Rapid Thermal Annealing System Rapid Thermal Processing System RF-PECVD Roll-to-Roll Coater Sputter Deposition System Stand Alone Glovebox Static Platform Tank Mixer Technotron-ASTeX Technotron-ASTeX Technotron-ASTeX Thermoevaporator AJA Sputtering System AJA Sputtering System Atmosphere Oxidation System (tube 21) Atmosphere Oxidation System (tube 22) Atmosphere Oxidation System (tube 23) Atmosphere Oxidation System (tube 24) Atomic Layer Deposition System (ALD) DC Sputter System Electron Beam Evaporator Electron Beam Evaporator Electron Beam Evaporator Graphene Deposition HD-PCVD Mini-Brute Furnace Parylene Deposition System PEALD Plasma-enhanced Chemical Vapor Deposition System Plasmatech CVD Rapid Thermal Annealer Thermal Evaporator 4.5 Tesla Magnetic Annealing Sysytem AJA Sputtering System EBE HEX Deposition system Magnetron Sputtering Coating Pulsed Laser Deposition System ALD ALD E-beam evaporator E-beam evaporator PECVD PLD Sputter deposition AET Atmospheric Rapid Thermal Processor AET Vacuum Rapid Thermal Processor Cambridge NanoTech S200 Denton Explorer 14 E-Beam Thermal Evaporator Lesker PVD 75 (PVD-02) Electroplating Process Bench Evatec Vision Sputterer IPE Plasma enhanced chemical vapor deposition system Lesker Nano 36 (PVD01) Lesker PVD 75 (PVD-03) Lesker PVD 75 (PVD-04) MST Molecular Vapor Deposition System Oxford Plasma Lab 100 Paralyne Deposition System Sandvik/MRL Sandvik/MRL Sandvik/MRL Sandvik/MRL SMI MOCVD System 790 Plasmatherm #1 PECVD Atomic Layer Deposition System (ALD) Atomic Layer Deposition System (ALD) Atomic Layer Deposition System (ALD) CHA E-beam evaporator CHA E-beam Evaporator Denton Thermal Evaporator Ebeam/Sputter Deposition System Forming Gas Furnace Ion assist E-beam Evaporator KJL_south cleanroom Kurt J. Lesker PVD E-beam Evaporator LPCVD MRL furnaces MRL furnaces Oerlikon Sputter POCL3 MRL furnaces Rapid Thermal Annealer Rapid Thermal Annealer Rapid Thermal Annealer Rapid Thermal Annealer SEMCON electroplating South KJL Thermal Deposition #1 (Digital Interface) Thermal Deposition #2 (Analog Interface) UT PTL-LPCVD-Nitride UT PTL-LPCVD-Polysilicon UT PTL-LTO ALD01 – Oxford Anneal Furnace Copper Plating EVAP1 EVAP2 EVAP3 Gold Plating LPCVD Parylene Coater PECVD1 PECVD2 Pulsed-CVD RTA-Clean RTA-Metals Sputter-Lesker Thermal Oxidation Thinky Mixer RECO1 RECO2 Heraeus Vacuum Oven (Marcus) CAVE – 3D visualization suite Computational Lab equipped with high performance machines Cray XC30 Hydroponics Laboratory LR Tech Walk-in Oven Tenney C-EVO Environmental Test Chamber AllWin 610 Rapid Thermal Annealer Glovebox 1-2 Micro Mill Muffle Furnace Pfeiffer HiCube 80 Turbo Pumping Station Pfeiffer Vacuum ADIXEN ASM 380 Leak Detector Graphitization Furnace MWCNT Synthesis Reactors Arc Melter Ball Miller Buehler ISOMet 1000 Precision Saw Buehler MiniMet 1000 Grinder-polisher Hardness Tester Lindberg 55322 Melt Spinner SC Microbalance MTI 1700 Spark Plasma Sintering KSV Langmuir-Blodgett Assembly and Deposition Trough Nano/Microfiber Electrospinning System Other Sample Prep Other Other Other Other Other SPR Sample Prep QCM Other Other Other Other Sample Prep Other Other Sample Prep Other Other Other SPR Other Sample Prep Other Sample Prep Sample Prep Other Other Other Sample Prep Other Other Other Other Other Other Sample Prep Other Other Sample Prep Sample Prep Sample Prep Sample Prep Other Sample Prep Sample Prep Sample Prep Sample Prep Other Sample Prep Other QCM SPR Sample Prep Sample Prep Sample Prep SPR Other Other Other QCM Critical Point Drying Wet Bench Plasma/Stripper Critical Point Drying Wet Bench Critical Point Drying Critical Point Drying Wet Bench Plasma/Stripper Other Other Plasma/Stripper Plasma/Stripper Wet Bench Wet Bench Spin Rinse Drying Plasma/Stripper Plasma/Stripper Plasma/Stripper Critical Point Drying Critical Point Drying Other Other Wet Bench Wet Bench Spin Rinse Drying Spin Rinse Drying Wet Bench Wet Bench Wet Bench Wet Bench Wet Bench Wet Bench Spin Rinse Drying Wet Bench Plasma/Stripper Stripper Spin Rinse Drying Wet Bench Wet Bench Other Critical Point Drying Critical Point Drying Other Critical Point Drying Wet Bench Wet Bench Spin Rinse Drying Wet Bench Other Plasma/Stripper Wet Bench Critical Point Drying Other Plasma/Stripper Plasma/Stripper Wet Bench Plasma/Stripper Critical Point Drying Plasma/Stripper Plasma/Stripper Other Other Plasma/Stripper Plasma/Stripper Plasma/Stripper Wet Bench Critical Point Drying Wet Bench Wet Bench Wet Bench Wet Bench Wet Bench Plasma/Stripper Plasma/Stripper Spin Rinse Drying Spin Rinse Drying Wet Bench Wet Bench Wet Bench Plasma/Stripper Plasma/Stripper Plasma/Stripper Spin Rinse Drying Plasma/Stripper Critical Point Drying Critical Point Drying Critical Point Drying Plasma/Stripper Critical Point Drying Wet Bench Wet Bench Wet Bench Spin Rinse Drying Spin Rinse Drying Plasma/Stripper Critical Point Drying Plasma/Stripper Wet Bench Wet Bench Wet Bench Wet Bench Wet Bench Wet Bench Wet Bench Plasma/Stripper Plasma/Stripper Wet Bench Critical Point Drying Wet Bench Critical Point Drying Wet Bench Critical Point Drying Spin Rinse Drying Spin Rinse Drying Spin Rinse Drying Spin Rinse Drying Spin Rinse Drying Wet Bench Wet Bench Plasma/Stripper Wet Bench Wet Bench Plasma/Stripper Spin Rinse Drying Plasma/Stripper Wet Bench RIE RIE RIE ICP Deep Silicon (Bosch) ICP Other Other Ion Mill Other Other Other Other Wet Bench Deep Silicon (Bosch) RIE RIE RIE RIE ICP Other RIE RIE RIE ICP ICP Other ICP Deep Silicon (Bosch) Other Wet Bench Wet Bench Wet Bench Other RIE RIE Deep Silicon (Bosch) Wet Bench Wet Bench Wet Bench Other Other Other ICP RIE ICP ICP RIE RIE ICP ICP ICP Deep Silicon (Bosch) ICP Other RIE RIE RIE RIE Other RIE Wet Bench Ion Mill RIE ICP RIE RIE Deep Silicon (Bosch) ICP Deep Oxide RIE Wet Bench Wet Bench RIE Deep Silicon (Bosch) Wet Bench Wet Bench RIE ICP Wet Bench Deep Silicon (Bosch) RIE RIE Wet Bench Wet Bench Deep Silicon (Bosch) Other RIE Wet Bench Other RIE RIE RIE Wet Bench RIE ICP Wet Bench RIE Ion Mill RIE RIE ICP Other Deep Silicon (Bosch) ICP ICP RIE RIE Wet Bench Other Deep Silicon (Bosch) Other Deep Oxide ICP ICP Deep Silicon (Bosch) ICP Other Wet Bench Wet Bench Wet Bench RIE Other Deep Silicon (Bosch) ICP Other Other Wet Bench Wet Bench Wet Bench RIE Deep Silicon (Bosch) Wet Bench Wet Bench Ion Mill RIE Other ICP RIE Ion Mill ICP RIE RIE Other Deep Silicon (Bosch) FIB Ion Mill RIE Deep Silicon (Bosch) Wet Bench Other Wet Bench RIE Wet Bench RIE RIE RIE Deep Silicon (Bosch) Other RIE RIE Other RIE RIE Ion Mill Other RIE ICP ICP Ion Mill Other Other ICP RIE RIE Deep Silicon (Bosch) RIE RIE Wet Bench Wet Bench Deep Silicon (Bosch) Wet Bench Wet Bench Wet Bench ICP ICP Other Deep Silicon (Bosch) RIE TEM TEM Optical Probe Probe TEM Other FIB FIB Optical SEM Other Other TEM TEM TEM TEM SEM Probe Other Optical Confocal Confocal Confocal Optical Sample Prep Optical Confocal Optical Confocal Optical Optical Optical Sample Prep Optical Confocal Optical Confocal SEM Other SEM SEM Other Probe Probe Sample Prep Other Sample Prep Optical Optical Optical Optical SEM SEM SEM SEM Sample Prep TEM Sample Prep Sample Prep Optical Probe Sample Prep FIB FIB TEM TEM TEM SEM SEM SEM SEM SEM Sample Prep Sample Prep Sample Prep TEM Optical SEM SEM Optical Optical Optical Optical Optical Optical Optical Optical Optical Optical Optical Optical Optical Optical Confocal Optical Optical Sample Prep Confocal Confocal SEM Sample Prep Sample Prep Sample Prep TEM Probe Sample Prep FIB TEM TEM SEM SEM SEM SEM Sample Prep TEM TEM TEM Sample Prep Sample Prep Sample Prep Sample Prep Sample Prep Sample Prep Sample Prep Probe SEM Optical Probe Optical SEM Optical Probe Sample Prep Probe Sample Prep FIB Optical Optical Confocal SEM TEM Other 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Processing Resist Processing UV DUV UV Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing UV Mask Making Mask Making Soft Lithography Resist Processing Resist Processing EBL EBL Other Resist Processing Soft Lithography Soft Lithography Resist Processing EBL Other Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing UV UV Resist Processing Resist Processing EBL Soft Lithography Resist Processing Resist Processing Resist Processing EBL UV UV Resist Processing EBL UV UV UV Resist Processing Resist Processing UV Mask Making Soft Lithography UV UV Resist Processing Resist Processing EBL EBL Resist Processing UV Mask Making UV UV EBL Other Resist Processing Other Resist Processing Resist Processing EBL Resist Processing Resist Processing UV UV Resist Processing Soft Lithography UV UV Resist Processing Resist Processing Resist Processing Resist Processing Other Mask Making Other UV EBL Other Resist Processing Resist Processing UV Mask Making Mask Making Resist Processing Resist Processing Resist Processing UV UV Resist Processing UV UV EBL UV UV UV UV UV UV UV EBL UV Resist Processing Resist Processing Mask Making EBL UV Resist Processing Resist Processing Other UV UV UV UV Soft Lithography EBL UV EBL Resist Processing Resist Processing UV UV Mask Making UV UV UV UV Mask Making Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing EBL Resist Processing Other Other EBL UV UV UV UV UV Resist Processing Resist Processing Resist Processing Resist Processing EBL Mask Making Resist Processing Resist Processing Resist Processing Resist Processing Soft Lithography Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Resist Processing Soft Lithography Resist Processing UV Resist Processing Resist Processing Resist Processing UV Resist Processing Resist Processing EBL UV UV UV UV EBL Other Other Resist Processing UV UV UV UV Resist Processing Resist Processing Resist Processing UV EBL UV Resist Processing Mask Making Mask Making Resist Processing Resist Processing Resist Processing Electrical Spectroscopy Spectroscopy XRD Profilometry Other Thickness Electrical Electrical Spectroscopy Spectroscopy Profilometry XRD Spectroscopy Optical Optical Other Profilometry Other Spectroscopy Electrical Optical XRD XPS Optical Spectroscopy Spectroscopy EDS/WDS Electrical Electrical Electrical Profilometry Profilometry Electrical Electrical Other Other Other Other Other Other Other Other Electrical Electrical Electrical Profilometry XRD Spectroscopy Contact Angle Thickness Other Electrical Other Contact Angle Spectroscopy Spectroscopy Profilometry Other Thickness Other Thickness Spectroscopy Spectroscopy Spectroscopy Electrical Profilometry Other Other XRD XPS Profilometry Mechanical Mechanical Contact Angle Other Profilometry Profilometry EDS/WDS EDS/WDS Other Optical EDS/WDS EDS/WDS Mechanical SIMS Optical XPS EDS/WDS Other Thickness Thickness Spectroscopy Spectroscopy XRD XRD XRD Mechanical Thickness TGA Spectroscopy Spectroscopy Other Spectroscopy Electrical Electrical Profilometry Profilometry Profilometry XPS Spectroscopy Spectroscopy Electrical Optical Thickness Thickness Thickness Profilometry Profilometry EDS/WDS Other Electrical Electrical Profilometry Electrical Electrical Contact Angle Mechanical Electrical Electrical Optical Thickness Thickness Electrical Profilometry Thickness Mass Spec Electrical NMR Electrical Spectroscopy NMR Spectroscopy Chromatography Spectroscopy Spectroscopy Electrical Electrical Electrical Thickness Spectroscopy Mechanical Mechanical Mechanical Mechanical Mechanical Electrical Electrical Profilometry Contact Angle Mechanical DSC Other Contact Angle Other XRD Other DSC TGA XPS Other Mechanical Other Mass Spec Mass Spec Mass Spec Profilometry Thickness Mass Spec XRD Mass Spec Mass Spec SIMS Optical Profilometry Chromatography Electrical Optical Other Mass Spec Mass Spec Optical XPS XRD Profilometry Spectroscopy Thickness Electrical Mechanical Thickness XRD Electrical XRD Other Mechanical SIMS Profilometry Profilometry XPS Profilometry Profilometry NMR NMR NMR NMR Mass Spec Mass Spec Mass Spec Mechanical XRD XRD Contact Angle XRF Electrical Other Thickness Spectroscopy Mass Spec XRD XRD XRD Spectroscopy Mass Spec Other Mass Spec Spectroscopy Other Other Chromatography XRD Thickness XRD XRD XRD XRD XRD XRD XRD Mass Spec XRD Chromatography Chromatography SIMS Profilometry Profilometry Mechanical Chromatography Chromatography XRF XPS Optical Electrical Profilometry XPS Electrical Spectroscopy XPS NMR NMR NMR NMR NMR NMR NMR NMR NMR Mass Spec XPS Other Other XPS Other Mass Spec Chromatography Spectroscopy Mass Spec Mass Spec Mass Spec Mass Spec Mass Spec Mass Spec Mass Spec Mass Spec Mass Spec XRD Other XRD Mass Spec XRD Other XRD Spectroscopy Spectroscopy Spectroscopy Mass Spec Profilometry Mass Spec Auger Electrical Other Other Other Other DSC DSC Electrical Other EDS/WDS Thickness Other Other Other Thickness Thickness Spectroscopy Other Electrical Other Electrical Other Thickness Mass Spec Other Electrical Profilometry Electrical Other Profilometry SIMS Spectroscopy Other Spectroscopy Profilometry TGA XPS XPS XRD XRD XRD XRD Profilometry Thickness Mechanical Other Electrical Profilometry Other Electrical Electrical Optical Optical Electrical XRD Spectroscopy Profilometry Profilometry Electrical Electrical Thickness Thickness Spectroscopy Optical Thickness Optical Electrical Electrical Electrical Other Electrical Electrical Electrical Spectroscopy XRD XRD XPS Optical Optical Spectroscopy Spectroscopy XRD Thickness Spectroscopy Mechanical Spectroscopy Mechanical Optical Other Profilometry Other Other Other Electrical Other XRD Thickness Electrical Other Other XPS Electrical XRD Other TGA Other Optical Electrical Chromatography Chromatography Other Other Other Other Spectroscopy Other Electrical Spectroscopy Other Electrical Electrical Electrical Electrical Electrical Electrical Other TGA Other Other Spectroscopy Chromatography TGA Thickness Profilometry Mechanical Other Profilometry Spectroscopy XPS Electrical XRD Thickness Thickness Thickness Electrical Profilometry Profilometry Spectroscopy Other Other Thickness Spectroscopy XPS Thickness Other XRD XRD Profilometry DSC Profilometry Other Optical XRD Electrical Electrical XRD XRD XRD TGA Other Other EDS/WDS EDS/WDS EDS/WDS Spectroscopy Spectroscopy Spectroscopy Profilometry Thickness Other XPS XRD Electrical Electrical Optical Optical Spectroscopy Optical Electrical Profilometry Profilometry XPS SIMS Electrical Other Optical Spectroscopy Other Other Other Spectroscopy Spectroscopy Profilometry Thickness Electrical Spectroscopy Contact Angle Profilometry Spectroscopy Mechanical Spectroscopy Profilometry TGA Spectroscopy Thickness Profilometry XRD XRD XRD Electrical XRD XRD XRD Profilometry XRD Electrical Electrical XRD Electrical Thickness Profilometry SIMS Electrical Thickness XPS Electrical Profilometry XRD Other Electrical Profilometry EDS/WDS Thickness Thickness Other Mass Spec Optical Other XPS Mechanical Thickness Profilometry Other Electrical Profilometry Spectroscopy XPS Thickness Optical Mechanical SIMS XPS Spectroscopy Spectroscopy Electrical Other Other Spectroscopy Mass Spec Other Optical Other Other Other Other Spectroscopy Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Other Dicing Dicing Bonding Bonding CMP Drilling Bonding Dicing Bonding Dicing Dicing Bonding Other Other Dicing Bonding Bonding Bonding Bonding Bonding Bonding Bonding 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Printing 3D Printing Other 3D Printing Other Laser Laser Laser Other Inkjet 3D Printing 3D Printing NIL Laser Laser 3D Printing Other Inkjet Laser Laser Laser NIL 3D Printing Inkjet 3D Printing Inkjet Other Other NIL 3D Printing 3D Printing 3D Printing 3D Printing 3D Printing 3D Printing 3D Printing 3D Printing 3D Printing 3D Printing Laser NIL Laser 3D Printing Laser Inkjet Laser Laser NIL NIL Inkjet PECVD Annealing Annealing ALD Evaporation Other Sputter Sputter Evaporation Evaporation Sputter Sputter MBE Sputter Oxidation PECVD RTA/RTP Sputter Annealing Spin Coating Doping Annealing Oxidation Doping Other CVD Oxidation Sputter Sputter Sputter ALD Doping CVD Evaporation Evaporation Oxidation Oxidation Plating Plating Plating Other CVD CVD CVD CVD CVD CVD CVD CVD CVD Annealing Annealing Annealing Sputter ALD PECVD CVD CVD Doping PECVD Oxidation Sputter RTA/RTP RTA/RTP Evaporation Evaporation CVD CVD Oxidation ALD Evaporation Evaporation Evaporation Annealing Oxidation Annealing Annealing Other Annealing Other Other Evaporation PECVD RTA/RTP Sputter Sputter RTA/RTP Sputter ALD ALD PECVD ALD ALD Evaporation Evaporation Evaporation Sputter Sputter Evaporation Evaporation CVD CVD CVD Sputter Sputter Evaporation Evaporation Spin Coating Plating Plating Spin Coating RTA/RTP Spin Coating Evaporation Other Other Other Other Oxidation Oxidation Oxidation Oxidation Annealing PECVD Plating Evaporation Evaporation Sputter CVD Spin Coating Spin Coating Spin Coating Spin Coating Other RTA/RTP PECVD PECVD Other Other Spray Coating Doping Doping Oxidation Other Annealing Oxidation Other Other PECVD Sputter ALD Evaporation ALD Evaporation Annealing ALD PECVD Evaporation RTA/RTP Sputter Evaporation Evaporation Evaporation Evaporation Sputter Sputter PECVD Oxidation Annealing Annealing CVD Annealing Oxidation Oxidation Spin Coating Spin Coating Evaporation Sputter PECVD Oxidation CVD Resist Processing ALD Resist Processing Evaporation Evaporation Evaporation Sputter Oxidation Sputter Evaporation Doping Oxidation Doping CVD RTA/RTP ALD Doping Sputter Annealing Oxidation Annealing Annealing Spin Coating Annealing Oxidation Evaporation Spin Coating Doping CVD CVD CVD Spin Coating Oxidation Evaporation ALD Evaporation Oxidation Sputter Sputter Other PECVD Other Other RTA/RTP Spin Coating Sputter Evaporation Evaporation Other Sputter Other Evaporation Sputter Other Sputter Sputter Sputter Evaporation Other Spin Coating Spin Coating Spin Coating Sputter Evaporation Other MBE MBE Other Other Other Other Other Other Evaporation RTA/RTP Other Other Doping Evaporation Sputter Spray Coating ALD ALD Other Spin Coating Sputter Evaporation Evaporation Spin Coating Evaporation Sputter Spin Coating Sputter Spray Coating Other PECVD PECVD ALD ALD Spin Coating Other CVD CVD Oxidation CVD Annealing Annealing CVD Other Sputter Sputter Evaporation Evaporation Evaporation CVD PECVD Evaporation CVD ALD ALD PECVD Sputter Sputter ALD Evaporation Sputter Sputter Sputter Other RTA/RTP RTA/RTP Evaporation Evaporation Oxidation Annealing Other Sputter Evaporation Oxidation Other RTA/RTP ALD Evaporation Spin Coating ALD ALD Other Other CVD Evaporation Annealing Plating Oxidation Other Other Annealing CVD CVD ALD Spin Coating PECVD Other RTA/RTP RTA/RTP CVD Other Sputter Spin Coating Other Annealing Other Other Other Evaporation Sputter Sputter Oxidation Oxidation Oxidation Oxidation Oxidation Sputter Evaporation Evaporation Evaporation CVD PECVD Annealing Other ALD PECVD CVD RTA/RTP Evaporation Annealing Sputter Evaporation Other Sputter Other ALD ALD Evaporation Evaporation PECVD Other Sputter RTA/RTP RTA/RTP ALD Sputter Evaporation Other Sputter PECVD Evaporation Sputter Evaporation Other PECVD Other Annealing Annealing Annealing Annealing Other PECVD ALD ALD ALD Evaporation Evaporation Evaporation Sputter Annealing Evaporation Sputter Evaporation CVD Annealing Sputter Doping RTA/RTP RTA/RTP RTA/RTP RTA/RTP Plating Sputter Evaporation Evaporation CVD CVD CVD ALD Doping Plating Evaporation Evaporation Evaporation Plating Oxidation Other PECVD PECVD Other RTA/RTP RTA/RTP Sputter Oxidation Other Applied Materials Mattson Technology Centrotherm Ulvac Veeco Annealsys Kokusai Electric JTEKT Thermo Systems Corporation ULTECH UniTemp GmbH Carbolite Gero ADVANCE RIKO, Inc. Angstrom Engineering CVD Equipment Corporation LarcomSE Dongguan Sindin Precision Instrument Advanced Materials Technology & Engineering Laplace (Guangzhou) Semiconductor Technology Wuhan JouleYacht Technology Silicon Crystal Growing Furnace: Linton Crystal PVA TePla AG Ferrotec Cyberstar Gigamat Mitsubishi Jingsheng NAURA Jinyuntong Jiangsu Huasheng Tianlong Photoelectric Czochralski(CZ) Method Furnace Floating Zone(FZ) Method Furnace Semiconductor Wafer Mounting Systems l Nitto Denko l LINTEC Corporation l Takatori Corporation l DISCO Corporation l Teikoku Taping System l NPMT (NDS) l Technovision l Dynatech Co.,Ltd l CUON Solution l Ultron Systems Inc l Semiconductor Equipment Corporation l AE Advanced Engineering l Powatec l N-TEC l TOYO ADTEC INC l Waftech Sdn. Bhd. l Advanced Dicing Technologies (ADT) l Jiangsu Jcxj l Shanghai Haizhan l Heyan Technology , Automatic Probe Stations Tokyo Seimitsu Tokyo Electron Semics Shen Zhen Sidea FitTech FormFactor MPI Semishare Electronic MicroXact Wentworth Laboratories SemiProbe ESDEMC Technology Shenzhen Titan Micro Electronics Hangzhou Changchuan Technology, Electron Beam Etching Machine : Oxford Instruments Hitachi High-Tech Samco Tokyo Electron Ltd Advanced Micro-Fabrication Equipment Diener electronic GmbH Lam Research Plasma-Therm GigaLane ULVAC Technologies CORIAL Sentech Instruments GmbH Trion Technology SPTS Technologies NAURA Technology Group. Wet Etching Equipment for Solar Cell : 45th Institute of CETC SILEX Chemcut Felcon Modutek Kzone Equipment Technology RENA Singulus Technologies Tzoyo Ultech Co Siemens. Rapid Thermal Processing Equipment : Applied Materials Mattson Technology Kokusai Electric Ultratech (Veeco) Centrotherm AnnealSys JTEKT Thermo System ECM CVD Equipment Corporation SemiTEq. Optical Film Thickness Monitor: Optorun Guangdong Huicheng Vacuum Technology Zhongke Weishi Technology Wuhan eoptics Technology OELABS Chengdu Guotai Vacuum Equipment KLA HORIBA Scientific LayTec AG Eddy Co. Angstrom Advanced Inc. Sentech Instruments GmbH Nanovea INFICON Intellemetrics Global Ltd Otsuka Electronics AccuStrata Inc. Colnatec LLC. Automation Ideas Elsisan Systematic Automation Proco Machinery Miller Process Coating Dubuit Far East Ska Fabricating RLS DYNATEC SYSTEMS Plasma Etch Cox & Plant Tantec Arcotec Novasys Vastex International EXERON InduPlasma Houn Jien HongYu Automation Technology. Plasma Flame Treatment Machines. Tokyo Seimitsu Tokyo Electron Semics Shen Zhen Sidea FitTech FormFactor MPI Semishare Electronic MicroXact Wentworth Laboratories SemiProbe ESDEMC Technology Shenzhen Titan Micro Electronics Hangzhou Changchuan Technology, Fully Automatic Probe Stations , Atlas Copco SHI Cryogenics Group ULVAC cryo PHPK Technologies Vacree Pengli Zhejiang Bokai Bama-supercon, Vacuum Pump, NBK America LLC ALIO Industries, LLC PI (Physik Instrumente) L.P. Optimal Engineering Systems, Inc. (OES) Reid Supply CHUO PRECISION INDUSTRIAL THK Tokyo Seimitsu Sumitomo Heavy Industries, Ltd. (SHI) NSK Ltd. Optics Focus MIRUC OPTICAL Sinto V-Cerax Ltd. igus GmbH, Global Used Semiconductor Equipment , ASML KLA Pro Systems Lam Research ASM International Kokusai Electric Applied Materials, Inc. (AMAT) Ichor Systems Russell Co., Ltd PJP TECH Maestech Co., Ltd Nikon Precision Inc Ebara Technologies, Inc. (ETI) iGlobal Inc. Entrepix, Inc Axus Technology Axcelis Technologies Inc ClassOne Equipment Canon U.S.A. TEL (Tokyo Electron Ltd.) ULVAC TECHNO, Ltd. SCREEN DISCO Corporation Metrology Equipment Services, LLC Semicat, Inc Somerset ATE Solutions SUSS MicroTec REMAN GmbH Meidensha Corporation Intertec Sales Corp. TST Co., Ltd. Bao Hong Semi Technology. Ion Milling Equipment. Technoorg Linda Hitachi Leica Microsystems AMETEK(Gatan) Intlvac Thin Film Corporatio AJA International Nano-Master Coxem Fischione Instruments Nanoscience Instruments Wuhan Zenvan Technologyco. Kyocera SEMCNS Co., Ltd Niterra (NTK) Serim Tech Inc. IM-TECHPLUS LTCC Materials FINE CERATECH INC. Shanghai Zenfocus Semi-Tech. Semiconductor Test Probe Card. PVA-Tepla (Haldor Topsde) Crystal Systems Quantum Design ECM Technologies (Cyberstar) ScIDre Jingsheng Mechanical and Electrical Beijing Jingyuntong Technology. Floating Zone Furnace. Wafer Expander. Dynatex International TECHNOVISION OHMIYA IND.CO.,LTD. Semiconductor Equipment Corporation Ultron Systems TOYO Adtec IHT CO Powatec Shanghai Angview Industrial Neontech Shanghai Prosrun Ferrotec KELK Ltd.(Komatsu) Coherent Corp (formerly II-VI Incorporated) Laird Thermal Systems Z-MAX KJLP Thermion Company Phononic Guangdong Fuxin Technology KYOCERA Thermonamic Electronics TE Technology Same Sky (formerly CUI Devices) Kryotherm Industries Crystal Ltd Merit Technology Group Wakefield Thermal Pelonis Technologies Zhejiang Wangu Semiconductor P&N Technology JiangXi Arctic Industrial Henan Hongchang Electronic Wei County Zhongtian Electron Stock Cooperative Beijing Xinyu Kaimeng Electronic Technology Beijing Huimao Refrigeration Equipment Hangzhou Aurin Cooling Device. Peltier Cooler. Peltier Module Component . Ferrotec KELK Ltd.(Komatsu) Coherent Corp (formerly II-VI Incorporated) Laird Thermal Systems Z-MAX KJLP Thermion Company Phononic Guangdong Fuxin Technology KYOCERA Thermonamic Electronics TE Technology Same Sky (formerly CUI Devices) Kryotherm Industries Crystal Ltd Merit Technology Group Wakefield Thermal Pelonis Technologies Zhejiang Wangu Semiconductor P&N Technology JiangXi Arctic Industrial Henan Hongchang Electronic Wei County Zhongtian Electron Stock Cooperative Beijing Xinyu Kaimeng Electronic Technology Beijing Huimao Refrigeration Equipment Hangzhou Aurin Cooling Device. SiC Ion Implanter , xcelis, ULVAC, AMAT, CETC-48, Nissin Ion Equipment Co., Ltd, IBS, Shanghai Kingstone Semiconductor Corp, Foshan Jihua, Qingdao Sifang Sri Intellectual Technology Atlas Copco (Edwards Vacuum), Ebara Corporation, Pfeiffer Vacuum GmbH, Kashiyama Industries, Beijing Grand Hitek, SKY Technology Development, Ningbo Baosi Energy Equipment, LOTVACUUM, Taiko Kikai Industries, Busch Vacuum, EVP Vacuum Technology, Scroll Laboratories, Inc, ULVAC, Inc, Highvac Corporation, Osaka Vacuum, Ltd Semiconductor Dry Vacuum Pump. Desktop Mask Alignment Lithography Machine . SUSS MicroTec, RotaLab Scientific Instruments, EV Group, KLOE, Neutronix Quintel, Yaco Chenxu Technology, Advanced Biological and Chemical Microscopy, Karl Suss, OAI Advanced Microengineering, MIDAS Systems, MJB, NIL Technology. Advanced Ceramic Heater. Sumitomo Electric Kyocera NGK Insulators Mico Ceramics BACH Resistor Ceramics BOBOO Hitech Semixicon CoorsTek Durex Industries Oasis Materials Cactus Materials Xiamen Innovacera. ASML, KLA Pro Systems, Lam Research, ASM International, Kokusai Electric, Hitachi High-Tech Corporation, Ichor Systems, Russell Co., Ltd, PJP TECH, Maestech Co., Ltd, SurplusGLOBAL, Ebara Technologies, Inc. (ETI), ULVAC TECHNO, Ltd., SCREEN Semiconductor Solutions, Canon, Nikon, iGlobal Inc., Entrepix, Inc, Axus Technology, ClassOne Equipment, Somerset ATE Solutions, Metrology Equipment Services, LLC, SEMICAT, Inc., SUSS MicroTec REMAN GmbH, Meidensha Corporation, Intertec Sales Corp., TST Co., Ltd., DISCO Corporation, Bao Hong Semi Technology, Genes Tech Group, DP Semiconductor Technology, E-Dot Technology, GMC Semitech Co.,Ltd, SGSSEMI, Wuxi Zhuohai Technology, Shanghai Lieth Precision Equipment, Shanghai Nanpre Mechanical Engineering, EZ Semiconductor Service Inc., HF Kysemi, Joysingtech Semiconductor, Shanghai Vastity Electronics Technology, JIANGSU DOMO SEMICONDUCTOR TECHNOLOGY CO.,LTD., Dobest Semiconductor Technology（Suzhou）Co.，Ltd. Semiconductor Equipment Refurbishment

Vacuum Dry Pump Main Manufactures: Atlas Copco; Ebara; Pfeiffer Vacuum; Busch; Hanbell; Agilent; Leybold; Anlet; SKY Technology Development; ULVAC; Ningbo Baosi Energy Equipment; Nash (Gardner Denver); BECKER; Anest Iwata; Dekker; Flowserve; Beijing Grand Hitek; Sichuan Leicester Vacuum Technology. Vacuum Dry Pump Types: Dry Roots Vacuum Pump; Dry Screw Vacuum Pump; Dry Scroll Vacuum Pump; Dry Claw Vacuum Pump; Others. Global Vacuum Dry Pumps Market, Segment by Application: Industrial and Manufacturing; Semiconductor and Electronics; Chemical and Pharmaceutical Processing; Lithium Battery; Others. Magnetic Turbomolecular Pump: Pfeiffer Vacuum, Atlas(Edwards & Leybold), Osaka Vacuum, Shimadzu, Agilent, Ulvac, KYKY, Multi-micro Technology, Emaging, Ebara.Semiconductor Equipment Refurbishment :ASML, KLA Pro Systems, Lam Research, ASM International, Kokusai Electric, Hitachi High-Tech Corporation, Ichor Systems, Russell Co.,Ltd, PJP TECH, Maestech Co.,Ltd, SurplusGLOBAL, Ebara Technologies, ULVAC TECHNO.Ltd., SCREEN Semiconductor Solutions, Canon, Nikon, iGlobal Inc., Entrepix, Axus Technology, ClassOne Equipment, Somerset ATE Solutions, Metrology Equipment Services, SEMICAT, SUSS MicroTec REMAN GmbH, Meidensha Corporatio, Intertec Sales Corp., TST Co..Ltd., DISCO Corporation, Bao Hong Semi Technology, Genes Tech Group, DP Semiconductor Technology, E-Dot Technology, GMC Semitech Co.,Ltd, SGSSEMI, Wuxi Zhuohai Technology, Shanghai Lieth Precision Equipment, Shanghai Nanpre Mechanical Engineering, EZ Semiconductor Service Inc., HF Kysemi, Joysingtech Semiconductor, Shanghai Vastity Electronics Technology, JIANGSU DOMO SEMICONDUCTOR TECHNOLOGY CO.,LTD., Dobest Semiconductor Technology（Suzhou）Co.，Ltd. Laser Ellipsometer manufacturers: J.A. Woollam Co.(US), Horiba(Japan), Gaertner Scientific Corporation(US), Semilab(Hungary), Sentech(Germany), Holmarc Opto-Mechatronics(India), Ellitop-Products(China), Accurion(Germany), Angstrom Sun Technologies(US), Film Sense(US). In-Line PVD Sputtering System: Semicore Equipment, Singulus Technologies AG, ULVAC, Dynavac, Syskey Technology, PVD, KDF Technologies, IKS PVD Technology, HongFeng VAC, Hondson Coating Technology. Oxygen Plasma Cleaning Machine: Nordson MARCH, Plasmatreat, Bdtronic, Panasonic, PVA TePla, Diener Electronic, Vision Semicon, Samco, Tantec, SCI Automation, PINK GmbH Thermosysteme, Plasma Etch, Naen Tech, PLAUX, Plutovac, GermanTech, Shenzhen Jiaan Technology. Tape for Dicing : Nitto Denko Corp, Mitsui Chemicals Inc., Sumitomo Bakelite Co. Ltd., AI Technology, LINTEC Corporation, Denka Company Limited, Ultron Systems Inc., Pantech Tape Co. Ltd., QES GROUP BERHAD, Nippon Pulse Motor, Loadpoint Limited, Daest Coating India Pvt. Ltd., Shenzhen Xinst Technology Co. Ltd., Solar Plus Company. Gas Scrubbers: Edwards Vacuum, Ebara, Global Standard Technology, CSK, Kanken Techno, Unisem, EcoSys, GnBS Eco,, DAS Environmental Expert GmbH, Shengjian, CS Clean Solution, YOUNGJIN IND, Integrated Plasma Inc (IPI), Taiyo Nippon Sanso, MAT Plus, KC Innovation, Busch Vacuum Solutions, Triple Cores Technology, Air Water Mechatronics. IGZO Target: ULVAC, Mitsui Kinzoku, JX Nippon Mining & Metals, ANP Materials, ENAM Optoelectronic Material, CRM. Liquid Nitrogen Preparation Machines： ULVAC CRYOGENICS INC, Hangzhou Chenrui ASU Manufacturing Co.,Ltd., Noblegen Cryogenics, Peak, Noblegen, F-DGSi, MMR Technologies, Imtek Cryogenics, Oxymat, Cryomech, Universal Boschi, Cryofab, Linde Engineering, Chart Industries, Universal Air Gases,Inc., Taylor-worton, Wessington Cryogenics, FIBA Technologie, BNH Gas Tanks. Transparent Conductive Film Deposition Equipment :TEL, Evatec, Satisloh, Veeco Instruments, Optorun, Von Ardenne, ULVAC, BOBST, Shenzhen S.C New Energy Technology Corporation. Wafer Prealigners: Logosol Inc., Brooks Automation, Kensington Laboratories, DAIHEN Corporation, RORZE Corporation, JEL Corporation, Hirata Corporation, Yaskawa, Genmark Automation, Kawasaki Robotics, TEX E. G. CO.LTD., TAZMO CO.,LTD., WACCO Technology. Handheld Plasma Cleaner : Allwin21, SemiStar, Innoclean, Techu Scientific, Ja0755, PLAUX, Relyon Plasma GmbH, Plasma Pipette, Plasma Etch, Harrick Plasma, Diener Electronic GmbH, PVA TePla AG, HRL Laboratories. Electroplating Equipment : Atotech, EEJA, George Koch Sons, Besi, PAT, PAL, Jettech, JCU, KOVOFINIS, Technic Inc, Gangmu machinery, HEKEDA, STS, PENC, HL. Maglev Turbo Pumps (STP): Leybold; Pfeiffer; Osaka Vacuum; Edwards Vacuum; Shimadz; Agilent Technologies; ULVAC; EBARA; Beijing Zhongke Instrument; Zhongke Jiuwei Technology. Vacuum Aluminum Plating Machine: Applied Materials; LEYBOLD OPTICS; BOBST; Darly; ULVAC; Nordmeccanica; BAOFENG; SGVAC; BDVAC; Lanzhou Vacuum; HCVAC; ZHENHUA. Segment by Type: Suspension Type; Roller Type. Segment by Application: Packing; Capacitor Coater. Semiconductor Photoresist Stripping: Advanced Energy Industries Inc.; Allwin21 Corp.; Brewer Science Inc.; Brinnovate; EV Group; Hitachi Ltd.; Lam Research Corp.; Mattson Technology Inc.; Merck KGaA; MT Systems Inc.; Nordson Corp.; Oxford Instruments plc; PSK Inc.; Samco Inc.; Screen Holdings Co. Ltd; TBS Holdings Inc.; Trymax Semiconductor Equipment B.V.; Ulvac Inc.. Vacuum Induction Melting Furnace : ALD Vacuum Technologies, ULVAC, ECM, Secowarwick, OTTO Junker GmbH, PVA IVS GmbH, Inductotherm Group (Consarc）, HHV, Therelek, Shanghai Xinlanhai Automation Technology, Hengjin, SIMUWU, Topcast, Ecco High Frequency, Shanghai XinYan Industrial Equipment. Flip Chip Mounting Machine: Yamaha; TDK; Semiconductor Equipment; Advanced Techniques; Setna; SHIBUYA; Athlete; Toray; Adwells; Hanwha; SET Corporation SA; ASMPT; K&S; Hamni. Ion Beam Trimming: Hitachi; Leica; Buhler Group; Scia Systems; Advanced Modular Systems Inc.; Oxford Instruments Plasma Technology; Schaefer; Nissin-ion Equipment; Inseto; TEL. Molecular Pump: Shimadzu, ULVAC Technologies, Osaka Vacuum, KYKY Vacuum, Ebara, Edwards, Busch, Leybold, Pfeiffer. Ion Beam Technology: Carl Zeiss; Canon Anelva; Hitachi High-Technologies; Meyer Burger; Plasma-Therm; Raith GmbH ; Scia Systems GmbH; 4Wave Incorporated; Veeco Instruments.Test Handler Systems:Cohu, Inc. (Xcerra); Advantest; Hon Precision; ChangChuan Technology; Chroma ATE; Kanematsu (Epson); Evest Corporation; ATECO; Esmo; YoungTek Electronics Corp.; Aetrium; SESSCO Technologies; TurboCATS; SPEA; Shenzhen Shenkeda Semiconductor; Cascol; Timetone Technology;; Yingshuo Electronic Technology; Micro-Electronic Technology; JHT-Design; BIAOPU SEMICONDUCTOR; Pailide; King Star; Good Machine. Thermoelectric Cooler : Ferrotec; II-VI Marlow; KELK Ltd.; Laird Thermal Systems; Z-MAX; RMT Ltd.; Guangdong Fuxin Technology; Thermion Company; Crystal Ltd; CUI Devices; Kryotherm Industries; Phononic; Merit Technology Group; TE Technology; KJLP electronics co. ltd; Thermonamic Electronics. Single Stage Thermoelectric Coolers (TEC) Product : Ferrotec; KELK Ltd.(Komatsu); Coherent Corp (formerly II-VI Incorporated); Laird Thermal Systems; Z-MAX; KJLP; Thermion Company; Phononic; Guangdong Fuxin Technology; KYOCERA; Thermonamic Electronics; TE Technology; Same Sky (formerly CUI Devices); Kryotherm Industries; Crystal Ltd; Wakefield Thermal; Pelonis Technologies; Zhejiang Wangu Semiconductor; P&N Technology; JiangXi Arctic Industrial; Henan Hongchang Electronic; Wei County Zhongtian Electron Stock Cooperative; Beijing Xinyu Kaimeng Electronic Technology; Beijing Huimao Refrigeration Equipment; Hangzhou Aurin Cooling Device. RF Generator : MKS Instruments; Advanced Energy; DAIHEN Corporation; XP Power (Comdel); Trumpf; Comet Plasma Control Technol; Kyosan Electric Manufacturing; Beijing Gmppower; ULVAC; JEOL; Adtec Plasma Technology; New Power Plasma; DKK; Plasma Technology; Pearl Kogyo; SAIREM; Reno Subsystems; T&C Power Conversion; Seren IPS; Coaxis Power Systems. Segment by Type: 13.56MHz; 27.12Mhz; 40.8 MHz; 2Mhz; 4Mhz. . Segment by Application: PECVD. PVD. ALD. HDPCVD. Wafer Expander Separator: DISCO; Ohmiya Industry; Dynatex International; Techvision ; n-tect; Semiconductor Equipment Corp; 东洋技术; Ultron Systems; Powatec; NeonTech; 河南通用智能. PVD Coating Equipment : Applied Materials; ULVAC; Optorun; Buhler Leybold Optics; Shincron; Von Ardenne; Evatec; Veeco Instruments; Hanil Vacuum; BOBST; Satisloh; IHI; Hongda Vacuum; Platit; Lung Pine Vacuum; Beijing Power Tech; SKY Technology; Impact Coatings; HCVAC; Denton Vacuum; ZHEN HUA; Mustang Vacuum Systems; KYZK. Pyrolytic Boron Nitride Ceramics:H.C.Starck 3M Shandong Pengcheng Special Ceramics QINGZHOU ORIENT SPECIAL CERAMICS Zibo HBN QingZhou MaTeKeChang Materials Plansee EVOCHEM Advanced Materials Neyco Momentive Yixing Jiurong JMC’s Ceramics Group ARIAKE Mascera-tec Ferro-Ceramic Grinding Morgan Technical Ceramics. Heat Treatment Furnace : Andritz; Tenova; Primetals Technologies; Aichelin Group; Inductotherm Corporation; ALD; Ipsen; Despatch; SECO/WARWICK; Nachi-Fujikoshi; PVA TePla; Cieffe(Accu）; Mersen; Gasbarre Furnace; TPS; Surface Combustion; CEC; Sistem Teknik; AVS; TAV; Nutec Bickley; Shenwu; Phoenix Furnace.Used Semiconductor Equipment :ASML; KLA Pro Systems; Lam Research; ASM International; Kokusai Electric; Applied Materials; Ichor Systems; Russell Co.; PJP TECH; Maestech Co.; Nikon Precision Inc; Ebara Technologies; Inc. (ETI); iGlobal Inc.; Entrepix; Axus Technology; Axcelis Technologies Inc; ClassOne Equipment; Canon U.S.A.; TEL (Tokyo Electron Ltd.); ULVAC TECHNO; SCREEN; DISCO Corporation; Metrology Equipment Services LLC; Semicat; Somerset ATE Solutions; SUSS MicroTec REMAN GmbH; Meidensha Corporation; Intertec Sales Corp.; TST Co.; Bao Hong Semi Technology; Genes Tech Group; DP Semiconductor Technology; E-Dot Technology; GMC Semitech Co.,Ltd; SGSSEMI; Wuxi Zhuohai Technology; Shanghai Lieth Precision Equipment; Shanghai Nanpre Mechanical Engineering; EZ Semiconductor Service Inc.; HF Kysemi; Joysingtech Semiconductor; Shanghai Vastity Electronics Technology; Jiangsu Sitronics Semiconductor Technology; Dobest Semiconductor Technology (Suzhou); Jiangsu JYD Semiconductor; AMTE (Advanced Materials Technology & Engineering); SurplusGLOBAL; Sumitomo Mitsui Finance and Leasing; Macquarie Semiconductor and Technology; Moov Technologies; CAE Online; Hightec Systems; AG Semiconductor Services (AGSS); Intel Resale Corporaton; EquipNet; Mitsubishi HC Capital Inc.; Hangzhou Yijia Semiconductor Technology. 300mm Used Equipment. 200mm Used Equipment. 150mm Used Equipment. 100mm Used Equipment; Research and development Used Equipment; Segment by Application; Refurbished Deposition Equipment. Refurbished Etch Equipment. Refurbished Lithography Machines. Refurbished Ion Implant. Refurbished Heat Treatment Equipment. Refurbished CMP Equipment. Refurbished Metrology and Inspection Equipment. Refurbished Track Equipment. Solid-State Cooling: AMS Technologies AG; Antylia Scientific; EVERREDtronics; Ferrotec Holdings Corp.; Hi Z Technology; II VI Inc.; Komatsu Ltd.; Kryotherm; Laird Thermal Systems Inc.; Merit Technology Group; P and N Technology Xiamen Co. Ltd.; Phononic; RMT Ltd.; Solid State Cooling Systems; Spectra Lab Instruments Pvt. Ltd.; TEC Microsystems GmbH; Thermonamic Electronics Jiangxi Corp. Ltd.; Wellen Technology Co. Ltd.; Z MAX Co. Ltd.. Lam Research, Tokyo Electron Limited, Applied Materials, Hitachi High-Tech, SEMES, AMEC, NAURA, SPTS Technologies (KLA), Oxford Instruments, ULVAC, Plasma-Therm

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