Description
Model: Temescal BJD-1800 3-Cathode Sputter System
Category: Sputter
Original Equipment Manufacturer: Temescal/ TFE
Condition: Used in Caltech University before Dec., 2018. We sell them at AS IS,WHERE IS condition. Refurbished or Refurbished&Upgraded are optional at extra cost and time.
Price: Please make an offer, Terms – Prepay
Quantity: 1
Valid Time: Subject to prior sale without notice
Lead Time: Immediately after receipt of payment.
Location: U.S.A.
Warranty: No warranty for the AS IS,WHERE IS condition.
Description:THIS INFO CAME WITH THE SYSTEM WHEN WE BOUGHT IT. NO GUARANTEE OF THE INFO BELOW. JUST FOR YOUR REFERENCE.
Temescal BJD-1800 3-Cathode Sputter System, System Specs: (see picture). Excellent condition. The system was fully operational prior to deinstallation in a Fab in Silicon Valley.
This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange and motorized linear motion assembly. The 7 .5″ substrate table assembry is mounted within this low volume adapter.
Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7″ diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300 watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downmeam pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.
Pls contact us via email sales@semistarcorp.com if you are interested in the following. These are subject to prior sale. These are only for end user. Appreciate your time.
| 1 | 000-0000// AMAT E5500 HOIST ENDURA 5500 SPUTTER TNAN [ASIS] |
| 2 | 0020-09031, AMAT, INSULATING WASHER – ONLY. Part from P5000 SPUTTER & TR |
| 3 | 0020-09911 / AMP-266-009, CARRIER, SPUTTER / APPLIED MATERIALS AMAT |
| 4 | 0020-09911, AMAT, Applied Materials CARRIER, SPUTTER, From P5000 Sputter kit |
| 5 | 0020-09912 PIN LIFTING SPUTTER, lot of 7 |
| 6 | 0020-09933 / GAS DISTR. PLATE SPUTTER / APPLIED MATERIALS AMAT |
| 7 | 0020-10527, AMAT, Applied Materials, SPUTTER PIPE , Teflon |
| 8 | 0021-11382 / MAGNET ASSEMBLY, ENDURA PVD SPUTTERING / APPLIED MATERIALS AMAT |
| 9 | 00-680909-00 / RAM BELLOWS ASSY,PRESSURE PLATE, ,SPUTTER,00-680909-00 / NOVELLUS |
| 10 | 0200-09086, AMAT, Applied Materials, QUARTZ RING 200MM SPUTTER ETCH |
| 11 | 0200-09090; RING QUARTZ 200MM SPUTTER ETCH BGR, Applied Materials (AMAT) |
| 12 | 0200-09608, AMAT, Applied Materials,SHLD QUARTZ,200MM,SPUTTER ETCH |
| 13 | 04-716797 /MULTI RANGE DC SPUTTERING POWER SUPPLY M2000,M2I / VARIAN VPW2870P5-S |
| 14 | 1,000 pounds of pure silicon sputtering targets polysilicon poly-silicon |
| 15 | 1021-12-151 / WEST COAST QUARTZ RING, 8″ SPUTTER CERAMIC / WEST COAST QUARTZ |
| 16 | 10538 ANATECH SPUTTERING SYSTEM HUMMER 10.2 |
| 17 | 115-0101// HITACHI 03E-0601, E-120 ION SPUTTER |
| 18 | 116-0503// AMAT APPLIED 0200-09087 QTZ RING 150MM SPUTTER |
| 19 | 119-0301// HONEYWELL E5500 11″ DB ENDURA 6″ SPUTTERING TARGET |
| 20 | 21″x 6″ Cadmium Tin Alloy Rotary Sputtering Target 99.9% (Cd)66.5(Sn)33.5 Wt% |
| 21 | 304-200225 Rev A, Sputtering |
| 22 | 324-0202// AMAT APPLIED 0020-39554 HARD STOP, WAFER LIFT, SPUTTER |
| 23 | 342-0101// AMAT APPLIED 0020-09912 LIFTING PIN, SPUTTER |
| 24 | 342-0101// AMAT APPLIED 0020-09912 LIFTING PIN, SPUTTER |
| 25 | 35mm Slide-#467-1961-Sputterer Spring |
| 26 | 3648 Sputtering Materials Inc. 03069440002-A Boundment Backing Plate RND: 4″ |
| 27 | 3744281 – Leybold Heraeus – CONTACT ELEMENT – FOR SPUTTERING 011/110 |
| 28 | 4″ Glass For Viewport UHV Sputtering |
| 29 | 6 inch diameter round sputter gun |
| 30 | 771 gram 27Oz 99.95% Niobium Columbium metal sputtering target element 41 sample |
| 31 | 786 gram 28Oz 99.95% Niobium Columbium metal sputtering target element 41 sample |
| 32 | 8 inch Reflective “Splatter&Adhesive” sputtering Reactive Shooting paper |
| 33 | 9.5″ Spit & Sputter Dying Perch Muskie Topwater Lure Handcrafted 6.5 Oz |
| 34 | 99.99% Aluminum 8.7/8″x 3.3/8″x 0.310″ Sputter Target Approx.103 Grams |
| 35 | 99.995% Titanium Sputtering Target Plate Diameter 57mm 2.24” Thick 5mm |
| 36 | 99.995% Titanium Ti Sputtering Target Disc Plate Diameter 150mm Thick 5mm |
| 37 | 99.995% Titanium Ti Sputtering Target Disc Plate Diameter 85mm Thick 5mm |
| 38 | 99.995% Titanium Ti Sputtering Target Plate Diameter 2” Thick 10mm |
| 39 | 99.995% Titanium Ti Sputtering Target Plate Diameter 70mm Thick 5mm |
| 40 | 99.995% Titanium Ti Sputtering Target Plate Diameter 75mm Thick 3mm |
| 41 | A&N Chain Clamp Sanitary Pipe Ultra Low Vacuum Sputtering Deposition Chamber |
| 42 | Advanced Energy 10kW Magnetron Drive Power Supply Sputtering MDX 2226-000-F |
| 43 | ADVANCED ENERGY 3152283-000A CONTROLS BOARD FOR MDX TYPE DC SPUTTER POWER SUPPLY |
| 44 | Advanced Energy 3157600-003 PEII Reactive Sputtering PSU 1100V 10kW 40KHz 208VAC |
| 45 | Advanced Energy 3157600-004 PEII Reactive Sputtering PSU 10kW 208VAC |
| 46 | Advanced Energy 3157600-004 PEII Reactive Sputtering PSU 1100V 10kW 40KHz 208VAC |
| 47 | Advanced Energy AE Ascent 40KW DC Sputtering Power Supply |
| 48 | ADVANCED ENERGY AE MAGNETRON CATHODE SPUTTERING T HEAD 6″ WAFER 3151701-010 |
| 49 | advanced energy AE MDX 2.5 2500w dc sputtering power supply single phase amat |
| 50 | Advanced Energy MDX 1K Magnetron Power Supply 1Kw, 115VAC, Single-Phase, 16A |
| 51 | Advanced Energy MDX 1K Magnetron Sputter Power Supply 1Kw, 115VAC, 1-Ph, 16A |
| 52 | Advanced Energy MDX 2.5K 3152224-031A DC Sputter Power Supply 200-208V, 220-240V |
| 53 | Advanced Energy MDX 5K Magnetron Drive 5 kW Sputter Power Supply 2011-000, USA |
| 54 | Advanced Energy MDX 5K Magnetron Drive 5kW Sputter Power Supply 2011-000-E USA |
| 55 | Advanced Energy MDX II 3152256-005F DC Sputter Power Supply 18KW 400V3-phase 32A |
| 56 | Advanced Energy MDX II 3152256-209C DC Sputter Power Supply |
| 57 | Advanced Energy MDX-1K, 2105 Dc Sputter Power Supply |
| 58 | Advanced Energy MDX-2.5K DC Sputtering Power Supply 2224-006-B Output 500-1800V |
| 59 | Advanced Energy MDX-500 DC Sputtering Power Supply – 6 month wrty. |
| 60 | Advanced Energy Pinnacle 3152352-123B Pulsed DC Sputter Power Supply, 8 KW |
| 61 | Advanced Strategies In Thin Film Engineering By Magnetron Sputtering |
| 62 | Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by Alberto |
| 63 | ADVANCED STRATEGIES IN THIN FILM ENGINEERING BY MAGNETRON SPUTTERING GU MDPI AG |
| 64 | AE ADVANCED ENERGY MDX 1.5K MAGNETRON SPUTTERING DC POWER SUPPLY. 500V 3A |
| 65 | AE Advanced Energy MDX 1.5K Sputtering DC Power Supply |
| 66 | AE Pulsed Plasma PEP-2500 bipolar dc rf sputter power |
| 67 | AJA INTERNATIONAL ST20 RF/DC sputtering source for 2″ x 0.25″ target |
| 68 | AJA INTERNATIONAL ST30-MM , RF/DC HV Sputter Source 3 Inch |
| 69 | AJA Intl Sputtering Target – Iron – 2″ Dia – 1/8″ Thick – 99.95% Pure |
| 70 | Al-Sc 87.5/12.5 wt% Alloy Sputtering Target |
| 71 | Aluminum Al Sputtering Targets – 2.00″ Diameter, 0.250″ Thick – Kurt J. Lesker |
| 72 | Aluminum MRC Chi Inset Sputter Target: Al 99.9+ With Materials certification |
| 73 | Aluminum nitride, AlN – Sputtering Target |
| 74 | Aluminum SEM Sputtering target: Al 99.999% pure, 54mm diameter x 1mm thick |
| 75 | Aluminum SEM Sputtering target: Al 99.999% pure, 57mm diameter x 1mm thick |
| 76 | Aluminum sputter target, Al 99.999% pure 2″ diameter x 0.125″ thick |
| 77 | Aluminum sputter target, Al 99.999% pure 2″ diameter x 0.25″ thick |
| 78 | Aluminum sputter target, Al 99.999% pure 50mm diameter x 3mm thick |
| 79 | Aluminum Sputtering target: Al 99.999% pure, 63mm diameter x 1mm thick |
| 80 | Aluminum Target for Nobler NT 1500 sputter coater |
| 81 | Aluminum, Al – Sputtering Target |
| 82 | Aluminum/Indium sputter target Al/In 1:1 at%, 99.99% pure 3″ dia x 1/4″ thk |
| 83 | Aluminum/Manganese sputter target Al/Mn 99.8/0.2 wt% 3″ diam x 0.25″ thk |
| 84 | Aluminum/Nickel sputter target 50/50 Al/Ni at% 99.99% rod 4.2″ long x 0.5″ diam |
| 85 | Aluminum/Silicon MRC Chi Sputter target: Al/Si 99/1 wt% |
| 86 | Aluminum-doped Zinc Oxide Sputtering Target AZO |
| 87 | AMAT 0010-01994 Rev.001, Magnet Assembly, PVD, Endura, Sputter Chamber |
| 88 | AMAT 0010-09425, Grounding Strap, Assy, Sputter Etch |
| 89 | AMAT 0010-20818 ENDORA 5500, MAGNET, SPUTTER, PVD source |
| 90 | AMAT 0020-00663, Insulator, Source, 11 inch, Ceramic, PVD, Sputter |
| 91 | AMAT 0020-07701 Shield Upper Ti TiN Al Flame Spray Endura sputter Chamber |
| 92 | AMAT 0020-09911 MXP Sputter, Etch Carrier, Wafer lift with 4 Pin |
| 93 | AMAT 0020-09911 SPUTTER CARRIER with 0020-09912 |
| 94 | AMAT 0020-10050 Pedestal, Flat Sputter |
| 95 | AMAT 0020-10050 Pedestal, Flat Sputter |
| 96 | AMAT 0020-10051 Ring, Top Sputter |
| 97 | AMAT 0020-10051, Ring, Top Sputter |
| 98 | AMAT 0020-10527 sputtering pipe, etch chamber, teflon insulator, MXP |
| 99 | AMAT 0020-21467 Adapter Source, PVD Chamber, Sputter, Endura Tool |
| 100 | AMAT 0020-21707 8 Inch wafer hoop, Lifter Endure, PVD sputter |
| 101 | AMAT 0020-21707 8 Inch wafer hoop, Lifter Endure, PVD sputter, CDSL-D-280 |
| 102 | AMAT 0020-21707 8 Inch wafer hoop, Lifter Endure, PVD sputter, CDSL-D-299 |
| 103 | AMAT 0020-24640, 6JMF, Tin clampring, PVD Sputter chamber |
| 104 | AMAT 0020-29719 Pre clean Endura sputter Pedestal quartz chuck |
| 105 | AMAT 0020-29719-PA, Endura, PVD, Chuck, Pedestal, Sputter Chamber |
| 106 | AMAT 0020-29719-PA, Endura, PVD, Chuck, Pedestal, Sputter Chamber |
| 107 | AMAT 0020-62669 SHIELD, APERATURE, B/S SPUTTER |
| 108 | AMAT 0021-11075-001, Endura, PVD, Chuck, Pedestal, Sputter Chamber |
| 109 | AMAT 0021-11382 Magnet Assembly, Endura PVD sputtering |
| 110 | AMAT 0021-76516 Chamber Liner, PVD Sputter, Endura Tool |
| 111 | AMAT 0040-01761 Endura Pre-clean Chamber Body, Sputter, PVD |
| 112 | AMAT 0040-20561 Belljar, Preclean II, Endura, Sputtering Plate |
| 113 | AMAT 0040-20561 Belljar, Preclean II, Endura, Sputtering Plate |
| 114 | AMAT 0040-20561 Belljar, Preclean II, Endura, Sputtering Plate |
| 115 | AMAT 0200-09084 Shield, 125mm, Sputter Etch |
| 116 | AMAT 0200-09088-B Quartz Ring 125MM Sputter Etch |
| 117 | AMAT 0200-09091 Graphite Ring For P5000 Sputter Etch (FCVD02C) |
| 118 | AMAT 0200-09608, Shield Quartz 200mm, Sputter |
| 119 | AMAT 0200-09608-C, Shield Quartz 200mm, Sputter |
| 120 | AMAT 0200-20059 PVD Sputter Liner Clamp, 6″, Aluminum, SMF, STR |
| 121 | AMAT 0200-20061 Insulator, Quartz, 6″, PVD Sputter chamber PCII |
| 122 | AMAT 233-2889-25 AMAT PVD endura clamp ring Sputter chamber |
| 123 | AMAT 6″ ENDURA HEATER ASSEMBLY, PVD SPUTTER CHAMBER |
| 124 | AMAT Applied Materials 0020-09933 Gas Distribution Sputter Plate |
| 125 | AMAT Applied Materials 0020-09933 Gas Distribution Sputter Plate |
| 126 | AMAT APPLIED MATERIALS 0100-20255 RF Sputtering |
| 127 | AMAT Applied Materials 0140-16349 Harness Assembly Sputter Chamber Right |
| 128 | AMAT Applied Materials 0140-16350 Harness Assembly Sputter Chamber Rear |
| 129 | AMAT Applied Materials 0140-16351 Harness Assembly Sputter Chamber Bottom |
| 130 | AMAT Applied Materials 0200-09088-B Quartz Ring 125MM Sputter Etch |
| 131 | AMAT Applied Materials 0200-09088-C Quartz Ring 125MM Sputter Etch |
| 132 | AMAT Applied Materials 0225-34794 Gas Distribution Sputter Plate |
| 133 | AMAT APPLIED MATERIALS QTZ RING, 200mm SPUTTER ETCH, AMAT P/N 0200-09086 |
| 134 | AMAT Endura Sputter Chamber Source Magnet Holder, Lock |
| 135 | AMAT Magnet Assembly, PVD, Sputter, 329947 |
| 136 | AMAT PVD Chamber Lift Assembly, Endura Sputter Chamber, SMC NCDQ2WB63-01-0193US |
| 137 | AMAT PVD Endura sputtering chamber clamp ring |
| 138 | Anatec Limited HUMMER VI Sputtering System |
| 139 | Anatech Gold Sputtering Coating Machine with Vacuum Pump Hummer VII |
| 140 | Anatech Hummer 6.2 Sputtering System |
| 141 | ANATECH HUMMER VI-A SPUTTERING SYSTEM |
| 142 | Anatech HUMMER X Sputter System |
| 143 | Anatech HUMMER X Sputter System |
| 144 | ANATECH HUMMER X SPUTTER SYSTEM |
| 145 | Anelva 32 Point PCB Relay Board For 1015/1013 Sputtering System ILC 1013 |
| 146 | ANELVA 9005-41429 SPUTTER TARGET, PVD, COML, BONDING D164 T4, 5N AI-PURE |
| 147 | ANELVA 9005-41429 SPUTTER TARGET, PVD, COML, BONDING D164 T4, 5N AI-PURE |
| 148 | Anelva Sputtering system ICL-1015 Semiconductor Processing Assembly |
| 149 | Angstrom Sciences 99.999% Copper 8.0″ x 0.25″ Sputtering Target |
| 150 | ANGSTROM SCIENCES NICKEL SPUTTERING TARGET (NI) 99.995% BONDED 8”X.250” |
| 151 | Angstrom Sciences Onyx Intevac Sputtering RM PVD Magnet Assembly |
| 152 | Angstrom Sciences PLux Control – Touchscreen – Magnetron Sputtering |
| 153 | Angstrom Sciences RF / DC PLANAR MAGNETRON SPUTTER GUN, 2″ TARGET |
| 154 | Angstrom Sciences Sputtering Cathode with Aluminum Target, 8″ x 3″ |
| 155 | Anode layer ion source plasma sputtering thin film 2.75″ conflat SHV baseplate |
| 156 | Anode layer ion source plasma sputtering thin film deposition |
| 157 | Antimony, Sb – Sputtering Target |
| 158 | Antimony/Telluride sputter target – Sb2Te3 99.99% pure, 1.00″ diam x 4mm thk |
| 159 | Applied Materials (AMAT) 0020-03597 Spider Sputter etch |
| 160 | Applied Materials (AMAT) 0020-09911 CARRIER, SPUTTER |
| 161 | Applied Materials (AMAT) 0020-10527 Sputter pipe |
| 162 | Applied Materials (AMAT) 0020-10527 SPUTTER PIPE |
| 163 | Applied Materials (AMAT) 0020-10527 SPUTTER PIPE TEFLON |
| 164 | Applied Materials (AMAT) 0020-21707 8″ wafer hoop, Lifter Endure, PVD sputter |
| 165 | Applied Materials (AMAT) 0020-30178 SPUTTER ETCH CARRIER SEMICONDUCTOR PART |
| 166 | Applied Materials (AMAT) 0200-09062 WEST COAST QUARTZ RING COVER 150MM SPUTTER |
| 167 | Applied Materials (AMAT) 0200-09083 SHIELD 150MM SPUTTER ETCH |
| 168 | Applied Materials (AMAT) 0200-09088 WEST COAST QUARTZ RING 125MM SPUTTER ETCH |
| 169 | Applied Materials (AMAT) 0200-09089 RING QUARTZ 100MM SPUTTER12NC:790050202513 |
| 170 | Applied Materials (AMAT) 0200-09090 RING GRAPHITE 200MM SPUTTER ETCH |
| 171 | Applied Materials (AMAT) 0200-09608 SHLD QUARTZ,200MM,SPUTTER ETCH |
| 172 | Applied Materials (AMAT) 0220-10629 KIT, SPUTTER ETCH LIFT ASSY MOD |
| 173 | Applied Materials (AMAT) 0225-34794 GAS DISTRIBUTION PLATE, SPUTTER |
| 174 | Applied Materials (AMAT) 0226-97903 CATHODE KIT TUNGSTEN ETCHBACK/ST SPUTTER |
| 175 | Applied Materials 0010-76306 Bearing, Assy. Sputter AMAT Etch |
| 176 | Applied Materials 0020-09911 Carrier,Sputter |
| 177 | APPLIED MATERIALS 0021-61445 300MM RING, DEPOSITION, CU SPUTTER, BCP (Cu) AMAT |
| 178 | Applied Materials AMAT 0200-09063 RING COVERING SPUTTER 4 |
| 179 | Applied Materials AMAT Heater Loop Sputter CPL 102136614 2600W 400V |
| 180 | Applied Materials Heater Loop Sputter, 102136616, 2600W, 400V CPL |
| 181 | Applied Materials Model:0020-10527 Sputter Pipe for FCVD02C |
| 182 | APPLIED MATERIALS PEDESTAL THICK 200MM GRAPH/QUARTZ SPUTTER ETCH 0020-10518 |
| 183 | APPLIED MATERIALS RING GRAPHITE 200MM SPUTTER ETCH, 91-00331A 0200-09090 |
| 184 | Arbogast Hawaiian Sputter Fuss Fish Lure |
| 185 | Arbogast Hawaiian Wiggler #2 1/2 Sputter Fuss 251 F Frog Skirt Box Pamphlet EUC |
| 186 | Assorted Matzuo Lure lot (3) Prism Shad Spit & Sputter, Zen Double Play Crank |
| 187 | Aurion B-MBT-48 Matchbox Prodik 30kW T300 for RF Sputtering Disposition Chamber |
| 188 | Aviza Technology 188850 150mm Back Sputter Shield Trikon |
| 189 | AZO- Sputtering Target |
| 190 | BALL BEARING, SPUTTERING COMPONENTS, P/N: 100195 |
| 191 | Balzers 150mm Wafer Carousel Assembly LLS 801 Sputtering System |
| 192 | Balzers 200mm Wafer Carousel Assembly LLS 801 Sputtering System |
| 193 | BALZERS 5×10″ Sputtering Target 99.999 Pure 95%Al Aluminum+1%Si+4%Cu BD 483790-T |
| 194 | Balzers 90/92 Coating Materials Sputtering Targets Evaporation Sources Catalog. |
| 195 | Balzers 90-88749 LLS 801 Sputtering System Manual |
| 196 | Balzers BAK 642 Sputtering System |
| 197 | Balzers Coating Materials Sputtering Targets Evaporation Sources 84/86 Catalog. |
| 198 | Balzers D12/45216951 Remote Control for Wafer Sputtering System |
| 199 | Balzers LLS 801 Sputtering System Operating Manual |
| 200 | Balzers Manual Set Unaxis LLS 502 Load Block Metal Film PVD Sputtering System |
| 201 | Balzers MC 515 BK221410-T Magnetron For LLS 502 Sputtering System |
| 202 | Balzers Unaxis Sputter Target AITi Ring ARQ 131 M00-1074/1 01-342081 |
| 203 | Barium sputter target Ba 99.9% purity 2″ diameter x 0.25″ thick |
| 204 | Bayville chemical carbon sputtering target (99.99%) 2″ diameter 0.125″Thk AA-17 |
| 205 | Big End Bearings KOLBENSCHMIDT Sputtering BMW 2.5d 3.0d 24V M57D30 M51D25 E71 X6 |
| 206 | Big End Bearings KOLBENSCHMIDT Sputtering VW T5 Transporter Bus 2,5l Tdi Axe Axd |
| 207 | BIG END BEARINGS Sputtering KS VW Audi Seat Skoda 1, 9L TDI PD AJM AUY ATD atj |
| 208 | Big End Bearings without Cleats Sputtering Glyco 71-3904 0,25mm Oversized 1,2 |
| 209 | Bio-Rad Polaron E6700 Turbo vacuum coating ?sputter evaporation bell jar coater |
| 210 | BioRad Polaron E7000 Freeze Fracture Sputter Coater Vacuum Chamber Bell Jar |
| 211 | Bismuth Selenide , Bi2Se3 – Sputtering Target |
| 212 | Bismuth sputter target, 99.999% pure Bi, 2.00″ diam x 0.25″ thk |
| 213 | Bismuth Sputtering Target, 3.00″ D x 0.25″ thick, 99.999% pure |
| 214 | Bismuth Telluride, Bi2Te3 – Sputtering Target |
| 215 | Black Wheel Cap for 2021 2022 KIA Sorento for 20-inch Sputtering Wheel Rim |
| 216 | Bohemia Jihlava JS14071, 10-Inch Crystal Vase with Platinum Gold Sputtering |
| 217 | Bohemia Jihlava JS16914, 10-Inch Crystal Vase with Blue/Gold Sputtering |
| 218 | Bonfire Sheet Sputtering Sheet Bonfire Board Seat Heat Welding Authentic |
| 219 | Bonfire Sheet Sputtering Sheet Bonfire Board Seat Heat Welding Authentic |
| 220 | Boron sputtering target B 99.5% purity, 2″ diameter x 0.125″ thick |
| 221 | Boron, B – Sputtering Target |
| 222 | Brian CHAPMAN / Glow Discharge Processes Sputtering and Plasma Etching |
| 223 | BUHLER SPUTTERING TARGET 6333032265 LOPH-14120-001 Target 320x100x8 |
| 224 | Bumper Sticker “Our ’38 Ford Is Sputtering” 1938 Classic Collector 14″ |
| 225 | Burbank Sportscards – World’s Largest Selection |
| 226 | BZ-1730-21-A – Leybold Heraeus – CONTACT ELEMENT – FOR SPUTTERING 011/110 |
| 227 | Cadmium SEM Sputtering target: Cd 99.99% pure, 57mm diameter x 0.25mm thick |
| 228 | Cadmium sputtering target Cd 99.99% pure 2″ diam x 0.25″ thk |
| 229 | Cadmium Sulfide, CdS – Sputtering Target |
| 230 | Calcium (reactive) sputter target Ca 99.9% 2″ diam x 1/4″ thk |
| 231 | Calcium Fluoride, CaF2 – Sputtering Target |
| 232 | Calcium Manganate, CaMnO3 – Sputtering Target |
| 233 | Calcium Ruthenate, CaRuO3 – Sputtering Target |
| 234 | Calcium Ruthenium-Titanate, Ca(Ru0.5Ti0.5)O3 – Sputtering Target |
| 235 | Calcium Titanate, CaTiO3 – Sputtering Target |
| 236 | Canon / Anelva 912-7060 Sputter Ion/Noble Ultra High Vacuum Pump 400 L/sec |
| 237 | CANON / ANELVA C-7300,PVD, SPUTTERING SYSTEMS “2010 vintage” , wafer size 12″ |
| 238 | Canon Anelva 1015i Sputtering System – 6″ |
| 239 | CANON ANELVA Sputtering Equipment C-7530 HF |
| 240 | Canon/Anelva C7100 PVD, SPUTTERING SYSTEMS *SJ3 |
| 241 | Carbon SEM Sputtering target: C 99.999% pure, 54mm diameter x 1mm thick |
| 242 | Carbon sputtering target C 99.999% 2″ diameter x 0.25″ thick ACI ALLOYS |
| 243 | CdS, 99.99%, 18” x 3.5” x 0.250” Sputtering Target, Bonded Cu BP/I |
| 244 | Cerac Aluminum Al Sputtering Target 5″ x .25″ |
| 245 | Cerac Chromium Silicide, CrSi2 Sputtering Target 5.94″ x .253″ |
| 246 | Cerac Indium-Tin Oxide 5 ” high Purity Sputtering Target |
| 247 | Cerac Specialty Inorganics Titanium Oxide TiO2 Sputtering Target |
| 248 | Cerac Titanium Sputter Target 99.999% Pure |
| 249 | Ceramic Back Sputter Shield |
| 250 | CHIYODA GREEN SPUTTER RESISTANT TUBING PN# TE-10AFG-20 |
| 251 | CHROMA ET535/50M SPUTTER/HARD COATED |
| 252 | Chrome sputtering target Chromium 5 inch round Varian MDP |
| 253 | Chromium Cr Sputtering Targets – 2.00″ Diameter, 0.250″ Thick – Kurt J. Lesker |
| 254 | Chromium sputter target, Cr 99.95% pure, 2″ diameter x 0.125″ thick |
| 255 | Chromium sputter target, Cr 99.95% pure, 2″ diameter x 0.25″ thick |
| 256 | CIGS – Sputtering Target – for solar cells |
| 257 | Cisco Kid Topper Top Water Buzz Sputter Bait Muskie Pike Bass Black Gold |
| 258 | Clunk & Sputter by Muerte Pan Alley (CD, 2014) |
| 259 | Co/Fe Sputtering Target: 90/10 At% 3N5 2” x 3mm Thick |
| 260 | Cobalt Chrome sputter target Co/Cr 83/17 at%, 99.95% pure, 3.0″ dia x 6mm thk |
| 261 | Cobalt Co Sputtering Targets – 2.00″ Diameter, 0.250″ Thick – Kurt J. Lesker |
| 262 | Cobalt Iron Aluminum sputter targe Co2/Fe/Al 99.95% 2″ diameter x 0.125″ thick |
| 263 | Cobalt Iron Boron sputter target (Co/Fe/B 6:2:2 at%, 99.9%) 1.50″ diam 2mm thick |
| 264 | Cobalt Iron Boron sputter target, Co/Fe/B 99.9% pure, 2″ diam x 3mm thk |
| 265 | Cobalt Iron Zirconium sputter target Co/Fe/Zr 60/25/15 at% 1.0″ diam x 0.1″ thk |
| 266 | Cobalt Manganese Silicon sputter target, Co2MnSi heusler alloy, 2″ dia x 3mm thk |
| 267 | Cobalt sputter target, 99.98% pure, 2″ diameter x 0.125″ thick |
| 268 | Cobalt sputter target, Co 99.95% pure, 1.00″ diameter x 0.045″ thick. |
| 269 | Cobalt Titanium sputter target Co/Ti 1:1 At% 99.95% 2“ diam x 1/4” thk |
| 270 | Cobalt with Iron, Boron & Silicon mixture- Sputtering Targets |
| 271 | Cobalt, Co – Sputtering Target |
| 272 | Cobalt/Iron sputter target, Co/Fe 50/50 weight% 99.95%, 2.00″ diam x 0.125″ thk |
| 273 | Cobalt/Iron/Boron sputter target Co/Fe/B 60/20/20 4″ diam x 0.079″ thick |
| 274 | Cobalt-Iron sputter target: Co/Fe 50/50 At% 3” x 0.08” Thick |
| 275 | Colored Sputtering Paint Shower Curtain Abstract Graffiti Bathroom Accessory Set |
| 276 | COMPUTATIONAL EXPLORATIONS IN MAGNETRON SPUTTERING By E. J. Mcinerney |
| 277 | Connecting Rod Bearing Kit Rotary VW Audi TDI 1,9l 1z AAZ AFN ASV AHF AVG 71-384… |
| 278 | Connecting Rod Bearing kolbenschmidt magnetrons BMW 2.5d 3.0d 24v m57d30 m51d25 … |
| 279 | Connecting Rod Bearing kolbenschmidt magnetrons VW t5 TRANSPORTER VAN 2,5l TDI A… |
| 280 | Connecting Rod Bearing magnetrons Audi VW 1,9l 2,0l 2,5l TDI ARL AVF ASZ Bottle … |
| 281 | Connecting Rod Bearing magnetrons Audi VW 1,9l 2,0l TDI BOTTLE BKD BLB BMM BL… |
| 282 | Connecting Rod Bearing magnetrons BMW e36 e39 e46 e60 525 530 TDS 6zyl. Diesel m… |
| 283 | Connecting Rod Bearing magnetrons GLYCO Mercedes Diesel C-Class E-Class |
| 284 | Connecting Rod Bearing magnetrons GLYCO Racing VW Audi Seat 1,8l 2,0l 16v Turbo … |
| 285 | Connecting Rod Bearing magnetrons GLYCO VW AUDI SEAT SKODA 1,2 1,4 1,9 TDI |
| 286 | Connecting Rod Bearing magnetrons kolbenschmidt VAG VW AUDI SEAT SKODA 1,9 2,0 T… |
| 287 | Connecting Rod Bearing magnetrons KS 0,25mm VW Audi Seat 1,8l 2,0l 16v Turbo 16v… |
| 288 | Connecting Rod Bearing magnetrons KS Racing Audi 5zyl. 2,2l s2 rs2 s4 s6 3b ABY … |
| 289 | Connecting Rod Bearing Set Sputtering VW Audi Tdi 1,9l 1Z Aaz AFN Asv Ahf AVG |
| 290 | Connecting Rod Bearing Sputtering GLYCO Mercedes Diesel C-Class |
| 291 | Connecting Rod Sputtering Audi VW 1,9l 2,0l 2,5l Tdi Arl Avf Asz Bkd Bmm 71-3930 |
| 292 | Connecting Rod Sputtering Audi VW 1,9l 2,0l Tdi Azv Bkd Blb Bmm Blt Axc Aws |
| 293 | Connecting Rod Sputtering KOLBENSCHMIDT BMW 4Zyl. Diesel M47D20 318d 320d E39 |
| 294 | Connecting Rod Sputtering KOLBENSCHMIDT VAG VW Audi Seat Skoda 1,9 2,0 Tdi |
| 295 | Connecting Rod Sputtering Ks Racing Audi 5Zyl. 2,2l S2 RS2 S4 S6 3B Aby Adu Aan |
| 296 | Connecting Rod Without Cam Sputtering VW Audi 1,2 1,4 1,9 Pd GLYCO 71-3904 Pair |
| 297 | Connecting Rod Without Cam Sputtering VW Audi 1,2 1,4 1,9 Pd GLYCO 71-3904 Set |
| 298 | CONROD BIGENG BEARINGS +0.5MM FOR MERCEDES BENZ M 276 DE35 SPUTTER REPLACEMENT |
| 299 | Copper Magnesium sputter target: Cu/Mg 98/2 wt%, 99.9% pure, 3″ dia x 6mm thk |
| 300 | Copper Nickel sputter target Cu/Ni 55/45 at% 99.99%, 1.00″ dia x 0.125″ thick |
| 301 | Copper Oxide Sputtering Target CuO 99.995″ Pure 2″ x .1875″ thick +Backing Plate |
| 302 | Copper Oxide, Cu2O – Sputtering Target |
| 303 | Copper SEM Sputter target: Cu 99.995% pure, 57mm diameter x 0.25mm thick |
| 304 | Copper sputter target Cu 99.997% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 305 | Copper, Cu – Sputtering Target |
| 306 | Copper/Gallium/Indium sputter target Cu/Ga/In (32.9/11.3/55.8 wt%) 1.5″ x 0.15″ |
| 307 | Copper/Manganese sputter target Cu/Mn 86.5/13.5 at% 1.5″ dia x 0.125″ thk |
| 308 | Copper/Nickel sputter target Cu/Ni 95/5 at% 99.99% 1 inch diam x 1/8 inch thk |
| 309 | Cover Food Splash Guard Microwave Anti-Sputtering with Steam Vents Magnetic |
| 310 | Cover Microwave Oven Food Cover Anti-Sputtering Heat Resistant Lid Household |
| 311 | CPI CPW2870B10-47 Power Supply 27-158946-00 36kW Sputtering 460V Input PARTS |
| 312 | Crystal Goose 7 Oz Wine Glasses on a Long Stem with Gold and Platinum Sputtering |
| 313 | Crystal Goose 7.1 Oz. Wine Glasses on a Long Stem with Gold Sputtering |
| 314 | Crystal Goose 7.1 Oz. Wine Glasses on a Long Stem with Gold Sputtering |
| 315 | Crystal Goose 8 Oz. Wine Glasses on a Long Stem with Gold Sputtering |
| 316 | Crystal Goose 8.11 Oz. Wine Glasses on a Long Stem with Gold Sputtering |
| 317 | Crystal Goose Two Glass Salad Bowls with Golden Sputtering |
| 318 | CTI-Cryogenics 8113008 On-Board FastRegen Control Sputtering Module |
| 319 | CTI-CYROGENICS ON-BD FAST REGEN CONTROL SPUTTERING 8129948G001 T13-D6 |
| 320 | CuGa – Sputtering Target – 99.99% purity |
| 321 | CUSTOM SPUTTERING SYSTEM W/ 5 SPUTTERING SOURCE & 1 EVAPORATION SOURCE |
| 322 | CVC Products 2800 Load Lock Dual Process Chamber Sputtering System with Handler |
| 323 | CVC Products Inc 2800 Sputter Shields Shutter Segments Cathode Stations Cleaned |
| 324 | CVC Products Vacuum Sputter Deposition System ENI RF Generators ACG 10 |
| 325 | CZTS & CZTS-Se- Copper-Zinc-Tin-Sulfur-Selenium Sputtering Targets |
| 326 | DC/RF Dual-Head High Vacuum 2″ Magnetron Plasma Sputtering Coater |
| 327 | Delta sputter target: Aluminum Al 99.999%,vacuum sealed, 200mm x 0.25″ |
| 328 | Denton Explorer 14 Sputter 2 Target, RF Generator, Matching Network, Turbo Pump |
| 329 | Denton vacuum desk carbon rod accessory 120volt |
| 330 | DENTON VACUUM DESK II Sputter Coater SEM Thin Film Deposition |
| 331 | Denton Vacuum Desk II Sputter Coater SEM Thin film Deposition *Parts/Repair* |
| 332 | Denton Vacuum DESK II Sputter Coater w/ Carbon Coater and Accessories |
| 333 | Denton Vacuum Desk-1 Cold Sputter Etch Unit |
| 334 | Denton Vacuum Desk-1 Cold Sputter Etch Unit Sputter coater and DCP-1 module |
| 335 | Denton Vacuum DV-502A High Vacuum sputtering parts transformer power supply |
| 336 | Denton Vacuum DV-502A High Vacuum sputtering parts valves |
| 337 | Denton Vacuum II Sputter / Sample Coater SEM Sample Prep |
| 338 | Desktop Magnetron sputtering PVD coating machine for fuel cell electrode sputter |
| 339 | DEUBLIN ROTARY UNION FOR SPUTTER ASSY, AMAT 0190-40352 SP0326 |
| 340 | Disney Pixar Cars Dan Haulin’ dinoco 400 #92 Sputter Stop cab |
| 341 | Disney Pixar Cars Lot Mack Hauler Truck 1:55 Diecast Model Car Toys Loose |
| 342 | Disney Pixar Cars McQueen 1:55 Diecast Movie Collect Car Toys Gift Boy Loose |
| 343 | Disney Pixar Cars McQueen 1:55 Diecast Movie Collect Car Toys Gift Boy Loose |
| 344 | Disney Pixar Cars Sputter Stop Kmart Exclusive Collector Days 1 Racer #92 |
| 345 | DISNEY PIXARCARS/PISTON CUP SPUTTER STOP NO.92 DIECAST VEHICLE ON CARD |
| 346 | Duniway Stockroom Corp. IPC-0062 Varian Sputter Ion Pump Control Unit PARTS |
| 347 | Duniway Stockroom GIP/25-TAP-M Sputter Ion Pump 10-4 torr – 10-11 torr vacuu |
| 348 | Dysprosium sputtering target Dy 99.9% 2″ diameter x 0.125″ thick: ACI ALLOYS |
| 349 | Early Arbogast Hawaiian Sputter Fuss Spinner Spoon Fishing Lure |
| 350 | Edwards S150B Sputter Coater T8840 Au/Pd 60mm *1 w/ Outlet Mist Filter MF20 |
| 351 | Edwards S150B Sputter Coater Works |
| 352 | EDWARDSS150B SPUTTER COATER WITH EDWARDS #2 VACUUM PUMP |
| 353 | Electromagnet for Nordiko Sputtering System |
| 354 | ENI 791521 DCG100 sputter module |
| 355 | ENI DCG-100A 10kW DC Sputtering Plasma Power Supply/Generator DCG2D-A031100021I |
| 356 | ENI OEM-50N-11601 13.56 MHz RF Plasma Generator Solid State for Sputter Chamber |
| 357 | Eratron PPS 8210 2KV RS MF 10kW DC Sputtering Plasma Power Supply with Castors |
| 358 | Eratron PPS 8210 RS MF 10KW DC Sputtering Plasma Power Supply |
| 359 | Eratron PPS 8210 RS MF High Power Sputtering Plasma Power Supply Output: 10KW DC |
| 360 | Erbium sputter target: Er 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 361 | Ernest F Fullam Vintage Sputter Coater 5 Torr Vacuum Gage |
| 362 | ESPI Metals Monel KND2240 Sputter Target |
| 363 | ESPI Metals Tin Zn AI Sputtering Target .375″x4.75″x14.875″ Purity 5N |
| 364 | ESPI Metals Tin Zn Sputtering Target .375″x4.75″x14.875″ Purity 5N |
| 365 | Europium sputter target Eu 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 366 | EVAC Chain Clamp Sanitary Pipe Ultra Low Vacuum Sputtering Deposition Chamber |
| 367 | FEI DUNIWAY Sputter Ion Pump Module 4022 198 24924 |
| 368 | FERROFLUIDICS ROTARY FEED THROUGH STAINLESS STEEL 52-110007 Sputtering Vacuum |
| 369 | FERROFLUIDICS ROTARY FEED THROUGH STAINLESS STEEL 7467 52-10007M Sputtering |
| 370 | FIL-TECH G71PT .709″ PYREX TWIN TUNGSTEN FILAMENTS MRC STYLE SPUTTERING G-71-PT |
| 371 | FIL-TECH G71PT .709″ PYREX, TWIN TUNGSTEN FILAMENTS, MRC STYLE, SPUTTERING – NIB |
| 372 | Fire Force Enen no Shouboutai Flare & Sputter T-shirt Japan Limited Cosplay |
| 373 | Fireball Beach Disney Pixar Cars #92 Sputter Stop Sheldon Shifter 1:55 Diecast |
| 374 | FISHING LURE ARBOGAST SPUTTER FUSS |
| 375 | FISHING LURE FRED ARBOGAST 3″ SPUTTER BUG RED HEAD |
| 376 | Fison Ins Polaron SC7640 Auto/Manual High Resolution Sputter Coater – Made in UK |
| 377 | Fisons Instruments Polaron SC7610 Sputter Coater w/ Vacuum Chamber |
| 378 | Fred Abrogast Hawaiian Wiggler lure lot (5) Sputter Fuss 3/8 oz 1/2 oz |
| 379 | Fred Arbogast Hawaiian Fishing Lure – Sputter Fuss |
| 380 | Fred Arbogast Sputter Fuss Hawaiian Fishing Lure |
| 381 | Fred Arbogast Sputter Fuss Hawaiian Fishing Lure |
| 382 | Ga2TeO3 – Sputtering Target – 99.99% purity |
| 383 | GAS DISTR. PLATE SPUTTER, AMAT 0020-09933 |
| 384 | Ga-ZnO – Sputtering Target – 99.99% purity |
| 385 | GENERIC SQT-0054 SPUTTER TABLE CHUCK OSR24544 SQT0054 |
| 386 | Generic Water Cooled Jacket for Sputtering / Vacuum Bell Jar Chambers |
| 387 | Germanium sputter target Ge 99.999% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 388 | Germanium Telluride (GeTe) Sputtering Target, 3″ D x 0.125″ thick 99.999% pure |
| 389 | Germanium-antimony-tellurium sputter target Ge2Sb2Te5 99.999% 1″ diam x 5mm thk |
| 390 | Glass For Viewport UHV Sputtering |
| 391 | Glow Discharge Processes : Sputtering and Plasma Etching, Hardcover by Chapma… |
| 392 | Glow Discharge Processes : Sputtering and Plasma Etching, Hardcover by Chapma… |
| 393 | GLOW DISCHARGE PROCESSES: SPUTTERING AND PLASMA ETCHING By Brian Chapman |
| 394 | Glow Discharge Processes: Sputtering and Plasma Etching by Brian Chapman |
| 395 | Glow Discharge Processes: Sputtering and Plasma Etching, Chapman, CHAPMA-, |
| 396 | GLYCO Connecting Rod Sputtering Volvo C70 S40 S60 S70 S80 V40 V60 V70 XC40 XC60 |
| 397 | Glyco Main Bearing Connecting Rod Sputtering Thrust Washers VW Audi 1,8T 20V S3 |
| 398 | GLYCO Main Bearings Rod Bearing magnetrons Thrust Washers VW Audi 1,8t 20v s3 ba… |
| 399 | Gold SEM Sputter target: Au 99.99% pure, 54mm diameter x 0.1mm thick |
| 400 | Gold SEM Sputter target: Au 99.99% pure, 57mm diameter x 0.1mm thick |
| 401 | Gold Target for MNT-JS1600 Plasma Sputtering Coater 50mm dia x 0.1mm (99.999%) |
| 402 | GREAT CONDITION-Mattel Disney Pixar Cars *SPUTTER STOP*-Never Opened-RARE |
| 403 | Great Prices and Quality from DeCluttr. 3m+ Feedbacks |
| 404 | Growth of High Permittivity Dielectrics by High Pressure Sputtering |
| 405 | GUND – SPUTTER THE BEAVER – #1553 – 9″ |
| 406 | Gund 1992 SPUTTER BEAVER w Bouquet & Tags 1553 |
| 407 | Gund 1992 Sputter Beaver White Pink Bouquet Stuffed Animal Plush Rare |
| 408 | H shaft connecting rod g60 steel connecting PG 1h + Connecting Rod Bearing magne… |
| 409 | Hafnium , Hf – Sputtering Target – 99.95% purity |
| 410 | Hafnium Oxide, HfO2 – Sputtering Target – 99.95% purity |
| 411 | Hafnium sputter target 99.99% pure Hf (<0.2% Zr) 2.00″ diam x 0.25″ thk |
| 412 | Hafnium sputter target, 99.9+% pure, 1.50″ diameter x 0.125″ thick |
| 413 | Hafnium/Silicon Hf/Si 1:1 at%, sputter target 4″ diam x 7mm thk, 99.9% pure |
| 414 | Handbook of Sputter Deposition and Technology HCDJ Wasa Hayakawa |
| 415 | Handbook of Sputter Deposition Technology : Fundamentals and Applications for… |
| 416 | Handbook of Sputter Deposition Technology : Fundamentals and Applications for… |
| 417 | Handbook of Sputter Deposition Technology: Fun.. 9781437734836 by Wasa, Kiyotaka |
| 418 | Handbook of Sputter Deposition Technology: Fund, Wasa.= |
| 419 | Handbook of Sputter Deposition Technology: Fundamentals and Applications for |
| 420 | HANDBOOK OF SPUTTER DEPOSITION TECHNOLOGY: PRINCIPLES, By Kiyotaka Wasa VG |
| 421 | Handbook of Sputter Deposition Technology: Principles, Technology and… |
| 422 | Hawaiian Sputter Fuss 2 1/2″ Long 5/8 0z. Yellow with multi color skirt |
| 423 | High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challen… |
| 424 | High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challen… |
| 425 | High Power Impulse Magnetron Sputtering: Fundam, Lundin, Daniel,, |
| 426 | High Purity 99.999% 5N Al Aluminum Sputtering Target Diameter 2” Thick 5mm |
| 427 | High Purity 99.999% 5N Al Aluminum Sputtering Target Diameter 70mm Thick 5mm |
| 428 | High Purity 99.999% 5N Al Aluminum Sputtering Target Diameter 70mm Thick 5mm |
| 429 | High Vacuum Deposition “Sputtering” Coating Machine |
| 430 | High Vacuum Heated Sensor Viewport / RGA Sputtering Analysis |
| 431 | Holmium sputter target Ho 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 432 | Honeywell 0190-20139/D 300mm Sputtering Target AMAT Applied Materials |
| 433 | Honeywell 037-0173-25 Sputtering Target 300mm |
| 434 | HONEYWELL 080796 Sputtering Target 5N5 TI 0437x11625x12555 BPM |
| 435 | HONEYWELL 084795 Sputtering Target 5N Al5Cu 7830x11640x13050 |
| 436 | Honeywell 090113 SPUTTERING TARGET 5N5 Al1Si.5Cu 12.555X11.625X1.600IN |
| 437 | Honeywell Sputtering Products 5N Ti Titanium) Target 20.625X17.478X1.000X0.500IN |
| 438 | Honeywell Sputtering Vectra Coil TSVCTISET-07935 OPENED READ |
| 439 | Honeywell target, M2000 sputtering, 59 Ti, .500X4.460X13.050 inches, PI000-04462 |
| 440 | Honeywell target, M2000 sputtering, 59.5Ti/.5CU, 4.460X11.64X13.050, PI000-05076 |
| 441 | Honeywell target, sputtering, M2000 49.5 Ti,.500X4.460X13.050inches, PI000-04462 |
| 442 | HONEYWELL TSENAL-MOX-06514 Sputtering Target 595AL5Cu 1910x11300x14495 |
| 443 | Honeywell TSQUALWDX-07821 Sputtering Target 59Al/1Cu 7.830×11.640×13.050″ |
| 444 | HOT WHEELS EDITIONS: #92 ’59 CADILLAC #98 ’03 SIDE SPUTTER |
| 445 | Huttinger 1841105-04 PCB TE 1714481 Plasma Sputtering System Trumpf |
| 446 | Huttinger 935416-16 Backplane Interface PCB Plasma Sputtering Trumpf |
| 447 | Huttinger Electronik TIG 30 DCplus Plasma Sputtering Controller Trumpf |
| 448 | Huttinger THE 478052 PCB Plasma Sputtering System Trumpf |
| 449 | Huttinger TIG 10/100 Sputtering Plasma Control Panel |
| 450 | HUTTINGER TIG 10/100P Sputtering Plasma Control Panel |
| 451 | Huttinger TIG 60 DC Plasma Sputtering Controller |
| 452 | Huttinger Trumph TIG 30 DCPLUS 30kW Plasma Sputtering Controller DC Plus kw |
| 453 | Huttinger Trumph TIG 30 DCPLUS 30kW Plasma Sputtering Controller DC Plus kw |
| 454 | IKC Chain Clamp Sanitary Pipe Ultra Low Vacuum Sputtering Deposition Chamber |
| 455 | Inconel 600 Sputter target: Ni/Cr/Fe 99.95% pure 2.00″ dia x 3mm thick |
| 456 | Indium Oxide (In2O3) Sputtering Targets- 99.99% Pure 3.00″ dia x 0.1875″ thick |
| 457 | Indium Tin Oxide (Kurt Lesker) sputtering target 4″ x .125″ thk 99.99% pure |
| 458 | Indium Tin Oxide sputter target: ITO 90/10 99.99% pure, 3″ x 0.1″ bonded to Cu |
| 459 | Indium Tin Oxide, ITO – Sputtering Target – 99.99% purity |
| 460 | Indium, In – Sputtering Target – 99.999% & 99.99% purity |
| 461 | Inficon SQM160-S-2-R Thin Film Deposition Monitor 2-Inputs, RS-232, 120/240VAC |
| 462 | InGaZnO4 – Bonded Target, – Sputtering Target – 99.99% purity |
| 463 | Innotec High Vacuum Batch Sputtering System Chamber |
| 464 | International Scientific Instrument PS-2 Coating unit Sputter Coater |
| 465 | Intevac Vacuum System Division TM-Gun Sputtering Source |
| 466 | Ion Implantation : Sputtering and Their Applications Hardcover P. |
| 467 | ION SPUTTER E1O1O HITACHI |
| 468 | Iron (Fe) Sputtering Targets – 2.00″ Diameter, 0.250″ Thick – Kurt J. Lesker |
| 469 | Iron SEM Sputter target: Fe 99.95% pure, 57mm diameter x 0.5mm thick |
| 470 | Iron SEM Sputter target: Fe 99.95% pure, 63mm diameter x 0.5mm thick |
| 471 | Iron Silicon Boron , FeSiB – Sputtering Target – 99.9% purity |
| 472 | Iron sputter target, 99.95% pure, 3″ diameter x 1mm thick |
| 473 | Iron sputtering target Fe 99.99% 2″ diameter x 0.0625″ thick: ACI ALLOYS |
| 474 | Iron, Fe – Sputtering Target |
| 475 | Jars Sputtering Anode Shields |
| 476 | JEGS – Selection, Value, Lifetime Support Since 1960… |
| 477 | JEOL FINE COAT Ion Sputter JFC 1100 BEAM W OMRON Miny Timer Type SYS |
| 478 | Johnson Matthey Sputtering Target mat’l: 49.5W/10Ti |
| 479 | Julanie Bonfire Stand Sheet Bonfire Sheet Sputtering Sheet Fire Authentic |
| 480 | Junron SP4 Green Sputtering Tube, For Spot Welder 2040 |
| 481 | Junron SP4-08 (GREEN) Sputtering Tube (Tube for Spot Welder) FNFP |
| 482 | Junron SP4-10 Sputtering Tube for Spot Welder |
| 483 | Junron SP4-10 Sputtering Tube for Spot Welder |
| 484 | Junron SP4-10 Sputtering Tube for Spot Welder |
| 485 | Junron SP4-10 Sputtering Tube for Spot Welder USIP |
| 486 | JX Nippon Mining & Metals FNx-000654B Sputtering Target 5N 17 17 |
| 487 | JX Nippon Mining Metals FNX-000544 F Sputtering Target 4N5 T7 17.508″x0.138″ DB |
| 488 | KEYED SHAFT SHAFT TRANSPORT BUFFER PN1001808 22.25 LONG 5/8 SPUTTER TOOL |
| 489 | KFMI 200MM SPTS SPUTTERING AL TARGET AL-0.5%CU (5N5) |
| 490 | KFMI 20CT17224 SPUTTERING AL TARGET 5N TI |
| 491 | KIA wheel ap for 2021 2022 KIA Sorento for 20-inch Sputtering Wheel Rim |
| 492 | Kimball / PHI Vacuum Electrical Feedthrough / Ion-Gun Sputtering 1.33″ CF Mini |
| 493 | KURT j LESKER 1 INCH OXIDE/TIN OXIDE SPUTTER TARGET |
| 494 | Kurt J Lesker Co. Zinc Oxide Sputtering Targets |
| 495 | Kurt J Lesker sputtering target Molybdenum (99.95%) 3″ diameter 0.1250″ THK |
| 496 | Kurt J Lesker sputtering target Ni-Cr target 80-20, 2″ – 0.125″ THK, 99.9% |
| 497 | Kurt J Lesker sputtering target Ni-Cr target 80-20, 3″ – 0.125″ THK, 99.9% |
| 498 | Kurt J Lesker sputtering target N-type doped Si (99.999%) 2″ – 0.250″ THK |
| 499 | Kurt J Lesker sputtering target Silicon Si undoped (99.999%) 2″ – 0.250″ THK |
| 500 | Kurt J. Lesker 108 Sputter |
| 501 | Kurt J. Lesker 750-005-G1 Sputtering Shutter Module Front Load Sensor |
| 502 | Kurt J. Lesker Cobalt Co Sputter Target 99.95% Pure, 4.00″ Dia. x 0.250″ Thick |
| 503 | Kurt J. Lesker Hafnium Hf Sputter Target 99.99% Pure, 3.0″ Dia. x 0.250″ Thick |
| 504 | Kurt J. Lesker Nickel Ni Sputter Target 99.99% Pure, 4.00″ Dia. x 0.250″ Thick |
| 505 | Kurt J. Lesker SILICON DIOXIDE (SiO2} Sputter Target, 3″ X .250 THICK, NOS |
| 506 | L.A. Girl Splatter Nail Lacquer Polish #355 Sputter |
| 507 | LADD MODEL# 30800 SPUTTER COATER |
| 508 | LADD MODEL# 30802 POWER SUPPLY FOR THE SPUTTER COATER |
| 509 | LAM / MRC Materials Research CORP. DC SPUTTER CONTROL PCB, P/N 880-71-000 REV G |
| 510 | Lam Research 15-135892-01 Sputtering Target Pedestal |
| 511 | LAM RESEARCH 715-026923-312A SPUTTERING TARGET HTR/BP ASSY |
| 512 | LAM RESEARCH ECHUCK328 SPUTTERING TARGET, 300MM (PARTS) 839-019090-328 |
| 513 | LAM RESEARCH ECHUCK328 SPUTTERING TARGET, 300MM 839-019090-328 |
| 514 | Lanthanum sputter target (99.9% La/TREM), 1.00″ dia x 0.125″ thick, in oil |
| 515 | Large pure silicon crystal ingot sputtering target polysilicon poly-silicon |
| 516 | Lead sputter target Pb 99.99% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 517 | Leybold / Balzers ZH620 Corona Sputtering System – Fully Operational |
| 518 | Leybold Coolpak 6000 Helium Compressor Removed From Pvd Sputtering Machine Q |
| 519 | LEYBOLD CORONA SPUTTERING SYSTEM ELEVATOR BOARD KHV-02 |
| 520 | LEYBOLD CORONA SPUTTERING SYSTEM ELEVATOR BOARD KHV-02 |
| 521 | LEYBOLD HAEREOUS Z660 DEPOSITION SPUTTERING |
| 522 | Leybold Heraeus z650 6″ Sputtering substrate holder |
| 523 | Leybold INFICON Sputter Discharge Sensor Head |
| 524 | Leybold WEA02 sputtering power supply |
| 525 | Leybold ZV6000 In Line Sputtering System / Dual Sided |
| 526 | Light Gold Sputter Window Tint Film VLT 70% Mirror Reflective Car Glass Anti-UV |
| 527 | Lithium Niobate, LiNbO3 – Sputtering Target – 99.99% purity |
| 528 | LITHIUM SPUTTERING, DEPOSITION AND EVAPORATION: CONTROLLED By Martin J. Neumann |
| 529 | LMO – LaMnO3 Sputtering Target – 99.9% purity |
| 530 | LSMO – La0.7Sr0.3MnO3 Sputtering Target – 99.9% purity |
| 531 | LTS Chemical inc sputtering target carbon (99.999%) 2″ diameter 0.1250″ AA-14 |
| 532 | Magnesium Fluoride, MgF2 – Sputtering Target – 99.99% purity |
| 533 | Magnesium sputter target Mg 99.95% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 534 | MAGNET GUARDMICROWAVE HOVER ANTI-SPUTTERING COVER |
| 535 | MAGNET MICROWAVE GUARD HOVER ANTI-SPUTTERING COVER |
| 536 | Magnetron Dual Head High Vacuum DC / RF Plasma Sputtering Coater CY-600-2HD |
| 537 | Magnetron Sputtering System for Multilayer Film Deposition with 3 S-Gun Cathodes |
| 538 | Main Bearing Big End GLYCO Sputtering Reinforced Audi VW 1.9 TDI AFN AHF ASV AVG |
| 539 | Main Bearings Rod Bearing Axial Bearing magnetrons Racing VW 1,6-2,0 reinforced … |
| 540 | Main Bearings Rod Bearing magnetrons VAG 1,8t 20v reinforced AGU AUM AJQ AEB ANB… |
| 541 | Manganese sputter target, 99.9% pure, 1.0″ diameter x 0.05″ thick |
| 542 | Manganese, Mn – Sputtering Target – 99.9% purity |
| 543 | Manganese/Tellurium sputter target Mn/Te (1:1 at%), 1.5″ diam x 0.15″ thk |
| 544 | Manganese-Germanium, Mn3Ge – Sputtering Target – 99.9% purity |
| 545 | Manganese-Tin, Mn3Sn- Sputtering Target – 99.9% purity |
| 546 | Material Research Corp MRC 603-III Sputtering Chamber 3-Targets on Side |
| 547 | Material Research Corporation Ni Mz Nickel Magnesium Sputtering Target |
| 548 | Material Research Corporation VP Vanadium Sputtering Target |
| 549 | Materials Research Corporation MRC RIE 61 Sputtering System. Ion Etcher |
| 550 | Materials Research Corporation XXB-100 electron beam sputtering system kit |
| 551 | Materion 101119284 Sputtering Target 16×6 Balzers |
| 552 | Materion 99.99% Tantalum Ta 12.98″ x.25″ Sputtering Target AMAT Centura |
| 553 | Materion Al/Cu 0.5% High Purity Sputtering Target, 12.98″ x 0.25″ |
| 554 | Materion Al/Cu 0.5% High Purity Sputtering Target, 12.98″ x 0.25″, |
| 555 | Materion NiFe 14W Sputter Target 10”Dia #US2227245. 553255-10 ZTH8000 NOS |
| 556 | Materion Silicon SI Sputter Target 0001703733 314259 2.9921″ DIA X 0.1969″ |
| 557 | Materion Sputter Target # US1637146. |
| 558 | Materion Titanium Sputtering Target 12.73″ x 1.9″ Purity 99% |
| 559 | MeiVac 2460 Chamber Lid Control Module Vacuum Sputter System |
| 560 | Mill Lane Engineering 4 source load locked with plasma clean sputter system |
| 561 | Mint Condition LEYBOLD CORONA SPUTTERING SYSTEM ELEVATOR BOARD KHV-02 |
| 562 | MKS ENI DCG-100 DC sputtering power supply. Master |
| 563 | Moly Chrome sputter target: Mo/Cr 85:15 at%, 2.00″ dia x 0.25″ thick, 99.9% pure |
| 564 | Molybdenum (Mo) sputter target, 99.99% pure 1.7″ diam x 0.125″ thick |
| 565 | Molybdenum Chrome sputter target MoCr 95/5 99.95% 3″ diameter x 0.25″ thick |
| 566 | Molybdenum di sulfide, MoS2 – Sputtering Target – 99.5% purity |
| 567 | Molybdenum silicide-Sputter Target – 99.5% |
| 568 | Molybdenum sputter target, Mo 99.95% 2″ diameter x 0.25″ thick |
| 569 | Molybdenum sputter target, Mo 99.95% pure, 1.5″ diameter x 0.25″ thick |
| 570 | Molybdenum trioxide, MoO3 – Sputtering Target – 99.99% purity |
| 571 | Molybdenum, Mo – Sputtering Target |
| 572 | MRC 20-555B-NB000-9000 NIOBIUM 99.8 RMX12 ASSY Sputtering Target Plate |
| 573 | MRC 5″ Stainless Steel ZINC Backing Plate, 808-03-005 Sputtering Target |
| 574 | MRC 500354-00 Belt, Timing .5W X15 Long Sputtering Tool |
| 575 | MRC 500665-00 Pin, Arm First, Sputtering Tool |
| 576 | MRC 500670-00 Bearing, Thrust Sputtering Tool |
| 577 | MRC 500676-00 Bearing Sputtering Tool |
| 578 | MRC 500681-00 Thermostat, Tempswitch Sputtering Tool |
| 579 | MRC 500691-00 Standoff, Vented Sputtering Tool |
| 580 | MRC 500737-00 Bearing, Arm (Elbow) Sputtering Tool |
| 581 | MRC 6.5 In Magnetron Sputter Cathode |
| 582 | MRC 808-88-100 NI/FE19% Mounted 6″ x 0.25″ TH Sputtering Target |
| 583 | MRC 828-04-200 VP Nickel 15″ x 4.75″ x 0.25″ Sputtering Target |
| 584 | MRC A114265 Quad 1000 RF Deck Sputter Power Supply 3500 VDC Eimac SK-4063-500Z |
| 585 | MRC Materials Research A115015 Sputtering System Remote Stand Rev. C |
| 586 | MRC Materials Research A120024 Sputtering System Remote Stand Eclipse Star |
| 587 | MSDS Materion Cr Chromium 99.95% 4″ Dia x 0.25″ Sputtering Target Plate |
| 588 | MTI Corporation GSL-1100X-SPC-12 Compact Plasma Sputtering Coater |
| 589 | MURRAY CLUTCHBURN #92 SPUTTER STOP DISNEY PIXAR CARS 3 2016 SCALE 1:55 |
| 590 | Muto Technology MT-49963 Sputter # 2/3 Cu Shield Kit 6″ 150mm Copper |
| 591 | MXL 910 Microphone MIC w/ Gold-sputter 6-micron diaphragm |
| 592 | Neodymium sputtering target Nd 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 593 | Nickel Moly Ni85Mo15 wt% sputter target- 1″ diameter x 0.25″ thick, 99.95% pure |
| 594 | Nickel Ni sputtering target- 99.99% pure 3.00″ diameter x 0.25″ thick |
| 595 | Nickel Oxide (NiO) Sputtering Target- 99.98% Pure 3.00″ dia x 0.125″ thick |
| 596 | Nickel SEM Sputter target: Ni 99% pure, 54mm diameter x 0.05mm thick |
| 597 | Nickel SEM Sputter target: Ni 99% pure, 57mm diameter x 0.025mm thick |
| 598 | Nickel SEM Sputtering target: Ni 99.9% pure, 57mm diameter x 0.25mm thick |
| 599 | Nickel sputtering target- 99.99% pure 2.00″ diameter x 0.125″ thick |
| 600 | Nickel sputtering target, 99.9% pure Ni, 3.00″ diameter x 0.125″ thick |
| 601 | Nickel sputtering target: 99.98% pure Ni, 1.00″ diameter x 0.25″ thick |
| 602 | Nickel Sulfide, Ni3S2- Sputtering Target – 99.5% purity |
| 603 | Nickel Titanium Ni/Ti 1:1 at% sputtering target: 2.0″ dia x 0.17″thk 99.99% pure |
| 604 | Nickel Vanadium(93:7 wt%), Ni-V – Sputtering Target – 99.95% purity |
| 605 | Nickel, Ni – Sputtering Target – 99.99%, 99.999% purity |
| 606 | Nickel-titanium sputter target: Ni/Ti 50/50 at%, 3″ dia x 1/4″ thk |
| 607 | Niobium 99.95% pure SEM sputter target, 57mm diameter x 0.5mm thick |
| 608 | Niobium Nb sputtering target: 3.99″ dia x 0.25″ thick 99.95% pure |
| 609 | Niobium Selenide, NbSe – Sputtering Target – 99.9% purity |
| 610 | Niobium sputtering target Nb 99.99% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 611 | Niobium Sputtering target: Nb 99.95% pure, 63mm diameter x 0.2mm thick |
| 612 | Niobium Titanium Nb/Ti 80/20 wt% sputter target: 3″ dia x 5mm thk 99.95% pure |
| 613 | Niobium, Nb – Sputtering Target – 99.95% purity |
| 614 | Nitoms Colo body floor Clean SC sputtering and expire adjustable length [26cm ~ |
| 615 | No Name Copper Unbranded Sputter Sputtering Target 4FC5297 001 18MM ID |
| 616 | NORDIKO A08759 HEATER ASSEMBLY ~ 9606 METAL FILM PVD SPUTTERING COATING |
| 617 | Nordiko D00019 Platform Low Tension DC Power Supply 9550 PVD Sputtering |
| 618 | Nordiko D00021 Platform Low Tension DC Power Supply 9550 PVD Sputtering |
| 619 | Nordiko MAG AMP Rotating Magnet Amplifier Controller 9550 PVD Sputtering |
| 620 | Nordiko RF Viewport Shield CF160 Sputtering System |
| 621 | Nordiko RF Viewport Shield Sputtering System |
| 622 | Nordiko RF Viewport Shield Sputtering System @ 4″x4″ |
| 623 | Nordiko Rotating Magnet Drive Controller Copley 423 9550 PVD Sputtering |
| 624 | Nordiko Rotating Magnet Power Supply Copley TR239-45 9550 PVD Sputtering |
| 625 | Nordiko Sputtering System Fast Shutter Actuator W/ Spinea Gear NTS00357 |
| 626 | Nordiko Sputtering System PC Board Controller N600599EE |
| 627 | Novellus 00-672232-00 Turnbuckle Assy. For 3000 Series Sputter System |
| 628 | NOVELLUS 04-710723-05 REV M RF MAGNETRON 17-116776-00 RADIO FREQUENCY SPUTTERING |
| 629 | NRC Sputtering Chamber with Varian SD-700 Vacuum Pump – Cracked Jar |
| 630 | Oerlikon Sputtering System Motor Drive W/cooling Plate 10068415 |
| 631 | OMP MAESM1AB Sputter Unit Interface MAE-SM1AB Control Board MAE SM1AB |
| 632 | OMP MAESM40A SPUTTER UNIT HV |
| 633 | OMP Maesm40A Sputter Unit HV with Maesm60A Sputter IGBT |
| 634 | Oryx Anelva Disposable Sputter Shield 215mm ANL62828 |
| 635 | ORYX Sn Zn AI Sputtering Target .375″x4.75″x14.875″ |
| 636 | ORYX Sn Zn Sputtering Target .375″x4.75″x14.875″ 65SN 35Zn nwt% |
| 637 | Osmium sputter target Os 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS, about 275g |
| 638 | OXFORD PLASMALAB SYSTEM 400 SPUTTER COATER |
| 639 | P5000 SPUTTER Process Kit. AMAT, |
| 640 | Palladium SEM Sputter target: Pd 99.99% pure, 57mm diameter x 0.1mm thick |
| 641 | Palladium sputtering target Pd 99.95% 2″ diameter x 1mm thick: ACI ALLOYS |
| 642 | Pella Pelco SC-7 Auto Sputter Coater Sputtering System (Ted Pella 7002) |
| 643 | Perkin Elmer 4400 Sputtering System |
| 644 | Perkin Elmer 4450 Sputtering PVD Tool Delta Target, Cryo Compressor, Vacuum pump |
| 645 | Perkin-Elmer 221-659-200 Pumpdown Control Gauge For 4450 Sputter System |
| 646 | Perkin-Elmer 4400 221-201-100 Auto Pumpdown Control Gauge Sputter System |
| 647 | Perkin-Elmer Sputtering system model 3140 |
| 648 | PERKIN-ELMER ULTEK AUTO PUMPDOWN CONTROL GAUGE SPUTTER |
| 649 | Permalloy, Ni:Fe – Sputtering Target – 99.95% purity |
| 650 | Pfeiffer Vacuum Classic 590 Evaporator PVD Sputtering system |
| 651 | Planar Magnetron Sputtering Magnet Sierra Applied Sciences Patent #5,262,026. |
| 652 | Planar Magnetron Sputtering Magnet Sierra Applied Sciences Patent #5,262,026. |
| 653 | Planar Magnetron Sputtering Magnet Sierra Applied Sciences Patent #5,262,028 |
| 654 | Plasma Sputtering Coater with Vacuum Pump Gold Target |
| 655 | Plasma Sputtering Coater with Vacuum Pump, Gold Target |
| 656 | plasmaterials lithium cobalt oxide sputter target LiCoO2 vacuum deposition |
| 657 | Plasmaterials Vanadium Sputtering Target 13.7″ x 0.4″ Purity 99.5% |
| 658 | Plasmionique FLR 300-TT Plasma Sputter Coater Etching |
| 659 | Platinum SEM sputter target Pt 99.99% 63mm diameter x 0.3mm thick: ACI ALLOYS |
| 660 | Platinum SEM Sputter target: Pt 99.99% pure, 57mm diameter x 0.1mm thick |
| 661 | PMN-PT – Sputtering Target – 99.9% purity |
| 662 | POLARON E6300 SPUTTER COATER SPUTTERING SYSTEM FISONS COATING CONTROL PANEL |
| 663 | POLARON E6300 SPUTTER COATER SPUTTERING SYSTEM FISONS POWER CONTROL PANEL |
| 664 | POLARON E6300 SPUTTER COATER SPUTTERING SYSTEM FISONS VACUUM CONTROL PANEL |
| 665 | Polaron Range Sputter Coater |
| 666 | Polaron Range Sputter Coater |
| 667 | Praxair Ceramics Ba-Sr-Ti-Zr 8″ Sputtering Target soldered to Backing Plate 413 |
| 668 | Praxair Ceramics Sputtering Target Ba-Sr-Ti-Nb Oxide 99.9% 8″x 0.25″ (3163) |
| 669 | Praxair Ceramics Sputtering Target Ba-Sr-Ti-Y Oxide 99.99% 10″x0.25″ (3131) |
| 670 | PRAXAIR MRC 20-555B-MO000-300 MO MOLYBDENUM Sputtering Target Plate |
| 671 | PRAXAIR MRC MRCGTI0009678 TI TITANIUM Sputtering Target Plate |
| 672 | Praxair Sputtering Target Barium Strontium Ti-Y Niobium Oxide 99.99% |
| 673 | Pulsed and Pulsed Bias Sputtering: Principles a, Barnat, Edward,, |
| 674 | Pulsed and Pulsed Bias Sputtering: Principles and Applications |
| 675 | Pulsed And Pulsed Bias Sputtering: Principles And Applications |
| 676 | Pulsed And Pulsed Bias Sputtering: Principles And Applications |
| 677 | Pulsed And Pulsed Bias Sputtering: Principles And Applications Barnat Lu |
| 678 | Pulsed and Pulsed Bias Sputtering: Principles and Applications, Barnat, Lu-, |
| 679 | PURE TECH Chromium/Titanium Cr/Ti 20%, at% 44093.0/01/1 Sputtering Target |
| 680 | Pure Tech Sputtering Target – Al/Cu 4%, wt% – 2″ Dia – 1/4″ Thick – 99.99% Pure |
| 681 | Pure Tech Sputtering Target – Zinc – 2″ Dia – 1/8″ Thick – 99.995% Pure |
| 682 | PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing: |
| 683 | Quantum Cleaned 4″ Glass For Viewport UHV Sputtering |
| 684 | Quartz sputtering target: SiO2 99.995%, 3.00″ diameter x 0.25″ thick |
| 685 | quartz substrate heaters for vacuum evaporator or sputtering systems |
| 686 | QUORUM EMITECH K550 FULLY AUTOMATIC SPUTTER COATER SPUTTERING SYSTEM |
| 687 | Quorum Sputter Coater Q150R-ES with Edwards RV5 Pump silver Target |
| 688 | Quorum Tech/Emitech K250 Sputter Coater System Controller |
| 689 | Quorum/Polaron SC7640 Auto/Manual High Resolution Sputter Coater |
| 690 | Race Motorsport rotary connecting rod 5zyl. s2 rs2 s4 s6 2,2 ADU 3b ADY RR aan |
| 691 | Race Motorsport Sputtering Big End Bearings 5Zyl. S2 RS2 S4 S6 2,2 Adu 3B Ady RR |
| 692 | RARE Disney Pixar The World of Cars Sputter Stop + Gasprin |
| 693 | RARE MISPRINT Disney Store CARS 2006 Doc Hudson Talking Car Sputtering Action |
| 694 | Rare Varian Sputtering Power Supply Kilowatt Meter Type VPW2871B2 |
| 695 | Reactive Sputter Deposition by Diederik Depla |
| 696 | Reinforced BIG END BEARINGS Sputtering GLYCO VW 2,5L TDI LT28 T4 Transporter |
| 697 | Reinforced Connecting Rod Sputtering VAG 1,8T 20V Agu Aum Ajq Aeb ANB App Bam |
| 698 | Reinforced Motorsport rotary connecting Rod Bearings Glyco VW 16v g60 1,8t 2,0 T… |
| 699 | Reinforced Motorsport Sputtering Connecting Rod GLYCO VW 16V G60 1,8T 2,0 Turbo |
| 700 | Reinforced Rod Bearings magnetrons GLYCO VW 2,5l TDI lt28 t4 Transporter AXG ACV… |
| 701 | Reinforced Rod Bearings magnetrons VAG 1,8t 20v AGU AUM AJQ AEB ANB APP BAM BFV … |
| 702 | Research DYNAMO! 2″ RF sputtering thin film deposition system coater + 9 TARGETS |
| 703 | Rhenium sputtering target Re 99.95% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 704 | Riber Vacuum Pressure Gauge – Sputtering |
| 705 | RON HAWKINS (90’S) – SPIT SPUTTER SPARKLE CD |
| 706 | Rotary Connecting Rod & Main Bearing VW AUDI 16v g60 1,8l 1,8t 20v 2,0 PG 2e AEB |
| 707 | Rotary Connecting Rod & MAIN BEARINGS & THRUST WASHERS 16V G60 1,8T 2,0 PG 2E AE… |
| 708 | Rotary Connecting Rod Bearing kolbenschmidt BMW 4 Cylinder 2,0 2,0 D n47d20 116d… |
| 709 | Rotary Connecting Rod Bearing KS BMW 6 Cyl. N57D30 B57D30 Alpina 3er 5er X3 X4 X… |
| 710 | Rotary Connecting Rod Bearings Glyco BMW 4 Cyl. 6 Cyl. n47d20 n57d30 |
| 711 | Rotary Connecting Rod Bearings Glyco BMW 4 Cylinder 2,0 D n47d20 116d 118d 120d … |
| 712 | Round 4” Sputtering Target Titanium Aluminum |
| 713 | Ruthenium (RU) Target Sputter 224μm |
| 714 | Ruthenium 99.9% pure SEM sputter target, 57mm diameter x 0.75mm thick |
| 715 | Ruthenium sputtering target Ru 99.95% 2″ diameter x 0.125″ thick: ACI ALLOYS |
| 716 | Ruthenium, Ru – Sputtering Target -99.95% |
| 717 | Ruthenium, Ru – Sputtering Target -99.95% |
| 718 | Samarium sputtering target, 99.9%, 2″ diameter x 0.25″ thick |
| 719 | Scandium sputter target: 4.00″ diameter x 0.125″ thick, 99.995% pure |
| 720 | Scandium sputtering target Sc 99.99% 2″ diameter x 0.125″ thick: ACI ALLOYS |
| 721 | Selenium sputtering target Se 99.999% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 722 | SEM Gold Au Sputtering Target: 99.99% Pure 57mm D x 0.1mm Thick Cutomizable |
| 723 | SEM Silver Ag Sputtering Target: 99.99% Pure,57mm D x 0.1mm Thick Customizab |
| 724 | SEM Sputter Coater PS3 Unit, Polaron PS100 Power Supply & Gold Carbon Applicator |
| 725 | Sencera In-line Sputter 6 target large panel DC power supply vacuum & Turbo pump |
| 726 | SHIBAURA Sputtering Machine Power Supply STELLA 200 |
| 727 | Si sputtering target Silicon pure undoped (99.999%) 2″ diameter x 0.070″ thick |
| 728 | Silicon (N & P Types) Sputtering Targets, 3″ D x 0.125″ thick, 99.999% pure |
| 729 | Silicon alloy sputter target Si: 4.75 x 22.0″ x 0.25″ |
| 730 | Silicon and carbon Sputtering Target, 3″ D x 0.250″ thick, |
| 731 | Silicon B-doped, 5N 18” x 3.5” x 0.250” Sputtering Target, Bonded Cu BP/I |
| 732 | Silicon Carbide N Type Sputtering Target, 3″ D x 0.125″ thick, 99.9% pure |
| 733 | Silicon Carbide N Type Sputtering Target, 3″ D x 0.25″ thick, 99.9% pure |
| 734 | Silicon Carbide N Type Sputtering Target, 3″ D x 0.375″ thick, 99.9% pure |
| 735 | Silicon Carbide Sputtering Target, 3″ D x 0.125″ thick, 99.5% |
| 736 | Silicon Carbide Sputtering Target, 3″ D x 0.125″ thick, 99.9% pure |
| 737 | Silicon Carbide Sputtering Target, 3″ D x 0.125″ thick, 99.9% pure |
| 738 | Silicon Carbide Sputtering Target, 3″ D x 0.25″ thick, |
| 739 | Silicon Carbide Sputtering Target, 3″ D x 0.25″ thick, |
| 740 | Silicon Carbide Sputtering Target, 3″ D x 0.255″ thick, |
| 741 | Silicon Carbide Sputtering Target, N 3″ D x 0.125″ thick, 99.5%-slightly chipped |
| 742 | Silicon Carbide, SiC, sputtering target, 3″ D x 0.250″ thick, N-Type |
| 743 | Silicon dioxide, SiO2 – Sputtering Target – 99.99% purity |
| 744 | Silicon Germanium Sputtering Target, 3.00″ D x 0.25″ thick, 99.999% pure |
| 745 | Silicon Germanium, SiGe sputtering targets, 3″ D x 0.125″ thick, 99.999% pure |
| 746 | Silicon Indium Zinc Oxide sputter target 99.9% 3″ dia x 0.2″ thick, bonded to Cu |
| 747 | Silicon Nitride Si3N4 sputtering target 99.5% 3″ diameter x 0.125″ thick |
| 748 | Silicon Nitride, Si3N4 – Sputtering Target |
| 749 | Silicon Nitride, Si3N4 sputtering target, 3″ D x 0.125″ thick, 99.9% pure |
| 750 | Silicon sputtering target Si 99.9999% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 751 | Silicon Sputtering Target, 2.950″ D x 0.125″ thick, 99.999% pure |
| 752 | Silicon Sputtering Target, 3″ D x 0.125″ thick, 99.999% pure |
| 753 | Silicon Sputtering Target, 3.00″ D x 0.25″ thick, 99.999% pure |
| 754 | Silicon, Si – Sputtering Target – 99.999% purity |
| 755 | Silve Target for MNT-JS1600 Plasma Sputtering Coater 50mm dia x 0.5mm (99.99%) |
| 756 | Silver SEM Sputter target: Ag 99.99% pure, 54mm diameter x 0.1mm thick |
| 757 | Silver SEM Sputter target: Ag 99.99% pure, 57mm diameter x 0.1mm thick |
| 758 | Silver SEM Sputter target: Ag 99.99% pure, 57mm diameter x 0.25mm thick |
| 759 | Silver, Ag – Sputtering Target – 99.999% & 99.99% purity |
| 760 | Singulus S-III / Skyline sputter cathode, PVD coating tool, 163 mm diam. target |
| 761 | Slotted Glass Chamber for Ladd Sputter Coater – 3.8″ Long x 2.9″ Diameter #4210 |
| 762 | Small Aluminum Vacuum Chamber 18 by 10″ overall “Sputter Target”? Assembly |
| 763 | small desk type magnetron sputtering apparatus with controllable sputtering powe |
| 764 | SMC SPUTTER CHAMBER MTS32-P2168-40 |
| 765 | Solar Applied Materials Aluminum Al Sputtering Targets 171mm X 15mm, 850 Grams |
| 766 | Solar Module inline sputteranlage Leybold OPTICS H3200 Coater sputtering |
| 767 | Solyndra 0141-30380, DC Gen 3-Target Intcon Cable 28FT for Sputtering System |
| 768 | Solyndra 0141-30549, 2 Splitter Cables to 4 each for PWR & TC Dist Sputtering HT |
| 769 | Spark Plug f3cs Bosch Motorsport 1,8t 16v Turbo s3 c20let s2 rs2 s4 vr6 Turbo |
| 770 | SPI Sputtering Coater Model 12121 |
| 771 | SPI Sputtering Coater Model 12121 Sputter |
| 772 | SPI Supplies Module Controls Vacuum Base 11425 Sputter and Carbon Coater |
| 773 | Splatter Guard Microwave Hover Anti-Sputtering Vent Cover clear with magnets |
| 774 | Spring Handle Welding Chipping Hammer Weld Slag Buster Sputter |
| 775 | Sputter Cathode for Unaxis Twister CD Metalizer |
| 776 | Sputter Chamber 12″ Target, PVD, Wafer Processing, 943-2, 302401, Backing Plate |
| 777 | Sputter Chamber 12″ Target, PVD, Wafer Processing, 943-2, 302401, Backing Plate |
| 778 | SPUTTER COATER MOTORIZED ROTATIONAL STAGE |
| 779 | SPUTTER PIPE |
| 780 | Sputter Stop No. 92 Piston Cup 2013 Disney Pixar Cars 2 diecast Mattel VHTF! |
| 781 | SPUTTER STOP NO. 92, 1/55 SCALE, DISNEY PIXAR CARS, PISTON CUP |
| 782 | SPUTTER STOP No.92 – PISTON CUP – 15 of 18 – DISNEY PIXAR CARS |
| 783 | SPUTTER TABLE CHUCK SQT-0054 OSR24544 |
| 784 | Sputter Target Aluminum for Singulus III Focus Cathode 3231001 |
| 785 | Sputter target: Chromium/Nickel Cr/Ni 60/40 wt% 6.00″ dia x 0.25″ thk, 99.99% |
| 786 | Sputter target: Si3N4 99.5% pure, 1.0″ diameter x 0.125″ thick, bonded to copper |
| 787 | Sputter Vacuum Chamber Assembly 14″ 300mm with Industrial Devices CVC001 Drive |
| 788 | Sputtering Big End Bearings KOLBENSCHMIDT BMW 4 Cylinder 2,0 D N47D20 116D |
| 789 | Sputtering Big End Bearings Ks BMW 6 Cylinder N57D30 B57D30 Alpina 3er 5er X3 X4 |
| 790 | SPUTTERING BY PARTICLE BOMBARDMENT I: PHYSICAL SPUTTERING By R. Behrisch |
| 791 | Sputtering by Particle Bombardment I: Physical Sputtering of Single-Element… |
| 792 | Sputtering by Particle Bombardment Ii: Sputtering of Alloys and Compounds, Elect |
| 793 | Sputtering By Particle Bombardment: Experiments And Computer Calculations F… |
| 794 | Sputtering by Particle Bombardment: Experiments and Computer Calculations f… |
| 795 | SPUTTERING EVAPORATION TARGET Co Cr Ta TANTALUM METAL |
| 796 | Sputtering Materials for VLSI and Thin Film Devices |
| 797 | Sputtering of Ammonite Spitoniceras with Pyrite and Cretaceous Symbircite 130mln |
| 798 | Sputtering Sheet Bonfire Sheet Heat Flameproof Bonfire Table La Authentic |
| 799 | sputtering target Molybdenum (Mo) 99.9% 2″ diameter 0.02″ AA-16 |
| 800 | sputtering target NiSi 2/1 at% 2″x.110 |
| 801 | Sputtering Target Silicon Dioxide (SiO2) Diameter:3 inch Thick:0.5 inch:4 pcs |
| 802 | sputtering target Zn/Cu (50:50 at% 99.99%) 2″ diameter 0.1250″ AA-10 |
| 803 | sputtering target ZnO/Cu2O (50:50 MOL% 99.95%) 2″ diameter 0.1250″ AA-11 |
| 804 | sputtering target, Al 2″x.250″ |
| 805 | Sputtering Target, AlCu 99/1 2″x.250″ |
| 806 | Sputtering Target, AlMn 50/50 at% 2″x.125″ |
| 807 | Sputtering Target, AlNd 97/3 wt% 2″x.250″ |
| 808 | sputtering target, AlNd 98/2 wt% 2″x.250″ |
| 809 | Sputtering Target, AlNi 22.3/77.7 wt% 2″x.200″ |
| 810 | Sputtering Target, AlTi 96.5/3.5 wt% 2″x.125″ |
| 811 | Sputtering Target, Aluminum (Al) 2″x.250″ |
| 812 | sputtering target, BiIn 10/1 at% 2″x.150″ |
| 813 | Sputtering Target, BiIn 4/1 at% 2″x5mm |
| 814 | sputtering target, Chromium (Cr) 2″x.250″ |
| 815 | Sputtering Target, CoAl 1/1 at% 2″x.250″ |
| 816 | Sputtering Target, CoFe 80/20 wt% 2″x.040″ |
| 817 | Sputtering Target, CoFe 90/10 at% 2″x3mm |
| 818 | sputtering target, CoFe 95/5 at% 2″x.145″ |
| 819 | Sputtering Target, CoFe 95/5 at% 2″x.145″ |
| 820 | Sputtering Target, CoFeAl 2/1/1 2″x.125″ |
| 821 | Sputtering Target, CoFeB 21/51/28 at% 2″x.125″ |
| 822 | Sputtering Target, CoGd 95/5 wt% 2″x.175″ |
| 823 | Sputtering Target, CoNi 20/80 at% 2″x.120″ |
| 824 | Sputtering Target, CoNi 20/80 at% 2″x.150″ |
| 825 | Sputtering Target, CoNi 55/45 2″x.240″ |
| 826 | sputtering target, CoTi 1/1 at% 2″x.250″ |
| 827 | sputtering target, CoTi 1/1 at% 2″x.250″ |
| 828 | sputtering target, Cr 2″x.250″ |
| 829 | sputtering target, FeAl 96.5/3.5 2″x.090 |
| 830 | Sputtering Target, FeAl 96.5/3.5 2″x.090″ |
| 831 | Sputtering Target, FeAl 96/4 at% 2″x.090″ |
| 832 | Sputtering Target, FeAl 96/4 at% 2″x.090″ |
| 833 | Sputtering Target, FeAl 97.5/2.5 2″x.090″ |
| 834 | sputtering target, FeB 7/3 at% 2″x.125″ |
| 835 | Sputtering Target, FeCo 65/35 at% 2″x.235″ |
| 836 | Sputtering Target, FeMo 85/15 at% 2″x.120″ |
| 837 | sputtering target, FeTb 30/70 wt% 2″x.120″ |
| 838 | sputtering target, GeTe 1/1 at% 2″x.125″ |
| 839 | sputtering target, MnGa 50/50 at% 2″x.125″ |
| 840 | Sputtering Target, MoCr 85/15 at% 2″x.250″ |
| 841 | Sputtering Target, NbTi 70/30 wt% 2″x.060″ |
| 842 | Sputtering Target, Ni 2″x.125″ |
| 843 | sputtering target, Ni/Ti 10/90 wt% 2″x.250″ |
| 844 | sputtering target, NiFe 50/50 wt% 2″x.228″ |
| 845 | Sputtering Target, NiFe 50/50 wt% 2″x.228″ |
| 846 | Sputtering Target, NiFe 7/3 at% 2″x.125″ |
| 847 | sputtering target, NiFe 79/21 at% 2″x.125″ |
| 848 | Sputtering Target, NiFe 79/21 at% 2″x.125″ |
| 849 | sputtering target, NiSi 2/1 at% 2″x.110″ |
| 850 | sputtering target, NiTi 10/90 wt% 2″x.250 |
| 851 | Sputtering Target, NiTi 10/90 wt% 2″x.250″ |
| 852 | sputtering target, NiTi 25/75 wt% 2″x.250″ |
| 853 | sputtering target, NiTi 25/75 wt% 2″x.250″ |
| 854 | Sputtering target, NiTi 50/50 at% 2″x.170″ |
| 855 | sputtering target, NiTi 50/50 at% 2″x.170″ |
| 856 | Sputtering Target, NiTi 50/50 at% 2″x.170″ |
| 857 | Sputtering target, Yttrium 2″x.063″ |
| 858 | sputtering target, ZnAl 98/2 wt% 2″x.250″ |
| 859 | STD 77218600 BMW M57 D30/25 M51 D25 M21 D25/24 SPUTTER big end con rod bearing |
| 860 | Steag FLT Unijet metalizer lid for sputter metalizer |
| 861 | Steel Connecting Rod GENUINE k1 + Connecting Rod Range 1,8t 20v s3 BAM AMK 144mm… |
| 862 | Steem-Up 3″ Steam Iron Cleaner Cleans Clogged Iron Stop Sputtering Lot 2 |
| 863 | Strontium Ruthenate, SrRuO3 – Sputtering Target |
| 864 | Strontium Ruthenium Titanate – Sputtering Target – 99.9% purity |
| 865 | Sun Surface Technology Sputtering Platform 18 inch 15-293699-00 |
| 866 | Ta2O5 99.9% pure sputter target, 90mm diameter x 12.5mm thick |
| 867 | Tantalum 99.95% sputter target, 60mm diam 5mm thick with step Sputtering target |
| 868 | Tantalum Pentoxide (Ta2O5) 99.9% Pure Sputter Target, 3″ Dia x 0.1875″ Thick |
| 869 | Tantalum pentoxide, Ta2O5 – Sputtering Target – 99.99% purity |
| 870 | Tantalum sputter target, Ta 99.95% pure, 1.5″ diameter x 0.25″ thick |
| 871 | Tantalum sputtering target 2.00″ diameter x 0.25″ thick- 99.95% pure Ta |
| 872 | Tantalum sputtering target 3.00″ diameter x 0.250″ thick- 99.95% pure |
| 873 | Tantalum sputtering target: 2.00″ diameter x 0.125″ thick- Ta 99.95%. ACI ALLOYS |
| 874 | Tantalum, Ta – Sputtering Target |
| 875 | Target Materials, Inc. Silicon Sputtering Target, 1.3″(dia)x0.125″(thick),99.999 |
| 876 | Target Materials, Inc. Tin (Sn) Sputtering Target, 1″(dia)x0.25″(thick),99.999% |
| 877 | Target Sputtering Desiccant Beads |
| 878 | TARGET,TK8859, Gold sputter target-K575X Emitech Products 99.99 |
| 879 | Technics Hummer HUM V Vent System Sputtering System SEM Sputter |
| 880 | Technics Hummer HUMMER Sputtering SEM Sputter PLATE ETCH SWITCH ASSEMBLY |
| 881 | TECHNICS HUMMER III SPUTTERING SYSTEM_AS-PICTURED_GREAT DEAL_FCFS |
| 882 | Technics Hummer Sputtering System High Voltage Process Control Unit |
| 883 | Technics Hummer V Sputtering System Sputter Coater AS-IS |
| 884 | Technics SSEM Sputtering Series 4, coater, Omron E5C4 |
| 885 | TEL / MRC SPUTTER 150 MM DAMPING RING, CLEANED, P/N 500006 |
| 886 | TEL / MRC SPUTTER 150 MM PART P/N 9000036 |
| 887 | TEL Tokyo Electron D125181-150SP Shield CR Wafer Holder Sputter Coated |
| 888 | Tellurium Metal, Sputtering Target Pieces, 99.999% (Trace Metals Basis), 100g |
| 889 | Tellurium Metal, Sputtering Target Pieces, 99.999% (Trace Metals Basis), 10g |
| 890 | Tellurium sputter target, 3″x 1/8″ thick, 99.999%, bonded for Meivac gun |
| 891 | Tellurium sputtering target, 2″x 1/4″ thick, 99.999% |
| 892 | Temescal 0101-8572-2 Model FCS-3200 Fast-Cycle Load-Lock Sputter System Manual |
| 893 | Temescal 0101-8572-2 Model FCS-3200 FastCycle Load-Lock Sputtering System Manual |
| 894 | Temescal Airco SC-3200 Sputtering Controller |
| 895 | Temescal Airco SC-3200 Sputtering Controller |
| 896 | Temescal Model BJE2400 Automatic R-F Sputter ETCH System Manual |
| 897 | Terbium sputtering target: Tb 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 898 | Testbourne Ltd Nickel Ni Sputter Target 99.99% Pure 3.00″x 0.25″Thick |
| 899 | The item is listed as a Top Rated Plus item Top Rated Plus |
| 900 | The item is listed as a Top Rated Plus item Top Rated Plus |
| 901 | TiAL 33/67 0025487c – Sputtering Target – 99.7% purity 160 x 12 mm |
| 902 | Tin – Sputtering Target – 99.99% purity |
| 903 | Tin Oxide (SnO2)) Sputtering Target, 76.2mm dia x 4.5mm thick |
| 904 | Tin Oxide- Sputtering Target |
| 905 | Tin SEM Sputtering target: Sn 99.99% pure, 57mm diameter x 0.5mm thick |
| 906 | Tin sputtering target Sn 99.995% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 907 | Tin/Aluminum 93.5/6.5 wt% sputter target, 2.92″ dia x 5mm, on Angstrom backer |
| 908 | Tin/Titanium sputter target:1:4 atomic, 99.99%, 3.00″ diameter x 0.25″ thick |
| 909 | Titanium Boride sputter target TiB2 99.5%, 2.0″ diameter x 0.25″ thick |
| 910 | Titanium Nitride High-Purity Sputter target: TiN 99.9%, 3″ dia x 0.125″, bonded |
| 911 | Titanium Oxide- black, TiOx- Sputtering Target – 99.99% purity |
| 912 | Titanium Selenide, TiSe2- Sputtering Target |
| 913 | Titanium SEM Sputtering target: Ti 99.995% pure, 57mm diameter x 0.1mm thick |
| 914 | Titanium SEM Sputtering target: Ti 99.995% pure, 63mm diameter x 0.1mm thick |
| 915 | Titanium sputter target 1″ diam x 0.125″ thick (1.3″ or 1.5″ diam also in stock) |
| 916 | Titanium sputter target 99.995% pure, 3″ diameter x 0.25″ thick |
| 917 | Titanium sputter target: Perkin-Elmer 200mm Delta: Ti 99.995% pure, 0.25″ thick |
| 918 | Titanium sputtering target 99.995% pure, 3.0″ diameter x 0.125″ thick |
| 919 | Titanium Sputtering Target Dia 80mm (3.15″) Width 60mm (2.36″) Purity 99.9% |
| 920 | Titanium sputtering target Grade II 8.00″ dia. x 0.25″ thick w/ copper backplate |
| 921 | Titanium Sputtering Target, 99.995%, 250mm Diameter x 6mm Thickness, by Atomergi |
| 922 | Titanium Target for Sputtering – 2.00″ Diameter, 0.250″ Thick – Kurt J. Lesker |
| 923 | Titanium, 99.995%, 18” x 3.5” x 0.250” Sputtering Target |
| 924 | Titanium-Tungsten, TiW- Sputtering Target – 99.99% purity |
| 925 | Ti-tungsten sputtering target, W/Ti 90/10 wt%, 99.99% 3″ diameter x 0.25″ thick |
| 926 | Ti-tungsten sputtering target, W/Ti 90/10 wt%, 99.99% pure, 2″ dia x1/4″ thick |
| 927 | TMD 8104 7678 / 81047678, ZnO/AL2O3 2wt% sputtering target, planar target |
| 928 | TMI Target Materials Inc Zirconium Zr Sputter Target 2.990″ Dia. x 0.25 Thick |
| 929 | Tokyo Electron Limited / TEL Model: D124680-150 Sputter Shield |
| 930 | TORIBE Scissors Kitchen Sputter Scissors KS-203 Dishwasher OK Japan F/S |
| 931 | Toribe Scissors Kitchen Sputter Scissors Ks-203 Made In Japan |
| 932 | TORR SQM160-S-2-R Thin Film Deposition Monitor 2-Inputs, RS-232, 120/240VAC |
| 933 | Tosoh 3481P-74001-45000V Quantum Sputtering Target 34820-29-027-250 Cu10% Ti10% |
| 934 | TOSOH Sputter Disk – Al-1% Silicon-1% copper |
| 935 | TOSOH Sputtering Conmag Target. Cobalt 99.9%. 0832F-27-000-300 for Varian 3180 |
| 936 | Tosoh Sputtering Target Chromium 6.74″ x 0.375″ — 6661E-24-000-280 |
| 937 | TRUSCO SPUTTERING & ABRASION-RESISTANT SUPPORT HOSE (L0.5m/10×6.5mm) TRH-6505 |
| 938 | TRUSCO SPUTTERING & ABRASION-RESISTANT SUPPORT HOSE (L0.5m/10×6.5mm) TRH-6505 |
| 939 | TRUSCO SPUTTERING & ABRASION-RESISTANT SUPPORT HOSE (L0.5m/12.5×8.5mm) TRH-8505 |
| 940 | TRUSCO SPUTTERING & ABRASION-RESISTANT SUPPORT HOSE (L0.5m/12.5×8.5mm) TRH-8505 |
| 941 | TRUSCO SPUTTERING & ABRASION-RESISTANT SUPPORT HOSE (L1.0m/10×6.5mm) TRH-6510 |
| 942 | TRUSCO SPUTTERING & ABRASION-RESISTANT SUPPORT HOSE (L1.0m/10×6.5mm) TRH-6510 |
| 943 | TRUSCO Torasuko sputtering felt 2.8X1000X1m 28CF-11 28CF11 Regular Inport |
| 944 | Tungsten oxide WO3- Sputtering Target |
| 945 | Tungsten sputtering target W 99.95% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 946 | Tungsten, W – Sputtering Target – 99.95% purity |
| 947 | Turbo Molecular Pump for Inline sputteranlage Leybold OPTICS Coater sputtering |
| 948 | UHV Magnetron Sputtering System for Multilayer Film Deposition on Large Optics |
| 949 | Ultek Varian Sputter Ion Pump 010-402 |
| 950 | Ultra Low Vacuum Pneumatic Actuated Valve Stainless 99B0649 Sputtering MKS |
| 951 | ULVAC PST-030AU Sputter ION PUMp |
| 952 | ULVAC PST-030AU Sputter ION PUMP |
| 953 | Umicore 0483078 Chromium 99.95% Sputtering Target AKQ515HEC Balzers BK209725-T |
| 954 | Umicore 0483428 Copper Cu 99.995% Sputtering Target AKQ515 Balzers BK209725-T |
| 955 | Umicore 0483484 NIFe 45.5 Sputtering Target 16×6 Balzers AKQ515 |
| 956 | Umicore 0483484 NiFe45.5 99.9% Sputtering Target AKQ515 Balzers BK221845-T |
| 957 | Umicore 0483591 NiFe18 99.9% Sputtering Target AKQ515 Balzers BK205602-T |
| 958 | Umicore AKQ515 Planar Magnetron Sputtering Target Kit NiFe45.5 wt% |
| 959 | Umicore BD483075-T TITANIUM 99.9% Sputtering Target AKQ515 Balzers BK205602-T |
| 960 | Umicore Nb 3N5 Target AK525 Sputtering Target CSBP-Cu-AK525 Material 3000101119 |
| 961 | Umicore Sputtering Target Silicone Si 99.9999% ARQ931 0704788 |
| 962 | Umicore Titanium 0483429 Sputtering Target 16×6 Balzers AKQ515 |
| 963 | Unaxis / Balzers ARQ900 Sputter Cathode |
| 964 | Unaxis / BPS Innenmaske 102050247 Sputter Mask |
| 965 | Unaxis ARQ131 silicone sputter target |
| 966 | Unaxis Indigo BD Sputter mask |
| 967 | UV Tech Material 6″ Sputtering Target Aluminum Type M2T5 6″ X 1 1/4″ thick |
| 968 | Vacuum Evaporator System Sputter Deposition Gun RF Plasma Brooks Cryo-Torr |
| 969 | Vanadium SEM Sputter target: V 99.95% pure, 57mm diameter x 0.2mm thick |
| 970 | Vanadium SEM Sputter target: V 99.95% pure, 63mm diameter x 0.2mm thick |
| 971 | Vanadium SEM Sputtering target: V 99.8% pure, 57mm diameter x 0.1mm thick |
| 972 | Vanadium sputtering target V 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 973 | Vanadium, V – Sputtering Target – 99.9% purity |
| 974 | VARIAN / L6427-301 / SPUTTER ION GAUGE BOARD |
| 975 | VARIAN / L6427-301 / SPUTTER ION GAUGE BOARD |
| 976 | VARIAN / VPW2871C2 / ARC COUNTER-3GUN, SPUTTERING POWER SUPPLY |
| 977 | Varian 00-664166-00 Insulator, Cathode for 3180 Sputtering |
| 978 | Varian 00-674163-00 Anode Cap for 3180 Sputtering |
| 979 | Varian 00-674163-00 Anode Cap for 3180 Sputtering |
| 980 | Varian 00-682216-00 Ceramic Clip Ring, 6″ for Varian Sputtering |
| 981 | Varian 00-684748-00 Shield, Heater, 5″ for Varian Sputtering |
| 982 | Varian 04-715634-01 Sputtering Power Supply Kilowatt Meter, VPW2871B2 |
| 983 | Varian 04-715634-01 Sputtering Power Supply Kilowatt Meter, VPW2871B2 |
| 984 | Varian 04-715634-01 Sputtering Power Supply Kilowatt Meter, VPW2871B2 |
| 985 | Varian Anode Cover 00-664198-01 for 3180 Sputtering |
| 986 | Varian Heator Insulator, 4″ Etch Ring 00-684270-00 for 3180 Sputtering |
| 987 | Varian Ion Pump 911-5032 High Vacuum 4.50 Conflat sputtering Getter Pump |
| 988 | Varian MULTI-RANGE DC SPUTTERING POWER SUPPLY |
| 989 | VARIAN MULTI-RANGE DC SPUTTERING POWER SUPPLY VPW2870P5-01-M,BB-95359685 |
| 990 | Varian Multi-Range DC Sputtering Power Supply VPW2870P5-M, TFS 04-716797 |
| 991 | VARIAN MULTI-RANGE DC SPUTTERING POWER SUPPLY VPW2870P5-M, VPW2870P5-S, SET |
| 992 | VARIAN MULTI-RANGE DC SPUTTERING POWER SUPPLY VPW2870P5-S |
| 993 | Varian Multi-Range DC Sputtering Power Supply VPW2870P5-S, TFS 04-716797 |
| 994 | Varian Semiconductor Heat Shield 6″ 0471216501 E06829 F/P Bore 3290 Sputter |
| 995 | Varian Shiled HTR 00-684725-00 for 3180 Sputtering |
| 996 | varian sputter gun hv power cable 780781-04 s-gun uhv vacuum pvd thin film |
| 997 | Varian Sputtering Power Supply |
| 998 | Varian Sputtering Power Supply Arc Counter 3 Gun VPW2871C2 04-718808-05 ++ |
| 999 | Varian Sputtering Power Supply Combiner Module VPW2871A1 04-70586-01 ++ |
| 1000 | VARIAN V30T 911-5032 TRIODE SPUTTER MOLECULLAR ION PUMP w/ ACCESSORIES |
| 1001 | Varian Vacuum Chamber For Sputter Coating 26″ Length x 20″ Wide |
| 1002 | VARIAN-EATON 04-716579 Sputter Titanium 4N5 CCHD0 Varian Quantam XL TI00-169-4N5 |
| 1003 | veeco spector iontech HBDG ion assist ion beam sputtering system IBAD thin film |
| 1004 | Veeco Sputtering System Part 0333-295-00 Rev. C |
| 1005 | VEM-CO Silicon Sputtering Target Si Poly Boron Doped, 99.999% 300x6mm 12″ |
| 1006 | Vent System Sputtering System Technics Hummer V + Mitsubishi motor |
| 1007 | Von Ardenne Sputter, 2 Cluster Tool – Model CF 850S, Turbo pump, Brooks Robot |
| 1008 | West Coast Quartz 91-00507A SHIELD QUARTZ 200mm AMAT MXP Sputter ETCH |
| 1009 | William Advanced Materials Cr/Ti 10%, at% STK5140.0/01/1 Sputtering Target |
| 1010 | William Advanced Materials Cr/Ti 10%, at% STK5195.0/01/1 Sputtering Target |
| 1011 | William Advanced Materials Cr/Ti 10%, at% STK5261.0/01/1 Sputtering Target |
| 1012 | William Advanced Materials Ni/Cr 22A 22%, at% 100533444-1 Sputtering Target |
| 1013 | William Advanced Materials Ni/Cr 36%/Fe 13% at% STK4168.0/01/1 Sputtering Target |
| 1014 | William Advanced Materials Thin Film Products Cr 04-29764/01A Sputtering Target |
| 1015 | Williams Advanced Mat Nobium/Nickel Nb/Ni 40%, at% 05-33802/01 Sputtering Target |
| 1016 | Williams Advanced Materials Chromium 04-29764/01A Sputtering Target |
| 1017 | Williams Advanced Materials Chromium 05-32937/01 Sputtering Target |
| 1018 | Williams Advanced Materials Co/Ni 25% 47289.0/01/1 Sputtering Target |
| 1019 | WILLIAMS ADVANCED MATERIALS Cr/Ti 10%, at% SPUTTERING TARGET STK6728.0/01/1 |
| 1020 | WILLIAMS ADVANCED MATERIALS Cr/Ti 20%, at% SPUTTERING TARGET 47340.1/01/1 |
| 1021 | Williams Advanced Materials Stainless Steel 304 Sputter Target |
| 1022 | Williams Advanced Materials Thin Film Products Sputtering Traget 03069440000 |
| 1023 | Williams Sputter Sputtering Target Silicon B-doped WAM TFP Dwg 01017-005-E |
| 1024 | Williams Sputter Sputtering Target ZnS/SiO(2) 20% at% 200mm dia X 6.35mm |
| 1025 | Ytterbium sputter target 99.9% pure (Y/TREM), 3.00″ diameter x 0.25″ thick |
| 1026 | Ytterbium sputtering target Yb 99.9% 2″ diameter x 0.125″ thick: ACI ALLOYS |
| 1027 | Yttria-Doped Alumina sputter target, Al2O3/Y2O3, 99.99%, 2″ diam x1/8″ thk |
| 1028 | Yttrium SEM Sputter target: Y 99.9% pure, 57mm diameter x 0.5mm thick |
| 1029 | Yttrium sputter target Y 99.9% 2″ diameter x 2mm thick |
| 1030 | Yttrium sputter target Y 99.9% 3″ diameter x 0.125″ thick |
| 1031 | Yttrium sputtering target, 99.9% Y/TREM, 2.00″ diameter x 0.25″ thick |
| 1032 | Zinc Aluminum (98:2 wt%) ZnAl – Sputtering Target – 99.99% purity |
| 1033 | Zinc Oxide – ZnO – Sputtering Target 99.999% & 99.99% purity |
| 1034 | Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% |
| 1035 | Zinc SEM Sputtering target: Zn 99% pure, 57mm diameter x 0.5mm thick |
| 1036 | Zinc SEM Sputtering target: Zn 99.99% pure, 63mm diameter x 1mm thick |
| 1037 | Zinc sputtering target- 1.00″ diameter x 0.25″ thick, 99.99% pure |
| 1038 | Zinc sputtering target- 99.99% pure, 2″ diameter x 0.25″ thick |
| 1039 | Zinc Sulfide, ZnS – Sputtering Target – 99.99% purity |
| 1040 | Zinc, Zn – Sputtering Target – 99.99% purity |
| 1041 | Zinc/Bismuth 90/10 wt% sputter target, 2.92″ dia x 0.2″, on Angstrom style back |
| 1042 | Zirconia- Yttria stabilized, ZrO2/Y2O3 – Sputtering Target – 99.9% purity |
| 1043 | Zirconium Copper Aluminum Nickel sputtering target Zr/Cu/Al/Ni 60/25/10/5 |
| 1044 | Zirconium SEM Sputtering target: Zr 99.2% pure, 57mm diameter x 0.25mm thick |
| 1045 | Zirconium sputtering target Zr 99.9% 2″ diameter x 0.25″ thick: ACI ALLOYS |
| 1046 | Zirconium yttrium sputtering target Zr/Y 80/20 wt% 2″ diameter x 0.125″ thick |
| 1047 | Zirconium Zr Sputtering Targets – 2.00″ Diameter, 0.250″ Thick – Kurt J. Lesker |
| 1048 | Zirconium, Zr – Sputtering Target |
| 1049 | ZnO/MgO (80:20 wt%) – Sputtering Target – 99.99% purity |
