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SAMCO RIE 10 NR

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Description

Equipment Model: SAMCO RIE 10NR Reactive Ion Etch System

Maker: SAMCO

Specifications: From the manual coming with the euipment

Photos: At Youtube

Condition: Used. It was complete, working in a Fab in USA. It was de-installed and stored in our company.

Price: Contact Us by filling the bottom form. Pls specify the condition you are going to buy at. Appreciate your time.

Quantity: 1 set

Vintage: 2007

Valid Time: Subject to prior sale without notice

Others: We sell it at any of the conditions: (1) AS IS; (2) Complete, Working, functional test; (3) Refurbished with installation and warranty.

Location: 000-A-E.D.-20220105

Description:

SAMCO RIE 10 NR – SAMCO RIE 10NR Reactive Ion Etch System | Dry Etching System / Tool with Thermo Electron Thrmoflex 900 Chiller


Info from O.E.M. website for your reference only.

Reactive Ion Etching System
RIE-10NR is a low-cost, high-performance, fully automatic, dry etching system that meets the most demanding process requirements using fluorine chemistry. A computerized touch panel provides user-friendly interface for parameter control and recipe storage.
Etching is performed with minimum sidewall deterioration and a high selectivity between materials. With its sleek, compact design, the RIE-10NR system requires minimal clean room space.

Dimensions:

Main Unit: 500(W) x 920(D) x 1510(H) mm

Pump Unit: 522(W) x 163(D) x 216(H) mm

Features:

  • Highly selective anisotropic etching

  • Fully automatic “one-button” operation with full manual override

  • Easy-to-use computerized touch panel for parameter control, recipe entry and storage

  • Process wafers up to ø8″ in diameter

  • Sleek, compact design uses minimal clean room space

Applications:

  • Stripping of passivation materials including silicon nitride, silicon dioxide and silicon oxynitride

  • Anisotropic etching of all types of silicon-based films, compound semiconductors and refractory metals including Si, SiO2, Poly-Si, Si3N4, GaAs and Mo

  • Manufacturing of micromachines

  • Failure analysis


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LOCATION: SS380EB

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