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Oxford Plasmalab 133+ RIE-SN417728

Oxford 133-SN417728

2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher

SKU: STS Multiplex ICP -5-1-1-1 Categories: Etcher, Oxford, RIE ICP DRIE Bosh Tags: Oxford Instruments, Plasmalab

Description

Description

2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher

Location: Nanjing, Jiangsu, China

OXFORD Plasmalab 133 RIE (CL)

Model Year : 2004
Quantity : 1
Condition : Was refurbished with OEM specifications ,crated, 3 month warranty, installation .

Photos: Download
Serial No : 417728
Availability :Subject to prior sale without notice.

Configuration:

Supports wafer sizes up to 300mm (330mm Platen)

Mechanical chuck
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 8 lines including following 7 MFCs:

Ar – 100sccm
CL2 – 100sccm
BCL3 – 100sccm
N2O – 200sccm
CHF3 – 200sccm
NH3 -100sccm
CH4 – 50sccm

Windows PC, user friendly interface GUI
This tool was removed from production October 2014.

ID-OEM-MODULE-1 MSP-175K-195K Ready Refurbished

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