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Multiplex ICP HRM

Main Refurbished Equipment

Categories: Etcher, RIE ICP DRIE Bosh, STS SPTS Tags: SPTS, STS

Description

Description

STS / SPTS Multiplex ICP HRM Etcher

EtcherProcess: MEMS-CMOS
Temperature: -20-100°C
Substrate: Small piece
Process pressure: 5-80 mTORR
Gases: SF6, C4F8, Ar, O2, C2
HBC with ESC
Masks: SiO2, SixNy
Materials used: Si, SOI wafers
Coil: 3000 W 13.56 MHz (ADVANCED ENERGY)
HF: 500 W, 13.56 MHz (ENI)
LF: 500 W, 380 KHz (ADVANCED ENERGY LF-5).

Condition: Used. We sell it at AS IS or complete, working, functional test .

Valid : It is only for end users and is subject to prior sale without notice. Appreciate your time!

SemiStar Corp. may provide certain information related to equipment offered for sale. Any and all such information is unverified and, therefore, supplied for information purposes only without guarantees or warranties of any kind. This picture is representative of the STS available

OEM-32 / SS380

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