Temescal BJD-1800

Description

Temescal BJD-1800 Thermal  Vacuum Deposition Evaporator. 2 sources.

ID-OEM-7

Condition: Used. Complete, working, functional test

Price: Pls contact us by email with your RFQ if possible.

Location: Morgan Hill,CA95037 USA

Lead time: TBD

Valid Time: Subject to prior sale. This item is only for end user

Info on Temescal BJD-1800 from OEM for your reference only

Low Profile Vacuum Deposition System

Temescal’s Model BJD-1800 is a flexible deposition system that accepts a multitude of accessories to meet almost any requirement. It features the same design criteria of pumping efficiency and operator convenience that have made Temescal systems leaders in the vacuum coating industry. The popular low profile appearance is achieved by the unique offset pumping design, which places the substrate holder at a convenient height and the pumping port precisely where it is most effective-between the evaporation source and the substrates.
(1) Designed for operator convenience
The substrate chamber is located 46 inches from the ground, considerably lower than conventional bell jar systems. For the operator, loading and unloading substrates at a convenient height is a real advantage .
The 18-inch-diameter chamber dome is hinged and spring loaded for touch-release opening and can be raised to a preset hold position as well.
(2) Designed for convenient maintenance
The offset pumping port, hinged front door panel, and swing-out source tray are the maintenance features admired in the BJD-1800. The offset pumping design greatly reduces the possibility of broken substrates, evaporating materials, and other debris from finding their way into the pumping module. The result is fewer unscheduled machine downtimes .
The hinged front door panel opens to the pumping system and the evaporation chamber. A built-in jackscrew lowers the source tray which can then be swung out for cleaning and maintenance. Access to the bellows-sealed high vacuum valve and other pumping system components is simple and direct.
Designed for Pumping Efficiency
The combination of high quality pumping components and an offset pumping port produces faster net speeds at the entry to the source  chamber than major conventional bell jar systems. The pumping port into the high vacuum chamber measures a full 6 by 12 inches and is located where it is most effective-between the substrates and the evaporation source. This reduces the distance the gases must travel and therefore results in greater pumping efficiency, purer films, and high yields.
(1) Pumping performance
Equipped with the standard mechanical and cryopumps, the typical 18-inch-diameter BJD-1800 can achieve pump down from atmosphere to 3.1 x10^-7 torr in 10 minutes and to 1.2 x10^-7 torr in 30 minutes. The ultimate vacuum is in the 10^-8 torr range, to which each BJD-1800 is tested. We can provide 1 typical pump-down curve.
(2) High vacuum pumping
The standard system is equipped with an 8-inch cryopump with a water-cooled compressor and has an ultimate vacuum in the 10^-8 torr range.
(3) BJD-1800 vacuum system
* Low profile allows convenient loading and unloading of substrates
* Hinged and spring loaded chamber dome for easy opening and closing
* Pumping plenum
* Stainless steel bellows
* Poppet valve
* Offset pumping port reduces distance gases must travel and increases pumping efficiency
* Cryopump
* Optionally, the BJD-1800 can be equipped with a diffusion pump or a turbomolecular pump for reactive evaporations.
(4) Bellows-sealed high vacuum valve
A 7.75-inch i.d. stainless steel bellows sealed high vacuum valve with electropneumatic actuator isolates the cryopump from the evaporation chamber. The poppet valve design eliminates problems encountered with butterfly high vacuum valves.
(5) 30 cfm mechanical pump
The standard BJ D-1800 utilizes a 30 cfm (50.5 m³h^-1) two-stage mechanical pump with a right angle trap to perform roughing and cryo-roughing service at the rate of 845 liters/minute. It is mounted on the floor behind the cabinet, connected to it with KF style joints and a 20-inch flexible stainless steel bellows line, but isolated from the main pumping chamber to eliminate transmission of pump vibration. Other size mechanical pumps can also be provided .
(6) Roughing, Cryo-roughing, vent valves, and manifold
The roughing valve is Edwards ½-inch  Model 2030 stainless steel to maintain the high vacuum integrity of the system. The cryo-roughing valve is Edwards 1/2-inch Model 2130 stainless steel, as is the system vent valve. All are electro-pneumentically actuated and incorporate a replaceable bellows. All vacuum manifolding is 1/2-inch stainless steel. T he manifolding includes a port in the fore-line for leak detection.
BJD-1800 Vacuum Chamber and Instrumentation
(1) Vacuum chamber
The vacuum chamber is available with a 9-inch-high, 18-inch-diametcr (or, optionally, a 20-inch-diameter) stainless steel bell-jar-shaped lid. A Viton o-ring seals this lid. A spring-assisted hinge gives fingertip control in raising and lowering it, and a positive stop is incorporated to prevent it from tilting back too far.
A variety of planetary fixtures is available. The BJ D-1800 can accommodate the TP-8 angle-of-incidence fixture for lift-off processes or the HSP (highspeed planetary) for step coverage.  Also available is the TP-2 flat planetary for optical processes. Custom substrate fixtures arc available upon request. The source is mounted in an 18-inchhigh by IS-inch-diameter all stainless steel well. The tray on which the evaporation sources arc mounted is an 18-inch-diameter flat plate. The source tray seals against the bottom of the vacuum chamber with a Viton o-ring and can be raised and lowered with a built-in jackscrew. When lowered, the tray swings out 90° to the front of the system for easy access. A wide-angle shut1ered viewing port is located in the front of the vacuum chamber. The valve plenum chamber measures 12 inches wide by 6 inches high by 14 inches deep .

(2) Instrumentation
A VersaVac® 5 thermocouple/ ionization gauge controller provides accurate measurement of pressure in the BJD-1800. T he location of the ionization gauge is at substrate level 10 allow accurate measurement at the point where operating vacuum is the critical factor.
(3) Vacuum map and controls
The arrangement of the system’s valves and pumps is indicated on a vacuum map on the vacuum control cabinet. Lights provide the operator with complete information on the system’s status at all times. Two modes of operation for valve  sequencing arc included: fully automatic or manual. In the automatic mode , the push of a button will pump clown the chamber from atmospheric pressure to high vacuum; automatic valve sequencing is completely interlocked to protect the pumping system. In the manual mode, the valves can be sequenced by throwing a switch for each valve. No interlocks are active in the manual mode.
BJD-1800 Options and Accessories
Full utility of the BJD-1800 is found in the wide selection of accessories that tailor each system to the purchaser’s requirements. Whether for
research and development or for production, the options on these pages assure that an optimum configuration can be specified. Electronic assemblies feature top-grade components and rigorous performance standards. Mechanical assemblies and fittings employ special materials such as 304 stainless steel, OHFC copper, Viton and Kovar, together with strict tolerances to assure high vacuum integrity.
(1) Electron beam sweep controller -Temescal programmable Sweep Controller
Electron beam sweep controllers are recommended for the evaporation of many dielectric or subliming materials. The sweep controller applies user-defined preprogrammed current to the lateral and longitudinal focus coils of an electron beam source which acts to deflect or “sweep” the beam over the entire top surface of the evaporant. This beam sweep action provides a more uniform evaporation of the source material than a stationary beam and will help to eliminate tunneling of the source material if it sublimes.

(2) Film deposition controller – IC 6000 multiple thin film deposition controller 

For precise measurement of deposition thickness and efficient repeatability control, the BJ D-1 00 can be equipped with a film deposition controller to control rate and thickness for up to six thin films. Measurement and control updates arc every 0.20 seconds. Optional plug-in source sensor modules permit control of multiple sources.
Electron beam power supply-Simba 2 electron beam power supply and optional control console
The Temescal model Simba 2 electron beam power supply provides 15 kw of constant high voltage over user-selectable ranges of – 4 to – 7 kV
and – 7 to – 10 kV. The Simba supply can power up to three electron beam sources simultaneously.

(3) Diffusion pump
The BJD-1800 is available with an optional 2100 liter/second 6-inch high-speed diffusion pump with an ultimate vacuum in the 10^-8 torr range.
BJD-1800 Options and Accessories
(4) Electron beam sources

STIH-270-2M electron beam source -A single or multi-crucible electron beam source, or both, can be mounted in the BJD-1800 for multi-material simultaneous or sequential evaporations. Filament evaporation is also available. Temescal is the world leader in electron beam technology and a number of single and multiple sources including the Gemini^® dual crucible source and Trigon^® triple crucible source arc available to meet specific requirements. All of Temescal’s electron beam sources incorporate 270° beam deflection to increase filament life, permanent primary magnets to maintain the electron beam on the source, and built-in lateral and longitudinal deflection coils to sweep the electron beam.
(5) Substrate holders – – -TP-8 substrate fixture and source covered by shutter .
The TP-8 dome substrate holder is offered for lift-off processes. The dome can handle 2-inch (50 mm), 3-inch (75 mm), or 4-inch (100 mm)wafers, or, for BJD box configurations, 5-inch (125 mm) wafers. The dome is designed so that the center of each wafer is at a normal angle-of-incidence at all times . For step coverage the BJ D-1800 can be fitted with the backside-loading HSP planetary. Also available is the flat TP-2 substrate holder . Special fixtures arc available upon request.
(6) Substrate heaters—HA-2 substrate heater
Either 2 kW or 4 kW of quartz lamp substrate heaters can be installed in the BJ D-1800 along with a heater power supply.
(7) Automatic process control
Fully automatic process control can be incorporated into the BJD-1800. An operator can then load the substrates into the system, push the start button, and allow the system to function automatically throughout the entire process. To assist the operator, or where precise steps must be repeatable from run to run, automatic process control should be an important consideration.
(8) Box shaped product chamber
The BJD-1800 can also be configured with a box-shaped product chamber for processes requiring larger substrate areas.
Specifications
(1) Construction
All internal chamber surfaces arc chemically polished 304 stainless steel. Shields arc honed to improve adhesion of evaporant.
(2) Vacuum chamber
* Steel bell jar: 18-inch-diamctcr x 9-inch-high ( 457 mm X 229 mm). Optional 20-inch-diameter (508 mm) size available. Water cooled. Designed for waist-high, 46-inch (1168 mm), substrate loading and unloading. Hinged dome with spring-assisted counterbalance for case of operation.
* Source well: 18-inch-diamctcr x 18-inch-high (457 mm x 457 mm). Water cooled. 12-inch-wide x 6-inch-high x 14-inch deep (305 mm x 152 mm x 356 mm) valve plenum chamber.
(3) Source tray
18-inch-diameter (457 mm) flat plate. Manual handwheel-operated jackscrew mechanism for raising and lowering the source tray. When lowered, the tray swings out 90° for ease of access.
(4) Vacuum pumps
8-inch (203 mm) cryopump with an ultimate vacuum in the 10^-8 torr range. 30 cfm (50.5 m³h^-1) 845 liter/minute dual-stage mechanical pump for roughing and backing. Floor mounted and isolated from the main chamber to eliminate vibration.
(5) Vacuum valves
775-inch ( 197 mm) i.d. bellows-scaled electropneumatic high vacuum valve. Poppet style design eliminates o-ring scuffing.    1¹_/2-inch (38 mm) electropneumatic stainless steel angle roughing valve. ⁵/₈-inch ( 15 mm) electropneumatic stainless steel inline cryo-roughing valve.  ⁵/₈-inch ( 15 mm) electropneumatic stainless steel inline vent valve.
(6) Vacuum gauge controller
Dual ionization/triple thermocouple gauge controller. Alternate gauge controller available.
(7) Automatic valve sequencer
Automatic valve sequencer pumps down system at push of button. Vacuum map provides visual display of valve sequence, and lights indicate status of valves and vacuum pumps.
(8) Electronics cabinet
Floor-mounted cabinet, 24-inch-wide x 27-inch-deep x 72-inch-high (610 mm x 686 mm x 1829 mm) overall dimensions, including casters. Counter-mounted cabinet available also, dependent upon which options arc selected: 24-inch-widc x 27-inch-dcep x 41.5-inch high (610 mm x 686 mm x 1054 mm) overall dimensions.
(9) Vacuum cabinet
46-inch-high, including casters, x 56-inch wide x 34-inch-deep ( 1168 mm x 1422 mm x 864 mm), steel sheet metal construction. Viewport and roughing line add approximately 9 inches (229 mm) to depth dimension. Interlocked hinged front door panel exposes pumping system and evaporation chamber for case of access.
(10) Water system
Stainless steel manifold with ³/₄ inch (19 mm) NPT female pipe tap connections on cabinet rear for “water in” and water out”.
(11) Air system
¹/₄ inch (6 mm) NPT female pipe tap connection on rear of cabinet .
(12) Performance
Pump-down time: Atmosphere to 3.1X10^-7 torr in 10 minutes or less. Atmosphere to 1.2X10^-7 torr in 30 minutes or less with standard pumping system. Typical operating vacuum: 10^-6 torr range. Ultimate vacuum: 10^-8 torr range. Typical operating cycle: 30 to 35 minutes for 10,000 A of aluminum with substrate heating 10 250°C. Coating uniformity: ± 5% with Model HSP-18 high speed planetary and with Model TP-8 substrate fixture . Tighter tolerances possible with custom shadow masking on TP-8.
(13) Utility requirements—Optional accessory utility requirements not included
Water : Filtered 3 gpm at minimum 50 psig inlet pressure at 60° to 80° F (0.95 l/m, 3.5kg/cm², 16° to 27° C). Compressed air: 5 cfm at 60 to 125 psig inlet pressure, filtered and dried ( 142 l/m, 4.2 to 8.8 kg/cm² ). Power: 208 V, 3 phase, 30 A, 60 Hz, 5 wire wye connection with ground and neutral. Optional voltages available. Ambient temperature: 80° F ± 10°(26.8°c ± 5.5^o) . Humidity: 50% maximum. System weight: Approximately 980 lb(445 kg).

VersaVac is a registered trademark of The BOC Group. Inc. Simba is a trademark of The BOC Group. Inc. Gemini and Trigon arc registered trademarks of The BOC Group, Inc. Viton is a registered trademark of E.I. DuPont de Nemours & Co . Inc.

Info on Temescal for your reference.

1. Temescal Versatile Coating Systems
   Temescal, a part of BOC Coating Technology, designs and manufactures ultra-reliable thin-film deposition equipment. Professionals prefer Temescal because, over the decades, the name Temescal has become synonymous for “absolutely, positively reliable coatings”. Temescal systems today offer conveniences such as cassette-to-cassette loading, high throughput cluster evaporation systems to handle substrates up to 1-meter x 1-meter in size. These systems offer state-of the-art control capabilities and flexibility, as well as the same • Temescal reliability. Temescal offers deposition systems to cover you, whatever your application.
   • Temescal BJD-1800: Manual load, batch system, Chamber size 10 inch.
   • Temescal FC-1800: Manual load, batch system, Chamber size 20 inch.
   • Temescal VES-2550: Manual load, batch system, Chamber size 20 inch.
   • Temescal FCE 2500: Manual load, batch system, Chamber size 20 inch.
   • Temescal FCE-2700: Manual load, batch system, Chamber size 20 inch.
   • Temescal FCE-3800: Manual load, batch system, Chamber size 40 inch.
   • Temescal AL-3800: Operate Free, Automatic load batch system, Chamber size 40 inch.
   • Temescal CE-6150: Operate Free, Automatic load cluster system, Chamber size 40 inch.
   • Temescal FCE-4800: Manual load, batch system, Chamber size 50 inch.
   • Temescal FCE-7000:Operate Free, Automatic load cluster system, Chamber size 50 inch.
2. Temescal Components Too
   Temescal provides superior components as well. Making ultra-reliable coating systems requires ultra-reliable components. So Temescal makes its own. The performance of Temescal E-beam guns has become a legend in the industry- over 14,000 in operation around the world! The same is true for ultra-precise power supplies. Temescal maintains stock shelf on all the most asked-for components so you can get them faster than ever. Usually shipped within 24 hours!
   Temescal designs and manufactures a wide range of deposition systems suited for a variety of semiconductor. flat panel, optical, biomedical, metallurgical and decorative applications. This versatile line includes low-profile bell jar systems, top-loading bell jar systems, fast cycle load-locked designs and cassette-to-cassette for high throughput applications. The systems range in size from a research coater with an 18-inch diameter bell jar to automatic cluster production system to handle substrates up to 1-meter by 1-meter.
3. Temescal Manual Load Batch Systems
   Temescal Batch System
   • Low Capital Cost
   • High Labor Requirement
   • Lowest Throughput
   • 18-inch and 25.5-inch Chambers
   • Up to 150 mm Substrates
   Temescal Load-Lock Batch System
   • Law Capital Cost
   • High Labor Requirement
   • Improved Throughput
   • 18-inch, 25-inch, 2 7-inch and 48-inch Chambers
   • Up to 300 mm Substrates
4. Temescal Automatic Load Batch -Systems
   •Moderate Capital Cost
   • Low Labor Requirement
   • Improved Throughput
   • Excellent Cost of Ownership
   • Cassette-to-Cassette Loading
   • AGV/MGV Interface
   • 2 7-inch and Larger Chambers
   • Up to 300 mm Substrates
5. Temescal Automatic Load Cluster Systems
   • High Capital Cost
   • Low Labor Requirement
   • Highest Throughput
   • Excellent Material Recovery
   • Cassette-to-Cassette Loading
   • AGV/MGV Interface
   • 2 7-inch and Larger Chambers
   • Up to I m x I m Substrates
6. Manual Load Batch Systems Models
   Temescal BJD-1800 System
   The low-profile bell jar of the BJD-1800 system permits easy access co the chamber for substrate loading. This industry-proven production system is a reliable evaporation unit for optical and electronic coating processes.
   • 18-inch (45 7 mm) or 20-inch (508 mm) diameter chamber
   • Clean-room compatible
   • Cryopump standard; turbopump also available
   • Temescal PC/PLC Control System ( optional)
   Temescal VES-2550 System
   Designed to provide high throughput without a load lock, the VES-2550 is suitable for all evaporation applications.
   • 25.5-inch (648mm) diameter, low-profile chamber
   • Designed for semiconductor production environments
   • Accommodates up to three electron beam sources
   • Cryopump standard; diffusion pump and turbopump also available
   • Temescal/ PC/PLC Control System (optional)
   Temescal FC-1800 System
   The load-lock design of the FC-1800 system ensures fast-cycle production in high-throughput evaporation processes. The vacuum-isolated lower chamber reduces pump down time per cycle and minimizes source and substrate heater contamination. The low-profile bell jar design is convenient for substrate loading and for enclosure by a laminar-flow hood .
   • 20-inch (508 mm) diameter product chamber
   • Multiple material deposition
   • Substrate fixturing for /i~-off and other process applications
   • Cryopump standard; diffusion pump and turbopump also available
   • Ion milling, glow discharge and substrate heat
   • Temescal PC/PLC Control System (optional)
   Temescal FCE-2500/FCE-2 700/FCE-3800 System
   The FCE-2500 system is available either freestanding or in a clean-room-compatible, through-the-wall configuration. To optimize through-the-wall applications. both the load lock and the source tray are accessible from either the clean room or the service area.
   • Accommodates multiple electron beam and resistance-heated sources
   • Compatible with lift-off and variable angle processes
   • Ion milling and substrate heat options available
   • Manual or fully automatic operation with the
   Temescal PC/PLC Control System
7. Temescal Automatic Load Batch Systems Models
   Temescal AL SERIES
   Temescal AL-3800
   The AL Series systems combine the capabilities of the FCE-2700 with automatic load and unload systems for higher throughput and improved yields due to Jess handling.
   • 38-inch (965 mm) or larger deposition chambers available
   • Cassette-to-cassette loading
   • AGV/MGV Interface standard
   • Ideal for high volume production of Substrates up to 300 mm in diameter
   • Throughput up to 50 substrates per hour
   • Single or multiple layer deposition
   • Cryopump standard; Turbo pump (optional)
   • Ideal for processing 150mm GaAs substrates
8. Temescal Automatic Load Cluster Systems Models
   Temescal CE-6 150
   This automatic load evaporation system in a cluster configuration provides the highest throughput and improved cost performance available by reducing overhead and improving material recovery.
   • Processes substrates up to 300 mm in diameter
   • Dual vacuum cassette elevators for maximum throughput
   • AGV/MGV interface standard
   • Throughput up to 7 5 substrates per hour
   • Single or multiple layer deposition in each module
   • Total process flexibility
   • Ideal for I 50 mm GaAs substrate processing
   Temescal FCE-7000
   The FCE-7000 evaporation system is configured so each module can deposit a single film or an entire stack, allowing for flexibility in current and future processes.
   • Processes panels up to /-meter by /-meter
   • High uniformity across the panel and panel-to-panel
   • Automatic, sequential multi-layer thin-film deposition
   • Rod-fed source ensures highest material utilization possible
   • Fully automatic cassette loading and unloading
   • AGV/MGV interface standard
   • Coating and process flexibility allows for parallel development and production
   • Ideal for FED cathode and anode evaporation processing.
9. Temescal Coating System Components 
   A wide range of components is available to support Temescal coating systems. Ongoing research and development are integral to this line of components which include:
   • Electron beam sources and spare parts. CV-6S
   • Electron beam power supplies
   • Programmable beam sweep controllers
   • Substrate fixturing
   • Deposition monitors and controllers
   • Feedthroughs
   • High performance emitter assemblies
10. BOC Coating Technology is a unit of The BOC Group, the worldwide vacuum technology, industrial gases and distribution services company. Temescal is global, with agents in over fourteen countries. Call Temescal today to learn how our products can help you meet your application needs. For enabling technology .. .. nothing tops a Temescal.

Other  Airco Temescal equipment and parts below for Evaporator and Sputtering Deposition Applications. Please contact us for the availability of any of them. They are subject to prior sale without notice. Appreciate your time. Location:SS380EB221101

Pls contact us for the availability of the following items. These are only for end users and are subject to prior sale without notice. Appreciate your time!

SS-OEM-00-20220412-SS380EB-203321510661