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CAMBRIDGE NANOTECH SAVANNAH S200 ALD. ATOMIC LAYER DEPOSITION SYSTEM

SAVANNAH S200-ALD

Main Refurbished Equipment

Categories: Cambridge, PECVD CVD ALD, Thin Film Equipment

Description

Description

Equipment Model: CAMBRIDGE NANOTECH SAVANNAH S200 ALD ATOMIC LAYER DEPOSITION SYSTEM

Maker: CAMBRIDGE NANOTECH , Veeco Cambridge Nanotech Ultratech

Condition: ATOMIC LAYER DEPOSITION SYSTEM. Used, Good condition. It was complete, working, functional test. It is crated. Dimensions 3’ x 5’ x 4.5’. Weight 466 pounds

Price: Contact Us by filling the bottom form. Appreciate your time.

Quantity: 1 set

Valid Time: Subject to prior sale without notice

Others: Refurbished, Installation, Training, Warranty are optional at extra charge.

Location: OEMVeeco-ALD-6

Description:

CAMBRIDGE NANOTECH SAVANNAH S200 ALD

ATOMIC LAYER DEPOSITION SYSTEM.

With high-speed pneumatic pulse valves to enable the unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates.

Can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.

Wafer size: up to 200mm

Ozone generator and vacuum pump.

Gases used: Ozone, Trimethylaluminum, Diethylzinc, and Ammonia, Anhydrous.

System power requirements 115V, 50/60Hz, 20A, CE.

MSP-195000 -145000

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All the used equipment trademarks belongs to the O.E.M. , the original equipment manufacturer. All rights reserved.

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