Description
2006 OXFORD Plasmalab 100 RIE (FL) Reactive Ion Etcher
- Supports wafer sizes up to 300mm (330mm Platen)
- RIE set up for SiO2 Etch
- RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz,
- Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller
- Blue color PLC type
- Water cooled electrode 10C-80C
- Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm
- Windows PC , user friendly interface
- Lauda WK 1200 Chiller was utilized by previous user. Not included.
This tool was removed from production October 2014.
ID-OEM-Module-1 MSP-175K-195K