Refurbished Lam Research AutoEtch 590 Plasma Etcher Semiconductor Equipment

SemiStar Corp. provides refurbished Lam Research AutoEtch 590 plasma etcher systems for universities, research institutes, semiconductor laboratories, and production fabs. The Lam AutoEtch 590 is a cassette-to-cassette automatic plasma etching platform designed for semiconductor wafer processing applications requiring stable plasma control, automated wafer handling, and repeatable process performance.

This system was previously upgraded by Allwin21 with a modern PC controller and touchscreen monitor configuration for improved operation, maintenance, and system usability. The current system is available in refurbished condition only. Upgrade service is no longer offered for this specific equipment.

Photo and configuration shown are for reference only. Actual refurbished system configuration, installed options, consumables, software revision, and cosmetic condition may vary depending on current inventory availability.

Current System Configuration

• Lam Research AutoEtch 590 Plasma Etcher
• Automatic cassette-to-cassette wafer handling
• Single wafer plasma etch processing platform
• Double airlock chamber structure
• Parallel plate plasma etching configuration
• Allwin21 upgraded PC controller
• Industrial touchscreen monitor interface
• Refurbished and fully tested condition
• Process chamber and vacuum system
• RF generator and matching network
• Gas delivery and MFC control system
• Vacuum pump system-Optional
• Facility and process dependent configuration

System Description

The Lam AutoEtch 590 is designed for automatic plasma etching applications with cassette-to-cassette wafer transfer capability. The system utilizes a fully automated wafer handling structure combined with a plasma process chamber and programmable process control architecture.

The platform supports programmable process parameters including RF power, chamber pressure, gas flow control, electrode spacing, and multi-step process recipes. The double airlock chamber structure allows the process chamber to remain under vacuum during operation for improved process stability and throughput.

The current refurbished system includes an upgraded Allwin21 PC controller and touchscreen monitor replacing obsolete legacy control hardware. The upgraded control structure improves equipment usability, maintenance capability, and long-term service support compared with original OEM legacy electronics.

Typical Applications

• Semiconductor plasma etching
• Thin film etching
• Oxide etching
• Research and development processing
• University semiconductor laboratory applications
• Compound semiconductor process development
• Production wafer plasma processing
• General dry etch applications

Available Service Support

• Refurbished system supply
• System testing before shipment
• Installation support available
• Process startup support available
• Limited spare parts support
• Technical support subject to system configuration

Facility Requirements

• Facility power is customer responsibility
• Process gases are customer responsibility
• Vacuum pump and exhaust connection required
• Cooling water and CDA requirements depend on final configuration
• Facility hookup and qualification are buyer responsibility

RFQ Information Required

• Wafer size and material
• Target process application
• Current process gases
• Required wafer throughput
• Facility power information
• Preferred vacuum pump configuration
• Special process requirements
• Expected purchase timeline

Important Notes

• System availability is subject to prior sale
• All refurbished systems are subject to configuration change without notice
• System specifications depend on final installed configuration
• Equipment information on website is for reference only and not final purchase specifications
• Please refer to official quotation for final commercial and technical scope
• OEM trademarks belong to their respective original manufacturers

Contact SemiStar

SS380-MSP-185