Description
Materials Research Corporation MRC 693 TES-600 sputtering system
OEM: Materials Research Corporation (TES)
Model: MRC 693 MRC 603 (TES-600) Video on Youtube
Location:380 Tennant Ave, Suite 7, CA, U.S.A.
MRC 693 Rebuilt as a TES-600 Fast Cycle Load Lock Sputtering System, Completely Rebuilt by TES (Technical Engineering Services), New Software and Planar Flat Screen Monitor, Advanced Energy Pinnacle II DC Power Supply, GE Fanuc System Automation COntrol Software and Hardware, Also includes RF Power Supply and Matching Network
Depending on customer budget, we sell it at (1) AS IS; (2) Complete, working, functional test; (3) Refurbished with OEM specification with installation.
The following info from OEM (TES) is only for your reference.
TES 600 series & TES 900 series load lock sputtering systems (MRC 600/900)
The TES-600 (horizontal process) & TES-900 (vertical process) series sputtering systems offer a fast cycle, dual level load lock capable of exchanging a completed 12” x 12” pallet load of substrates with a new pallet load allowing continuous operation. The pallet of substrates travels in a linear motion in front of up to three 5” x 15” magnetron cathodes. With the pallet scanning in front of the rectangular cathode the substrate deposition uniformity of +/-5% is achievable and target utilization is excellent. RF etch and substrate heating are in the process chamber.
To build the most reliable thin film equipment we incorporate GE Fanuc system automation control software and hardware. The system automation package allows the process engineer to develop a complex recipe. Once the recipe has been developed an operator can load the substrates and press start. The system software will run a repeatable process every time.
The fast cycle load lock eliminates the need to vent the process chamber to load substrates thereby reducing the pump down time along with reducing contamination of targets and interior chamber surfaces. Typically the TES-600 & 900 series sputtering systems will be able to automatically transfer the substrates from atmosphere to the process chamber and achieve a base pressure of 9 x 10-7 torr in less than seven minutes.
The following are only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!
| 1 | 11″ Ti Titanium Sputtering Targets | |
| 2 | FIL-TECH G71PT .709″ PYREX TWIN TUNGSTEN FILAMENTS MRC STYLE SPUTTERING G-71-PT | |
| 3 | FIL-TECH G71PT .709″ PYREX, TWIN TUNGSTEN FILAMENTS, MRC STYLE, SPUTTERING – NIB | |
| 4 | LAM / MRC Materials Research CORP. DC SPUTTER CONTROL PCB, P/N 880-71-000 REV G | |
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| 6 | Material Research Corporation MRC 603-III 3-Target Side Sputtering Chamber | |
| 7 | Material Research Corporation Ni Mz Nickel Magnesium Sputtering Target | |
| 8 | Material Research Corporation VP Vanadium Sputtering Target | |
| 9 | Materials Research Corp 20-554F-AL107-1000 MRC 11″ SPUTTERING TARGET | |
| 10 | Materials Research Corp MRC (Tosoh-Varian) VP Delta Al/Si Sputter Target NOS | |
| 11 | MRC 11″ Screw Eclpise Sputtering Target Al/Cu 1,5% | |
| 12 | MRC 11″D Screw Eclpise Sputtering Target Al/Si 1% | |
| 13 | MRC 20-555B-NB000-9000 NIOBIUM 99.8 RMX12 ASSY Sputtering Target Plate | |
| 14 | MRC 5″ Stainless Steel ZINC Backing Plate, 808-03-005 Sputtering Target | |
| 15 | MRC 500354-00 Belt, Timing .5W X15 Long Sputtering Tool | |
| 16 | MRC 500665-00 Pin, Arm First, Sputtering Tool | |
| 17 | MRC 500670-00 Bearing, Thrust Sputtering Tool | |
| 18 | MRC 500676-00 Bearing Sputtering Tool | |
| 19 | MRC 500679-00 Heater Cartridge 500W Sputtering Tool | |
| 20 | MRC 500680-00 Heater Cartridge 100W Sputtering Tool | |
| 21 | MRC 500681-00 Thermostat, Tempswitch Sputtering Tool | |
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| 23 | MRC 500737-00 Bearing, Arm (Elbow) Sputtering Tool | |
| 24 | MRC 6 5/16″OD Ti/W Sputtering Target, NEW!! | |
| 25 | MRC 808-88-100 NI/FE19% Mounted 6″ x 0.25″ TH Sputtering Target | |
| 26 | MRC 828-04-200 VP Nickel 15″ x 4.75″ x 0.25″ Sputtering Target | |
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| 28 | MRC A114265 Quad 1000 RF Deck Sputter Power Supply 3500 VDC Rev. E | |
| 29 | MRC Chi Sputter target: Al/Si 99/1 wt%, new, vacuum sealed | |
| 30 | MRC CHI Sputtering Target Set Al/1SI/0.5Cu | |
| 31 | MRC CHI Sputtering Target Set Al/Cu/Si VP Grade | |
| 32 | MRC Materials Research A120024 Sputtering System Remote Stand Eclipse Star | |
| 33 | MRC Materials Research A120024 Table Top Sputtering System Remote Eclipse | |
| 34 | MRC Materials Research Corp A120024 Sputtering System Remote Stand Rev. B | |
| 35 | MRC Materials Research Corp A120024 Sputtering System Remote Stand Rev. C | |
| 36 | MRC Materials Research Corp. 900 In-Line Sputtering Systems Info Manual 1981 | |
| 37 | MRC Sputtering Conmag Target. AL / SI 30PPM for Varian 3180 | |
| 38 | MRC Sputtering Target #20-551C-AL235-3000 ~ AL/.5CU/1.2SI For S-Gun | |
| 39 | MRC Sputtering Target #H46-0775-70915-04 ~ AL/.5CU/1.2SI For S-Gun | |
| 40 | MRC SPUTTERING TARGET CONICAL II 20-551J-TI000-0018 | |
| 41 | MRC Sputtering Target. Al/30ppmSi. CCH CONICAL 1 TGT. for Varian 3180 | |
| 42 | MRC UNK VP Chromium 15″ x 4.75″ x 0.25″ Sputtering Target | |
| 43 | PRAXAIR MRC 20-555B-MO000-300 MO MOLYBDENUM Sputtering Target Plate | |
| 44 | PRAXAIR MRC MRCGTI0009678 TI TITANIUM Sputtering Target Plate | |
| 45 | SEMICORE / MRC SEC-643 SC643 RF Sputter Coater Sputtering System | |
| 46 | SiO2 sputtering target 4″ diameter 0.25″ thick sputter NEW old stock MRC | |
| 47 | Sputtering Target Silicon Dioxide (SiO2) Diameter:3 inch Thick:0.5 inch:4 pcs | |
| 48 | TEL / MRC SPUTTER PART P/N A115553 | |
| 49 | TEL Tokyo Electron D122081 Sputter Shield Rev. C MRC Metron New Surplus | |
| 50 | Tosoh ( Materials Research Corp MRC -Varian) VP Delta Al/Cu Sputter Target NOS | |
| 51 | Varian ( Materials Research Corp MRC -Tosoh) VP Delta Al/Si Sputter Target NOS |
LOT2.1/ID380EB
