Description
Model: Temescal BJD-1800 3-Cathode Sputter System
Category: Sputter
Original Equipment Manufacturer: Temescal/ TFE
Condition: Used in Caltech University before Dec., 2018. We sell them at AS IS,WHERE IS condition. Refurbished or Refurbished&Upgraded are optional at extra cost and time.
Price: Please make an offer, Terms – Prepay
Quantity: 1
Valid Time: Subject to prior sale without notice
Lead Time: Immediately after receipt of payment.
Location: U.S.A.
Warranty: No warranty for the AS IS,WHERE IS condition.
Description:
Temescal BJD-1800 3-Cathode Sputter System, System Specs: (see picture). Excellent condition. The system was fully operational prior to deinstallation in a Fab in Silicon Valley.
This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange and motorized linear motion assembly. The 7 .5″ substrate table assembry is mounted within this low volume adapter.
Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7″ diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300 watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downmeam pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.
