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Temescal BJD-1800 3-Cathode Sputter System

Temescal BJD-1800 3-Cathode Sputter System

Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition

Description

Model Temescal BJD-1800 3-Cathode Sputter System

Category:  Sputter

Original Equipment Manufacturer: Temescal/ TFE

Condition: Used in Caltech University before Dec., 2018. We sell them at AS IS,WHERE IS condition. Refurbished or Refurbished&Upgraded are optional at extra cost and time.

Price: Please make an offer, Terms – Prepay

Quantity: 1

Valid Time: Subject to prior sale without notice

Lead Time: Immediately after receipt of payment.

Location: U.S.A.

Warranty: No warranty for the AS IS,WHERE IS condition.

Description:

Temescal BJD-1800 3-Cathode Sputter System, System Specs: (see picture). Excellent condition.  The system was fully operational prior to deinstallation in a Fab in Silicon Valley.

 
This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange and motorized linear motion assembly. The 7 .5″ substrate table assembry is mounted within this low volume adapter.
Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7″ diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300 watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downmeam pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.

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