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Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher

Oxford 133 -SN-417718

2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher

SKU: STS Multiplex ICP -5-1-1-1-1 Categories: Etcher, Oxford, RIE ICP DRIE Bosh Tags: Oxford Instruments, Plasmalab

Description

Description

2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher

Location: Nanjing, Jiangsu, China

OXFORD Plasmalab 133 RIE (CL)

Model Year : 2003
Quantity : 1
Condition : Refurbished with OEM specifications ,crating, warranty, installation if necessary at different prices.
Serial No : 417718

Availability : Subject to prior sale without notice.

Configuration:

Supports wafer sizes up to 300mm (330mm Platen)

RIE set up for GaN Etch

RF Power: 600W, 13.56MHz

Water cooled electrode 10C-80C

Load Lock with turbo pump

End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 6 lines including following MFCs:
Ar – 100sccm
CL – 100sccm
BCL3 – 100sccm
N2O – 100sccm

Windows PC, User friendly interface

This tool was removed from production October 2014.

Chiller, Pump are not included.

MSP-175K-195K

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Metrology | Tester | Wafer Carriers
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