Description
GSI UltraDep 1 PECVD :
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Equipment Make: GSI
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Equipment Model: UltraDep 1
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Type: PECVD
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Wafer Size: 4″, 6″
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TEOS silicon oxide: normal & low stress
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Silicon oxide
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Silicon nitride: stoichiometric & low stress
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Amorphous silicon: doped and undoped
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Oxynitrides: 1.46 – 2.0 refractive index range
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TEOS Oxide
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PSG,BSG, and BPSG
Condition: Used. We sell it at AS IS .
Valid : It is only for end users and is subject to prior sale without notice. Appreciate your time!
Info on the system from the owner for your reference.
OEM-2