Description
- Basic plasma research
- Photoresist Ashing
- III-V compound semiconducts (GaAsn,InP,GaN)
- Si, SiO2, SiNx
Plasma Etch System Options
- High vacuum pumping system
- OES or RGA systems.
- Load-Lock System(single substrate, cassette-to-cassette)
- Cluster able for vacuum transfer of substrates