Description
Oxford Instruments Plasmalab 100 PECVD TEOS Deposition System Load Locked
Condition: Used.
- Wafer Size Range Maximum 200 mm
- Process: PECVD & TEOS
- Controller Type: PC
- Loadlock
- Loadlock Pump: Alcatel APT 80 Turbo, ACT 200T Controller
- RF Generator: Advanced Energy LF5 & Advanced Energy RFX 600A
- Ten Process Gas Inputs with MFCs
- CF4 80%, O2 20%–500 SCCM—MKS 1179A
- Ar 90%, PH3 10%–50 SCCM—MKS 1479A
- Ar 90%, GeH4 10%–50 SCCM—MKS 1479A
- Ar 90%, BeH6 10%–50 SCCM—MKS 1479A
- N2 95%, SiH4 5%–1 SLM—MKS 1479A
- NH3 100%–100 SCCM—MKS 1479A
- N2O 100%–3 SLM—MKS 1179A
- N2O 100%–200 SCCM MKS 1179A
- N2 100%–2 SLM MKS 1179A
- O2 100%–500 SCCM MKS 1179A
Location: USA
Lead time: TBD
Valid Time: Subject to prior sale. This item is only for end user.
OEM-Module-2
