Description
The items are subject to prior sale without notice. These items are only for end users.
1 | ADE | Metrology | WaferSight | Wafer Flatness Measurement | 12 |
2 | Alcatel | Etch | Alcatel Gir | Dry Etch | 5 |
3 | AMAT | CMP | Reflexion | Oxide CMP | 12 |
4 | AMAT | CVD | Centura DxZ | PESiON | 8 |
5 | AMAT | CVD | Centura DxZ | PESiON | 8 |
6 | AMAT | CVD | Centura UltimaX | IMD FSG/USG HDP | 12 |
7 | AMAT | CVD | Centura UltimaX | IMD FSG/USG HDP | 12 |
8 | AMAT | CVD | P5000 | CVD | 8 |
9 | AMAT | CVD | P5000 | LTO CVD, TEOS | 8 |
10 | AMAT | CVD | P5000 | LTO CVD, TEOS | 8 |
11 | AMAT | CVD | P5000 | LTO CVD, TEOS | 8 |
12 | AMAT | CVD | P5000 | Oxide | 8 |
13 | AMAT | CVD | P5000 | PECVD | 4 |
14 | AMAT | CVD | P5000 | PECVD | 4 |
15 | AMAT | CVD | P5000 | PECVD | 4 |
16 | AMAT | CVD | P5000 | PECVD | 5 |
17 | AMAT | CVD | P5000 | TEOS | 6 |
18 | AMAT | CVD | P5000 | TEOS | 6 |
19 | AMAT | CVD | P5000 Optima | LP-CVD | 8 |
20 | AMAT | CVD | Producer GT Chamber | Low K | – |
21 | AMAT | CVD | Producer SE | ACL | 12 |
22 | AMAT | CVD | Producer SE | SA BPSG | 12 |
23 | AMAT | Etch | Centura DPS2 Metal | Metal | 12 |
24 | AMAT | Etch | Centura DPS2 Poly | Poly | 12 |
25 | AMAT | Etch | Centura DPS2 Poly | Poly | 12 |
26 | AMAT | Etch | Centura2 eMAX | Oxide | 8 |
27 | AMAT | Etch | P5000 | Metal | 6 |
28 | AMAT | Etch | P5000 | Metal | 6 |
29 | AMAT | Etch | P5000 | Metal | 6 |
30 | AMAT | Etch | P5000 | Poly | 6 |
31 | AMAT | Etch | P5000 | Poly | 5 |
32 | AMAT | Etch | P5000 | Poly | 6 |
33 | AMAT | Metrology | Orbot WF720 | Metrology | 5 |
34 | AMAT | Metrology | SEMVision G3 | – | 12 |
35 | AMAT | Metrology | SEMVision G3 FIB | DR SEM | 12 |
36 | AMAT | Metrology | UVision 4 | Bright field inspection | 12 |
37 | AMAT | Metrology | WF720 | Metrology | 6 |
38 | AMAT | Metrology | WF730 | Metrology | 6 |
39 | AMAT | PVD | Endura 2 | METAL | 12 |
40 | AMAT | PVD | Endura CL | PVD | 12 |
41 | AMAT | RTP | AMC7800RPX | EPI | 6 |
42 | AMAT | RTP | AMC7811 | EPI | 6 |
43 | AMAT | RTP | AMC7821 | EPI | 6 |
44 | AMAT | RTP | AMC7821 | EPI | 6 |
45 | AMAT | RTP | Centura XE | Anneal | 8 |
46 | ASM | CVD | Dragon 2300 | PECVD Equipment for Barrier | 12 |
47 | ASM | CVD | Eagle10 | DARC | 8 |
48 | ASM | CVD | Eagle10 | PETEOS | 8 |
49 | ASM | CVD | Eagle12 | Curing | 12 |
50 | ASML | Scanner | AT850T | Twin Scanner | 12 |
51 | ASML | Scanner | XT1250D | Arf twinscan | 12 |
52 | ASML | Scanner | XT1400F | ArF, twinscan | 12 |
53 | ASML | Stepper | PAS 2500/30 | Lithography | 5 |
54 | ASML | Stepper | PAS 2500/40 | Lithography | 5 |
55 | ASML | Stepper | PAS 2500/40 | Lithography | 5 |
56 | ASML | Stepper | PAS 5500/100D | i-Line | 6 |
57 | ASML | Stepper | PAS 5500/400D | i-line Scanner | 8 |
58 | Asyst | FAB ETC | LPT2000 | SMIF, LEFT | 8 |
59 | Asyst | FAB ETC | LPT2200 | SMIF, RIGHT | 8 |
60 | Aviza/SVG | Furnace | 10K | Diffusion | 5 |
61 | Aviza/SVG | Furnace | 10K | Diffusion | 5 |
62 | Axcelis | Asher | Microlite | Lithography | 5 |
63 | Axcelis | Track | RapidCure 320FC | UV anneal Unit | 12 |
64 | Blue M | FAB ETC | DCC 606 EMP550 | – | 12 |
65 | BMR | Etch | ICP Etcher | ICP Etch | 4 |
66 | BMR | Etch | ICP Etcher | ICP Etch | 4 |
67 | Canon | Scanner | FPA-5000ES3 | KrF Scanner | 8 |
68 | Canon | Scanner | FPA-6000ES6a | 90nm,KrF) Scanner | 12 |
69 | Canon | Stepper | FPA-3000i4 | i-line | 8 |
70 | Canon | Stepper | FPA-5500iZ+ | i-Line Stepper | 12 |
71 | Cymer | Scanner | ELS-5400 | KrF Laser | – |
72 | Cymer | Scanner | ELS-5410 | KrF Laser | – |
73 | DNS | CMP | AS2000 | – | 8 |
74 | DNS | CMP | AS2000 | [Part] AS2000 | 8 |
75 | DNS | CMP | AS2000 | [Part]AS2000 | 8 |
76 | DNS | CMP | AS2000 | Oxide | 8 |
77 | DNS | RTP | LA-820 | Lamp Anneal | 8 |
78 | DNS | RTP | LA-W820-A | Lamp Anneal | 8 |
79 | DNS | Track | RF-300A | Track | 8 |
80 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
81 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
82 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
83 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
84 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
85 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
86 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
87 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
88 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
89 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
90 | DNS | Track | SS-W80A-A | Scrubber | 8 |
91 | DNS | Track | SS-W80A-A | Scrubber | 8 |
92 | DNS | Track | SS-W80A-A | Scrubber | 8 |
93 | DNS | Track | SS-W80A-A | Scrubber | 8 |
94 | DNS | Track | SS-W80A-A | Scrubber | 8 |
95 | DNS | WET | FC-3000 | Wet Station | 12 |
96 | DNS | WET | SU-3100 | CLN | 12 |
97 | DNS | WET | WS-820C | Wet Etching | 8 |
98 | EBARA | CMP | EPO-222 | WCMP | 8 |
99 | EBARA | CMP | EPO-222A | W | 8 |
100 | EBARA | CMP | EPO-222A | W | 8 |
101 | EBARA | CMP | EPO-222A | W | 8 |
102 | EBARA | CMP | EPO-222A | W | 8 |
103 | EBARA | CMP | EPO-222A | W | 8 |
104 | EBARA | CMP | EPO-223 | W | 8 |
105 | EBARA | CMP | EPO-223 | W | 8 |
106 | EBARA | CMP | EPO-223 | W | 8 |
107 | EBARA | CMP | F-REX200 | ox | 8 |
108 | EBARA | CMP | F-REX300S | W | 12 |
109 | EBARA | CMP | F-REX300S | W | 12 |
110 | EBARA | CMP | F-REX300S | W | 12 |
111 | Fusion | Track | M150 | Dry Etch | 5 |
112 | Fusion | Track | M150PC | Lithography | 6 |
113 | Fusion | Track | M150PC | Lithography | 6 |
114 | GES | CVD | CAYMAN | PESiON | 12 |
115 | GES | CVD | CAYMAN | PESiON | 12 |
116 | GES | CVD | CAYMAN | PESiON | 12 |
117 | GES | CVD | CAYMAN | PESiON | 12 |
118 | GES | CVD | CAYMAN | PESiON | 12 |
119 | Hitachi | Etch | DM421P | Etch | 8 |
120 | Hitachi | FAB ETC | UTS2020 | Lithography | 6 |
121 | Hitachi | Metrology | I6300 | Defect Inspection | 12 |
122 | Hitachi | Metrology | I6300 | Defect Inspection | 12 |
123 | Hitachi | Metrology | IS2700 | Dark Field inspection | 12 |
124 | Hitachi | Metrology | RS3000 | DR SEM | 8, 12 |
125 | Hitachi | Metrology | RS3000T | DR SEM | 12 |
126 | Hitachi | Metrology | RS4000 | DR SEM | 12 |
127 | Hitachi | Metrology | RS4000 | DR SEM | 12 |
128 | Hitachi | Metrology | RS5000 | DR SEM | 12 |
129 | Hitachi | Metrology | S-5200 | FE SEM | – |
130 | Hitachi | Metrology | S-9220 | METRO | 8 |
131 | Hitachi | Metrology | S-9380II | CD SEM | 12 |
132 | Hitachi | Metrology | S-9380II | CD SEM | 12 |
133 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 8 |
134 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 8 |
135 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 8 |
136 | Hitachi Kokusai | Asher | RAM-8500ZX | Asher | 8 |
137 | Hitachi Kokusai | Furnace | DD-1206V-DF | Gate OX | 12 |
138 | Hitachi Kokusai | Furnace | DD-1206V-DF | Gate OX | 12 |
139 | Hitachi Kokusai | Furnace | DD-1206V-DF | Gate OX | 12 |
140 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
141 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
142 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
143 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
144 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
145 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
146 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
147 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
148 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
149 | Hitachi Kokusai | Furnace | DD-1206VN-DF | BPSG-ANL | 12 |
150 | Hitachi Kokusai | Furnace | DD-1206VN-DF | Oxide undope | 12 |
151 | Hitachi Kokusai | Metrology | VR-120SD | Resistivity Measurement | 12 |
152 | Horiba | Metrology | PR-PD2 | Reticle/Mask Particle Detection System | 6 |
153 | JEOL | Metrology | JSM-7401F | FE SEM | 12 |
154 | Karl SUSS | Stepper | MA150 | Aligner | 6 |
155 | Karl SUSS | Stepper | MA150 | Aligner | 6 |
156 | Karl SUSS | Stepper | MA200 | Aligner | 8 |
157 | Karl SUSS | Stepper | MA200 | Aligner | 6, 8 |
158 | Karl SUSS | Stepper | MA200 | Aligner | 6, 8 |
159 | KLA-Tencor | Metrology | AIT Fusion | Dark Field inspection | 8 |
160 | KLA-Tencor | Metrology | AIT XUV | Dark Field inspection | 12 |
161 | KLA-Tencor | Metrology | Aleris CX | Film thickness measurements | 12 |
162 | KLA-Tencor | Metrology | Aleris HX8500 | Thickness Mesurement | 12 |
163 | KLA-Tencor | Metrology | Archer 10 AIM+ | Overlay | 12 |
164 | KLA-Tencor | Metrology | Archer AIM MPX | Overlay | 12 |
165 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 12 |
166 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 12 |
167 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 12 |
168 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 8 |
169 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 8 |
170 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | 12 |
171 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | 12 |
172 | KLA-Tencor | Metrology | Ergolux | Metrology | 6 |
173 | KLA-Tencor | Metrology | INM100+INS10 | Metrology | 6 |
174 | KLA-Tencor | Metrology | KLA2371 | Inspection | 8 |
175 | KLA-Tencor | Metrology | KLA2552 | Data Review Station | 8 |
176 | KLA-Tencor | Metrology | KLA2800 | Bright Filed inspection | 12 |
177 | KLA-Tencor | Metrology | KLA5100 | Metrology | 8 |
178 | KLA-Tencor | Metrology | LDS3300M | Macro inspection | 8 |
179 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | 5 |
180 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | 5 |
181 | KLA-Tencor | Metrology | MPV-CD | Metrology | 5 |
182 | KLA-Tencor | Metrology | NANOMAPPER | Nanotopography | 12 |
183 | KLA-Tencor | Metrology | P11 | Profiler | 6 |
184 | KLA-Tencor | Metrology | Puma 9000 | Dark field defect Inspection | 12 |
185 | KLA-Tencor | Metrology | Puma 9130 | Dark field defect Inspection | 12 |
186 | KLA-Tencor | Metrology | SFS7700 | Particle Counter | 5 |
187 | KLA-Tencor | Metrology | Surfscan 2.1 | Particle Counter | 5 |
188 | Komatsu | Scanner | G20K2-1 | KrF Laser | – |
189 | Komatsu | Scanner | G20K2-1 | KrF Laser | – |
190 | Komatsu | Scanner | G20K4-1 | KrF Laser | – |
191 | Komatsu | Scanner | G20K4-1 | KrF Laser | – |
192 | Komatsu | Scanner | G20K4-1 | KrF Laser | – |
193 | Lam | Etch | 2300 Exelan | Oxide | 12 |
194 | Lam | Etch | 2300 Exelan Flex | Oxide | 12 |
195 | Lam | Etch | R4420 | Oxide | 8 |
196 | Lam | Etch | R4420 | Poly | 8 |
197 | Lam | Etch | R4520 | Oxide | 8 |
198 | Lam | Etch | R4520 | Oxide | 8 |
199 | Lam | Etch | TCP9600SE | Metal | 8 |
200 | Mattson | Asher | Aspen 2 | Photoresist Stripper | 8 |
201 | Mattson | Asher | Aspen 2 | Photoresist Stripper | 8 |
202 | Mattson | Asher | Aspen 3 | Light etch, 3LP + 2 chamber | 12 |
203 | Mattson | Etch | Paradigme SP | Light Etch | 12 |
204 | Mattson | Etch | Paradigme SP | Light Etch | 12 |
205 | Mattson | RTP | AST3000 | RTP | 8 |
206 | Mattson | RTP | AST3000 | RTP | 12 |
207 | Mattson | RTP | AST3000 | RTP | 12 |
208 | Mattson | RTP | AST3000 | RTP | 8 |
209 | Mattson | RTP | AST3000 | RTP | 12 |
210 | Mattson | RTP | AST3000 plus | RTP | 12 |
211 | Mattson | RTP | Helios | RTP | 12 |
212 | Mattson | RTP | Helios | RTP | 12 |
213 | Mattson | RTP | Helios | RTP | 12 |
214 | Montair | Etch | Prefurnace clean | General | 5 |
215 | Montair | Etch | Wafer etch | General | 5 |
216 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 12 |
217 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 12 |
218 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 12 |
219 | Nanometrics | Metrology | Metra2200M | Overlay | 8 |
220 | Nanometrics | Metrology | Metra7200 | Overlay | 8 |
221 | Nanometrics | Metrology | NanoSpec 210 | Metrology | 5 |
222 | Nikon | Metrology | OPTIPHOT 66 | Microscope | 6 |
223 | Nikon | Scanner | NSR-S204B | KrF Scanner | 8 |
224 | Nikon | Scanner | NSR-S204B | KrF Scanner | 8 |
225 | Nikon | Scanner | NSR-S205C | KrF Scanner | 8 |
226 | Nikon | Scanner | NSR-S609B | Scanner | 12 |
227 | Nikon | Stepper | NES1-H04 | Mini stepper | 4 |
228 | Nikon | Stepper | NSR-2005i10C | i line stepper | 2 |
229 | Nikon | Stepper | NSR-2005i9C | i line stepper | 8 |
230 | Nikon | Stepper | NSR-2005i9C | i line stepper | 8 |
231 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | 8 |
232 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | 8 |
233 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 8 |
234 | Nikon | Stepper | NSR-2205i11D | i-Line stepper | 4 |
235 | Nikon | Stepper | NSR-4425i | i-Line | 8 |
236 | Nikon | Stepper | NSR-SF120 | i-Line stepper | 12 |
237 | Nikon | Stepper | NSR-SF130 | Stepper | 12 |
238 | Nikon | Stepper | NSR-TFHEX14C | KrF Stepper | 6 |
239 | Novellus | Asher | Gamma2130 | Asher | 12 |
240 | Novellus | CVD | C2 Altus | WCVD | 8 |
241 | Novellus | CVD | C2 Speed Shrink | HDP | 8 |
242 | Novellus | CVD | C2 Speed Shrink | HDP | 8 |
243 | Novellus | CVD | C3 Speed MAX | HDP | 12 |
244 | Novellus | CVD | C3 Speed NEXT | HDP | 12 |
245 | Novellus | CVD | C3 Speed XT | ILD, IMD | 12 |
246 | Novellus | CVD | Vector | Passivation SiO2/SiN, BL ARC | 12 |
247 | Novellus | CVD | Vector | PESiN/PETEOS | 12 |
248 | Novellus | CVD | Vector Express | PESiN/PETEOS | 12 |
249 | Novellus | CVD | Vector Extreme | CVD | 12 |
250 | Novellus | PVD | Inova | PVD | 8 |
251 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
252 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
253 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
254 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
255 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
256 | OAI | Metrology | 358 | Stepper Exposure Analyzer | 6 |
257 | OAI | Metrology | 358 | Stepper Exposure Analyzer | 6 |
258 | OAI | Metrology | 358 | Stepper Exposure Analyzer | 6 |
259 | Olympus | Metrology | BHMJL | Microscope | 6 |
260 | Olympus | Metrology | BHMJL | Microscope | 6 |
261 | PSK | Asher | Tera 21 | PR Ashing | 12 |
262 | Rudolph/August | Metrology | 3Di8500 | Wafer Inspection | 12 |
263 | Rudolph/August | Metrology | Axi-S | Macro inspection | 12 |
264 | Rudolph/August | Metrology | Axi-S | Macro Inspection | 12 |
265 | Rudolph/August | Metrology | Axi-S | Macro Wafer Inspection | 8 |
266 | Rudolph/August | Metrology | FE-IV | Inspection | 8 |
267 | Rudolph/August | Metrology | FE-VII | Ellipsometer | 8 |
268 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | 8 |
269 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | 8 |
270 | Rudolph/August | Metrology | MetaPULSE 300 | Thickness Measurement | 12 |
271 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 8 |
272 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 8 |
273 | SEMES | WET | WS-820L | WET | 8 |
274 | Semitool | WET | Raider ECD | Electroplating | 12 |
275 | Semitool | WET | Raider ECD | Electroplating | 8 |
276 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 5 |
277 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 6 |
278 | Semitool | WET | SST-F-421-280-FK | Spin Dryer | 6 |
279 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 5 |
280 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 6 |
281 | Semix | Track | TZP | Lithography | 6 |
282 | SEZ | WET | SP201 | – | 8 |
283 | SEZ | WET | SP201 | – | 8 |
284 | SEZ | WET | SP201 | – | 8 |
285 | Star | FAB ETC | 2000 Primer | ATV | 5 |
286 | Star | FAB ETC | 2000 Primer | General | 5 |
287 | Surftens | Metrology | Measurement | Metrology | 6 |
288 | SVG | Furnace | 5204 | Diffusion | 5 |
289 | SVG | Furnace | 5204 | Diffusion | 5 |
290 | TEL | CVD | Trias | ALD TiN | 12 |
291 | TEL | CVD | Trias | CVD TiN | 12 |
292 | TEL | CVD | Trias | Metal | 12 |
293 | TEL | CVD | Trias SPA | CVD | 12 |
294 | TEL | CVD | Trias SPA | CVD | 12 |
295 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
296 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
297 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
298 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
299 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
300 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
301 | TEL | Furnace | Alpha-303i-H | D-Poly | 12 |
302 | TEL | Furnace | Alpha-303i-H | D-Poly | 12 |
303 | TEL | Furnace | Alpha-303i-H | MTO | 12 |
304 | TEL | Furnace | Alpha-303i-H | MTO | 12 |
305 | TEL | Furnace | Alpha-303i-H | MTO | 12 |
306 | TEL | Furnace | Alpha-303i-K | DCS MTO | 12 |
307 | TEL | Furnace | Alpha-303i-K | HTO/SiN | 12 |
308 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
309 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
310 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
311 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
312 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
313 | TEL | Furnace | Alpha-303i-K | PIQ | 12 |
314 | TEL | Furnace | Alpha-303i-K | Poly | 12 |
315 | TEL | Furnace | Alpha-303i-K | TEOS | 12 |
316 | TEL | Furnace | Formula | Nit | 12 |
317 | TEL | Furnace | Formula | Nit | 12 |
318 | TEL | Furnace | Formula | SiGe-POLY | 12 |
319 | TEL | Furnace | Indy-A | DCS Nit | 12 |
320 | TEL | Furnace | Indy-A | DCS Nit | 12 |
321 | TEL | Furnace | Indy-B | DIFF | 12 |
322 | TEL | PVD | MarkIV | Metal sputter | 8 |
323 | TEL | Track | ACT12 | COT/DEV | 8 |
324 | TEL | Track | ACT12 | COT/DEV | 12 |
325 | TEL | Track | ACT12 | COT/DEV | 12 |
326 | TEL | Track | ACT12 | COT/DEV | 12 |
327 | TEL | Track | ACT8 | COT/DEV | 8 |
328 | TEL | Track | ACT8 | COT/DEV | 8 |
329 | TEL | Track | ACT8 | COT/DEV | 6 |
330 | TEL | Track | LITHIUS | – | 12 |
331 | TEL | Track | LITHIUS | – | 12 |
332 | TEL | Track | LITHIUS | – | 12 |
333 | TEL | Track | LITHIUS | – | 12 |
334 | TEL | Track | LITHIUS | – | 12 |
335 | TEL | Track | LITHIUS | – | 12 |
336 | TEL | Track | LITHIUS | – | 12 |
337 | TEL | Track | LITHIUS | – | – |
338 | TEL | Track | LITHIUS | COT/DEV | 12 |
339 | TEL | Track | LITHIUS | COT/DEV | 12 |
340 | TEL | Track | LITHIUS | COT/DEV | 12 |
341 | TEL | Track | LITHIUS | COT/DEV | 12 |
342 | TEL | Track | LITHIUS | COT/DEV | 12 |
343 | TEL | Track | LITHIUS | COT/DEV | 12 |
344 | TEL | Track | LITHIUS | COT/DEV | 12 |
345 | TEL | Track | LITHIUS | COT/DEV | 12 |
346 | TEL | Track | LITHIUS | COT/DEV | 12 |
347 | TEL | Track | LITHIUS | COT/DEV | 12 |
348 | TEL | Track | LITHIUS i+ | – | 8 |
349 | TEL | Track | LITHIUS i+ | COT/DEV | 12 |
350 | TEL | Track | Mark7 | COT/DEV | 8 |
351 | TEL | Track | Mark7 | COT/DEV | 8 |
352 | TEL | Track | NS300 | Scrubber | 12 |
353 | TEL | Track | NS300 | Scrubber | 12 |
354 | TEL | Track | NS300 | Scrubber | 12 |
355 | Ultratech | Stepper | 1500 | Lithography | 6 |
356 | Ultratech | Stepper | 1500 | Lithography | 6 |
357 | Ultratech | Stepper | 1500 | Lithography | 6 |
358 | Ulvac | PVD | Ceraus Z-1000 | PVD | 8 |
359 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
360 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
361 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
362 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
363 | Ulvac | PVD | Entron EX | PVD | 12 |
364 | Ulvac | PVD | Entron EX W300 | PVD | 12 |
365 | Ulvac | PVD | Entron EX W300 | PVD | 12 |
366 | Ulvac | PVD | Entron S | PVD | 12 |
367 | Ulvac | PVD | Entron T | PVD | 12 |
368 | UNAXIS | PVD | LLS900 | PVD | 8 |
369 | Ushio | Track | UMA-1002-HC93FS | Stabilizer | 8 |
370 | Ushio | Track | UMA-1002-HC93FWL | Stabilizer | 8 |
371 | Varian | PVD | 3290 | PVD | 6 |
372 | Veeco | Metrology | Dimension X3D | AFM | 12 |
373 | WONIK IPS | CVD | MAHA SP | PTEOS | 12 |
374 | Yield Engineering System | FAB ETC | YES-5 | Lithography | 6 |
375 | Yield Engineering System | FAB ETC | YES-5E | Lithography | 6 |
376 | Yield Engineering System | FAB ETC | YES-5E | Lithography | 6 |
SS5684