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Temescal FC-1800 Evaporator

Temescal FC-1800 Evaporator,Power Supply and other system components (Crated, not pictured),San Jose, CA, U.S.A.

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Description

Temescal FC-1800 Evaporator

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OEM: Temescal 

Model: Temescal FC-1800 Evaporator

Includes:  Power Supply and other system components (Crated, not pictured)

Location: San Jose, CA, U.S.A.

Description of Temescal FC-1800 Loadlock E-Beam Evaporator for your reference.

Production Features
• High throughput due to fast cycling, load-lockdesign
• Better reproducibility and higher yields because of complete programmed sequencing
• Improved step coverage with 2R source-to-substrate spacing
• Single dome for lift-off processes
• Minimized EIB source and substrate heater contamination since lower chamber is isolated
• Clean, convenient operation in laminar flow hood because of low profile construction

• Canted-dome planetary fixturing possible in full capacity chamber
• Manual semiautomatic or fully automatic operation due to modular systems designs
• Multimetal deposition capability with optional sources

The load-lock fast cycle concept

In 1966, Temescal introduced the first practical fast cycle coater designed for production-scale vacuum deposition-the FC-1100 with an 11″-diameter substrate carrier. It was made possible by the development  f higher-speed, more efficient pumping systems, more reliable power supplies, and rugged, dependable electron-beam sources with long-life filaments. The objectives were to free industry from dependence on a batch-type operation: to offer consistently superior coatings cycle after cycle, run after run, and to insure reproducibility. The sophisticated capability of the FC-1800 is based on the technology pioneered in development of the FC-1 100. The success of the simple concept of keeping the evaporation chamber under vacuum at all times while  loading substrates in and out through an isolated load/unload chamber (or chambers) depended on the efficiency of the electron-beam source and related accessories. Temescal anticipated the demands of evaporation technology and was largely responsible for the configuration of today’s proven electron-beam sources. Many problems were solved in the years between the development of the first FC-11 00 and today’s highly sophisticated FC-1800. Most were mechanical in nature: for example. eliminating shut-downs due to flaking, developing jamb-proof internal wire feeders, replacing O-ring seals with bellows seals, protecting sealing surfaces from scattered evaporant. and creating rotating rod-fed sources for subliming materials such as chrome and silica. The problems had to be solved quickly since industrial evaporation requirements were outgrowing the bell jar. By developing the integrated equipment needed by the electronics industry, Temescal has attained a unique “total systems” responsibility in the vacuum industry. We completely assemble and rigorously test each FC-1800 prior to shipment. “Total system” performance is guaranteed by Temescal. “Total system” maintenance and service are performed by qualified Temescal service engineers. You deal with only one manufacturer – TEMESCAL-and our responsibility is complete and fixed. This, in turn. makes Temescal a one-stop source for all vacuum deposition needs from the finest bell jar systems to high-production load-lock coaters.

The FC-1800

Compact
Although the FC- 1800 occupies the same floor space as and only two-thirds the height of a conventional bell Jar of the same diameter, It produces more than twice the per-shift volume. In addition. the substrates are of a consistently higher quality. For example. it takes only
9 minutes per cycle to evaporate and deposit 10,000 angstroms of aluminum. This includes the substrate heating and cooling cycles.

Capacity
Despite its compact 20″-diameter by 11 “-deep size, the FC-1800 deposition chamber is designed to accommodate the same mechanisms and duplicate all the functions performed in a conventional bell jar. The small volume of this chamber (approximately 60 liters)  can be pumped down rapidly before deposition usually in less than two minutes, utilizing the standard 30 cfm mechanical pump. This rapid pump-down is
possible because of a special gate valve. The balance of the system remains under continuous vacuum throughout the run.

Uniformity and Reproducibility
Maximum uniformity of ± 7% is a characteristic of substrates coated in the Temescal canted-dome planetary and angle-of-incidence dome. Step coverage with the canted dome is excellent. Reproducibility is outstanding because the evaporation chamber is kept under vacuum at all times and the possibility of trapped or absorbed gases is minimized. Because of the efficiency of the Temescal electron-beam sources and efficiency of the Temescal electron-beam sources and the integrity of the valve system, the material to be evaporated in this unique load-lock fast-cycle coater always remains outgassed and at its threshold of evaporating temperature. The source is never allowed to cool. and the longer the evaporation chamber remains hot and under vacuum, the cleaner the system becomes. With proper cleaning of the substrates. consistent coating reproducibility is assured.

Options
There is no need to buy more capability than is required. The basic FC-1800 load-lock fast-cycle coater includes automatic valve sequencing during pump-down and venting to atmosphere. All other steps may be conducted manually by activating switches or pushing buttons.
However, modules may be added to fully automate the FC-1800. With total automation, the operator need only load and unload substrates and start the automatic cycle. In addition to automation, options include substrate heaters, a second or multi-crucible electron-beam source for sequential or graded deposition, rate and thickness monitors, shutters, wire feeders, filament evaporation sources, and many others.

Simplicity
Simplicity of operation depends entirely on the number of options ordered. However, even In the basic manual model, a semiskilled technician can operate the FC-1800 with minimum training. In construction. the FC-1800 incorporates the best features of a bell jar. It has the same uncomplicated valve sequencing. All controls are within easy reach. Unlike the conventional bell Jar. there Is no troublesome
hoist or heavy chamber. Loading is at a comfortable height. The spring-loaded hinged lid lifts with a finger-tip touch and remains In any preset position until lowered. And because of its low profile construction. the FC-1800 fits neatly into the economical, clean environment of a freestanding laminar-flow hood.

Vacuum Chambers
The large-capacity but compact load-lock deposition chamber is 20 inches in diameter and 11 inches high. By optimum utilization of space, this chamber duplicates the coating capacity and the flexibility of a conventional bell jar, and, at the same time, can be pumped down in less than two minutes. The lid is dome-shaped and will accept a canted-dome or angle of-incidence planetary fixture. The lid is hinged and spring-loaded. The spring-tensioned hinge can be set to keep the lid open in any position desired. One viewing port is provided in the load-lock deposition chamber. The volume of this “work” chamber is approximately one-third that of a conventional bell jar, so pump down is exceptionally fast. Work may be cooled in this chamber under vacuum or under partial pressure of inert gas. The evaporation chamber, directly below the deposition chamber. is kept under high vacuum continuously. It is large enough to accommodate one or two electron beam
sources associated with wire or rod-fed crucibles, feeders, shutters and monitors. Chambers and associated hardware are made of 304 stainless steel with internal surfaces No. 4 finish, or better to reduce outgassing and to facilitate cleaning. A new, unique and extremely efficient shielding system in this chamber protects all internal components from the evaporant. This one-piece shield is in the form of an open-ended single-stepped stainless steel cylinder which is held in place with spring clips. Cleaning is exceptionally easy and fast, outside the
chamber. The spring clips are released. and the unit drops straight down and out of the system.

Valves
The valve system is very similar to that used in bell jar valve sequencing. It has a simple. direct sequence which automatically controls four valves: (1) Roughing valve. (2) Deposition chamber vent valve. (3) Foreline valve, and (4) High-vacuum gate. The high-vacuum gate also acts as a shutter prior to substrate heating and deposition. It is designed to slide out of the way during evaporation. An isolation valve above the diffusion pump allows maintenance in the evaporation chamber without having to cool and vent the diffusion pump or bring the liquid nitrogen baffle up to ambient temperature.

Pumping Systems
The standard pumping system includes a 6-inch, highspeed diffusion pump module with ultimate pressure In the 1 o-e torr range. The system includes a highvacuum gate valve. a diffusion-pump isolation valve. a liquid-nitrogen trap and a 30 elm mechanical pump. The l1qu1d-nitrogen trap and its offset reservoir are built as one unit. A top diaphragm assures positive antimigrat1on trapping of all pumping fluids. Tests conducted under adverse conditions-without liquid nitrogen-measured an available pumping speed of 900 I/S when utilizing the expanded 6-inch d1ffus1on pump.   An alternate pumping system is the Cyro-Torr1 CTI 8 cryopump which can be supplied with either air- or water-cooled compressors. This model has pumping speeds of 400 I/s of water vapor.

Shutters
There is an efficient shutter system to protect against unwanted deposition. First. the high-vacuum gate acts as a shutter. Second, a shuttle ring-shaped shield exchanges place with the high-vacuum gate to protect the valve sealing surface during evaporation. Third. a small shutter covers the source until just before evaporation commences, when it swings clear, and. when evaporation stops, closes.

Planetary Fixturing
The FC-1800 is the first load-lock fast-cycle coater designed to accept planetaries-both canted-dome and flat types. The movement of the canted-dome planetary during deposition assures optimum uniformity of coating and step coverage. Using the TP-8 angle-of- incidence
dome and masking guarantees the user of high uniformity and minimum step coverage. Because of the bellows-sealed rotary drive, no leakage of contaminants into the system can occur, even during extended production runs. The consistent high quality, run-after-run, is uniquely attributable to the continuous vacuum environment in the source chamber. Together, the combination of benefits to industrial producers cannot be duplicated by any other vacuum deposition system on the market.

Substrate Heaters
Optional equipment includes substrate heaters. The design of the high-speed substrate heaters is unique and cannot be duplicated in a conventional bell jar. Because the heaters are below the gate valve. contamination resulting from high-temperature exposure to the atmosphere is minimized. Also, the cooling cycle time is reduced since the residual heat is shielded from the substrates by the closed gate valve. Heating action is extremely fast – 300°C substrate temperature is attained in less than 5 minutes. A water-cooling loop keeps the lower portion of the chamber lid cool and protects the O-ring from outgassing. The substrate heating system can be programmed into an automatic cycle. or controlled manually.

Electron-Beam Sources
One or two single or multiple-crucible Temescal 270-degree deflection electron-beam sources may tie installed for single sequential or graded deposition. They have long filament life because I0n erosion has been eliminated, and the cathode is shielded from falling particles. Each electron-beam source can be provided with a quick-acting shutter and a wire- feed mechanism. A variety of arrangements is available for resistance heated evaporation. Rate and thickness control systems can be tailored to exact requirements and coordinated with sources.

Power Supply
The standard power supply is the Temescal Model CV-8. It is rated for 8 kW at 10 kilovolts continuously, can be adjusted from 1.2 to 10 kilovolts and can be used with one or two electron-beam sources. Optionally. the Model CV-14 Temescal 14 kW. 10 kilovolt power supply is available.

Option:NE-6 Switching Power Supply (10KV, 600mA) instead of the  standard power supply  Temescal Model CV-8or CV-14

 

Cabinets and Accessories

Cabinets
A unique feature of the FC-1800 frame construction is the mounting of the roughing pump. This pump rests directly on standard shock mounts on the floor, instead of on long legs. As a result, vibration transmitted to the FC-1800 during roughing is virtually eliminated. When the system is to be moved, a maintenance person simply tightens one nut linking each end of the pump to a bracket on the frame, thus lifting
the pump slightly off the floor and joining it firmly to the sturdy frame. The frame is enclosed by removable painted steel panels. Hinged doors are on the front. Access to the interior from any direction is fast and easy. The counter top is covered with black Formica. Toe space is provided at floor level for the comfort of the operator.

Instrumentation
A compact instrumentation module, which contains all necessary controls and instrumentation for manually operated units, rests on the counter top. With fully automated units, all evaporation sequencing is contained in a 41 “-high rack that may stand on top of the cabinet or in an adjacent freestanding rack. The standard CV-8 electron-beam power supply can fit in the same freestanding rack. An optional electron-beam source power supply is the Temescal CV-14, which is housed in its own rack.

Source Viewing
Since the viewport for the evaporation source is located within the cabinet, Temescal has provided a direct viewing system. With easy-to-reach controls, the technician simply opens the protective shield over the viewing port to view the source. Clear film also protects the viewport from the evaporant. Again, with counter-top controls, the technician simply advances the roll of film to an unexposed section
after it coats up.

Maintenance
All components in the FC-1800 are easily accessible There are two ways to get into the evaporation chamber. For minor maintenance, the diffusion pump isolation valve is closed, the vacuum gate is moved aside, and the operator reaches in from the top of the counter. For cleaning and major maintenance, the entire source tray can be quickly and easily rotated outside the cabinet. Quick utility disconnects are provided. The source tray then is lowered, rotated to the front or side, and raised to counter-top height outside the cabinet.

The instrumentation module contains all necessary controls and instrumentation. It may stand on top of the cabinet or in an adjacent freestanding rack.

Specifications

Cycle Time
10 to 15 minutes for 1 μ of aluminum

Coating Uniformity
± 7% with high-speed planetary substrate fixture
Construction
All internal surfaces are polished 304 stainless steel
Deposition Chamber
20″-diam. x 11 “-high (508 mm x 280 mm) bell jar.Designed for waist-high, 36.25” (921 mm) substrate loading and unloading. Hinged and counter-balanced cover for ease of operation. Easily raised to preset position.
Source Chamber
18″-diam. (457 mm).Automatically maintained at high vacuum at all times to prevent contamination
Source Tray
19″-diam. (483 mm) blank, flat plate.Manually operated jackscrew mechanism for raising and lowering the source tray. When lowered, the tray swings out 90° for ease of access
Electron Beam Source
A variety of optional electron beam source combinations is available (resistance sources available upon request)
Tray-mounted and fully shielded
Power Supply
A variety of 8 and 14 kW electron beam power supplies and accessories is available
Electronics
All components are conservatively rated and have proven records of performance. Electronic equipment is countertop-mounted in a 40.37″ H x 19″ W ( 1026 mm x 483 mm) relay rack for ease of operation (optional floor-supported cabinet available)
Vacuum System
Direct sequencing with automatic control of all valves. Fully automatic evaporation controller available. Vac-map panel, vacuum gauge controller and interconnecting cables provided with visual display of valving sequence and substrate rotation
Vacuum Valves
Stainless steel, removable high vacuum gate valve. Seals upward to isolate the substrate chamber from the evaporation chamber. High-vacuum valve design eliminates scuffing. Diffusion pump isolation valve for ease of maintenance.Handwheel actuated, ½” (13 mm), brass, angle leak detector valve included

Vacuum Pumps
30 cfm (845 I/m) dual-stage mechanical roughing and backing pump. Mounted on separate base for vibration isolation(remote location)
6″, 2400 I/s oil diffusion pump with isolation valve . Cryogenic pumping systems available
Shielding
Stainless steel cylindrical vapor shield in source chamber. Removable stainless steel source tray debris shield .Easily removable seal-ring vapor shield
Viewing Port
Model VV-400 4″ (102 mm) polarized-window viewing port in source chamber. Teflon® film, film advance, and shutter provided for continuous viewing
Cold Trap
Liquid nitrogen-cooled baffle
Vacuum Gauge Controller
Temescal VersaVac® ionization gauge controller with Bayard Alpert gauge tube. Automatic range-changing provided

Pumpdown Time for Load Lock

Less than 2 minutes
Typical Operating Vacuum
Mid 10-6 to mid 10-7 torr range with standard pumping system
Ultimate Operating Vacuum
1 o-8 torr with standard pumping system
Water System
Stainless steel manifold with four available circuits. Flow meter, flow switch and all necessary interconnects provided
Air System
Pressure regulator, meter and all necessary interconnects provided
Installation Requirements
Water: Filtered 1.25 gpm at 50 psig inlet pressure at <60° to 80°F (4.73I/m, 3.51 kg/cm2 , < 16° to 27°C)
Compressed air: 5 elm at 60 to 125 psig inlet pressure, filtered and dried (2360 cc/sec, 4.22 to 8.75 kg/cm2 )
Power: 208 V, 3 ct,, 70 A, 50/60 Hz, 5-wire with active neutral and equipment ground (optional input voltages available). Tolerable voltage ± 5%
Ambient temperature: 80° ± 10°F (26.8 ± 5.5°C)
Humidity: 50% maximum
Instrument weight: < 1800-lb. (818 kg)

Optional accessory utility requirements not included

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175 CHA Industries High Vacuum Valve
176 CHA Industries VG-1A-002 Tube Ionization Ion Gauge Gage NEW NOS VG1B/3
177 CHA Industries Bell Jar
178 CHA Industries VG-1A-006T Tube Ionization Ion Gauge Gage NEW NOS VG1A/2
179 CHA Industries Bell Jar
180 CHA Industries/High Tech Services Filament Electron Panel
181 CHA Industries/High Tech Services Auto Pump Down Control
182 CHA Industries Bell Jar Motorized Hoist
183  CHA Industries Bell Jar Motorized Hoist

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LOT 114+SSEB380

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