Description
Xactix e1 XeF2 Etcher. The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher. XeF2 is a vapor phase etch, which exhibits nearly very high selectivity of silicon to photo-resist, silicon dioxide, silicon nitride and aluminum. The e-1 Series can be used to etch silicon wafers, up to 6” in diameter, wafer pieces, die, or other structure into the etch chamber. Details of the process sequence are controlled and captured by the control software. The etch progress can be monitored through the transparent chamber lid. System was de-installed in working operational condition. We sell it at AS IS with crating.
This is subject to prior sale without notice. Pls contact us for more photos.
