Description
STS Multiplex ICP Deep Reactive Ion Etcher (DRIE), 6″-8″
********** Used. Great Condition.
Valid : It is only for end users and is subject to prior sale without notice. Appreciate your time!
Condition: We sell it at AS IS or complete, working, functional test at extra cost.
Photos: Please contact us.
Info on the system from the owner for your reference.
- STS Multiplex ICP Deep Reactive Ion Etcher (DRIE), 6″-8″
Semi auto mode
Frequency: 600 Hz
Mode: Bosch
Generator rack
Chiller
Pump - Chamber:
Deep silicon etch process
SOI Trench etch
Gas line: (4) Valves – MFC Filters (VCR)
ICP 240BF Source (ASE-exc PSU / Matching unit)
Temperature: 5°C – 40°C
ICP SC160M Process chamber (MESC)
RF Supply / Matching unit: 300/30 W (13.56 MHz)
RF Supply / Matching unit: 1 kW (13.56 MHz)
Chamber parts: Substrate, 6″ (Mechanical clamping)
Chamber externals: ICP V2
Mechanical wafer clamp electrode (Tripod)
With he backside cooling - Process chamber:
ICP V2 Unified ISO250 (Inc insulation spacers) SR
With 160 adapter
LEYBOLD MAG900CT Turbo pump
EDWARDS iQDP80 (M) Dry pump - Includes:
EDWARDS D146 Penning gauge
MKS 51A and SMC ZSE6B Pressure switches
EDWARDS 655 100 mT Cap man gauge
EDWARDS E2M40 PFPE vacuum pump
NW16 Bypass pump line
Gas box
Affinity chiller
Electric cluster cabinet - Lower electrode: ICP WTC Tripod lift
Substrate clamping / Platen: ICP WTC Tripod 150 mm
Lower RF enclosure / MU: ICP V2 WTC H/F, L/F (SOI)
Electrode lift stops: 96 mm
Electrode spacing: 136 mm
HBC Assembly: ICP V2
TYLAN CDLD 10T Cap man gauge
TYLAN FC2901 50 sccm He Cal MFC
Upper electrode with aperture mounting
Upper electrode source: ICP Balun
Upper RF enclosure / MU: Balun 1kW (High cool)
Chamber lid: ICP Heated - RF Generators:
Upper: ENI ACG10B 1 kW (13.56 MHz)
Lower: ENI ACG3B 300 – 30 W (13.56 MHz)
LF5 Pulse gen switch unit - Bypass pumping: Automatic NW16
Heated foreline: ICP
NW40 (1m) Pumping line
EDWARDS iQDP80 (M) Backing pump
Chamber heating: (4) WATLOW 700 W Cartridge heaters
Gasbox: (4) lines (Includes PFC1 module)
Chamber cover panels: ICP V2 - Gases / MFC Size (sccm) / Seal type / Line type / Gas type
C4F8(S) / 200 / VITON / G12 / Clean
SF6(S) / 300 / VITON / G12 / Clean
O2(S) / 100 / VITON / G12 / Clean
Ar / 100 / VITON / G12 / Clean / Process - Loadlock:
Carousel vacuum loadlock
Carousel loadlock parts: (2) Substrates, 6″
EDWARDS RF Rack mount Cabinet F (Fomblin) Rotary pump - Power supply: 208 V, 3 Phase, 60 Hz
- 2000 vintage.
OEM-15-1&SS7526