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PVD equipment

PVD equipment

Categories: PVD, Resell

Description

Description

Please contact us if you are interested in the PVD equipment which are located in USA. We do not own the items. These items are only for end user. They are subject to prior sales without notice. First come, first serviced. Appreciate your time.

Airco Temescal BJD-1800 Filament Evaporator–Cryo Pumped Cryo Pumped
Airco Temescal VES 2550 E Beam Deposition System, 4 Pocket Cryo Pumped
CHA Industries SEC-1000-RAP Electron Beam Evaporator Cryo Pumped
CHA Industries SEC-600-RAP Filament Evaporator Cryo Pumped
CHA Industries SSC 1000 Sputtering System
CVC 611 Load Lock Batch Type Production Sputtering System
CVC AST-304 Sputtering–Ion Etch Cryo Pumped
Denton DV-SJ/26 E-Beam Evaporator, 4 Pocket Cryo Pumped
DynaVac High Capacity Cylindrical System
Leybold LAB 600 EB E Beam Evaporator–Ion Assist Turbo Pumped
Mill Lane Eng 4123 Reel Sputter/Etch System Cryo Pumped
Mill Lane Eng Custom Research Dual Chamber Research Sputtering System
MRC 643P In-Line Sputtering System — KDF Refurbished Cryo Pumped
MRC 902 In-Line Sputtering System Diffusion Pumpd
MRC 903M RF Sputter, Etch, 3 Target Cryo Pumped
Sharon Vacuum Sputtering System Sputtering System Cryo Pumped
Temescal BJD 1800 E Beam Evaporator, 10″ Crucible Cryo Pumped
Temescal BJD-1800 E Beam Evaporator, 7″ Crucible Cryo Pumped
Temescal VES-2550 High Volume Evaporator Cryo Pumped
Varian 3190 Single Wafer Vertical Sputter System Cryo Pumped
Varian Core System SS 25.5″ Diameter X 30″ High Vacuum Chamber
Vergason Technology Press-Side 2000 Rapid Cycle Metalizing Systems Diffusion Pumped

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formation,radical-based oxidation process,rapid thermal processing spike anneal,300mm RTP spike anneal process,ramp-up methodologies, rampdown methodologies,Rapid thermal annealing apparatus,RTA furnace,Dai-ichi Kiden,Dai-ichi Kiden RSA, Combustion furnace, High vacuum heating system, Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system,CreaTec Fischer,Growth Systems,Mini MBE System,LT-STM/AFM,Evaporators,Centrotherm,centrotherm c.HORICOO 300 ,horizontal batch-type system,centrotherm c.HORICOO 200 , field-proven , ultra-versatile tube furnace system ,centrotherm c.VERTICOO , batch-type wafer processing , semiconductor device fabrication, atmospheric processes, LPCVD processes,centrotherm c.ACTIVATOR, high-temperature annealing, high-volume SiC device manufacturing, electrical activation , post implantation annealing ,SiC MOSFET , diode manufacturing,Cost-efficient dopant activation,Annealing of AlN seed layers , Annealing of AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，