Description
- Alcatel 601E Deep Reactive Ion Etcher He Backside Cooling, Mechanical Clamp
- Alcatel 601E Reactive Ion Etcher Alcatel 601HPE Reactive Ion Etcher
- March PX-250 March PX-250 Plasma Asher
- Oxford Plasmalab 100 ICP Platen, Load-Locked Single Chamber ICP, Chlorine Chemistry for Metal Etch Process
- Oxford Plasmalab 100 RIE Oxford Plasmalab 100 RIE System
- Oxford Plasmalab 133 ICP Load-Locked Single Chamber, 380mm electrode, Chlorine Chemistry!300mm
- Oxford Plasmalab 80 Plus ICP Single Chamber ICP, non-load locked, platen, All-New Oxford PLC controller installed with Windows 10.
- Oxford Plasmalab 80 Plus PECVD Oxford Plasmalab 80 Plus PECVD System
- Plasmatherm SLR-720 RIE Etcher 8″/ wafers max, single load-locked chamber
- SPTS MPX ASE-HRM ICP PRO Etcher , Deep Silicon Etch (Bosch Process), High Rate Magnetic Chamber
- SPTS MPX ICP PRO ETCHER wafer capable, SiC etch process, single chamber, load-locked, 2011 Vintage, Like-New!
- SPTS MPX ICP SR Etcher Single Chamber, Load-Locked, 2007 Vintage
- SPTS Primaxx Monarch 3 HF Etcher HF Vapor Etcher, currently 6″/, capable of , Semi-Automatic 3-wafer loader with Load Lock.
- Tepla 300 Plasma Asher wafers, Quartz Chamber, 2 Process Gas Inputs Plus N2 Input
- Tepla 300 Plasma Asher wafers, Quartz Chamber, 2 Process Gas Inputs Plus N2 Input
- Tepla 300 Plasma Asher wafers, Quartz Chamber, 2 Process Gas Inputs Plus N2 Input
- Tepla 300 Plasma Asher wafers, Quartz Chamber, 2 Process Gas Inputs Plus N2 Input
Please contact us if you are interested in the Plasma Resist Stripper/Asher/Etcher. We do not own these. These are only for end user. These are subject to prior sale without notice. First come, first serviced.
