MV Systems PECVD for aSi/cSi/cGe Deposition, Dual Chamber PECVD for aSi/cSi/cGe Deposition
Please contact us if you are interested in the Oxford Instruments 133 ICP – Ion Couple Plasma Etching System. We do not own the items. These items are only for end user. They are subject to prior sales without notice. First come, first serviced. Appreciate your time.