Main Maker

Temescal BJD-1800 sputter system

Description

Model: Temescal BJD-1800 3-cathode sputter system

Location: USA.

Sales Type: Make offer

Sales Condition :AS IS/WHERE IS. No Warranty. No Refund.

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Detail info we can provide.

This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange, and motorized linear motion assembly. The 7.5” substrate table assembly is mounted within this low volume adapter.

Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7.5”diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300-watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downstream pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.

The items are subject to prior sale without notice. These items are only for end users.

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