Description
Plasmatherm Unaxis 790
- ICP Plasma Etch System. Inductively coupled plasma etching system for high etch rates and control over selectivity and damage.
- RF Generators: RFPP5S 500W, 13.56 MHz and RFPP10M 1000W, 2 MHz.
- Six MFC mass flow gas controllers. Previous Gases used: CL2, SF6, N2, CF4, AR, BCL3
- PC controller with graphical user interface.
- 9.5 in. bottom electrode, ceramic clamp currently for 2 in. wafer.
- Chamber pumped via turbo pump with rough pump.
Please contact us if you are interested in the Plasmatherm Unaxis 790 ICP equipment. We do not own the items. These items are only for end user. They are subject to prior sales without notice. First come, first serviced. Appreciate your time.
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