Description
ATC-UHV 2200 AJA International Sputtering Tool
Condition: Believe fully functional and complete before turnoff.
Location: CA,USA
Photos: Download
Info on the system from the owner.
- Vintage: 2007
- a UHV Sputtering system
- Equipped with a 17″ x 22″ vacuum chamber
- 7 magnetron sputtering sources with in-situ tilt,
- two AJA 750w DC power supplies,
- two AJA RF power supplies (100w and 300w)
- a Pinnacle Plus 5k pulsed DC supply.
- The main chamber was pumped with a 1080 1/s Shimadzu wide range, magnetically levitated, compound turbopump, and roughed by an Edwards dry pump. There is a suite of 3 vacuum gauges controlled by a Granville Philips gauge controller. Processes are fed by 3 mass flow controllers for precise introduction of inert and reactive gases.
- There is a load lock for substrate insertion/removal which is pumped with a separate turbo and roughing pump. The system also includes a 7 substrate cassette in the load-lock to boost throughput.
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