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SAMCO RIE 10 NR

Description

Equipment Model: SAMCO RIE 10NR Reactive Ion Etch System

Maker: SAMCO

Specifications: From the manual coming with the euipment

Photos: At Youtube

Condition: Used. It was complete, working in a Fab in USA. It was de-installed and stored in our company.

Price: Contact Us by filling the bottom form. Pls specify the condition you are going to buy at. Appreciate your time.

Quantity: 1 set

Vintage: 2007

Valid Time: Subject to prior sale without notice

Others: We sell it at any of the conditions: (1) AS IS; (2) Complete, Working, functional test; (3) Refurbished with installation and warranty.

Location: 000-A-E.D.-20220105

Description:

SAMCO RIE 10 NR – SAMCO RIE 10NR Reactive Ion Etch System | Dry Etching System / Tool with Thermo Electron Thrmoflex 900 Chiller


Info from O.E.M. website for your reference only.

Reactive Ion Etching System
RIE-10NR is a low-cost, high-performance, fully automatic, dry etching system that meets the most demanding process requirements using fluorine chemistry. A computerized touch panel provides user-friendly interface for parameter control and recipe storage.
Etching is performed with minimum sidewall deterioration and a high selectivity between materials. With its sleek, compact design, the RIE-10NR system requires minimal clean room space.

Dimensions:

Main Unit: 500(W) x 920(D) x 1510(H) mm

Pump Unit: 522(W) x 163(D) x 216(H) mm

Features:

  • Highly selective anisotropic etching

  • Fully automatic “one-button” operation with full manual override

  • Easy-to-use computerized touch panel for parameter control, recipe entry and storage

  • Process wafers up to ø8″ in diameter

  • Sleek, compact design uses minimal clean room space

Applications:

  • Stripping of passivation materials including silicon nitride, silicon dioxide and silicon oxynitride

  • Anisotropic etching of all types of silicon-based films, compound semiconductors and refractory metals including Si, SiO2, Poly-Si, Si3N4, GaAs and Mo

  • Manufacturing of micromachines

  • Failure analysis


Please contact us for more information on the product:

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9 SAMCO, Inc. model RIE-200iP Inductively Coupled RIE Fluorine Etching System . It looks to be in very good cosmetic condition, showing some signs of wear. Among other things, this system features a Shimadzu TMP-003LMC Turbomolecular Vacuum Pump with EI-R04M Power Unit, a VAT Gate Valve with Controller, a pair of Adtec RF Plasma Generators (AX-600II and AX-1000II-S). Also included are a pair of Adixen Vacuum Pumps (2033C2 and 2033SD) which plug into the back panel of the Etcher. The owner has no way of testing this system, or any of its components, and it is being sold as-is. Approximate overall unpacked dimensions: 34″L x 47″W x 72″H.  (ID-380EB-CA USA)

LOCATION: SS380EB

All the used equipment  trademarks belongs to the O.E.M. , the original equipment manufacturer. All rights reserved. 

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers