Description
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SEMITHERM / SEMITOOL VTP 1500 LH LPCVD Reactor furnace
Control unit
Manual
Facility requirements:
Furnace: 150 Amps
Vacuum pump: 150 Amps
Nominal voltage: +/- 15%
Nominal frequency: +/- 5%
Exhaust:
Furnace cabinet exhaust: 10″ Duct
Minimum pressure: (-.5 in) at 900 CFM
Gas cabinet: 6″ Duct
Minimum pressure: (-.5 in.) at 250 CFM
Process chamber:
1/2″ Swagelock:
Minimum pressure: (-.5 in.) at < 1 CFM
3/4″ Swagelock
Minimum pressure: (-.5 in.) at 5 CFM
Vacuum:
Wafer handling: 1/4″ Swagelock – 24″ HG static
Cooling water:
Cannister and baseplate:
1/2″ Swagelock – 2 GPM at 20 psi inlet to outlet differential pressure
Maximum differential pressure: 40 PSI
Maximum inlet pressure:100 PSI
Swagelock return line, 1/2″
Drains:
Acid drain (Optional on wet ox)
Teflon tubing: 1/2″
Clean dry compressed air:
1/2″ Swagelock – 80 PSI Minimum
5 CFM: Typical
20 CFM: Peak (100 PSI Max)
5 CFM Used for pneumatic control
15 CFM Used for element / Jar movement
Nitrogen – non process:
1/2″ Swagelock – 80 PSI Minimum
5 CFM: Typical
30 CFM: Peak (100 PSI Max)
5 CFM: Baseplate (Used at high temp only)
25 CFM: Furnace filter (Used only when filter or fan fails)
30 CFM: Non-process nitrogen
Power supply: 208 V, 3-Phase, 60/60 Hz, 150 A.
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