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Oxford Instruments Plasmalab 800 Plus PECVD


Oxford Instruments Plasmalab 800 Plus PECVD Chemical Vapor Deposition System

A 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers.

Ideally suited for batch PECVD processing where excellent across chamber uniformity of less than 2 percent is achieved for silicon nitride and silicon dioxide layers.

Last owner had set up for 2 in. wafers.

18.75 in. top electrode with shower head gas input.

Footprint is kept to a minimum by locating all electronics and vacuum components within the body of the tool, mass flow controllers are housed separately in a wall mounted gas pod.

Six MFC gas controllers, previously used gases He, N2, N2O, NH3, SIH4/N2, CF4.

PC controller provides intuitive user interaction with the system via advanced graphics and process recipe pages.

Includes vacuum pump and blower package.

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OEM-Module-1 MSP-155000-195000

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