Gasonics
Showing all 6 results
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Sale!
ASYST TECHNOLOGIES Minienvironment
$18,000.00$13,000.00ASYST TECHNOLOGIES Minienvironment for Gasonics Aura 3000, Gasonics Aura 3010 , Gasonics L3510 , Gasonics L3500 . It was complete, working before de-installation
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Sale!
Z-BOT 001-6300-03
$12,000.00$8,000.00Z-BOT Robot for Gasonics Aura 3000, Gasonics Aura 3010 , Gasonics L3510 , Gasonics L3500 . It was complete, working before de-installation, Model No.: 001-6300-03, Serial No.: ZBT-3132, OEM: Brooks Automation
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Sale!
Touch Screen Monitor
$2,200.00$1,500.00Touch Screen Monitor for Gasonics Aura 3000, Gasonics Aura 3010 , Gasonics L3510 , Gasonics L3500 . It was complete, working before de-installation
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Gasonics L3500
The Gasonics L3500 plasma system is designed for ashing and cleaning semiconductor wafers. Gasonics L3500 does this by creating monatomic oxygen, the active specie, which chemically reacts with the photoresist on the surface of the wafer.
The Gasonics L3500 system is composed of two main components:
(1)The process sub-system The process sub-system includes the controller, the microwave generator, the gas flow control, the cassette platform, and the robot assembly.
(2)he vacuum pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should be kept running continuously.
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Gasonics Aura 1000
The Gasonics Aura 1000 Plasma System is a microprocessor controlled down-stream, or “afterglow” photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute.The Gasonics Aura 1000 is fully automated, cassette-to-cassette, and is a single-wafer process design.
The Gasonics Aura 1000 system consists of two separate but interconnected.vacuum ·chambers (reaction and stripping), ·a microwave plasma generator, automatic wafer loader/unloader, keypad panel/display, mass flow controllers (MFC’ s ), an infrared heat source, pneumatic and electronic control systems, ‘stainless steel gas plumbing, and incorporates several safety interlock features, as well as troubleshooting indicators . (LED’s) that illuminate to display the operating sequence and key component function signals.
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Gasonics L3510 Asher
The Gasonics L3510 plasma system is designed for ashing and cleaning semiconductor wafers. Gasonics L3510 does this by creating monatomic oxygen, the active specie, which chemically reacts with the photoresist on the surface of the wafer.
The Gasonics L3510 system is composed of two main components:
(1)The process sub-system The process sub-system includes the controller, the microwave generator, the gas flow control, the cassette platform, and the robot assembly.
(2)he vacuum pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should be kept running continuously.
