Main Maker

Tegal 901e Tegal 903e

Description

Model: Tegal 901e Tegal 903e plasma dry etch semiconductor process equipment

Original Equipment Manufacturer: Tegal Corp.

Condition: Refurbished with OEM specifications and warranty. Upgrade with new PC control  and/or new wafer transfer method are   available at extra cost. Installation is also optional.

Wafer Size: 3,4,5,6 inch capability

Gas Lines: 4

Manuals: Complete manuals.

Location: Morgan Hill,, CA, U.S.A.

Tegal 901e Tegal 903e plasma dry etch description for reference

The Tegal 901e Tegal 903e plasma dry etch semiconductor equipment were made by Tegal Corporation  and represents the Industry Standard in single-wafer Dry Etch of Polysilicon, Nitride, Silicon Oxide  and the mainstay of the highly successful plasma etch system.

The Tegal 901e Tegal 903e plasma dry etch semiconductor equipment are used by the semiconductor industry for integrated circuit fabrication. The Tegal 901e Tegal 903e plasma etcher plasma etch semiconductor equipment are used in one part of the sequence of manufacturing steps that transfer a pattern formed from a layer of photosensitive material, the photoresist, to a layer that makes up a permanent part of the finished device.

Wafers in the Tegal 901e Tegal 903e plasma dry etch semiconductor equipment are transported to a Reaction Chamber. A gas mixture is introduced into the Reaction Chamber, and the gas mixture is caused to become reactive by the application of radio frequency (RF) electromagnetic radiation. The reactive mixture, or plasma, etches away material that is not covered by the masking photoresist. The etch process is terminated at an appropriate time, the wafer is unloaded from the Reaction Chamber, and a new wafer is introduced. The cycle repeats.

The Tegal 901e Tegal 903e plasma dry etch semiconductor equipment Plasma/RlE etchers have been configured to take advantage of the characteristics of plasmas for etching various films. Each of the models in the 90Xe family have been optimized for specific etches of specific films. All models have the common ability to implement multi-step etch recipes using multiple process gases. An optical monitoring system provides a means for determining etch completion so that the etch process may be terminated.

Comparison Of Tegal® 901e Tegal® 903e

Tegal® 901e Tegal® 903e
Applications
  • Silicon Nitride
  • Plating Seed Layers
  • Thin Film Resistors
  • Photoresist
  • Descum
  • PRIST
  • Polyimide
  • Polyimide
  • Silicon Oxide
  • Contact/Via
  • Planarization
Pressure Range(mT) 0-1000 0-5000
Pressure Control 225 sccm UPC 2000 sccm UPC
MFC
  • 50 sccm O2
  • 60 sccm Argon
  • 25 sccm CFCl3
  • 100 sccm SF6
  • 15 sccm N2
  • 50 sccm CHF3
  • 15 sccm SF6
  • 200 sccm He
Upper Electrode
  • Gas inlet and outlet holes are contained in 1 piece
  • 429 inlet holes(0.031 dia)
  • 120 outlet holes(0.062 dia)
  • Coolant flows around outside diameter
  • Not anodized
  • Gas inlet and outlet holes are contained in separate pieces
  • 593 inlet holes(0.008 to 0.016 dia)
  • 60 outlet holes(0.130 dia)
  • Coolant flows around outside and through showerhead Showerhead is anodized (exhaust ring is not)
Pins Length (Inches) 1.79 2.125
Water Recirculators 1 1 or 2
Wafer Ring
  • Aluminum
  • Ceramic (99.5% Alumina)
  • Castillated
RF Cable to Chuck Different Length (26.25″) Different Length (16″)
Electrode Gap (mm) 38 6
Lower Electrode Not Anodized, Not Flat Aligned  Anodized, Flat Aligned

All the used equipment  trademarks belongs to the O.E.M. , the original equipment manufacturer. All rights reserved. 

Valid : It is only for end users and is subject to prior sale without notice. Appreciate your time!

SemiStar Corp. may provide certain information related to equipment offered for sale. Any and all such information is unverified and, therefore,  supplied for information purposes only without guarantees or warranties of any kind. This picture is representative of the STS available

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330 Tegal BES-530-8-PCB 8-Port/Channel Solenoid Valve Control Board
331 Tegal CC1147-00303 REAC Industrial/Laboratory Triode Split Assembly Unit
332 Tegal CC1326-00100 Chamber-Stripper For Parts As-Is
333 Tegal CC1327-00300 EZ Reactor Assembly HRE-PM1 6500 HRe
334 Tegal CD1039-00301 Industrial/Laboratory Endpoint Detector Assembly Unit
335 Tegal CD-1039-00303 Endpoint Detector Detection System Module/Plug-In
336 Tegal CD-1039-00303 Endpoint Detector Detection System Module/Plug-In
337 Tegal CD1039-00403 Wafer Etcher Plasma Chamber System Endpoint Detector Module
338 Tegal CD1043-00601 Industrial Wafer Etcher System Main Controller Module
339 Tegal CD1043-00601 Wafer Etcher Plasma Main Controller Module Chassis Frame
340 Tegal CD1043-00601RW Industrial/Lab Main Controller Assembly Module
341 TEGAL CD1298-02300 CON-MDL-VME-1HD CHASIS
342 Tegal CD1310-00104 Endpoint Module
343 Tegal CD1310-00300 Endpoint Module PM1 PM Tegal 6550 Etcher
344 Tegal CD1310-00300 Endpoint Module Tegal 6550 Etcher
345 Tegal CE00839 2 PINS WIDE 104ZA051 FEEDTHROUGH
346 Tegal CE00840 WDE 103 ZA053-600
347 Tegal CE00841 2 CTS FEMALE PLUG S 104 Z051-1
348 Tegal CE00842 4 CTS FEMALE PLUG S 103 Z053-1
349 Tegal CE00843 2 CTS MALE PLUG S 104 A051-130
350 Tegal CE00844 4 CTS MALE PLUG S 103 A053-130
351 Tegal CE00845 CABLE CLAMP E3 103.6/6.7 103.1
352 Tegal CE00845 CABLE CLAMP E3 104.3/6.7 + B I
353 Tegal CE1028-00303 AC Module Wafer Etcher 1/3/5/10/15A Power Controller Module
354 Tegal CE1028-00303 Industrial AC Module Wafer Processing Plug-In Assembly
355 Tegal CE1028-00304 AC Module Wafer Etcher 1/2/5/15A Power Controller Module
356 Tegal CE1028-00304 Industrial AC Module Wafer Processing Plug-In Assembly
357 Tegal CE1028-00304 Industrial/Laboratory AC Module Assembly Unit
358 Tegal CE1028-00401RW Industrial/Lab AC Module Assembly Unit
359 Tegal CE1029-00201 DC Module Wafer Etcher Power Supply Chassis Enclosure Frame
360 Tegal CE1029-00201 DC Module Wafer Etcher System -15/5/15/24V Power Supply PSU
361 Tegal CE1029-00201 DC Module Wafer Etcher System -15/5/15/24V Power Supply Unit
362 Tegal CE1029-00201 Industrial/Laboratory DC Module Assembly Unit
363 Tegal CE1029-00201 Industrial/Laboratory DC Power Module Plug-In Unit
364 Tegal CE1029W00840 Industrial/Laboratory DC Power Module Plug-In Assembly
365 Tegal CE1093-0030 Industrial Motor Controller Control Module/Unit/Plug-In
366 Tegal CE1093-00303 Industrial Motor Controller Module Plug-In Unit
367 Tegal CE1093-00303 Industrial Plug-In Motor Controller Module Assembly
368 Tegal CE1153-00102 Industrial/Lab PSVTN Module Assy w/Watlow 804 Controller Unit
369 Tegal CE1153-00102 Watlow 804 Temperature Controller Passivation Module PARTS
370 Tegal CE1153-00102RW PSVTN Watlow 804 Temperature Controller Passivation Module
371 Tegal CE1323-10101 AC Module Distribution
372 Tegal CE1323-10101 AC Module Distribution Unit 6500 HRe SW HTR 208 Working Spare
373 Tegal CE1354-00200 DC Power Supply Module
374 Tegal CG1041-00402RW Industrial Pressure Controller Module Assembly
375 Tegal CG1148-00602 Wafer Chamber Gass Delivery Valve UFC-1020 BCI3 MFC Assembly
376 Tegal CG1150-00205RN Industrial 8-Channel RWK Gas Controller Plug-In Module Unit
377 Tegal CG1150-00206 Industrial 8-Channel Plug-In Gas Controller Module Unit
378 Tegal CG1150-0020G Industrial 8-Channel Gas Controller Module
379 Tegal CM04345 POTENTIOMETER MONOTURN 10K 1 TURN BIAS MATCH
380 Tegal CM05136 O-RING KIT VAT PENDULUM THROTTLE VALVE PUMPING CHAMBER
381 Tegal CM05346 POT, 10K, 10 TURN, SOURCE MATCH (PKG 2)
382 Tegal CM05473 BELT TIMING BROOKS MX600 116GRV LOAD LOCK
383 Tegal Compact Air Products Water Chuck, Vacuum Pump
384 Tegal Control Unit
385 Tegal Corp 39-452-002A ARM UPPER LH DOOR T915
386 TEGAL CORP 39-453-001
387 TEGAL CORP 39-453-002
388 Tegal Corp 39-659-001 Screw Stud Standoff Aluminum 38   T915
389 Tegal Corp 39-958-001 TEGAL PULLEY TENSION DOOR T915
390 TEGAL CORP 40-575-002-C   RING, CHUCK FRONTLINE – 6″
391 TEGAL CORP 40-751-601-A   RING, 6″ WAFER CENTER STRIPPER
392 Tegal Corp 42-401-002 O-Ring, 235 V
393 Tegal Corp 42-402-001 Bracket Slide Front LH  T915
394 Tegal Corp 42-402-002 Bracket Slide Front RH T915
395 Tegal Corp 57-017-001 TEGAL PULLEY IDLER (BIG) DOOR T915
396 Tegal Corp 80-095-146 Transformer 220/115-24V  AC Module T9156-P-1623420
397 Tegal Corp 81-105-222 Sensor, Control(Platinum)Temperature TEGAL T915 RES-ASHER
398 Tegal Corp 99-196-003RW PCB  ATI-3  AUTO TUNE  T915
399 Tegal Corp 99-206-001 PCB AGCP-1 TEGAL 915
400 Tegal CP1037 CRT Program Terminal 13″ Wafer Etcher System Display Monitor PARTS
401 Tegal CR1031-00305 Industrial 100kHz Matching Network Plug-In Module Unit
402 Tegal CR1031-00305RW Industrial 100kHz Matching Network Plug-In Module Unit
403 Tegal CR1031-00306 Industrial/Laboratory 100kHz Matching Network Assembly
404 Tegal CR1040-00205EX Industrial RF Controller Plug-In Module Unit
405 Tegal CR1040-00205RW RF Controller Wafer Etcher Signal Generator Module PARTS
406 Tegal CR1087-20101RW RWK-RF Generator CR1087-20101RW – RF Plasma Model# T-502S
407 Tegal CR1296-00100 KHZ Controller CONT MTCH NTWK 500W 45 Tegal 6500 Etcher
408 Tegal CR1324-00100 RF Match Network Source Strip
409 Tegal CR1324-00400 RF Match Network Source Strip 6500 HRe
410 Tegal CR1325-00300 MHz Controller CONT MTCH NTWK STRIPPE
411 Tegal CR1330-10100 MHz Controller Cont 6550 RF Source Tegal 6550 Etcher
412 Tegal CR1338-10102 RF Match MTCH NTWK 450KHZ-ESC T Tegal 6550
413 Tegal CR1338-10102 RF Match MTCH NTWK 450KHZ-ESC T Tegal 6550
414 Tegal CR1350-00100 Source Reactor Module Process Chamber Tegal 6550 Etcher
415 Tegal CR1350-00100 Source Reactor Module Process Chamber Tegal 6550 Etcher Tool
416 Tegal CV00110 O-RING 699
417 Tegal CV00133 O-RING 178 01250
418 Tegal CV00134 O-RING 200 21313 G2 T47501 FPM
419 Tegal CV00136 O-RING 300 41145 COOLANT LOWER COOLING PLATE OUTER SOURCE
420 Tegal CV00137 O-RING 300 38500 COOLANT LOWER COOLING PLATE OUTER SOURCE
421 Tegal CV00325 O-RING 200 23100 COOLANT LOWER COOLING PLATE INNER SOURCE
422 Tegal CV00476 O-RING 0.138 X 0.609
423 Tegal CV00477 O-RING 0.139 X 0.734 CHEMRAZ
424 Tegal CV00481 O-RING 0.210 X 1.1
425 Tegal CV00482 O-RING CHEMRAZ 366C639 7.225 INCH X 0.210 INCH SC639
426 Tegal CV00507 O-RING 533
427 Tegal CV00508 O-RING 270
428 Tegal CV00527 O-RING TOR 240 00660 HE FEED ESCP SH
429 Tegal CV00528 O-RING 200 00570 HE FEED ESCP SH
430 Tegal CV00553 O-RING KIT VAT VALVE PROCESS PUMPING
431 Tegal CW 1047-00302 Industrial Electrostatic Wafer Chuck Assembly Unit
432 Tegal CW 1047-01101RW Industrial Wafer Chuck Assembly W/ 2x SMC NAQ2000
433 Tegal CW1033-00301 Industrial Wafer Elevator Assembly w/Stepping Motor
434 Tegal CW1033-00302 Industrial Wafer Elevator Assembly w/Stepping Motor
435 Tegal CW1033-00303 Wafer Elevator Library Selector Transfer Handling Assembly
436 Tegal CW1033-00303 Wafer Elevator Library Selector Transfer Handling Assembly
437 Tegal CW1038-00402 Industrial Spatula Drive Belt Assembly w/Stepping Motor
438 Tegal CW1038-00402RW Industrial/Laboratory Spatula Drive Assembly
439 Tegal CW1048-00502 Industrial Wafer Shelf Lift Assembly Machine Indexer Module
440 Tegal CW1048-00502 Industrial/Lab Pneumatic Indexer Module Assembly Unit
441 Tegal CW1048-00502 Industrial/Laboratory Indexer Pneumatic Assembly
442 Tegal CW1048-00502 Industrial/Laboratory Indexer Pneumatic Assembly
443 Tegal CW1048-00502 Wafer Chamber Shelf Lift Assembly Machine Indexer Module
444 Tegal CW1078-W00304RW Spatula Drive, 99-200-003 PCB Board
445 Tegal CW1299-20103 VCE Left Generic Load Lock Chamber Tegal 6550 Etcher
446 Tegal CW-1302 00500 Wafer Aligner Tegal 6550 Etcher
447 TEGAL DEIONIZED WATER HEATER CONTROLLER CE132100201
448 Tegal elevator frame assembly
449 TEGAL ENDPOINT MODULE, STRIPP, 99-390-004 CD1310-00202
450 TEGAL EPROM 400k MEMORY PCB,  PN 99-095-320
451 Tegal FLIP 03601-22-040 Alphanumeric Fluorescent Display
452 TEGAL Front Robot Loader interface
453 Tegal Heater Controller Tegal 6550 Etcher *working
454 Tegal Industrial Computer Source 7410-14H Control Unit CD1100-00302 4U Rack
455 Tegal Industrial Lab REAC Heated Upper Electrode Chamber Assembly Plate Unit
456 Tegal Industrial Lab Upper Body Chamber Ring Unit w/Viewing Side Ports PARTS
457 Tegal Industrial Optical Fiber Laser Head System I/O RF Driver Amplifier Module
458 Tegal Industrial Plasma Etcher Chamber Ceramic Insulator Ring 12.5″ Diameter
459 Tegal Industrial Plasma Etcher Chamber Ceramic Insulator Ring 13.5″ Diameter
460 Tegal Industrial REAC Heated Upper Electrode Chamber Assembly Plate CC1230-00100
461 Tegal INS-1 Wafer Etcher System 15-Pin Connector Sensor Component Board PCB
462 Tegal M3 X 16MM SCREW BUTON HEAD STAINLESS STEEL CLS. .3C16BHCS
463 Tegal Model 421 Manual PCB 99-011-001
464 Tegal Model 421, 3″, 75 mm Aluminum Wafer Carrier, 25 Slot
465 Tegal Model 421, 3″, 75 mm Aluminum Wafer Carrier, 25 Slot,
466 Tegal Model 901e / 903e Plasma Etcher SHUTTLE REBUILD KIT, 80-202-034, NOS
467 Tegal Model 903e Plasma Etcher FRONT PANEL INTERFACE PCB, 99-125-008, NOS
468 Tegal Model 903e Plasma Etcher GAS INTERFACE PCB ICG5 99-126-005 REV M
469 Tegal MX01136 PHYTRONIC ASSEMBLY ESCP SH
470 Tegal MyDax 2H14A Temperature Controller Instruction Manual
471 Tegal P/N 31-165-006 Stepping Motor, Carrier
472 TEGAL PCB ASSY (PARTS) 98-391-004
473 TEGAL PCB ASSY 31-398-002
474 TEGAL PCB ASSY 98-391-004
475 TEGAL PCB ASSY 99-406-001
476 TEGAL PCB ASSY 99-416-001
477 Tegal PEP-250-Te High Voltage Power AC Plasma Source Generator 100Kz RF Supply
478 Tegal PEP-250-Te Industrial/Laboratory AC Plasma Source Assembly 3157508-000A
479 TEGAL PLASMA 903
480 TEGAL PLASMA ETCHER 9XX 98-247-002, TSI. REV B
481 TEGAL PLASMA ETCHER 9XX GAS INTERFACE PCB, ICG-6, 99-126-006 REV F
482 Tegal PlasmaLine 200 Plasma Barrel Etcher –  Power Supply
483 Tegal Plasmaline 415 Plasma Chamber w/Varian L6267-301 NW40 Vacuum Valve
484 TEGAL PLASMALINE MODEL 421 WITH SPARE PARTS
485 TEGAL PLASMOD w/ MARCH GCM 100 PLASMA ASHER CLEANER ETCHER
486 Tegal PM3 Over Temp PM4 Level Sense Tegal 6550 Etcher
487 Tegal Quartz PIN P/N 40-297-001-E, NEW
488 Tegal RF Delivery
489 Tegal RF Interface PCB # 99-173-008
490 TEGAL RF SIGNAL GENENRATOR SUPPLY T-1000E
491 Tegal SE 1496A A/D Plug-In PCB Circuit Board Assembly Unit
492 Tegal SE 2059 AX CPU Plug-In PCB Circuit Board Assembly Unit
493 Tegal source reactor ICP CR1350-00300 with Tegal MHZ controller CR1325-00400
494 Tegal SPI-80-095-057 Probe Temperature SST
495 Tegal T-1000E Comdel T1000E/DCX Wafer RF Signal Generator DC Power Supply Module
496 Tegal T-1000E Comdel T1000E/RFG 13.56MHz RF Signal High Voltage Power Supply
497 Tegal T-1000E Industrial 40VDC DC Power Supply Plug-In Module Unit Assembly #2
498 Tegal TG00461 MONOBLOCK CENETRING RING CERAMIC PART
499 Tegal TR01785 PIPE ALUMINA INTEGRATED CIRCUIT SUPPORT ICS-2471883
500 Tegal TR05113 CONNECTOR HELIUM ESCP SH (PKG 2)
501 Tegal Type 41-137-001 Flag Chuck For Tegal Etcher
502 Tegal Type 80-202-186 Timing Belt (Pack Of 4)
503 Tegal Vacuum Cassette Elevator Loadlock VCE, 100/150MM, Left CW1299-10102
504 Tegal Wafer Elevator Vexta Motorized Linear Transfer Selector Library Handler
505 Tegal Wafer Lift Quartz Tip ANOD PIN, 49-042-002, 6 ea.
506 Tegal Wafer Transfer System Motorized Linear Selector Handler +Vexta C4412 PARTS
507 TEGAL XJET-11503 TCU Elbow Fitting, 416192
508 Tegal XJET-14004-2 HGST Carrier 6500 Centring Ring Assembly
509 Tegal/Bay Pneumatic BES-530-8-PCB 8-Port/Channel Solenoid Valve Control Board
510 Tegal/Comdel T1000E/RF Industrial/Laboratory 13.56MHz RF Power Supply Unit
511 TEGAL/DDI SHUTTLE INTERFACE CIRCUIT BOARD 00094072, 98-287-002 REV. A DVO 450-B
512 TEGAL1513e MOTOR CONTROLLER ITEM CE 1093
513 Thermo Couple (TC) TEGAL 80-700-xx JES-CE
514 Unit/Tegal CHF3 80SCCM — UFC-1000
515 Vacuum valve, KF-40. Tegal P/N
516 VAT 14046-PE44-1016 HV High Vacuum Gate Valve Tegal 6500 HRe
517 Veriflo NPR400Z (TEGAL) High Pressure Regulator w/ Vacuum Torr Gauge
518 Xycom MVME-490/1 Circuit Board Tegal 6550 Etcher

MSP-165000

All the Tegal 903e Plasma Etch Plasma Etcher semiconductor process equipment trademarks belongs to  Tegal , the original equipment manufacturer. All rights reserved. 

hermal annealer, Lindberg furnaces,Plasma therm ICP (deep RIE), Plasma therm PECVD, Plasma term RIE, STS PECVD, PlasMos ellipsometer, Ozone stripper, Alpha step profilometer, Veeco Dektak profilometer, Filmetrics Profilm3D Profilometer Tencor Alpha-Step 200 Profilometer AST VCA Optima XE Zeiss Axiotech Microscope Cascade Probe Station PDMS Alignment Tool 3D Systems Figure 4 3D Printer Motic BA310MET-T Microscope CorSolutions PDMS Port Creator Disco DAD 2H/6T Wafer Dicer Fisher Muffle Furnace Lindberg/Blue M Tube Furnace Blue M Oven Lindberg/Blue M Oven Unitron Z10 Stereo Zoom Microscope Leica Stereo Zoom Microscope Electro-Technic Products BD-20 Corona Treater Harrick PDC-32G Plasma Cleaner PDMS Station Brewer Science Cee 100 PVD Chamber Stratasys Mojo 3D Printer Universal M-25 CO2 LASER Engraver SUSS MicroTec PMC-150 Cryoprober ​Keysight PNA Network Analyzer N5127B DC-67 GHz Lakeshore CPX Cryogenic Probe Station Zurich Instruments HF2LI Lock-in Amplifier Cascade Microtech Model 9000 Manual RF Probe Station QuikLaze-50 Multi-Wavelength Laser Trimming Station JFP Microtechnic Flip Chip Bonder WestBond 747677E Three-Way Convertible Manual Bonder Cincinnati Sub-Zero MicroClimate Temperature Chamber Zyvex tDriver 1600 Micro-Electro-Mechanical (MEMS) Control Station Lithography Equipment DUV Exposure Station and Aligner MicroWriter ML3 Pro Metrology Equipment Ellipsometer Reflectometer Atomic Force Microscope (AFM) Scanning Electron Microscope (SEM) NIR-UV-VIS Spectrophotometer Measuroscope Optical Microscope Plasma etching (Deep Reactive Ion Etching) Analytic Probe Contact Profilometer Optical Profilometer Processing Equipment Plasma Asher Hot Plate Station Non-vacuum Oven Denton Plasma Coating Xanthos Hood Probestation (Zeus) PE50 O2 Plasma Asher Oxidation Furnace-Wet Teaching Bay Diffusion Furnace (MRL P-Type) Teaching Bay Diffusion Furnace (MRL N-Type) Hydra Wet Hood Chimera Wet Hood Wafer Bonder 3-Zone Tube Furnace Ebeam Evaporator RTP Oxford ICP/RIE Back-End Processing Critial Point Dryer Lapping and Polishing Tool LatticeGear Scribing Tools MA 1006 Dicing Saw Chemical Vapor Deposition EasyTube Diffusion Furnace Fiji Plasma ALD GSI 2000 PECVD SSI Solaris RTA Etching AutoGlow 200 Plasma Cleaner Oxford 100 ICP RIE Oxford 80+ ICP RIE Oxford Cryo Bosch DRIE XeF2 Silicon Etcher Lithography EVG 620 Mask Aligner Heidelberg DWL-66 Laser Mask Writer Laurell Spinners YES HDMS Prime Ovens Metrology Filmetrics F54-UV Reflectometer Four Point Probe Station KLA P-7 Stylus Profiler Olympus BH-2 Optical Microscope Woollam Ellipsometer Zeta-20 Optical Profiler Sputtering and Evaporation Denton E-Beam Evaporator KJL Sputterer Nano38 Thermal Evaporator PETE E-Beam Evaporator PECVD PEALD AJA Magnetron Sputter SuSS MJB4 Contact Aligner Vacuum Oven Chemical Hoods Deposition Equipment E-Beam Evaporator Lithographic Tools LaserWriter.jpg UV Mask Aligner (front side and front to back) Laser Writer MLA Interferometric Lithography System 100KV Electron Beam Lithography System (JEOL 9100 FS) Raith 30KV Electron Beam Lithography System Focused Ion Beam System Plasma and Reactive Ion Etching Oxford ICP etching system (2 chambers – 1 loadlock) Oxford 6 Inch ICP March RIE etchers Wet Processing WAFER PRIMING OVEN LAMINAR FLOW PROCESS STATIONS Deposition Small Coater AJA Oxide Sputter System AJA Sputter System (metals) FC2000 Ferrotec Ebeam Evaporator(metals) ICP – CVD Deposition System Nanocarbon Synthesis Facilities Lamda Microwave Plasma CVD system (nanocrystalline diamond deposition) Thermal/PECVD System for Synthesis of CNT and Graphene Seeding Station for UNCD Deposition Metrology SPECTROSCOPIC ELLIPSOMETER SCANNING PROBE MICROSCOPE SURFACE PROFILOMETERS Filmetrics F40-UV OPTICAL MICROSCOPE RESISTIVITY MEASUREMENT SYSTEM SCANNING VIBRATING ELECTRODE SYSTEM VOLTAMMETRY SYSTEM Misc Tools ADT 7200 Dicing Saw Critical Point Dryer Jeol JBX-5500FS Electron Beam Writer Nanonex NX-2004 ABM Mask Aligner Thermionics eBeam Evaporator AJA ATC-2200 Denton Desk II Brewer Cee 200X KRI KDC75 Oxford Instrument Plasmalab System 100 ICP Oxford Instrument Plasmalab System 80 Fume Hoods Allwin AW 410 Ultraviolet Ozone Cleaning System Characterization X-ray Photoelectron Spectroscopy Electron Microprobe Scanning Electron Microscope ICP-MS ICP-OES RAMAN Combustion Elemental Analyzer (CHN) Leica GZ Stereo Microscope Spectroscopic Ellipsometer WYKO NT1100 3-D Profiling System Lithography and NanoImprint Electron Beam Nanolithography System Nanonex NX1000 NanoImprint OAI Mask Aligner Model 800 Thin-film deposition Angstrom Engineering 6-pocket E-Beam Evaporator IntlVac – Nanochrom I Sputterer Oxford Instruments – Atomic Layer Deposition (ALD) System – OpAL Nanonex_Ultra Plasma etching Oxford Instruments – RIE-ICP PlasmaPro 100 Cobra Oxford Instruments RIE NGP80 Sample Preparation VWR Vacuum Oven – AFM – Asylum MFP3D – Confocal Laser Scanning Microscope – Zeiss LSM 700 – Contact angle – Dataphysics OCA15plus – Dynamic Light Scattering (DLS) – AvidNano W130i – Optical Microscope – Olympus BX51 – Optical Stereo Microscope – Leica M80 – Scanning Electron Microscopy Focused Ion Beam (SEM-FIB) workstation – Tabletop microscope TM3030 Plus Hitachi – Drying oven – Electro-optical bench – Glove Box – Heated vacuum desiccator – Langmuir–Blodgett – NMR Spectrometer – Precision Balance – Rotovapor – UV/Vis Spectrophotometer – Agilent 4155C semiconductor parameter analyzer + Cascade Microtech M150 manual probe station – Agilent 4155C semiconductor parameter analyzer + Everbeing C-2 Mini manual probe station – Biorad/Nanometrics HL5500 Hall effect systems – Jandel Four point prober – Keithley 4200 SCS semiconductor parameter analyzer + Janis ST-500 cryogenic probe station – Keysight B1500A semiconductor parameter analyzer + Cascade Microtech EPS 150 manual probe station – Potentiostat Gamry Reference 600 – Heidelberg µPG 101 Tabletop Micro Pattern Generator – Hot plates – Spinners for resist coating and development – Suss MA6 UV mask aligner – Suss substrate conformable nanoimprint lithography (SCIL) – Trion Phantom 3 reactive ion etcher (RIE-ICP) – Zeiss Axioscope 5 optical microscope – AJA ATC-1300 F Sputtering – AJA ATC-1800 F Sputtering – AJA Orion-8 Sputtering – AnnealSys As-One 100 Rapid thermal processing – ELETTRORAVA PECVD – HOSITRAD PECVD – Resistive and e-beam evaporators – Speciality Coating PDS-2010 Parylene coater – “3 chamber” PECVD – “3 target” home-made sputtering – “Home-made” e-beam evaporator – “Pfeiffer” sputtering – FTIR – Thermo Nicolet 6700 – Luminescence Spectrometer – Perkin Elmer LS55 – Micro Plate Reader – Raman Microscope – Reninshaw Qontor – Spectrometer UV-Vis_NIR – Perkin Elmer Lambda 950 – Spectroscopic Ellipsometer – Horiba-Jobin Yvon – Sun Simulator – SPI 240A – TGA-DSC – STA 449 F3 Jupiter – X-ray diffraction – PANalytical Xpert PRO CHARACTERIZATION 3D Optical Profiler – Zygo Atomic Force Microscope – Bruker Edge Contact Angle Measurement – VCA Optima XE Electrical Test Station Microscope – Nikon LV150 Reflectometer – Filmetrics F20 Spectroscopic Ellipsometer – J.A. Woollam alpha-SE Stylus Profilometer – Veeco Dektak-8 DEPOSITION Atomic Layer Deposition – Arradiance GEMStar XT-P E-beam Evaporator – AJA Parylene Coater – SCS Labcoter2 Parylene Deposition System Plasma Enhanced Chemical Vapor Deposition (PECVD) – STS LpX CVD Sputter I – AJA Orion Sputter II – AJA Orion Thermal Evaporator – Denton Vacuum Explorer 14 ETCHING – ASHING Deep Reactive Ion Etcher (DRIE) – STS LpX Pegasus Plasma Cleaner – Samco PC-300 Reactive Ion Etcher (RIE) – Samco RIE-10NR Xenon Difluoride Etcher – Xactix FURNACES Furnace – Tystar Rapid Thermal Processor – AW-610 PACKAGING Laser Cutter – LPKF ProtoLaser R Wire Bonder -Ball- iBond5000 Wire Bonder – Wedge – West Bond 747677E PHOTOLITHOGRAPHY Convection Ovens – Blue M DCC-146-C-ST350 Develop Hood Mask Aligner – Suss MABA6 Mask Aligner – Suss MJB4 Maskless Aligner – Heidelberg MLA150 Maskless Aligner – Heidelberg uPG501 Microscope – Nikon LV150 Polyimide/SU8 Hood Spinner Hood Ultraviolet Flood Exposure System – Inpro Technologies F300S Vacuum Oven – YES WET PROCESSING Acid Hoods Critical Point Dryer – Tousimis Automegasamdri – 915B, Series C Ultrasonic and Megasonic Cleaners Characterization 1540XB FIB/SEM Stacks Image 173 Tencor P7 Profilometer Stacks Image 177 1530 SEM Stacks Image 175 Woollam Ellipsometer Stacks Image 179 Leica Stereozoom Stacks Image 183 Zeiss Axioskop Stacks Image 181 Mitutoyo Finescope Stacks Image 197 Lithography Neutronix-Quintel NXQ4006 Mask Aligner Stacks Image 107 Solitec 5110 coater/developer Stacks Image 111 Karl Suss MA6 Mask Aligner Stacks Image 109 CEE 200 spinner Stacks Image 113 Zeiss 1530 e-beam Lithography Stacks Image 117 Yield Engineering YES-3TA HMDS oven Stacks Image 115 Zeiss 1540XB FIB lithography Stacks Image 119 Innopsys Innostamp Stacks Image 121 Deposition Angstrom e-beam Deposition Stacks Image 91 IKO Electroplating Bench Stacks Image 95 Custom e-beam Deposition Stacks Image 93 Filgen Osmium Plasma Coater Stacks Image 97 STS PECVD Stacks Image 101 Edwards Auto500 Sputtering Stacks Image 99 Etching Trion Orion RIE Stacks Image 235 Miscellaneous Grey Lab Spinner Stacks Image 223 Ozone Cleaner Stacks Image 221 Spin Rinse Dryer Stacks Image 219 Dicing Saw Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean,Gasonics AE 2001, Gasonics AE 2000LL Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Tegal 915, Tegal 965, Tegal 405, Tegal 401 Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch Rapid Thermal Process, Modular Process Technology, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, 4100 , 4100S 4108, 8108 ,Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing,JIPELEC, ag2146,JetClip,JetStar, AST SHS2000, AST STEAG 2800, ssintegration, Rapid Thermal Oxide,JetFirst ,Mattson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG-MATTSON 2800, STEAG-MATTSON 2900, STEAG-MATTSON 3000, heat pulse, Solaris, Eclipse ,modularpro, RLA-1000, AG Heatpulse, rapid thermal processor, Steag AST SHS2000, Solaris 75, Solaris75,STEAG Electronic Systems ,eng-sol, Annealsys, RLA-3000, Engineering Solutions ,Solaris 150, Rapid Thermal Annealer , AS-Master ,modularpro,RTO ,Modular Process Technology, Solaris150,AS-One,AS-Micro, ADDAX, JetFirst, JetLight, JetStar, MPT-600S,MPT-800S, MPT-600XP, MPT-800XP, MPT-3000, Jipelec Jetfirst 150,Jipelec Jetfirst 200, JETFIRST 100,AnnealSys AS-One, RTP-3000, ULVAC, Ulvac Technology MILA 3000 ,Rapid Thermal Annealing, ULVAC RTA-2000,ULVAC RTA-4000,ULVAC RTA-6000,ULVAC RTA-8000,ULVAC RTA-12000, EasyTube® 3000EXT, CVD Equipment Corporation, Dr. Eberl MBE-Komponenten GmbH, AO 600,Rapid Thermal Annealing System,MBE Components,MBE Systems,OCTOPLUS 300,OCTOPLUS 400,OCTOPLUS 500,OCTOPLUS 500 EBV,OCTOPLUS 600,OCTOPLUS 600 EBV,OCTOPLUS-O 400,Thin Film Systems,Organic Deposition System,Rapid Thermal Annealing,MBE Components,Thin Film / CIGS / CZTS / CdTe,ECM, Annealsys AS-Premium, Annealsys Zenith-100, Annealsys AS-One, Annealsys AS-Master, Jipelec JetStar, Annealsys AS-Micro, Jipelec JetLight, Jipelec JetFirst 100, Jipelec JetFirst 200, Jipelec JetFirst 300, CreaTec Fischer & Co. GmbH, Rapid Thermal Anneling System, Mini MBE System,Growth System, Research Linear Transfer System,RTA System,UHV Shuttle System, SemiTEq JSC, Molecular-Beam Epitaxy Systems (MBE),PVD Systems,RTP & RTA Systems,ICP/RIE/PECVD Systems,Components and accessories, STE RTP150, STE RTA100, STE ICP200 , ADVANCE RIKO, Inc., RTP-mini, Atmospheric Thermoelectric Module Evaluation System F-PEM,Mini Lamp Annealer MILA-5050,infrared lamp heating system, ULTECH CO.LTD,Real RTP-100,Real RTP-100,Real RTP-150,Real RTP-Mini,SPUTTER,DRY ETCHER,PECVD,ALD,E beam evaporator,Thermal Evaporator, SJ High Technology ,Tube RTA,R-8160,drawer type RTA, R-401, Dai-ichi Kiden Co.,Ltd., Combustion furnace,High vacuum heating system,Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system, Koyo Thermo Systems Co.,Ltd., Premtek Technology Co, 技鼎股份有限公司,技鼎股份有限公司,VF-5900 300mm Large Batch,VF-5700 300mm Mini Batch,VF-5300,8 inch,Large Batch,VF-5100,8 inch,Wide-Range Batch,VF-3000,8 inch,Low-Cost Mini Batch,VF-1000,Small Production and R&D,VFS-4000,Large Bore Vertical Furnace,Koyo Thermo Systems Co.,Ltd.,Model 200 Series Horizontal Furnaces for Mass Production and Experiments,Model 206A Horizontal Furnace for PV Production ,Model 206A Horizontal Furnace for PV ,Production,RLA-3100 Lamp Annealing System for Rapid Thermal Processing,RLA-1200 Lamp Annealing System for Rapid Thermal Processing,RLA-1200 Lamp Annealing System for Rapid Thermal Processing,SO2-12-F Heated-air Circulating Type Clean Oven for 300-mm Wafers,CLH Series High-Temperature Clean Ovens,CLH Series High-Temperature Clean Ovens,VFS-4000 Large Bore Vertical Furnace,VF-5300HLP Activation Annealing Furnace,VF-5300H Vertical Furnace for Gate Insulating Film Formation,VF-5300H Vertical Furnace for Gate Insulating Film Formation,RLA-4106-V Lamp Annealing System for Contact Annealing,RLA-4106-V Lamp Annealing System for Contact Annealing,VF-3000HLP Activation Annealing Furnace, VF-3000HLP Activation Annealing Furnace,VF-3000H Vertical Furnace for Gate Insulating Film Formation,VF-3000H Vertical Furnace for Gate Insulating Film Formation,RLA-3100-V Lamp Annealing System for Contact Annealing,RLA-3100-V Lamp Annealing System for Contact Annealing,Rapid temperature rise annealing furnace RTP_Table ,RTP_Table type rapid temperature rise annealing furnace,Rapid temperature rise annealing furnace RTP_SA ,RTP ,semi-automatic rapid temperature rise annealing furnace,Rapid temperature rise annealing furnace ,RTP_Auto ,automatic rapid temperature rise annealing furnace,RTP600V,RTP600Z,RTP500Z,RTP500V,RTP500SV,快速退火炉,北京东之星应用物理研究所,快速升溫退火爐,estarlabs,Glovebox+PVD,2D material CVD,LPCVD & furnace,Vacuum Sintering Furnace,RTP,Plasma Doping (PDS),ASHER,Wet bench,Crystal Si solarcell Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor, Sonog-age 200, Sono-gage 300, Sonogage200, Sonogage 300, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition Singulus,singular, pecvd,Plasma Enhanced Chemical Vapor Deposition, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment Furnace, MRL, MRL 4 Stack,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment ,快速退火炉,速升溫退火爐,保护气氛快速退火炉,保護氣氛快速退火爐,快速退火爐,红外灯加热,红外灯快速退火,卤素灯加热,高温计,红外高温计,等离子去胶机,等离子刻蚀,深刻蚀,各向同性,各向异性,等离子清洗,溅射台,蒸发台,磁控溅射台,直流电源溅射,高频溅射,自动刻蚀机,自动去胶机,手动去胶机,手动刻蚀机,干法去胶机,湿法去胶机,干法刻蚀机,湿法刻蚀机,半导体设备,半导体旧设备,半导体中古设备,半导体前道工艺设备,半导体后道工艺设备,半导体前道设备,半导体后道设备,半导体量测仪器,半导体量测设备,美国制造,紅外線燈加熱,紅外線燈快速退火,鹵素燈加熱,高溫計,紅外線高溫計,等離子去膠機,等離子蝕刻,深刻蝕,各向同性,各向異性,等離子清洗,濺射台,蒸發台,磁控濺射台,直流電源濺射,高頻濺射,自動蝕刻機,自動去膠機,手動去膠機,手動蝕刻機,乾式去膠機,濕式去膠機,乾法蝕刻機,濕蝕刻機,半導體設備,半導體舊設備,半導體中古設備,半導體前道製程設備,半導體後道製程設備,半導體前道設備,半導體後道設備,半導體量測儀器,半導體量測設備,美國製造 Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean,Gasonics AE 2001, Gasonics AE 2000LL Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Tegal 915, Tegal 965, Tegal 405, Tegal 401 Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch Enviro,ENVIRO-1XaENVIRO-1Xa ,2CENVIRO-Optima,Luminous NA,NA-8000NA-1300NA-1500 ,Multifilm,NE-550EXaNE-950EX, APIOSNE-5700Deep, Oxide Etching ,NLD-570EXaRISE System,RISE Series,Cluster Systems,SME SeriesuGmni Series,SRH SeriesULDiS Series,SMV-500FRoll-coater,SPW SeriesIn-line Systems,SIV SeriesSDH-4550LR&D,CS-200, 300mm,ENTRON-EXENTRON-EX2,Evaporation Roll Coater,EW SeriesR&D/Pilot Production,Ei-5In-line Systems, Ei-H series,Si Processing,IMX-3500SOPHI-200/260 ,SiC,IH-860,Brazing Furnace,FB SeriesFHHn series ,Vacuum Sintering,FSC SeriesVacuum,Induction Melting,FMI Series,Vacuum Heat Treatment,FHB-60CFHV Series,Single-Substrate,CC Series,CME Series,In-line Systems, ULGLAZE Series,Lyophilizer,DFB Series,Micropowder Dry, UPD-400D,FM Series,DFR Series,Centrifugal Type,CEH-400B,ULVAC Rapid Thermal Process, Modular Process Technology, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, 4100 , 4100S 4108, 8108 ,Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing,JIPELEC, ag2146,JetClip,JetStar, AST SHS2000, AST STEAG 2800, ssintegration, Rapid Thermal Oxide,JetFirst ,Mattson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG-MATTSON 2800, STEAG-MATTSON 2900, STEAG-MATTSON 3000, heat pulse, Solaris, Eclipse ,modularpro, RLA-1000, AG Heatpulse, rapid thermal processor, Steag AST SHS2000, Solaris 75, Solaris75,STEAG Electronic Systems ,eng-sol, Annealsys, RLA-3000, Engineering Solutions ,Solaris 150, Rapid Thermal Annealer , AS-Master ,modularpro,RTO ,Modular Process Technology, Solaris150,AS-One,AS-Micro, ADDAX, JetFirst, JetLight, JetStar, MPT-600S,MPT-800S, MPT-600XP, MPT-800XP, MPT-3000, Jipelec Jetfirst 150,Jipelec Jetfirst 200, JETFIRST 100,AnnealSys AS-One, RTP-3000, ULVAC, Ulvac Technology MILA 3000 ,Rapid Thermal Annealing, ULVAC RTA-2000,ULVAC RTA-4000,ULVAC RTA-6000,ULVAC RTA-8000,ULVAC RTA-12000, EasyTube® 3000EXT, CVD Equipment Corporation, Dr. Eberl MBE-Komponenten GmbH, AO 600,Rapid Thermal Annealing System,MBE Components,MBE Systems,OCTOPLUS 300,OCTOPLUS 400,OCTOPLUS 500,OCTOPLUS 500 EBV,OCTOPLUS 600,OCTOPLUS 600 EBV,OCTOPLUS-O 400,Thin Film Systems,Organic Deposition System,Rapid Thermal Annealing,MBE Components,Thin Film / CIGS / CZTS / CdTe,ECM, Annealsys AS-Premium, Annealsys Zenith-100, Annealsys AS-One, Annealsys AS-Master, Jipelec JetStar, Annealsys AS-Micro, Jipelec JetLight, Jipelec JetFirst 100, Jipelec JetFirst 200, Jipelec JetFirst 300, CreaTec Fischer & Co. GmbH, Rapid Thermal Anneling System, Mini MBE System,Growth System, Research Linear Transfer System,RTA System,UHV Shuttle System, SemiTEq JSC, Molecular-Beam Epitaxy Systems (MBE),PVD Systems,RTP & RTA Systems,ICP/RIE/PECVD Systems,Components and accessories, STE RTP150, STE RTA100, STE ICP200 , ADVANCE RIKO, Inc., RTP-mini, Atmospheric Thermoelectric Module Evaluation System F-PEM,Mini Lamp Annealer MILA-5050,infrared lamp heating system, ULTECH CO.LTD,Real RTP-100,Real RTP-100,Real RTP-150,Real RTP-Mini,SPUTTER,DRY ETCHER,PECVD,ALD,E beam evaporator,Thermal Evaporator, SJ High Technology ,Tube RTA,R-8160,drawer type RTA, R-401, Dai-ichi Kiden Co.,Ltd., Combustion furnace,High vacuum heating system,Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system, Koyo Thermo Systems Co.,Ltd., Premtek Technology Co, 技鼎股份有限公司,技鼎股份有限公司,VF-5900 300mm Large Batch,VF-5700 300mm Mini Batch,VF-5300,8 inch,Large Batch,VF-5100,8 inch,Wide-Range Batch,VF-3000,8 inch,Low-Cost Mini Batch,VF-1000,Small Production and R&D,VFS-4000,Large Bore Vertical Furnace,Koyo Thermo Systems Co.,Ltd.,Model 200 Series Horizontal Furnaces for Mass Production and Experiments,Model 206A Horizontal Furnace for PV Production ,Model 206A Horizontal Furnace for PV ,Production,RLA-3100 Lamp Annealing System for Rapid Thermal Processing,RLA-1200 Lamp Annealing System for Rapid Thermal Processing,RLA-1200 Lamp Annealing System for Rapid Thermal Processing,SO2-12-F Heated-air Circulating Type Clean Oven for 300-mm Wafers,CLH Series High-Temperature Clean Ovens,CLH Series High-Temperature Clean Ovens,VFS-4000 Large Bore Vertical Furnace,VF-5300HLP Activation Annealing Furnace,VF-5300H Vertical Furnace for Gate Insulating Film Formation,VF-5300H Vertical Furnace for Gate Insulating Film Formation,RLA-4106-V Lamp Annealing System for Contact Annealing,RLA-4106-V Lamp Annealing System for Contact Annealing,VF-3000HLP Activation Annealing Furnace, VF-3000HLP Activation Annealing Furnace,VF-3000H Vertical Furnace for Gate Insulating Film Formation,VF-3000H Vertical Furnace for Gate Insulating Film Formation,RLA-3100-V Lamp Annealing System for Contact Annealing,RLA-3100-V Lamp Annealing System for Contact Annealing,Rapid temperature rise annealing furnace RTP_Table ,RTP_Table type rapid temperature rise annealing furnace,Rapid temperature rise annealing furnace RTP_SA ,RTP ,semi-automatic rapid temperature rise annealing furnace,Rapid temperature rise annealing furnace ,RTP_Auto ,automatic rapid temperature rise annealing furnace,RTP600V,RTP600Z,RTP500Z,RTP500V,RTP500SV,快速退火炉,北京东之星应用物理研究所,快速升溫退火爐,estarlabs,Glovebox+PVD,2D material CVD,LPCVD & Furnace,Vacuum Sintering Furnace,RTP,Plasma Doping (PDS),ASHER,Wet bench,Crystal Si solarcell Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor, Sonog-age 200, Sono-gage 300, Sonogage200, Sonogage 300, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition Singulus,singular, pecvd,Plasma Enhanced Chemical Vapor Deposition, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment Furnace, MRL, MRL 4 Stack,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment

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