Plasma Therm plasma processing system for single substrates up to 150mm dia.
Parallel plate plasma processing with shower head gas delivery system.
Six MFC gas channels.
Previous Gases: AR, N2, O2, SF6, CHF3, CF4.
Easy menu driven process programming.
Turbo pumped vacuum system with roughing pump.
500W 13.56 MHz RF generator with matching network.
SS281909209747
Metrology | Tester | Wafer Carriers
Main Refurbished Equipment
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AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，
