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Semilab CMS3 non contact sheet resistance measuring system

Semilab CMS3 non contact sheet resistance measuring system

Category: Metrology

Description

Description

Semilab CMS3 non contact sheet resistance measuring system

FAST NON-CONTACT MATERIAL CHARACTERIZATION AND PROCESS CONTROL

Emitter sheet resistance is a primary quality control parameter for silicon wafers in PV applications after emitter diffusion.

The CLS models, CLS-1A, CLS-3A, and CLS-5A, Emitter Sheet Resistance Testers allow measurement of sheet resistance at 1 to 5 points with the high throughput that meets the requirements of in-line quality control in fully automated cell production lines.

The CMS models, CMS-1A, CMS-3A, Emitter Sheet Resistance Testers allow measurement of wafers “on the fly”, i.e. conveyor belt does not stop during measurement. Therefore, they have the high throughput that meets the requirement of in-line quality control in fully automated cell production lines.

Featrues and System specifications:

Meas. technique: non-contact, junction photovoltage (JPV)
Sample size: 100 to 156 mm (210mm option)
Sample structure: np or pn junctions
Measurement range: 10 Ω/sq. to 200 Ω/sq.
Probe distance: 1.5 mm probe height above transport bel
Wafer vertical position tolerance: < 400 μm
Sample support: on belt
Calibration: by wafers verified with four point probe

Options:

Measurement module (incl. 1A-5A sheet resistance measurement heads)
Industrial PC (Windows operation system) and peripherals
CLS-1M emitter checker – option
Wafer presence sensor (CMS only)

Wide variety of available interfaces to automation and MES:

24V optically isolated I/O, Ethernet interface
Profibus
OPC DA
TCP/IP protocol, content can be XML or ASCII
SQL database
SECS/GEM

Please contact us if you are interested in the item. This item is only for end users and are subject to sale without notice. Appreciate your time.

SS7270

All used equipment /parts trademarks belongs to the original equipment manufacturer. All rights reserved.

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