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SemiStar Corp

Resale Semiconductor Equipment

Description

Description

Hitachi SU6600 (USA,Accepting offers now)
KLA-Tencor, SP3, 300mm, Particle Counter (NY, USA, Accepting offers now)
Hitachi S-5500 (NY, USA, Accepting offers now)
Hitachi S-2700 (Silicon Valley,CA,Accepting offers now)
AIXTRON VP2400HW SiC MOCVD (NJ, USA, Accepting offers now)
Hitachi Z-5700 (Taiwan,Accepting offers now)
Suss MicroTec MA-200E (NY, USA, Accepting offers now)
LAM Research Corp. Rainbow 4428 Plasma Etch (Singapore, Accepting offers now)
LAM Research Corp. TCP 9608SE Metal Etch (Singapore, Accepting offers now)
LAM Research Corp. 2300 ELD (2 sets, Germany, Accepting offers now)
LAM Research Corp. 2300 Exelan Flex (Taiwan, Accepting offers now)
Hitachi S-4700 SEM Type II (Auction, June 12, Sunnyvale CA)
Rigaku XRF ZSM Primus III+ X-ray Diffractometer (Auction, June 12, Sunnyvale CA)
Rigaku MiniFlex 600 BenchTop XRD X-ray Diffractometer (Auction, June 12, Sunnyvale CA)
Utratech Simply ALD Savannah G2 Atomic Laser Disposition System (Auction, June 12, Sunnyvale CA)
Kurt J Lesker Thin Film Dual Thermo Evaporator (Auction, June 12, Sunnyvale CA)
Semicore SC1801 PVD Physical Vapor Deposition (2 sets) (Auction, June 12, Sunnyvale CA)
Varian 3118 E-Beam Evaporator with CHA Hearter Power Supplies (Auction, June 12, Sunnyvale CA)
Kurdex MRS-2 Thin Film Coater / Sputtering System (Auction, June 12, Sunnyvale CA)
Physical Vapor Deposition System (Auction, June 12, Sunnyvale CA)

Subject to prior sale without notice.

Recommended Hot Equipment

Metrology | Tester | Wafer Carriers
Main Refurbished Equipment

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formation,radical-based oxidation process,rapid thermal processing spike anneal,300mm RTP spike anneal process,ramp-up methodologies, rampdown methodologies,Rapid thermal annealing apparatus,RTA furnace,Dai-ichi Kiden,Dai-ichi Kiden RSA, Combustion furnace, High vacuum heating system, Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system,CreaTec Fischer,Growth Systems,Mini MBE System,LT-STM/AFM,Evaporators,Centrotherm,centrotherm c.HORICOO 300 ,horizontal batch-type system,centrotherm c.HORICOO 200 , field-proven , ultra-versatile tube furnace system ,centrotherm c.VERTICOO , batch-type wafer processing , semiconductor device fabrication, atmospheric processes, LPCVD processes,centrotherm c.ACTIVATOR, high-temperature annealing, high-volume SiC device manufacturing, electrical activation , post implantation annealing ,SiC MOSFET , diode manufacturing,Cost-efficient dopant activation,Annealing of AlN seed layers , Annealing of AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，