Description
PLASMATHERM SLR Etcher
4″ round wafer configuration,Adapter plates for 2”
LEYBOLD D65BCS (PFPE) Main chamber pump
ALCATEL 5900 Turbo pump
700W ASTECX 2.45 GHz Microwave power supply
RF 5S 555W 13.56 Mhz RF supply
Ultra low cooling option: Down to -150 C with LN2
Loadlock (semi manually controlled with switches)
TEKTEMP TKD-100 Heat exchanger
Astex 1000W uwave supply
Spare ECR head
Aluminum showerhead assembly
Cooling ring for etch option
Main console electronics
Process / Sequence controller
Core interface
252C-1-5 Exhaust valve controller
AM-5 700 RF matching network
Fixed capacitance loading: 600pF
DC Probe range: 1000V
AMNPS-2A 700 Macthing network power supply
290-03 Ion gague controller
286 Thermocouple gague controller
Heater control box
RF-5S RF Generator
Output power: 555 Watts, 13.56 MHz
HS-700 Microwave generator
Output power: 700 Watts, 2.45 GHz
PLASMATHERM SLR Etcher Gas panel:
Chamber 1:
CH1 N2 FSF 20 SCCM
CH2 N2 FSF 50 SCCM
Chamber 2:
CH1 C12 FSF 20 SCCM
CH2 N2 FSF 20 SCCM
PLASMATHERM SLR Etcher Fluid input panal:
Air regulator setting: 80 psi
Pressure switch: 70 psi
PLASMATHERM SLR Etcher Input requirements:
Compressed air: 80 psi
Nitrogen: 20 psi
Water: 20 psi
PLASMATHERM SLR Etcher System power center:
Line voltage: 208 VAC
Maximum current: 60 Amps, 4-wire
Motor starter overload current setting
Mechanical pump: 6 Amps
PLASMATHERM SLR Etcher Vacuum pumps:
023-241 Lock mechanical pump
Fluid type: Fomblin 14-6
Charge: 6Kg
TDK 100 Temperature control system
Fluid type: 50/50 Glycol
Local setpoints CH1: 25°C
Valid Time: Subject to prior sale without notice.
SS5487
