EQUIPMENT DETAILS:
(1) M&W Chiller
Model: RPC2/28W-2/D-WTR-D12x10″-AA-RM-HE
MFG Date: 2000
Power Requirements: 208/230 VAC, 30A, 3-PH, 50/60 HZ
Mainly for Lam Rainbow 4420, Lam Rainbow 4520, Lam Rainbow 4620,Lam Rainbow 4720
M & W Systems RPC228W-RND ChillerHeat Exchanger
All the Lam Plasma Etcher equipment trademarks belongs to Lam Research , the original equipment manufacturer. All rights reserved.
Metrology | Tester | Wafer Carriers
Main Refurbished Equipment
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AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，
