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JEOL JBX 6300

Categories: 0-Partners, Metrology Probe Tag: Jeol

Description

Description

JEOL JBX 6300 E-Beam Lithography System

Description:

The JEOL JBX 6300 lithography system uses a high-brightness field emission electron source, a 100 keV acceleration potential, a 25 Mega-Hertz deflection system and magnetic lenses to define a beam diameter as small as 2 nm and patterns in resist as small as 8 nm. The laser-controlled stage is capable of loading 1 cm square compound semiconductor chips, up to 200 mm (8 inch) diameter silicon substrates.

Location: U.S.A.

Condition: The unit is currently operational in a laboratory clean room and should be ready for removal soon( July 20th,2022)

Quantity:1 set

Price: Make offer

These are subject to prior sale. These are only for end user. Appreciate your time.

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.

OEM-Model-1

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