Description
Beta Squared Lithography Inc. Micralign Projection Mask Aligner
The OS2000 software package.
All Manuals are with this tool.
Resolution: 1.25um lines spaces, UV-4(340-440nm)
Throughput: 120 wafers per hour, 125/100mm systems and 100 wafers per hour, 150mm systems
Depth of Focus:+-6um for 1.5um lines and spaces
Focus Stability:+-2.0um over 6 days
Focus Range:+-200um +-450um w/extended bellows chuck
Partial Coherence: Variable, 0.37 to 0.86
Numerical Aperture: .167
Uniformity of Illumination: +-3.0%
Particulate Generation:7 Particles per wafer pass (1.0um or larger)
Prealignment and First-Level Placement Accuracy: +-15um
Footprint: 18.65 sq.ft. (1.732 sq. M)
Wafer/Substrate Sizes for this tool is 2″ and the Standard:100mm
Valid Time: Subject to prior sale without notice.
SS1302044388295
