Aixtron/Veeco MOCVD
| Maker | Model | Wafer | Process | Config |
| Veeco | K465 | 4 | MOCVD | |
| Veeco | K465 | 4 | MOCVD | |
| Veeco | K465 | 4 | MOCVD | |
| Aixtron | Crius | 2 | MOCVD | (CCS MOCVD System CRIUS) Upgrade for CCS System (31 x 2″ CRIUS) |
| Aixtron | Crius | 2 | MOCVD | 31×2″ CCS IC MOCVD System |
Please contact us for the availability of the used MOCVD semiconductor process Equipment.
The items are subject to prior sale without notice. These items are only for end users.
SS5684-1-3-1-1
SS5684
Metrology | Tester | Wafer Carriers
Main Refurbished Equipment
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AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，
