Description
ADVANCE RIKO,Inc. RTP-6 Rapid Thermal Processing equipment
Condition: Used.
This is only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!
Specifications from OEM for your reference only.
| Temperature Range | RT ～ 1100 °C |
|---|---|
| Sample Size | 6-inch wafer 1 piece (4 or 5-inch wafer is optional.) |
| Atmosphere | In Static gas, Gas flow, Air, Vacuum (Vacuum pumping system is optional.) |
| Heating Method | Top single-side heating method by paraboloidal surface reflected infrared lamp |
| Maximum Heating Rate | 80 °C/s |
| Uniform Temp. Precision | ΔT = 10 °C at 800 °C being maintained in N2 |
| Control Sensor | Thermocouple JIS “K” (inserted in SiC coated carbon susceptor), pyrometer (option) |
ID-AD2020
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