Description
2006 OXFORD Plasmalab 133 RIE (FL) Reactive Ion Etcher
OXFORD Plasmalab 133 RIE (FL) For Sale
Model Year : 2006
Quantity : 1
Condition : Complete system
Availability : Immediate
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz,
Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller
Blue color PLC type
Water cooled electrode 10C-80C
Gas pod with 6 lines including following MFCs:
Ar – 100sccm
N2 – 200sccm
CHF3 – 200sccm
NF3 – 200sccm
N2O – 200sccm
Windows PC , user friendly interface
Lauda WK 1200 Chiller was utilized by previous user
This tool was removed from production October 2014.
