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OXFORD Plasmalab 133 RIE

2006 OXFORD Plasmalab 133 RIE (FL) Reactive Ion Etcher

SKU: STS Multiplex ICP -5-1-1 Category: Tags: ,


2006 OXFORD Plasmalab 133 RIE (FL) Reactive Ion Etcher 

Location: Nanjing, Jiangsu, China

Photos for your reference: Link

OXFORD Plasmalab 133 RIE (FL) For Sale
Model Year : 2006
Quantity :        1 + 1 +1 + 1

SN: 94-417795
Condition : It was complete, working. We did not test it. We will sell it at (1) AS IS WHERE IS; (2) Complete, working, functional test with crating; (3) Refurbished with OEM specifications ,crating, warranty, installation if necessary at different prices.

Availability : Immediate. Subject to prior sale without notice.


Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator : Advanced Energy RFX 600A ;  600W, 13.56MHz,
Chamber Turbo Pump : Alcatel ATH 400M  w/ ACT 600M controller

Blue color PLC type

Water cooled electrode 10C-80C

Gas pod with 6 lines including following MFCs:
Ar      – 100sccm
N2     – 200sccm
CHF3  – 200sccm
NF3    – 200sccm
N2O   – 200sccm

Windows PC , user friendly interface
Lauda WK 1200 Chiller was utilized by previous user

This tool was removed from production October 2014.

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