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OXFORD Plasmalab 133 RIE

2006 OXFORD Plasmalab 133 RIE (FL) Reactive Ion Etcher

SKU: STS Multiplex ICP -5-1-1 Category: Tags: ,

Description

2006 OXFORD Plasmalab 133 RIE (FL) Reactive Ion Etcher 

OXFORD Plasmalab 133 RIE (FL) For Sale
Model Year : 2006
Quantity :    1
Condition : Complete system
Availability : Immediate

Configuration:

Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator : Advanced Energy RFX 600A ;  600W, 13.56MHz,
Chamber Turbo Pump : Alcatel ATH 400M  w/ ACT 600M controller

Blue color PLC type

Water cooled electrode 10C-80C

Gas pod with 6 lines including following MFCs:
Ar      – 100sccm
N2     – 200sccm
CHF3  – 200sccm
NF3    – 200sccm
N2O   – 200sccm

Windows PC , user friendly interface
Lauda WK 1200 Chiller was utilized by previous user

This tool was removed from production October 2014.

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