Sort By Manufacturer

Asher

Showing 1–12 of 14 results

  • Branson IPC L3200 PLasma Dry Etch (2)

    Branson IPC L3200

     The Branson IPC L3200 Photoresist Stripper combines the control capability of single wafer processing with the throughput typical of batch systems. Downstream plasma stripping technology, low-particulate handling and processing features, as well as an oxygen-only process ensure high yields. The Branson/IPC L3200 is self-diagnostic, and can store up to 26 recipes. This dual-chamber, dual-cassette system provides throughputs of up to 60 six-inch wafers per hour with minimal particle generation.


  • Branson IPC L3200 PLasma Etching Equipment (7)

    Branson IPC L3200 Plasma etching

     The Branson IPC L3200 Photoresist Stripper combines the control capability of single wafer processing with the throughput typical of batch systems. Downstream plasma stripping technology, low-particulate handling and processing features, as well as an oxygen-only process ensure high yields. The Branson/IPC L3200 is self-diagnostic, and can store up to 26 recipes. This dual-chamber, dual-cassette system provides throughputs of up to 60 six-inch wafers per hour with minimal particle generation.


  • Matrix Bobcat 209S Asher

    Matrix Bobcat 209S

    Model: Matrix Bobcat 209S  semiconductor process equipment

    Category:  Plasma Asher Plasma Descum

    Original Equipment Manufacturer: Matrix Integrated Systems, Inc

    Condition: Refurbished by seller 

    Wafer Size: 8 inch configuration. 

    Valid Time: Subject to prior sale

    Lead Time: 12 weeks

    Location: Silicon Valley, CA, U.S.A.


  • Matrix 105 Plasma Asher Descum

    The Matrix 105 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix 105 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Matrix System One Stripper Matrix 103 (2)

    Matrix System One Stripper Matrix 103

    The Matrix System One Stripper Matrix 103 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix System One Stripper Matrix 103 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Branson IPC 3000 Plasma Asher-1

    Branson/IPC 3100

    The Branson/IPC 3100S Plasma Systems generate a low pressure, low temperature gaseous plasma. In this machine plasma reactions, such as ashing, etching, and polymer surface modification can be performed quickly and reproducibly. The Branson/IPC 3100S comprises a source of RF electrical power, means for coupling the RF power into the plasma treatment chambers, and a system to control the flow of reactant plasma gases.


  • Matrix System One Stripper Matrix 10X (7)

    Matrix System One Stripper

    The Matrix System One Stripper plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix System One Stripper plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Matrix Bobcat 209S Asher semiconductor process equipment

    Matrix Bobcat 209S

    Model: Matrix Bobcat 209S Asher  semiconductor process equipment

    Category:  Plasma Asher Plasma Descum

    Original Equipment Manufacturer: Matrix Integrated Systems, Inc

    Condition: Refurbished by seller 

    Wafer Size: 8 inch configuration. 

    Valid Time: Subject to prior sale


  • Gasonics L3500 Plasma Asher Plasma Descum Equipment

    Gasonics L3500

    The Gasonics L3500 plasma system is designed for ashing and cleaning semiconductor wafers. Gasonics L3500 does this by creating monatomic oxygen, the active specie, which chemically reacts with the photoresist on the surface of the wafer.
    The Gasonics L3500 system is composed of two main components:
    (1)The process sub-system The process sub-system includes the controller, the microwave generator, the gas flow control, the cassette platform, and the robot assembly.
    (2)he vacuum pump The vacuum pump is normally located in an adjacent equipment room separate from the main system. The pump should be kept running continuously.


  • Matrix 205 (Through The Wall Matrix 105) (17)

    Matrix 205 Plasma Asher

    The Matrix 205 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix205 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • AG Associates Heatpulse 8108 Rapid Thermal Annealing System

    Semiconductor Equipment in Stock

    Semiconductor Equipment in stock ON SALE now. Hitachi S-570, EG 1034, EG 4085, HP 4062/HP 4062UX, Tegal 903e, Heatpulse 8108, Heatpulse 4108, Lam AutoEtch 590, Branson/IPC 3000, Matrix 105, Matrix 303, Matrix 302, Lam Rainbow 44XX Series


  • Branson IPC L3200 Plasma Asher (15)

    Branson IPC L3200

     The Branson/IPC L3200 Photoresist Stripper combines the control capability of single wafer processing with the throughput typical of batch systems. Downstream plasma stripping technology, low-particulate handling and processing features, as well as an oxygen-only process ensure high yields. The Branson/IPC L3200 is self-diagnostic, and can store up to 26 recipes. This dual-chamber, dual-cassette system provides throughputs of up to 60 six-inch wafers per hour with minimal particle generation.


The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers