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Asher

Showing 1–12 of 19 results

  • Matrix Bobcat 209S Asher

    Matrix Bobcat 209S

    Model: Matrix Bobcat 209S  semiconductor process equipment

    Category:  Plasma Asher Plasma Descum

    Original Equipment Manufacturer: Matrix Integrated Systems, Inc

    Condition: Refurbished by seller 

    Wafer Size: 8 inch configuration. 

    Valid Time: Subject to prior sale

    Lead Time: 12 weeks

    Location: Silicon Valley, CA, U.S.A.


  • Matrix 105 Plasma Asher Descum (1)

    Matrix 105 Plasma Asher Descum

    The Matrix 105 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix 105 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Branson IPC 3000 Plasma Asher-1

    Branson/IPC 3100

    The Branson/IPC 3100S Plasma Systems generate a low pressure, low temperature gaseous plasma. In this machine plasma reactions, such as ashing, etching, and polymer surface modification can be performed quickly and reproducibly. The Branson/IPC 3100S comprises a source of RF electrical power, means for coupling the RF power into the plasma treatment chambers, and a system to control the flow of reactant plasma gases.


  • Matrix Integrated Systems Inc Matrix 105 Plasma Asher PLasma Descum -San Jose (7)

    Matrix 105 -ID 7

    The Matrix 105 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix 105 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Brasnon IPC 3000 Plasma Asher Descum

    Branson IPC 3000

    The Branson IPC 3000 Plasma Systems generate a low pressure, low temperature gaseous plasma. In this machine plasma reactions, such as ashing, etching, and polymer surface modification can be performed quickly and reproducibly. The Branson/IPC 3000 comprises a source of RF electrical power, means for coupling the RF power into the plasma treatment chambers, and a system to control the flow of reactant plasma gases.


  • Matrix Integrated Systems Inc Matrix 105 Plasma Asher PLasma Descum -San Jose (6)

    Matrix 105 -ID 6

    The Matrix 105 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix 105 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Matrix Bobcat 209S Asher semiconductor process equipment

    Matrix Bobcat 209S

    Model: Matrix Bobcat 209S Asher  semiconductor process equipment

    Category:  Plasma Asher Plasma Descum

    Original Equipment Manufacturer: Matrix Integrated Systems, Inc

    Condition: Refurbished by seller 

    Wafer Size: 8 inch configuration. 

    Valid Time: Subject to prior sale


  • Matrix Integrated Systems Inc Matrix 105 Plasma Asher PLasma Descum -San Jose (4)

    Matrix105 -ID 4

    The Matrix 105 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix 105 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Matrix 205 (Through The Wall Matrix 105) (17)

    Matrix 205 Plasma Asher

    The Matrix 205 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix205 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Matrix System One Stripper Matrix 103 (2)

    Matrix System One Stripper Matrix 103

    The Matrix System One Stripper Matrix 103 plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix System One Stripper Matrix 103 plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


  • Branson IPC L3200 Plasma Asher (15)

    Branson IPC L3200

     The Branson/IPC L3200 Photoresist Stripper combines the control capability of single wafer processing with the throughput typical of batch systems. Downstream plasma stripping technology, low-particulate handling and processing features, as well as an oxygen-only process ensure high yields. The Branson/IPC L3200 is self-diagnostic, and can store up to 26 recipes. This dual-chamber, dual-cassette system provides throughputs of up to 60 six-inch wafers per hour with minimal particle generation.


  • Matrix System One Stripper Matrix 10X (7)

    Matrix System One Stripper

    The Matrix System One Stripper plasma Asher Plasma descum semiconductor equipment  represents the Industry Standard in single-wafer photoresist removal and the mainstay of the highly successful System One family. Developed in cooperation with many of the world’s leading IC producers, the Matrix System One Stripper plasma Asher Plasma descum semiconductor equipment has been designed for optimum performance and Cost of Ownership.


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