New Products
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200mm 300mm Wafers (9)
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New ALD Equipment (5)
Koninklijke DSM N.V. Specialty Coating Systems (SCS) Biocoat Coatings2Go Hydromer Harland Medical Systems AST Products Aap Implantate AG Covalon Technologies Ltd. DOT GmbH Surmodics Sciessent LLC Aran Biomedical BioCote Ltd Jiangsu Biosurf Biotech jMedtech DSM Biomedical Thermal Spray Technologies Harland Medical Systems Precision Coating Surface Solutions Group ISurTec Whitford AdvanSource Biomaterials Antimicrobial Coatings Capacitance Manometer Vacuum Gauges , Inficon MKS Instruments Agilent Setra Systems Pfeiffer Vacuum Canon Anelva Atlas Copco (Leybold and Edwards) Brooks Instrument ULVAC Kurt J. Lesker Thyracont InstruTech Azbil Horiba Atovac. ASM International Tokyo Electron Lam Research Applied Materials Leadmicro Wuxi Songyu Technology Co. LTD Ideal Deposition ANAME SRII NAURA Hunan Red Solar Veeco Piotech Superald LLC Picosun Jiangsu MNT KE-Micro -
New Asher Equipment (5)
Nordson MARCH, Plasmatreat, Bdtronic, Panasonic, PVA TePla, Diener Electronic, Vision Semicon, Samco Inc., Tantec, SCI Automation, PINK GmbH Thermosysteme, Plasma Etch, Shenzhen OKSUN, Plasma Surface Preparation Machines ">快速退火炉，速升溫退火爐，保护气氛快速退火炉，保護氣氛快速退火爐，快速退火爐，红外灯加热，红外灯快速退火，卤素灯加热，高温计，红外高温计，等离子去胶机，等离子刻蚀，深刻蚀，各向同性，各向异性，等离子清洗，溅射台，蒸发台，磁控溅射台，直流电源溅射，高频溅射，自动刻蚀机，自动去胶机，手动去胶机，手动刻蚀机，干法去胶机，湿法去胶机，干法刻蚀机，湿法刻蚀机，半导体设备，半导体旧设备，半导体中古设备，半导体前道工艺设备，半导体后道工艺设备，半导体前道设备，半导体后道设备，半导体量测仪器，半导体量测设备，美国制造，紅外線燈加熱，紅外線燈快速退火，鹵素燈加熱，高溫計，紅外線高溫計，等離子去膠機，等離子蝕刻，深刻蝕，各向同性，各向異性，等離子清洗，濺射台，蒸發台，磁控濺射台，直流電源濺射，高頻濺射，自動蝕刻機，自動去膠機，手動去膠機，手動蝕刻機，乾式去膠機，濕式去膠機，乾法蝕刻機，濕蝕刻機，半導體設備，半導體舊設備，半導體中古設備，半導體前道製程設備，半導體後道製程設備，半導體前道設備，半導體後道設備，半導體量測儀器，半導體量測設備，美國製造，Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean,Gasonics AE 2001, Gasonics AE 2000LL Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Tegal 915, Tegal 965, Tegal 405, Tegal 401 Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch Enviro,ENVIRO-1XaENVIRO-1Xa ,2CENVIRO-Optima,Luminous NA,NA-8000NA-1300NA-1500 ,Multifilm,NE-550EXaNE-950EX, APIOSNE-5700Deep, Oxide Etching ,NLD-570EXaRISE System,RISE Series,Cluster Systems,SME SeriesuGmni Series,SRH SeriesULDiS Series,SMV-500FRoll-coater,SPW SeriesIn-line Systems,SIV SeriesSDH-4550LR&D,CS-200, 300mm,ENTRON-EXENTRON-EX2,Evaporation Roll Coater,EW SeriesR&D/Pilot Production,Ei-5In-line Systems, Ei-H series,Si Processing,IMX-3500SOPHI-200/260 ,SiC,IH-860,Brazing Furnace,FB SeriesFHHn series ,Vacuum Sintering,FSC SeriesVacuum,Induction Melting,FMI Series,Vacuum Heat Treatment,FHB-60CFHV Series,Single-Substrate,CC Series,CME Series,In-line Systems, ULGLAZE Series,Lyophilizer,DFB Series,Micropowder Dry, UPD-400D,FM Series,DFR Series,Centrifugal Type,CEH-400B,ULVAC Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition Nordson MARCH Plasmatreat Bdtronic Panasonic PVA TePla Diener Electronic Vision Semicon Samco Inc. Tantec SCI Automation PINK GmbH Thermosysteme Plasma Etch Shenzhen OKSUN. Plasma Surface Treating Equipment : Nordson MARCH, bdtronic, Diener electronic, AcXys Technologies, Europlasma, ME.RO, Tantec, Plasmatreat, Plasma Etch, PINK GmbH Thermosysteme, Kalwar Group, Arcotec, Shenzhen OKSUN.Handheld Plasma Cleaner : Allwin21, SemiStar, Innoclean, Techu Scientific, Ja0755, PLAUX, Relyon Plasma GmbH, Plasma Pipette, Plasma Etch, Harrick Plasma, Diener Electronic GmbH, PVA TePla AG, HRL Laboratories. -
New Dry Cleaning (3)
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New Etch RIE ICP Equip (9)
">快速退火炉，速升溫退火爐，保护气氛快速退火炉，保護氣氛快速退火爐，快速退火爐，红外灯加热，红外灯快速退火，卤素灯加热，高温计，红外高温计，等离子去胶机，等离子刻蚀，深刻蚀，各向同性，各向异性，等离子清洗，溅射台，蒸发台，磁控溅射台，直流电源溅射，高频溅射，自动刻蚀机，自动去胶机，手动去胶机，手动刻蚀机，干法去胶机，湿法去胶机，干法刻蚀机，湿法刻蚀机，半导体设备，半导体旧设备，半导体中古设备，半导体前道工艺设备，半导体后道工艺设备，半导体前道设备，半导体后道设备，半导体量测仪器，半导体量测设备，美国制造，紅外線燈加熱，紅外線燈快速退火，鹵素燈加熱，高溫計，紅外線高溫計，等離子去膠機，等離子蝕刻，深刻蝕，各向同性，各向異性，等離子清洗，濺射台，蒸發台，磁控濺射台，直流電源濺射，高頻濺射，自動蝕刻機，自動去膠機，手動去膠機，手動蝕刻機，乾式去膠機，濕式去膠機，乾法蝕刻機，濕蝕刻機，半導體設備，半導體舊設備，半導體中古設備，半導體前道製程設備，半導體後道製程設備，半導體前道設備，半導體後道設備，半導體量測儀器，半導體量測設備，美國製造，Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean,Gasonics AE 2001, Gasonics AE 2000LL Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Plasma RIE ,Reactive Ion Etch System, Reactive Ion Etch System, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Tegal 915, Tegal 965, Tegal 405, Tegal 401 Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch Enviro,ENVIRO-1XaENVIRO-1Xa ,2CENVIRO-Optima,Luminous NA,NA-8000NA-1300NA-1500 ,Multifilm,NE-550EXaNE-950EX, APIOSNE-5700Deep, Oxide Etching ,NLD-570EXaRISE System,RISE Series,Cluster Systems,SME SeriesuGmni Series,SRH SeriesULDiS Series,SMV-500FRoll-coater,SPW SeriesIn-line Systems,SIV SeriesSDH-4550LR&D,CS-200, 300mm,ENTRON-EXENTRON-EX2,Evaporation Roll Coater,EW SeriesR&D/Pilot Production,Ei-5In-line Systems, Ei-H series,Si Processing,IMX-3500SOPHI-200/260 ,SiC,IH-860,Brazing Furnace,FB SeriesFHHn series ,Vacuum Sintering,FSC SeriesVacuum,Induction Melting,FMI Series,Vacuum Heat Treatment,FHB-60CFHV Series,Single-Substrate,CC Series,CME Series,In-line Systems, ULGLAZE Series,Lyophilizer,DFB Series,Micropowder Dry, UPD-400D,FM Series,DFR Series,Centrifugal Type,CEH-400B,ULVAC Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition Nordson MARCH Plasmatreat Bdtronic Panasonic PVA TePla Diener Electronic Vision Semicon Samco Inc. Tantec SCI Automation PINK GmbH Thermosysteme Plasma Etch Shenzhen OKSUN. Plasma Surface Treating Equipment : Nordson MARCH, bdtronic, Diener electronic, AcXys Technologies, Europlasma, ME.RO, Tantec, Plasmatreat, Plasma Etch, PINK GmbH Thermosysteme, Kalwar Group, Arcotec, Shenzhen OKSUN. Helium Leak Detector: Mass Spectrometer Leak Detector, INFICON, Agilent, Pfeiffer Vacuum, Leybold, Shimadzu, AnHui Wanyi, Edwards Vacuum, ULVAC, Canon Anelva, VIC Leak DetectionPlasma Cleaners,Semiconductor Automotive Electronics Tabletop Type Large Chamber Type Nordson MARCH Plasmatreat Bdtronic Panasonic PVA TePla Diener Electronic Vision Semicon Samco Inc. Tantec SCI Automation PINK GmbH Thermosysteme Plasma Etch , Semiconductor Mass Flow Controller : HORIBA Fujikin MKS Instruments Sevenstar Hitachi Metals, Ltd Pivotal Systems MKP AZBIL Bronkhorst Lintec Kofloc Brooks Sensirion ACCU Sierra Instruments, Dry Etching Equipment, Lam Research TEL Applied Materials Hitachi High-Technologies Oxford Instruments ULVAC SPTS Technologies GigaLane Plasma-Therm SAMCO AMEC NAURA , Nano-master, Allwin21, SemiStar, Inductively Coupled Plasma (ICP) Etchers, Lam Research TEL Applied Materials Hitachi High-Tech Oxford Instruments SPTS Technologies Plasma-Therm GigaLane SAMCO Corial AMEC NAURA Planar ICP Source, Cylindrical ICP Source, Semiconductors; Dielectrics; Metals; Polymers;Handheld Plasma Cleaner : Allwin21, SemiStar, Innoclean, Techu Scientific, Ja0755, PLAUX, Relyon Plasma GmbH, Plasma Pipette, Plasma Etch, Harrick Plasma, Diener Electronic GmbH, PVA TePla AG, HRL Laboratories. Reactive Ion Etch (RIE) Systems：Oxford Instruments； SAMCO Inc.； Plasma-Therm； NANO-MASTER； Lam Research； Nordson MARCH； AMEC； Trion Technology； SENTECH； Plasma Etch Inc.； Torr International； Korea Vacuum Tech； Beijing Chuangshiweina Technology。
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New Evaporator Equip (4)
Thin Film Coating : Precision Optical Alluxa Micro Point Pro Ltd (MPP) Thin Films Inc. EP LABORATORIES, INC ULVAC-PHI, INCORPORATED Oerlikon Balzers Reynard Corporation Torr Scientific Ltd IDEX Corporation MATREION Anti-Reflection Coatings Infrared Coatings Visible Coatings Ultraviolet Coatings Filter Coatings Conductive Coatings -
New Furnace LPCVD CVD (7)
Vertical Oxidation Furnace : ASM International l Tempress l Tokyo Electron Limited l Centrotherm Photovoltaics l Koyo Thermo Systems Co.,Ltd. l Kokusai Electric Corporation l KE Semiconductor Equipment Co.,Ltd. l Applied Materials l NAURA Technology Group Co.,Ltd. l Beijing E-town Semiconductor Technology Co.,Ltd. | Tystar. Carbon Nanotube Composite Membrane: XG Sciences; Nanocyl; Cheap Tubes; OCSiAl; Nanolab Technologies; Carbon Waters; Applied Sciences Inc.; CNT Technologies; Carbon NT&F; Cnano Technology; Nanoshell Materials; Nanocarbonsol. Segment by Type: Polymer Membrane; Ceramic Membrane. Segment by Application: Water Treatment; Battery Manufacturing; Electronics Manufacturing. Metal Furnace Manufacturer Player OEM supplier vendor: Cremer, CARBOLITE GERO, ECM GROUP, Seco/Warwick, BMI Fours Industriels, TAV, The Furnace Source, PVA, TISOMA, CM Furnaces, Elnik Systems, LLC., Materials Research Furnaces, AVS, Inc, Ningbo Hiper Vacuum Technology Co.,Ltd, Sinterzone, LINGQI, Haoyue, Jutatech, Meige. Heat Treatment Furnace : Andritz; Tenova; Primetals Technologies; Aichelin Group; Inductotherm Corporation; ALD; Ipsen; Despatch; SECO/WARWICK; Nachi-Fujikoshi; PVA TePla; Cieffe(Accu）; Mersen; Gasbarre Furnace; TPS; Surface Combustion; CEC; Sistem Teknik; AVS; TAV; Nutec Bickley; Shenwu; Phoenix Furnace.Hydrogen Free Diamond-Like Carbon Coating(DLC) : Oerlikon Balzers; IHI Group; CemeCon; Morgan Advanced Materials; Miba Group (Teer Coatings); Acree Technologies; IBC Coatings Technologies; Techmetals; Calico Coatings; Stararc Coating; Creating Nano Technologies. PVD; PACVD. -
New Metrology Instruments (2)
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New MOCVD Equip (1)
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New Parts & Service (66)
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New PECVD Equip (6)
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New Rapid Thermal Process (3)
JTEKT Thermo Systems Centrotherm Tystar Corporation Toyoko Kagaku CETC-48 AMAT NAURA Shenzhen S.C New Energy Technology Shandong Leguan LAPLACE-SEMI Qingdao Huaqi Technology Sunred Electronic Equipment Hunan Exwell Semiconductor Mattson (Beijing E-Town) ULVAC Sumitomo Heavy Industries Annealsys Chengdu LasTop Technology Larcomse Equipment (Shanghai) Kokusai Electric Wuxi Yiwen Electronic Technology, SiC Thermal Process Equipment, Semiconductor Rapid Thermal Treatment Equipment .Applied Materials Mattson Technology Kokusai Electric Beijing E-Town Semiconductor Technology Co. Ltd. Centrotherm AnnealSys JTEKT Thermo System ECM CVD Equipment Corporation -
New Sputter Equipment (4)
Sputter Coaters ULVAC Quorum Technologies Buhler Cressington Scientific Instruments Hitachi High-Technologies Corporation Oxford Instruments Semicore Equipment Plassys Bestek PVD Products Denton Vacuum Veeco Instruments Kolzer SPI Supplies Hind High Vacuum Company (HHV) KDF Electronic & Vacuum Services FHR Anlagenbau Angstrom Engineering Soleras Advanced Coatings Milman Thin Film Systems Plasma Process Group Mustang Vacuum Systems Kenosistec Scientific Vacuum Systems AJA International Electron Microscopy Sciences, High Purity Precious Metals Target ,Materion (Heraeus) Solar Applied Materials Tanaka Precious Metals FURAYA Metals Angstrom Sciences GRIKIN ULVAC KJLC Sumitomo Chemical. Thin Film Coating : Precision Optical Alluxa Micro Point Pro Ltd (MPP) Thin Films Inc. EP LABORATORIES, INC ULVAC-PHI, INCORPORATED Oerlikon Balzers Reynard Corporation Torr Scientific Ltd IDEX Corporation MATREION Anti-Reflection Coatings Infrared Coatings Visible Coatings Ultraviolet Coatings Filter Coatings Conductive Coatings. Sputtering Target manufacturers for Semiconductor: JX Advanced Metals; Materion; Konfoong Materials International; Linde; Proterial; Plansee SE; TOSOH; Honeywell; Grinm Advanced Materials Co.Ltd.; ULVAC; TANAKA; Sumitomo Chemical; Luvata; Advantec; Longhua Technology Group (Luoyang); Furuya Metal; Umicore Thin Film Products; Angstrom Sciences. Sputtering Target for Semiconductor Segment by Type: Metal Sputtering Target Material; Alloy Sputtering Target Material; Non-metal Sputtering Target Material. Sputtering Target for Semiconductor Segment by Application: Wafer Manufacturing; Wafer Assembly and Testing. Small Ion Sputtering Instrument: Hitachi; ULVAC Technologies; Ted Pella; Bühler Group; Oxford Instruments; Veeco Instruments; Mustang Vacuum Systems; Kenosistec; Plasma Process Group; Agar Scientific; KYKY Technology; Jingying Technology; Micro Hezao; Shanghai Xinu Optical Technology; Gevee-Tech; Shenzhen Meinmei Technology. -
New TC Wafers TCW (1)
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New Wafer Carriers (10)
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New Wet Cleaning (3)
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Optical Coating System (1)
