Main Maker

AG Associates Heatpulse 4100 Rapid Thermal Processing System

Options of AG Associates Heatpulse 4100 Rapid Thermal Annealer

The following options can be added to the AG Associates Heatpulse 4100 Rapid Thermal Annealer at any time:

  • Non-Contact Wafer Aligner : Finds the flat edge or notch of a wafer prior to loading it  into the heating chamber. No contact is made with the edge of the wafer; contact is on the backside of the wafer only.
  • Susceptor Autoloader : Provides the capability to process wafers in a Autoloader susceptor. Wafers are automatically loaded into a susceptor for processing and unloaded at the end of the process cycle. This application is ideal for processing GaAs wafers.
  • Slip Free :Hardware and software that dramatically reduces slip for high-temperature processing. Option includes either the flatfinder or non-contact wafer aligner.
  • Dual-Color Pyrometer: The Dual-Color Pyrometer (DCP) measures the wafer Pyrometer temperature at two different wavelengths. Using the emissivity correction software, the system can compensate for variations in emissivity from one wafer to another.
  • Emissivity Temperature Calibrator : Device that calibrates the system pyrometer to a reference wafer to allow fast emissivity-correction. Includes a  portable cart, vacuum source, and closed-loop cooling system.
  • Rear Controller: Touch-screen controller for operation from the rear of the  system to facilitate maintenance activities.
  • E-SECS :Protocol messages which facilitate the remote control of the HEATPULSE 4100 from a host computer system. Option includes communication processor with 12K ROM and 16K RAM. Option supports common SECS II communications protocol required to operate the AG Associates HEATPULSE 4100.

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers