Description
STS CPX Cluster DRIE XeF2, STS / SPTS CPX Cluster Multi chamber silicon etch system
- With ESC
- 8 inch
- 2 of Process modules
- ICP Deep silicon etch chamber (DRIE), 6″
- Isotropic silicon etch chamber (XeF2)
Please contact us if you are interested in the STS CPX Cluster DRIE XeF2. We do not own this. These are only for end user. They are subject to prior sale without notice. First come, first serviced.
