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PE-2400-8SA MULTI TARGET SYSTEM

PE-2400-8SA MULTI TARGET SYSTEM

Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition

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Description

Model PE-2400-8SA MULTI TARGET SYSTEM

Condition: Used. Refurbished is optional.

Valid Time: Subject to prior sale without notice. First come, first serviced. This item is only for end user.

Description from OEM for your reference only:

  1. RF Forward & Reflected Meters.
  2. Target Selector Mode Selector.
  3. Shutter full circle design.
  4. Shutter position selector.
  5. Auto Pump Sequencing.
  6. Cryo Pumped.
  7. Hoist for Sputter Head.
  8. Three 8″ Round RF Diode Cathodes.
  9. Annular Table 21.5″ O.D.
  10. Variable Speed Drive Motor.
  11. Anode Cathode Spacing.
  12. RF Power 1 & 2 kW.
  13. Servo Match Auto Tune.
  14. Load & Tune Functions

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