Refurbished Matrix 105 RF Downstream Plasma Asher Photoresist Stripper Descum Semiconductor Equipment

SemiStar Corp. offers refurbished Matrix 105 RF downstream plasma asher photoresist stripper Descum semiconductor equipment refurbished to OEM specification for qualified end-user customers. The Matrix 105 is a production-proven single-wafer photoresist removal and descum system used for semiconductor wafer fabrication, resist stripping, and related dry process applications.

This RF plasma asher supports single-wafer processing, cassette handling, robotic wafer transfer, endpoint detection, and controlled photoresist removal for universities, research institutes, MEMS labs, compound semiconductor fabs, and semiconductor manufacturing applications.

Photo is for reference only. Actual system configuration and appearance may vary.

System Description

The Matrix 105 is a compact single-wafer RF plasma asher photoresist stripper semiconductor equipment designed for non-damaging photoresist removal, descum, and plasma cleaning applications.

The system uses a 13.56 MHz RF plasma source, closed-loop process control, robotic cassette-to-cassette wafer handling, and endpoint detection capability. It is designed to reduce carbon-chain polymer resists in a controlled plasma environment while minimizing thermal and electrical device damage.

The Matrix 105 supports 100 mm, 125 mm, and 150 mm wafer processing and is suitable for semiconductor R&D, MEMS, compound semiconductor, university, and production fab applications.

Configuration Capability

• 50mm, 75mm, 100 mm, 125 mm, and 150 mm wafer capability
• Single-wafer processing
• Cassette handling
• Robotic wafer handling
• RF plasma ashing configuration
• 13.56 MHz RF generator
• Timed or absolute endpoint detection
• Closed-loop wafer chuck temperature control
• Pins-up and pins-down processing capability
• Multi-step process control
• Quartz chamber with dispersive gas plenum and quartz ion shield baffle
• Butterfly-type pressure control
• Mass flow controller gas delivery capability
• Modular system design for serviceability

Applications

• Photoresist stripping
• Plasma ashing
• Descum process
• Dry photoresist removal
• Semiconductor wafer cleaning
• MEMS process applications
• Resist thinning
• Pre-metal deposition clean
• Pre-plate descum
• Pre-wet-etch descum
• Adhesion promotion
• Research, pilot line, and semiconductor fab applications

Typical Process Capability

Typical Matrix 105 process capability may include RF plasma ashing, oxygen-based resist stripping, timed or absolute endpoint detection, controlled pressure, controlled gas flow, and closed-loop wafer chuck temperature control.

• RF Frequency: 13.56 MHz
• RF Power: Up to approximately 650 W
• Process Pressure: Typically 3.0 to 5.0 Torr depending on process
• Wafer Chuck Temperature: Typically 80–250°C depending on configuration and process
• Typical Strip Rate: Approximately 0.8–1.5 µm/min depending on process conditions
• Throughput: Typically 40–60 WPH depending on substrate size, pattern density, and process requirements

Actual performance depends on the final system configuration, wafer type, process recipe, resist condition, and customer facility conditions.

Facility Requirements

Facility requirements should be confirmed before PO and may vary depending on the exact system configuration. Typical facility items may include:

• Power: 200–240 VAC, single phase, 50/60 Hz, approximately 30 A
• Vacuum: Vacuum pump required; pump configuration depends on process and facility requirements
• Cooling Water: Closed-loop cooling water or water temperature controller may be required depending on configuration
• Process Gases: O₂, N₂, forming gas, and other gases depending on process configuration
• Exhaust: Cabinet, chamber, and vacuum pump exhaust required
• Utilities: Final utility requirements to be confirmed with SemiStar before shipment
• Facility Responsibility: Customer is responsible for facility preparation, vacuum pumps, chillers or water temperature controllers if applicable, process gas supply, exhaust, CDA, power connection, and related facility support items unless otherwise specified in quotation.

PC Controller Upgrade Service

In addition to offering refurbished Matrix 105 systems, SemiStar also provides PC controller upgrade solutions for customer-owned working systems. This option is intended for customers who already own a Matrix 105, System One Model 105, or similar plasma asher and want to improve system usability, replace obsolete controls, or extend equipment life.

RFQ Information Required

To help us recommend the correct configuration and provide an accurate quotation, please provide the following information:

• End user company name and contact information
• Wafer size
• Wafer material
• Photoresist type and thickness, if available
• Required process gases
• Process specifications and target results
• Throughput requirement
• Temperature requirement
• Endpoint detection requirement
• Have you used Matrix 105, System One Model 105, or similar plasma asher equipment before? If yes, please provide model information.
• Budget range
• Purchase timeline
• Any special facility or installation requirements

Contact SemiStar

SS380-MSP-175