Description
Equipment Model: STS Multiplex ICP Deep Reactive Ion Etcher (DRIE)
Maker: STS
Condition: Used. It was complete, working in a Fab. It was de-installed and stored in our company.
Price: Contact Us by filling the bottom form. Pls specify the condition you are going to buy at. Appreciate your time.
Quantity: 1 set
Vintage: 2002
Valid Time: Subject to prior sale without notice
Others: We sell it at any of the conditions: (1) AS IS; (2) Complete, Working, functional test; (3) Refurbished with installation and warranty.
Location: OEM-11
Description:
Info from O.E.M. for your reference only.
STS Multiplex ICP Deep Reactive Ion Etcher (DRIE), 6″-8″
Power supply: 208 V, 3 Phase, 60 Hz, Semi auto mode. Mode: Bosch
Chamber:
Deep silicon etch process package
SOI Trench etch package
Gas line: (4) Valve-MFC-filters (VCR)
ICP 240BF Source (ASE-exc PSU / Matching unit)
Electrode temperature control: 5°C-40°C
Multiplex ICP SC160M process chamber (MESC)
RF Supply / Matching unit: 300/30 W (13.56 MHz)
RF Supply / Matching unit: 1 kW (13.56 MHz)
Chamber parts: Substrate, 6″ (Mechanical clamping)
Chamber externals: ICP V2
Mechanical wafer clamp electrode (Tripod)
With backside cooling
Process chamber:
ICP V2 Unified ISO250 (Inc insulation spacers) SR
With 160 adapters
LEYBOLD MAG900CT Turbo pump
EDWARDS iQDP80 (M) Dry pump
Includes:
EDWARDS D146 Penning gauge
MKS 51A and SMC ZSE6B Pressure switches
EDWARDS 655 100 mT Cap man gauge
EDWARDS E2M40 PFPE vacuum pump
NW16 Bypass pump line
Gas box
Affinity chiller
Electric cluster cabinet
Lower electrode: ICP WTC Tripod lift
Substrate clamping / Platen: ICP WTC Tripod 150 mm
Lower RF enclosure / MU: ICP V2 WTC H/F, L/F (SOI)
Electrode lift stops: 96 mm
Electrode spacing: 136 mm
HBC Assembly: ICP V2
TYLAN CDLD 10T Cap man gauge
TYLAN FC2901 50sccm He Cal MFC
Upper electrode with aperture mounting
Upper electrode source: ICP Balun
Upper RF enclosure / MU: Balun 1kW (High cool)
Chamber lid: ICP Heated
RF Generators:
Upper: ENI ACG10B 1 kW (13.56 MHz)
Lower: ENI ACG3B 300/30 W (13.56 MHz)
LF5 Pulse gen switch unit
Bypass pumping: Automatic NW16
Heated foreline: ICP
NW40 (1m) Pumping line
EDWARDS iQDP80 (M) Backing pump
Chamber heating: (4) WATLOW 700 W Cartridge heaters
Gasbox: Minimum 4 lines (Includes PFC1 module)
Chamber cover panels: ICP V2
Gases / MFC Size (sccm) / Seal type / Line type / Gas type
C4F8(S) / 200 / VITON / G12 / Clean
SF6(S) / 300 / VITON / G12 / Clean
O2(S) / 100 / VITON / G12 / Clean
Ar / 100 / VITON / G12 / Clean / Process
Loadlock:
Carousel vacuum loadlock
Carousel loadlock parts: (2) Substrates, 6″
EDWARDS RF Rack mount Cabinet F (Fomblin) Rotary pump
Pls contact us for the availability for the following items. These are only for end users and are subject to prior sale without notice. Appreciate your time.
All the used equipment trademarks belongs to the O.E.M. , the original equipment manufacturer. All rights reserved.
