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Strip Photostabilize etc.

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Semiconductor Equipment parts-Process equipment-Strip Photostabilize Resist Coat Bake Develop

Location: CA, U.S.A.

These are  subject to prior sale. These are only for end user. Appreciate your time.

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.

1 Brewer Science CEE-1300X programmable hot plate for 200mm wafers
2 Brewer Science DSD-1
3 CEE 100FX Developer for 300mm wafers or substrates up to 8×8 square
4 CEE 200FX Coater for substrates up to 450mm or 14in x14in square with cabinet and stainless fume hood
5 CEE100 wafer spin coater dual dispense nozzles, 200mm wafer chuck, and base cabinet
6 Cybor 5126C/5126CE Photoresist Pump, Controller 505D/ 512F, 512H
7 Headway PWM-32-PS-CB15 Large Substrate Photoresist Coater with dispense pump
8 IDI Integrated Designs resist pump
9 karl Suss RC-5 spin coater with Gyrset for max 5in substrates
10 Millipore FAS Technologies W2501VS01/ W2501CC01 Thermoelectric Photoresist Cooler
11 MTI VTC-200 Programmable spin coater for maximum 8″ substrate
12 Solitec 5110C photoresist coater for maximum 9in diameter substrate
13 Solitec 820ACB Coat Bake Track System
14 Suss Microtec Delta 80 Gyrset coater
15 Suss Microtech RC8-MS2 coater
16 Suss RC8-MS3 Photoresist Spin Coater for max 200mm substrates

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SS7270-1-2-1-1 and SS7270W

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers