Description
Semiconductor Equipment parts-Process equipment-Strip Photostabilize Resist Coat Bake Develop
Location: CA, U.S.A.
These are subject to prior sale. These are only for end user. Appreciate your time.
The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.
1 | Brewer Science CEE-1300X programmable hot plate for 200mm wafers |
2 | Brewer Science DSD-1 |
3 | CEE 100FX Developer for 300mm wafers or substrates up to 8×8 square |
4 | CEE 200FX Coater for substrates up to 450mm or 14in x14in square with cabinet and stainless fume hood |
5 | CEE100 wafer spin coater dual dispense nozzles, 200mm wafer chuck, and base cabinet |
6 | Cybor 5126C/5126CE Photoresist Pump, Controller 505D/ 512F, 512H |
7 | Headway PWM-32-PS-CB15 Large Substrate Photoresist Coater with dispense pump |
8 | IDI Integrated Designs resist pump |
9 | karl Suss RC-5 spin coater with Gyrset for max 5in substrates |
10 | Millipore FAS Technologies W2501VS01/ W2501CC01 Thermoelectric Photoresist Cooler |
11 | MTI VTC-200 Programmable spin coater for maximum 8″ substrate |
12 | Solitec 5110C photoresist coater for maximum 9in diameter substrate |
13 | Solitec 820ACB Coat Bake Track System |
14 | Suss Microtec Delta 80 Gyrset coater |
15 | Suss Microtech RC8-MS2 coater |
16 | Suss RC8-MS3 Photoresist Spin Coater for max 200mm substrates |
SS7270-1-2-1-1 and SS7270W