Description
Refurbished STS / CPX Multiplex PECVD Plasma Enhanced Chemical Vapor Deposition System
SemiStar Corp. offers one refurbished STS / CPX Multiplex PECVD Plasma Enhanced Chemical Vapor Deposition (PECVD) System for semiconductor, MEMS, university cleanroom, compound semiconductor, advanced materials, and thin film deposition applications. The system is available in refurbished condition with OEM specifications, subject to final inspection, refurbishment scope, and prior sale.
The STS / CPX Multiplex PECVD platform is designed for advanced plasma enhanced thin film deposition processes including silicon dioxide (SiO2), silicon nitride (Si3N4), silicon carbide (SiC), and related dielectric or passivation layer applications. The system includes automatic wafer transfer capability between load-lock and process chamber with dual-frequency PECVD architecture for flexible process development and production applications.
Product photos are for reference only. Actual system configuration, accessories, software, utilities, installed options, process capability, and cosmetic condition should be confirmed by SemiStar’s final quotation and inspection report.
Availability
| Equipment Model | STS / CPX Multiplex PECVD |
| Equipment Type | Plasma Enhanced Chemical Vapor Deposition System (PECVD) |
| Category | PECVD / Thin Film Deposition / Semiconductor Deposition System |
| Manufacturer / OEM | STS / Surface Technology Systems / CPX |
| Condition | Refurbished with OEM specifications |
| Wafer Capability | Loader substrates up to 200 mm diameter |
| Chuck Size | 100 mm diameter chuck |
| Load Lock | MK4 Single Wafer Load Lock |
| Transfer Configuration | Automatic transfer between load-lock and process chamber |
| Vacuum Load Lock | Manual load-lock operation |
| Quantity | 1 system |
| Price | Contact SemiStar by filling out the inquiry form below |
| Availability | Subject to prior sale without notice |
System Description
The STS / CPX Multiplex PECVD system is a dual-frequency plasma enhanced chemical vapor deposition platform designed for advanced dielectric and thin film deposition applications. The system supports automatic wafer transfer from load-lock to process chamber and includes remote gas box architecture, turbo vacuum systems, and Windows-based computer control.
Multiplex PECVD platforms are widely used for semiconductor research, MEMS fabrication, dielectric deposition, passivation layer development, and compound semiconductor thin film processing.
Current Configuration
- STS / CPX Multiplex PECVD System
- Dual-frequency PECVD architecture
- High-frequency PECVD capability
- Low-frequency PECVD capability
- Automatic wafer transfer between load-lock and process chamber
- MK4 single wafer load lock
- Remote gas box
- Computer, monitor, and keyboard included
- Windows 2000 operating system
- Affinity chiller included
- Operation manuals included
- Electrical drawings included
- Auxiliary equipment manuals included
RF Power Configuration
| RF Configuration | Specification |
|---|---|
| Dual Frequency PECVD | High Frequency / Low Frequency |
| RF Frequency | 187.5 kHz / 375 kHz |
Vacuum System Configuration
- EDWARDS IH600 Vacuum Pump for process chamber
- VARIAN SH-100 Vacuum Pump for load-lock
- Turbo-pumped vacuum process architecture
- Load-lock isolation for improved contamination control and throughput
Installed Gas Configuration
| Gas | MFC Range |
|---|---|
| SiH4-Ar (Silane-Ar) | 100 SCCM |
| NH3 (Ammonia) | 500 SCCM |
| N2O | 5000 SCCM |
| N2 | 5000 SCCM |
| CF4 | 1000 SCCM |
| O2 | 500 SCCM |
| Ar | 1000 SCCM |
| C2H2 | 1000 SCCM |
The system also includes two purge lines for Silane and CH4 process support.
Thin Film Deposition Capability
- Silicon Dioxide (SiO2) deposition
- Silicon Nitride (Si3N4) deposition
- Silicon Carbide (SiC) deposition
- Dielectric thin film deposition
- Passivation layer deposition
- MEMS thin film processing
- Research and pilot production PECVD processing
Typical Applications
- Semiconductor dielectric deposition
- MEMS fabrication
- Compound semiconductor passivation
- Thin film research and development
- University cleanroom PECVD processing
- Advanced materials deposition
- SiO2 and Si3N4 film deposition
- Protective and insulating film deposition
Control System
- Windows 2000 operating system
- Computer workstation included
- Monitor included
- Keyboard included
- User-friendly graphical interface
- Recipe management capability
- Process monitoring and control capability
Facility Requirements
- Electrical power requirements to be confirmed during final configuration review
- Process gas cabinets and gas delivery systems required
- Vacuum pump exhaust and facility exhaust required
- Cooling water and chiller support required
- Facility scrubber and gas safety systems required
- Customer responsible for utilities, facility preparation, exhaust, gas cabinets, abatement systems, and local code compliance unless specifically included in quotation
Included Documentation
- Operation manuals
- Electrical drawings
- Auxiliary equipment manuals
Refurbishment and Support
SemiStar can provide the equipment in refurbished condition with OEM specifications. Refurbishment scope, functional testing, installation, training, utilities integration, and warranty scope will be confirmed based on the final purchase order and customer requirements.
Installation, startup assistance, and training support are available if necessary.
RFQ Information Requested
To help us recommend the best final configuration and support scope, please provide:
- Substrate size and material
- Target thin film deposition application
- Required film type and thickness
- Required process gases and chemistry
- Expected throughput and production requirements
- Facility readiness and utility information
- Required installation or startup support
- Expected purchase timeline and budget range
Important Notes
- Subject to prior sale without notice.
- Final specifications subject to SemiStar official quotation and inspection confirmation.
- All OEM names, trademarks, and model names belong to their respective owners.
- SemiStar is not the OEM. Product information is provided for reference only and should not be used as final purchase specifications.
- Final purchase specifications, refurbishment scope, warranty terms, installation scope, and commercial terms must follow SemiStar’s official quotation.
Contact SemiStar
SS9892 and OEM-00-PECVD-1