Description
Refurbished Plasma-Therm SLR 720 RIE Etcher & PECVD System
SemiStar Corp. offers one refurbished Plasma-Therm SLR 720 RIE Etcher & PECVD System. This system is configured with two chambers: one chamber for RIE etching and one chamber for PECVD deposition. It is available in refurbished condition with OEM specifications, subject to final inspection, configuration confirmation, and prior sale.
The Plasma-Therm SLR 720 platform is suitable for semiconductor, MEMS, compound semiconductor, university, research institute, and advanced materials applications requiring both plasma etching and PECVD thin-film deposition capability.
Product photos are for reference only. Actual system configuration, accessories, cosmetic condition, utilities, and installed options should be confirmed by SemiStar’s final quotation and inspection report.
Availability
| Equipment Model | Plasma-Therm SLR 720 RIE Etcher & PECVD |
| Equipment Type | RIE Etcher and PECVD System |
| Category | Etch / RIE / ICP / PECVD |
| Manufacturer / OEM | Plasma-Therm |
| Condition | Refurbished, used good condition |
| Chamber Configuration | Two chambers: one RIE chamber and one PECVD chamber |
| Quantity | 1 set |
| Warranty | 6 months after shipment, subject to final quotation terms |
| Installation / Training | Available if necessary; scope and cost to be confirmed |
| Price | Contact SemiStar by filling out the inquiry form below |
| Validity | Subject to prior sale without notice |
System Description
The Plasma-Therm SLR 720 is a dual-chamber plasma processing system configured for both RIE etching and PECVD deposition. This configuration provides flexibility for research and process development users who need plasma etch capability and dielectric or passivation film deposition capability on one platform.
The system is suitable for RIE etching, plasma surface treatment, dielectric film deposition, passivation processes, and compound semiconductor or MEMS process development.
Current Configuration
- Plasma-Therm SLR 720 system
- Two-chamber configuration
- One RIE etch chamber
- One PECVD deposition chamber
- MKS mass flow controllers installed
- Endpoint detection system installed
- RF Power Products RF generator installed
- Hot cathode controller installed
- Research and pilot production plasma processing capability
Installed Gas Configuration
| Gas | MFC Range |
|---|---|
| Oxygen (O2) | 50 SCCM |
| CHF3 | 200 SCCM |
| SF6 | 200 SCCM |
| CF4 | 100 SCCM |
| Oxygen (O2) | 50 SCCM |
| Helium (He) | 100 SCCM |
| Chlorine (Cl2) | 100 SCCM |
| BCl3 | 100 SCCM |
All listed gas channels are configured with MKS MFCs. Final gas assignment by chamber should be confirmed during system inspection and quotation review.
RF Power Configuration
- RF Power Products RF5S RF generator
- 500 W RF power
- 13.56 MHz frequency
Endpoint / Vacuum Related Configuration
- Endpoint system: SC Technology Inc. Delta laser head
- Model information: DES-200LPT / DES3320
- Hot cathode controller: HP 919
Typical Applications
- RIE plasma etching
- Fluorine-based silicon and dielectric etching
- Chlorine-based compound semiconductor etching
- PECVD dielectric film deposition
- Passivation film deposition
- MEMS process development
- Compound semiconductor research
- University and advanced materials laboratory use
Facility Requirements
- Electrical power requirements to be confirmed during final configuration review
- Process gas cabinets and gas delivery systems required
- Vacuum pump and exhaust requirements to be reviewed
- Cooling water/chiller requirements to be confirmed
- Facility exhaust and scrubber compatibility required
- Customer responsible for utilities, facility preparation, gas safety systems, exhaust, abatement, and local code compliance unless specifically included in quotation
Refurbishment and Support
SemiStar can provide the equipment in refurbished condition with OEM specifications. Refurbishment scope, functional testing, installation, training, utilities integration, and warranty scope will be confirmed based on the final purchase order and customer requirements.
The standard offering includes a 6-month warranty after shipment unless otherwise stated in the official quotation. Installation and training can be quoted separately if required.
RFQ Information Requested
To help us recommend the best final configuration and support scope, please provide:
- Substrate size and material
- Target etch or deposition process
- Required film type or etch material
- Required gas configuration changes if any
- Required RF power or process temperature range
- Expected process result targets
- Need for installation, startup, or training support
- Facility readiness and utility information
- Expected purchase timeline and budget range
Important Notes
- Subject to prior sale without notice.
- Final specifications subject to SemiStar official quotation and inspection confirmation.
- All OEM names, trademarks, and model names belong to their respective owners.
- SemiStar is not the OEM. Product information is provided for reference only and should not be used as final purchase specifications.
- Final purchase specifications, refurbishment scope, warranty terms, installation scope, and commercial terms must follow SemiStar’s official quotation.
Contact SemiStar
| Plasma-Therm | Dual Chamber 790 PECVD (on side Low Freq. & other side 13.56Mhz) could be converted to both sides 13.56MHz |
| Plasma-Therm | 790 PECVD upper Electrode Low Freq. & Lower electrode High Freq. |
| Plasma-Therm | 790 RIE Parts tool |
| Plasma-Therm | 790 PECVD |
| Plasma-Therm | 790 PECVD |
| Plasma-Therm | SLR 720 RIE |
| Plasma-Therm | SLR 720 RIE |
| Plasma-Therm | SLR 720 RIE |
| Plasma-Therm | SLR 720 RIE |
| Plasma-Therm | SLR 720 RIE |
| Plasma-Therm | VLR VersaWorks Cluster tool- one chamber PECVD |
| Plasma-Therm | VLN (Versaline) ICP – single wafer manual load |
| Plasma-Therm | VLN (Versaline) ICP – two wafer Brooks handler – manual load |
| YESHMDS | Class 10 – all Stainless Steel |
ID-SS5732W and OEM Module-2